制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时，制备条件诸如功率、气压等对薄膜性能的影响. 主要通过测量薄膜方块电阻随退火温度的变化情况，探索Ge2Sb2Te5薄膜的成长机理. 实验结果表明，不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别，而随着溅射气压的上升，薄膜方块电阻随退火温度的增加，下降的速率增加，意味着由面心立方结构转变为六方结构所需的结晶温度降低     

制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时,制备条件诸如功率、气压等对薄膜性能的影响.主要通过测量薄膜方块电阻随退火温度的变化情况,探索Ge2Sb2Te5薄膜的成长机理.实验结果表明,不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别,而随着溅射气压的上升,薄膜方块电阻随退火温度的增加,下降的速率增加,意味着由面心立方结构转变为六方结构所需的结晶温度降低.     

溅射参数对Ge2Sb2Te5薄膜光学常数的影响

研究了溅射参数对Ge2Sb2Te5薄膜的光学常数随波长变化关系的影响,结果表明：(1)当溅射功率一定时,随溅射氩气气压的增加Ge2Sb2Te5薄膜的折射率先增大后减小,而消光系数先减小后增大.(2)当溅射氩气气压一定时,对于非晶态薄膜样品,在500nm波长以下,折射率随溅射功率的增加先增加后减小,消光系数则逐渐减小;在500nm以上,折射率随溅射功率的增加逐渐减少,消光系数先减小后增加.对于晶态薄膜样品,在整个波长范围折射率随溅射功率的增加先减小后增加,消光系数则逐渐减少.(3)薄膜样品的光学常数都随波长的变化而变化,在长波长范围变化较大,短波长范围变化较小.探讨了影响Ge2Sb2Te5薄膜光学常数的机理.     

制备条件对Ge2Sb2Te5薄膜电学性能的影响

研究了磁控溅射制备Ge2Sb2Te5薄膜时,制备条件诸如功率、气压等对薄膜性能的影响.主要通过测量薄膜方块电阻随退火温度的变化情况,探索Ge2Sb2Te5薄膜的成长机理.实验结果表明,不同溅射功率下制备的薄膜经不同温度退火后方块电阻没有明显的区别,而随着溅射气压的上升,薄膜方块电阻随退火温度的增加,下降的速率增加,意味着由面心立方结构转变为六方结构所需的结晶温度降低.     

溅射参数对Ge_2Sb_2Te_5薄膜光学常数的影响

研究了溅射参数对 Ge2 Sb2 Te5 薄膜的光学常数随波长变化关系的影响 ,结果表明 :(1)当溅射功率一定时 ,随溅射氩气气压的增加 Ge2 Sb2 Te5 薄膜的折射率先增大后减小 ,而消光系数先减小后增大 .(2 )当溅射氩气气压一定时 ,对于非晶态薄膜样品 ,在 5 0 0 nm波长以下 ,折射率随溅射功率的增加先增加后减小 ,消光系数则逐渐减小 ;在 5 0 0 nm以上 ,折射率随溅射功率的增加逐渐减少 ,消光系数先减小后增加 .对于晶态薄膜样品 ,在整个波长范围折射率随溅射功率的增加先减小后增加 ,消光系数则逐渐减少 .(3)薄膜样品的光学常数都随波长的变化而变化 ,在长波     

Long-Term Structural Instabilities in Undoped and Nitrogen-Doped Ge2Sb2Te5 Films

We investigated the compositional, microstructural, and electrical properties of undoped and nitrogen-doped Ge₂Sb₂Te₅ films subjected to long-term thermal annealing under air atmosphere. Considering the absence of chemical and structural changes, the sheet resistances of samples annealed at 200°C may potentially be related to changes in the lattice parameters. The disappearance of Ge–N bonds and decrease of Ge and N concentrations in samples treated at 300°C were found to depend on the cubic to hexagonal phase transition.     

