Electrical and crystallographic properties of nanocrystalline CdSe<Subscript>0.5</Subscript>S<Subscript>0.5</Subscript> composite thin films deposited by dip method

A dip method is employed for the deposition of CdSe_0.5S_0.5 composite thin film at room temperature. Cadmium sulphate, thiourea and sodium selenosulphate were used as the basic source material. Solid solution with cubic phase was observed from X-ray diffraction studies. The specific conductivity of the film was found to be in order of 10⁻⁷ (Ωcm)⁻¹. The temperature dependence of an electrical conductivity, thermoelectrical power, carrier density and carrier mobility for CdSe_0.5S_0.5 thin films have been examined. The low temperature conductivity is governed by a variable range of conduction while grain boundary limited conduction mechanism is predominant at higher temperature.     

Characterization of Cd1−x Zn x Se thin films deposited at low temperature by chemical route

Optoelectronic technologically important pseudo-binary Cd_1−x Zn _x Se thin films with a variable composition (0 < x < 1) has been developed by chemical bath deposition method. The objective to study growth kinetics, physical, microscopic, compositional, optical, electrical and structural changes. Cd_1−x Zn _x Se have been deposited on non-conducting glass substrate in tartarate bath containing Cd⁺² and Zn⁺² ions with sodium selenosulphate with an aqueous alkaline medium at 278 K. The quality and the thickness of the films are depends upon deposition temperature, deposition time and pH, etc. X-ray diffraction (XRD), atomic absorption spectroscopy, optical absorption, scanning electron microscopy and thermoelectric technique characterized the films. The XRD study indicates the polycrystalline nature in single cubic phase over whole range of composition. Analysis of absorption spectra gave direct type band gap, the magnitude of which increases non-linearly as zinc content in the film is increased and dc electrical conductivity at room temperature was found to decreases from 10⁻⁷ to 10⁻⁸ (Ω cm)⁻¹. All the films show n-type conductivity. The promising features observed are the formation of continuous solid solutions in a single cubic phase.     

Measurement of the Thermal Conductivity of Nanodeposited Material

The small size of nanomaterials deposited by either focused ions or electron beams has prevented the determination of reliable thermal property data by existing methods. A new method is described that uses a suspended platinum hot film to measure the thermal conductivity of a nanoscale deposition. The cross section of the Pt film needs to be as small as 50 nm × 500 nm to have sufficient sensitivity to detect the effect of the beam-induced nanodeposition. A direct current heating method is used before and after the deposition, and the change in the average temperature increase of the Pt hot film gives the thermal conductivity of the additional deposited material. In order to estimate the error introduced by the one-dimensional analytical model employed, a two-dimensional numerical simulation was conducted. It confirmed the reliability of this method for situations where the deposit extends onto the terminals by (1 μm or more. Measurements of amorphous carbon (a-C) films fabricated by electron beam induced deposition (EBID) produced thermal conductivities of 0.61 W · m⁻¹ · K⁻¹ to 0.73 W · m⁻¹ · K⁻¹ at 100 K to 340 K, values in good agreement with those of a-C thin films reported in the past.     

Thin films of boron nitride grown by CVD

For the first time, thin films of boron nitride were deposited by chemical vapour deposition on to polished silicon and other metal substrates using the inorganic compound H₃BNH₃ (aminodiborane) and ammonia as carrier gas. The substrate temperature was varied from 400 to 600°C. The films were chemically inert and adherent to the substrates. The FTIR spectrum of the film showed B-N-B absorption at 800 cm⁻¹, B-N stretching at 1056 cm⁻¹, and also a weak absorption at 1340cm⁻¹ corresponding to B-N-B bending vibration. Deposited films also exhibited X-ray diffraction pattern with interplanar spacing with (002) plane of hexagonal boron nitride.     

Preparation and thermoelectric properties of BP films on SOI and sapphire substrates

The chemical vapor deposited (CVD) BP films on Si(100) (190 nm)/SiO _x (370 nm)/Si(100) (625 μm) (SOI) and sapphire (R-plane) (600 μm) substrates were prepared by the thermal decomposition of the B₂H₆–PH₃–H₂ system in the temperature range of 800–1050 °C for the deposition time of 1.5 h. The BP films were epitaxially grown on the SOI substrate, but a two-step growth method, i.e., a buffer layer at lower temperature and sequent CVD process at 1000 °C for 1.5 h was effective for obtaining a smooth film on the sapphire substrate. The electrical conduction types and electrical properties of these films depended on the growth temperature, gases flow rates and substrates. The thermal conductivity of the film could be replaced by the substrate, so that the calculated thermoelectric figure-of-merit (Z) for the BP films on the SOI substrate was 10⁻⁴–10⁻³/K at 700–1000 K. Those on the sapphire substrate were 10⁻⁶–10⁻⁵/K for the direct growth and 10⁻⁵–10⁻⁴/K for the two-step growth at 700–900 K, indicating that the film on a sapphire by two-step growth would reduce the defect concentrations and promote the electrical conductivity.     

