共查询到18条相似文献,搜索用时 78 毫秒
1.
2.
化学气相沉积金刚石薄膜的摩擦学性能研究进展 总被引:2,自引:0,他引:2
介绍了化学气相沉积金刚石薄膜的主要方法 ,着重讨论了金刚石薄膜的摩擦学性能研究 ,简要分析了化学气相沉积金刚石薄膜中存在的问题。 相似文献
3.
介绍了化学气相沉积金刚石薄膜的的主要方法,着重讨论了金刚石的摩擦学性能研究,简要分析了化学气相沉积金刚石薄膜中存在的问题。 相似文献
4.
类金刚石薄膜内应力的测试 总被引:2,自引:0,他引:2
采用射频-直流等离子增强化学气相沉积法制备出类金刚石薄膜,用弯曲法测定薄膜的内应力。结果表明,类金刚石薄膜中存在1~4.7GPa的压应力,沉积工艺对薄膜的内应力有很大的影响,薄膜的内应力随极板负偏压的升高而降低,陆C_2H_2气体含量的增加而增大。 相似文献
5.
6.
7.
8.
基于RFPECVD方法不锈钢上沉积类金刚石薄膜的机械与摩擦特性 总被引:6,自引:0,他引:6
讨论用射频等离子体增强化学气相沉积(RFPECVD)工艺,在室温下实现在1Cr18Ni9Ti不锈钢基底上镀类金刚石(DLC)膜.为提高DLC膜的结合力,首先在不锈钢基底上沉积Ti/TiN/TiC功能梯度膜.借助所设计的界面过渡层,成功地在不锈钢基底上沉积了一定厚度的DLC膜.通过优化沉积参数,所沉积的DLC膜在与100Cr6钢球对磨时摩擦系数低于0.020.在摩擦过程中DLC膜的磨损机制借助SEM、Raman分析进行了研究. 相似文献
10.
11.
12.
真空阴极弧离子镀类金刚石碳(DLC)膜的碳弧稳定性研究 总被引:1,自引:0,他引:1
选用氩气、氩气加氢气、氩气加乙炔等气体作为介质,石墨作为靶材进行真空阴极弧离子镀来制备类金刚石碳膜。石墨电弧有其独特的电弧特性曲线,不同气体介质对碳弧特性的影响不同,磁场的大小对电弧的稳定性有很大作用,碳弧下基片偏流随电弧电压的增加而减小,试验得到表面光滑的类金刚石碳(DLC)膜,对膜的表面进行了SEM分析。 相似文献
13.
SiOx-DLC (diamond-like coating) films as candidates for protection coating of polymers were prepared by using a pulse-biased inductively coupled plasma chemical vapor deposition system with acetylene, tetramethylsilane and oxygen gasses. Effects of the gas composition and O2 plasma pre-treatment on adhesion of the SiOx-DLC films were investigated. Adhesion strength of Si-DLC films (with 0% oxygen) was almost the same to that of undoped DLC films. By employing O2-plasma pre-treatment, adhesion strength of the Si-DLC films was considerably improved, while that of the undoped DLC films was not. The SiOx-DLC films with the carbon to oxygen (O/C) ratio of 0.15 showed adhesion strength as high as that of the Si-DLC films on the O2-plasma pre-treated substrate. However, further improvement of adhesion strength of the SiOx-DLC was not realized by employing the O2-plasma pre-treatment. On the other hand, the SiOx-DLC films showed favorable feature of high deposition rate and large optical band gap although higher O/C ratio (> 0.15) brought about poor adhesion strength of the films. 相似文献
14.
Diamond-like carbon (DLC) films were successfully prepared on glass substrates and surfaces of selenium drums via radio frequency plasma enhanced chemical vapor deposition method. The microstructure, surface morphology, hardness, film adhesion, and tribological properties of the films were characterized and evaluated by X-ray photoelectron spectroscopy, atomic force microscopy, and micro-sclerometer and friction-wear spectrometer. The results showed that DLC films have smooth surfaces, homogeneous particle sizes, and excellent tribological properties, which can be used to improve the surface quality of the selenium drums and prolong their service life. 相似文献
15.
磷掺杂类金刚石薄膜的制备与性能研究 总被引:1,自引:0,他引:1
应用等离子体浸没离子注入与沉积方法合成了磷掺杂的类金刚石(P doped diamond like carbon,P-doped DLC)薄膜.结构分析表明磷以微米级岛状结构分散于DLC薄膜表层,P的掺杂增加了DIE薄膜的无序性,俄歇能谱证明岛型区域是由P、C、O三种元素形成的化合物,衰减全反射傅里叶红外光谱(ATR-FTIR)的分析结果显示存在P-O-P和P-O-C的非对称伸缩振动.掺杂表面表现出强烈的亲水性(水接触角为16.9°),体外血小板粘附实验结果显示,P掺杂DLC薄膜表面粘附的血小板少且变形小,表现出的血液相容性优于热解碳和未改性DLC.P-doped DLC薄膜与水的界面张力为2.7 Nj/cm2,具有较理想的接近于血细胞的界面张力,因此与血液保持了较高的相容性. 相似文献
16.
17.
18.
类金刚石薄膜的激光损伤特性及工艺优化 总被引:1,自引:1,他引:1
采用脉冲真空电弧沉积(PVAD)技术制备了类金刚石(DLC)薄膜,并对其抗激光损伤特性进行了研究,优化了制备工艺.对DLC薄膜激光损伤阈值(LIDT)的测试结果表明,随着厚度的增加,薄膜的LIDT开始呈下降趋势,当厚度达到100nm以上时,则趋于一个稳定值.正交实验结果的处理和分析表明,在所给定的工艺参数范围内,主回路电压是影响DLC膜抗激光损伤性能的最主要因素,基片温度、清洗时间和脉冲频率则影响较小.为得到较好的抗激光损伤能力,采用PVAD技术制备DLC薄膜的最佳工艺参数为:清洗时间20 min、基片温度150℃、脉冲频率5 Hz、主回路电压150 V.退火处理会使DLC薄膜的激光损伤阈值明显提高. 相似文献