共查询到19条相似文献,搜索用时 203 毫秒
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TaN和NiCr是AlGaN/GaN HEMTs微波集成电路中薄膜电阻最为常用的两种材料.文中对比了在SiC衬底上生长的这两种材料的薄膜电阻的可靠性.通过TaN和NiCr薄膜电阻的对比,发现TaN薄膜电阻的方块电阻(Rs)随着退火温度的上升而增大,然而NiCr薄膜电阻的Rs却出现相反的趋势.同时发现随着退火温度的上升TaN薄膜电阻的s.和接触电阻(Rc)的变化远远小于NiCr薄膜电阻的变化.在400℃退火及等离子刻蚀机的氧等离子暴露后,TaN薄膜电阻的Rs只下降了0.7Ω,大概2.56%,并且Rc上升了0.1Ω,大概6.6%.但是NiCr薄膜电阻的Rs.和Rc在不同的退火条件下经过氧等离子暴露后发生了很大的变化.因此,TaN薄膜电阻在氮气保护下经过400℃退火后在氧等离子暴露下更为稳定. 相似文献
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TaN和NiCr是AlGaN/GaN HEMTs微波集成电路中薄膜电阻最为常用的两种材料.文中对比了在SiC衬底上生长的这两种材料的薄膜电阻的可靠性.通过TaN和NiCr薄膜电阻的对比,发现TaN薄膜电阻的方块电阻(Rs)随着退火温度的上升而增大,然而NiCr薄膜电阻的Rs却出现相反的趋势.同时发现随着退火温度的上升TaN薄膜电阻的s.和接触电阻(Rc)的变化远远小于NiCr薄膜电阻的变化.在400℃退火及等离子刻蚀机的氧等离子暴露后,TaN薄膜电阻的Rs只下降了0.7Ω,大概2.56%,并且Rc上升了0.1Ω,大概6.6%.但是NiCr薄膜电阻的Rs.和Rc在不同的退火条件下经过氧等离子暴露后发生了很大的变化.因此,TaN薄膜电阻在氮气保护下经过400℃退火后在氧等离子暴露下更为稳定. 相似文献
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采用射频磁控溅射法在 Pt/TiO2/SiO2/Si(100) 衬底上制备了Ba0.7Sr0.3TiO3薄膜,研究了工作气压、衬底温度等溅射参数对Ba0.7Sr0.3TiO3薄膜结构和电学性质的影响.使用 XRD 分析了工作气压为 2Pa、衬底温度分别为 200 ℃、400 ℃、600℃(组a),以及衬底温度为600℃、工作气压分别为 1.5Pa、2.0Pa、2.5Pa、3.0Pa 和 5.0Pa (组b)两组薄膜的微结构,结果表明工作气压在 2.5Pa 以下、衬底温度为 600℃时沉积的薄膜具有较好的钙钛矿结构.在 1.5Pa 条件下溅射的薄膜具有明显的(111)择优取向.在2.5Pa时,Pt/Ba0.7Sr0.3TiO3/Pt电容有最优铁电性能,在外加4 V电压(电场为 80 kV/cm)下,剩余极化 (Pr) 和矫顽场(Ec)分别为 2.32 μC/cm2、21.1 kV/cm. 相似文献
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锰铜计是一种特种传感器,主要用于测量冲击波产生的超高压力。其量程上限可达50GPa,是现有传感器中最高的。为满足国防工程的特殊需要,须进一步提高传感器的量程上限及缩短传感器的响应时间。笔者通过传感器的结构设计、敏感材料和封装材料的研制以及采用新的传感器制备工艺,制作了一种新型的薄膜化的锰铜传感器,所得到的主要结论及创新性的结果可归纳如下: 相似文献
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为了研制可用于高温环境下进行应变测量的应变层,采用脉冲激光沉积(PLD)法在陶瓷基底上制备了氧化铟锡(ITO)薄膜.研究了PLD法中不同基底温度对ITO薄膜显微结构、电学性能以及阻温特性的影响.采用X射线衍射仪(XRD)测试了薄膜的晶体结构,通过四点探针测量法测得薄膜的薄层电阻,采用场发射扫描电子显微镜(FESEM)对... 相似文献
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Enhancing the Sensitivity of Percolative Graphene Films for Flexible and Transparent Pressure Sensor Arrays
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Zhuo Chen Tian Ming Mahomed Mehdi Goulamaly Heming Yao Daniel Nezich Marek Hempel Mario Hofmann Jing Kong 《Advanced functional materials》2016,26(28):5061-5067
Flexible and transparent pressure sensor arrays can find applications in many places such as touch panels, artificial skin, or human motion detection. However, conventional strain gauges are rigid and opaque and are not suitable for such applications. Graphene‐based percolative strain gauges can overcome these challenges but currently are still in the infancy of their development. In this work, the performance of graphene‐based percolative strain gauges is investigated and guidelines to improve the durability and sensitivity of graphene films as sensing elements are developed. It is found that the gauge factor depends on the initial resistance of the graphene film. For the same film resistance, it is found that graphene flake size and film morphology also play a role in determining the gauge factor. Increasing the flake–flake resistance through assembly of surfactant molecules between graphene flakes provides an additional route to enhance the gauge factor. Furthermore, encapsulating the percolative film in micrometer‐thin Poly(methyl methacrylate) does not disrupt the sensing process but significantly improves the sensor's durability. Finally, thus enhanced graphene strain gauges are integrated into flexible and transparent pressure sensor arrays that exhibit high reproducibility and sensitivity. 相似文献