Sb2Te3 and Bi2Te3 Thin Films Grown by Room-Temperature MBE

Sb₂Te₃ and Bi₂Te₃ thin films were grown on SiO₂ and BaF₂ substrates at room temperature using molecular beam epitaxy. Metallic layers with thicknesses of 0.2?nm were alternately deposited at room temperature, and the films were subsequently annealed at 250°C for 2?h. x-Ray diffraction and energy-filtered transmission electron microscopy (TEM) combined with high-accuracy energy-dispersive x-ray spectrometry revealed stoichiometric films, grain sizes of less than 500?nm, and a texture. High-quality in-plane thermoelectric properties were obtained for Sb₂Te₃ films at room temperature, i.e., low charge carrier density (2.6?×?10¹⁹?cm^?3), large thermopower (130???V?K^?1), large charge carrier mobility (402?cm²?V^?1?s^?1), and resulting large power factor (29???W?cm^?1?K^?2). Bi₂Te₃ films also showed low charge carrier density (2.7?×?10¹⁹?cm^?3), moderate thermopower (?153???V?K^?1), but very low charge carrier mobility (80?cm²?V^?1?s^?1), yielding low power factor (8???W?cm^?1?K^?2). The low mobilities were attributed to Bi-rich grain boundary phases identified by analytical energy-filtered TEM.     

Electrode Materials for Ge2Sb2Te5-Based Memristors

The memristive characteristics of Ge₂Sb₂Te₅ (GST) as a representative chalcogenide material have been verified and show great potential for memory applications. This paper focuses on the influence of different electrode materials on the properties of GST-based memristors. Several electrode materials (Ti₃W₇, Ag, Cu, and Ta) were adopted in devices with a top electrode (TE)/GST/bottom electrode (BE) layer structure. Through different current–voltage (I–V) curves, it was demonstrated that devices with Ag or Cu electrodes are suitable for GST-based memristors, while those utilizing inert electrodes are not. Because of their relatively smaller radius and lower binding energy, it is much easier for Ag and Cu to diffuse into the GST layer and form conductive filaments. The results obtained from memristors annealed at different temperatures further support the conductive filament model. Moreover, an optimized Cu/Ag/GST/Cu device structure different from the traditional TE/GST/BE structure is proposed, showing improved stability with higher R _off/R _on ratio and good endurance.     

Confinement-Induced Phonon Softening and Hardening in Sb2Te3 Thin Films

Scaling effects in Sesqui-chalcogenides are of major interest to understand and optimize their performance in heavily scaled applications, including topological insulators and phase-change devices. A combined experimental and theoretical study is presented for molecular beam epitaxy-grown films of antimony-telluride  (Sb₂Te₃). Structural,vibrational, optical, and bonding properties upon varying confinement are studied for thicknesses ranging from 1.3 to 56 nm. In ultrathin films, the low-frequency coherent phonons of A_1g¹ symmetry are softened compared to the bulk (64.5 cm⁻¹ at 1.3 nm compared to 68 cm⁻¹ at 55.8 nm). A concomitant increase of the high-frequency A_1g² Raman mode is seen. X-ray diffraction analyses unravel an accompanying out of plane stretch by 5%, mainly stemming from an increase in the Te-Te gap. This conclusion is supported by density functional theory slab models, which reveal a significant dependency of chemical bonding on film thickness. Changes in atomic arrangement, vibrational frequencies, and bonding extend over a thickness range much larger than observed for other material classes. The finding of these unexpectedly pronounced thickness-dependent effects in quasi-2D material Sb₂Te₃ allows tuning of the film properties with thickness. The results are discussed in the context of a novel bond-type, characterized by a competition between electron localization and delocalization.     

Local Structure and Anti-Structural Defects of Tin in Amorphous and Crystalline Ge2Sb2Te5 Films

Semiconductors - The absorption Mössbauer spectroscopy on 119Sn impurity centers shows that germanium atoms in the structure of amorphous and polycrystalline Ge2Sb2Te5 films have different...     

Tunable Volatility of Ge2Sb2Te5 in Integrated Photonics

The operation of a single class of optical materials in both a volatile and nonvolatile manner is becoming increasingly important in many applications. This is particularly true in the newly emerging field of photonic neuromorphic computing, where it is desirable to have both volatile (short‐term transient) and nonvolatile (long‐term static) memory operation, for instance, to mimic the behavior of biological neurons and synapses. The search for such materials thus far have focused on phase change materials where typically two different types are required for the two different operational regimes. In this paper, a tunable volatile/nonvolatile response is demonstrated in a photonic phase‐change memory cell based on the commonly employed nonvolatile material Ge₂Sb₂Te₅ (GST). A time‐dependent, multiphysics simulation framework is developed to corroborate the experimental results, allowing us to spatially resolve the recrystallization dynamics within the memory cell. It is then demonstrated that this unique approach to photonic memory enables both data storage with tunable volatility and detection of coincident events between two pulse trains on an integrated chip. Finally, improved efficiency and all‐optical routing with controlled volatility are demonstrated in a ring resonator. These crucial results show that volatility is intrinsically tunable in normally nonvolatile GST which can be used in both regimes interchangeably.     

Influence of the Degree of Crystallinity on the Dispersion of the Optical Parameters of Ge2Sb2Te5 Phase-Change Memory Thin Films

Semiconductors - Abstract—Extensive studies of Ge2Sb2Te5 material are associated with the possibility of producing multilevel nonvolatile elements for high-speed integrated optical functional...     

硫系相变材料Ge1Sb2Te4和Ge2Sb2Te5薄膜相变速度及电学输运性质研究

利用磁控溅射方法制备了Ge1Sb2Te4和Ge2Sb2Te5两种相变存贮材料的薄膜.原位X射线衍射(XRD)的结果表明,随着退火温度的升高,Ge1Sb2Te4和Ge2Sb2Te5薄膜都逐步晶化,材料结构发生了从非晶态到面心立方结构、再到六角密堆结构的转变.由衍射峰的半宽高可以看出,在达到第一次相变温度后,Ge2Sb2T...     

激光致晶态Ge2Sb2Te5相变介质的光学常数

利用椭偏仪和光谱仪研究了结晶程度对Ge2Sb2Te5相变薄膜光学常数的影响.当初始化仪转速固定时,随激光功率的增加,折射率基本随之减小,消光系数逐渐增大,透过率逐渐减小;当激光功率固定时,随转速的增大,折射率也随之增大,消光系数随之减小,透过率逐渐增加.非晶态与晶态间的变换、薄膜微结构的变化(包括原子间键合状态的变化)以及薄膜内残余应力是影响Ge2Sb2Te5相变薄膜复数折射率的主要原因.测量了CD-RW(可擦重写光盘)中Ge2Sb2Te5薄膜非晶态和晶态的反射率.     

激光致晶态Ge2Sb2Te5相变介质的光学常数

利用椭偏仪和光谱仪研究了结晶程度对Ge2Sb2Te5相变薄膜光学常数的影响.当初始化仪转速固定时,随激光功率的增加,折射率基本随之减小,消光系数逐渐增大,透过率逐渐减小;当激光功率固定时,随转速的增大,折射率也随之增大,消光系数随之减小,透过率逐渐增加.非晶态与晶态间的变换、薄膜微结构的变化(包括原子间键合状态的变化)以及薄膜内残余应力是影响Ge2Sb2Te5相变薄膜复数折射率的主要原因.测量了CD-RW(可擦重写光盘)中Ge2Sb2Te5薄膜非晶态和晶态的反射率.     