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NiCr溅射薄膜内应力的研究 总被引:1,自引:0,他引:1
本文采用磁控溅射法在0.5mm厚的40Cr钢基片上沉积1 ̄12μm的NiCr合金薄膜,运用钠光平面干涉法测量NiCr溅射薄膜的内应在力,研究表明影响NiCr薄膜内应力的主要因素是工作气压和基片温度,并运用Klokolm理论对该影响作用进行了分析。 相似文献
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利用射频磁控溅射的方法,在Si(111)衬底上制备了LiNbO3薄膜。采用X射线衍射(XRD)和扫描电子显微镜(SEM)研究了衬底温度、退火温度和溅射气体压强对LiNbO3薄膜结晶和表面形貌的影响,并用椭圆偏振仪测量了薄膜的厚度和折射率。结果表明:衬底温度为450℃时制备的薄膜,退火前后都没有LiNbO3相生成;衬底温度为500~600℃时,LiNbO3薄膜出现(012)、(104)和(116)面衍射峰,经600℃退火后3个衍射峰的强度加强;衬底温度为600℃时,经600~900℃退火得到的LiNbO3薄膜,除出现(012)、(104)和(116)面衍射峰外,还出现(006)面衍射峰;溅射气体压强从0.8 Pa增大到2.4 Pa时,经800℃退火后得到的LiNbO3薄膜表面晶粒团簇变小,而0.8 Pa制备的薄膜经800℃退火后LiNbO3相的结晶程度较其它压强下完善;900℃退火后得到的LiNbO3薄膜折射率为2.25,与LiNbO3晶体相当。 相似文献
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3D Graphene Films Enable Simultaneously High Sensitivity and Large Stretchability for Strain Sensors
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Fei Pan Si‐Ming Chen Yuhan Li Zhuchen Tao Jianglin Ye Kun Ni Han Yu Bin Xiang Yibin Ren Faxiang Qin Shu‐Hong Yu Yanwu Zhu 《Advanced functional materials》2018,28(40)
Integration of 2D membranes into 3D macroscopic structures is essential to overcome the intrinsically low stretchability of graphene for the applications in flexible and wearable electronics. Herein, the synthesis of 3D graphene films (3D‐GFs) using chemical vapor deposition (CVD) is reported, in which a porous copper foil (PCF) is chosen as a template in the atmospheric‐pressure CVD preparation. When the 3D‐GF prepared at 1000 °C (noted as 3D‐GF‐1000) is transferred onto a polydimethylsiloxane (PDMS) membrane, the obtained 3D‐GF‐1000/PDMS hybrid film shows an electrical conductivity of 11.6 S cm?1 with good flexibility, indicated by small relative resistance changes (ΔR/R0) of 2.67 and 0.36 under a tensile strain of 50% and a bending radius of 1.6 mm, respectively. When the CVD temperature is reduced to 900 °C (generating a sample noted as 3D‐GF‐900), the 3D‐GF‐900/PDMS hybrid film exhibits an excellent strain‐sensing performance with a workable strain range of up to 187% and simultaneously a gauge factor of up to ≈1500. The 3D‐GF‐900/PDMS also shows a remarkable durability in resistance in repeated 5000 stretching‐releasing cycles. Kinetics studies show that the response of ΔR/R0 upon strain is related to the graphitization and conductivity of 3D‐GF which are sensitive to the CVD preparation temperature. 相似文献
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利用磁控溅射法在硅(Si)衬底上沉积了Ta2O5薄膜,对薄膜进行了不同温度的退火处理,并利用X射线衍射仪对薄膜的微观结构进行了分析.然后在Si的背面和介电薄膜的上面沉积Pt电极,组成了金属—氧化物—半导体( MOS)电容器,对不同温度下退火得到的薄膜制备的MOS电容器的电学性能进行了研究.结果表明,薄膜在700℃开始结... 相似文献