钛掺杂对Ge2Sb2Te5薄膜相变特性的改善

利用椭偏光谱术与XRD对钛掺杂Ge2Sb2Te5薄膜中钛元素对体系的光学性质及其微结构的影响进行了实验研究。进而对该薄膜进行的变温阻抗实验表明,钛掺杂Ge2Sb2Te5薄膜与未掺杂的薄膜相比具有更好的热稳定性。基于对薄膜样品的数据保持能力测试的实验数据,经阿伦纽斯外推处理可知,钛掺杂Ge2Sb2Te5薄膜样品的10年数据保持温度要高于未掺杂Ge2Sb2Te5薄膜样品。本文的实验结果均证实,钛掺杂Ge2Sb2Te5薄膜更适合应用于相变随机存取存储器中。     

Single Pulse Laser‐Induced Phase Transitions of PLD‐Deposited Ge2Sb2Te5 Films

Phase transformations between amorphous and crystallized states are induced by irradiation with a single nanosecond laser pulse in Ge₂Sb₂Te₅ films grown by pulsed laser deposition. By adjusting the laser fluence, the two different phases are obtained and can be distinguished by their different optical reflectivity. The effect of laser fluence on the crystalline nature of the films is studied in detail. Large structural differences between the laser‐irradiated and thermally annealed films are revealed, due to the high heating rate and short duration of the laser pulse. X‐ray reflectivity measurements show a density increase of 3.58% upon laser‐induced crystallization.     

Ge2Sb2Te5的电化学特性及化学机械抛光

从电化学角度研究了Ge2Sb2Te5薄膜在化学机械抛光液中的作用，以及不同的pH值和H2O2浓度下的电化学特性. 采用Solartron SI1287电化学设备测试了Ge2Sb2Te5薄膜在溶液中的开路电位和动电位扫描. 开路电位结果表明：Ge2Sb2Te5在pH值为10的抛光液中表现出钝化行为；而抛光液的pH值为11时，开始向活化转变；当pH值为12时，薄膜处于活化状态. 在动电位扫描过程中，不同的pH值和H2O2浓度下，薄膜的扫描曲线形状相似，表明薄膜腐蚀具有相同的反应机理. 自制碱性抛光液，对Ge2Sb2Te5薄膜进行化学机械抛光，用SEM和EDS对抛光后的结构进行分析. 结果表明，通过CMP实现了Ge2Sb2Te5填充结构.     

Ge2Sb2Te5的电化学特性及化学机械抛光

从电化学角度研究了Ge2Sb2Te5薄膜在化学机械抛光液中的作用,以及不同的pH值和H2O2浓度下的电化学特性.采用Solartron SI1287电化学设备测试了Ge2Sb2Te5薄膜在溶液中的开路电位和动电位扫描.开路电位结果表明:Ge2Sb2Te5在pH值为10的抛光液中表现出钝化行为;而抛光液的pH值为11时,开始向活化转变;当pH值为12时,薄膜处于活化状态.在动电位扫描过程中,不同的pH值和H2O2浓度下,薄膜的扫描曲线形状相似,表明薄膜腐蚀具有相同的反应机理.自制碱性抛光液,对Ge2Sb2Te5薄膜进行化学机械抛光,用SEM和EDS对抛光后的结构进行分析.结果表明,通过CMP实现了Ge2Sb2Te5填充结构.     

Ge2Sb2Te5的电化学特性及化学机械抛光

从电化学角度研究了Ge2Sb2Te5薄膜在化学机械抛光液中的作用,以及不同的pH值和H2O2浓度下的电化学特性.采用Solartron SI1287电化学设备测试了Ge2Sb2Te5薄膜在溶液中的开路电位和动电位扫描.开路电位结果表明:Ge2Sb2Te5在pH值为10的抛光液中表现出钝化行为;而抛光液的pH值为11时,开始向活化转变;当pH值为12时,薄膜处于活化状态.在动电位扫描过程中,不同的pH值和H2O2浓度下,薄膜的扫描曲线形状相似,表明薄膜腐蚀具有相同的反应机理.自制碱性抛光液,对Ge2Sb2Te5薄膜进行化学机械抛光,用SEM和EDS对抛光后的结构进行分析.结果表明,通过CMP实现了Ge2Sb2Te5填充结构.