Sol–gel derived Co<Subscript>3</Subscript>O<Subscript>4</Subscript> thin films: effect of annealing on structural,morphological and optoelectronic properties

Nanocrystalline Co₃O₄ thin films were prepared on glass substrates by using sol–gel spin coating technique. The effect of annealing temperature (400–700 °C) on structural, morphological, electrical and optical properties of Co₃O₄ thin films were studied by X-ray diffraction (XRD), Scanning Electron Microscopy, Electrical conductivity and UV–visible Spectroscopy. XRD measurements show that all the films are nanocrystallized in the cubic spinel structure and present a random orientation. The crystallite size increases with increasing annealing temperature (53–69 nm). These modifications influence the optical properties. The morphology of the sol–gel derived Co₃O₄ shows nanocrystalline grains with some overgrown clusters and it varies with annealing temperature. The optical band gap has been determined from the absorption coefficient. We found that the optical band gap energy decreases from 2.58 to 2.07 eV with increasing annealing temperature between 400 and 700 °C. These mean that the optical quality of Co₃O₄ films is improved by annealing. The dc electrical conductivity of Co₃O₄ thin films were increased from 10⁻⁴ to 10⁻² (Ω cm)⁻¹ with increase in annealing temperature. The electron carrier concentration (n) and mobility (μ) of Co₃O₄ films annealed at 400–700 °C were estimated to be of the order of 2.4–4.5 × 10¹⁹ cm⁻³ and 5.2–7.0 × 10⁻⁵ cm² V⁻¹ s⁻¹ respectively. It is observed that Co₃O₄ thin film annealing at 700 °C after deposition provide a smooth and flat texture suited for optoelectronic applications.     

Structural and surface morphological properties of chemically deposited Mo<Subscript>0.5</Subscript>W<Subscript>0.5</Subscript>S<Subscript>2</Subscript> thin film

Preparation of layered type semiconductor Mo_0.5W_0.5S₂ ⁻ thin films has been successfully done by using chemical bath deposition method. Objective of the studies are related to structural, optical, morphological and electrical properties of the thin films. The preparation method is based on the reaction between tartarate complex of Mo and W with thiourea in an aqueous alkaline medium at 363 K. X-Ray diffraction reveals a polycrystalline film composed of both MoS₂ and WS₂ phases. The optical study shows that the band gap of the film is 1.6 eV. Electrical conductivity is high which is in the order of 10⁻³–10⁻² (Ώ cm)⁻¹.     

Properties of Va metal-B films prepared by r.f.-sputtering

Nb_100−x B _x alloy films were prepared by the r.f.-sputtering method in the chemical composition range of 30 ≦x ≦ 76. Nb_100−x B _x (30 ≦x ≦ 54) films consisted of the amorphous state, and NbB₂ crystal phase was observed on Nb_100−xB_x (67 ≦x ≦ 76) films. A remarkable preferred orientation with the (001) plane of NbB₂ in parallel to the film surface was observed on Nb₃₃B₆₇ film. d.c. electrical conductivity of Nb_100−xB_x (30 ≦x ≦ 76) films decreased with increasing content of boron in the range from 7.3×10³ to 7.6 ×10²Ω⁻¹cm⁻¹. Micro-Vickers hardness of Nb_100−x B _x (30 ≦x ≦ 76) films exhibited the values of 1070 to 2060 kg mm².     

Growth and characterization of HfO2 high-k gate dielectric films by laser molecular beam epitaxy (LMBE)

The HfO₂ gate dielectric films were fabricated by the laser molecular beam epitaxy (LMBE) technique. High-resolution transmission electron microscopy (HRTEM) observation showed that under optimized condition, there is no detectable SiO₂ interfacial layer in the as-deposited film and a SiO₂ interfacial layer of about 0.4 nm was formed at the Si interface due to the post deposition annealing. Capacitance–voltage (C–V) measurement of the film revealed that the equivalent oxide thickness was about 1.3 nm. Such a film showed very low leakage current density of 1.5 × 10⁻² A cm⁻² at 1 V gate bias from the current–voltage (I–V) analysis. The conduction mechanisms as a function of temperature T and electric field E were also systematically studied.     

Fabrication,dielectric and ferroelectric properties of Ba<Subscript>0.6</Subscript>Sr<Subscript>0.4</Subscript>TiO<Subscript>3</Subscript> film with preferred orientation

Ba_0.6Sr_0.4TiO₃ films were fabricated by RF magnetron sputtering method. The X-ray diffraction (XRD) showed that the preferred orientation of films growing on platinum Si substrates can be tailored by sputtering pressure. The processing parameters such as sputtering pressure and substrate temperature were optimized to obtain a developed perovskite film with (110) preferred orientation. The polarization hysteresis loops and permittivity–voltage curves of the (110)-oriented film have been investigated,which demonstrated that the film is in ferroelectric phase at room temperature. Besides, it had excellent fatigue properties without polarization reduction after about 10¹⁰ switch cycles, and showed low leakage current (10⁻⁹–10⁻⁷ A/cm²) within an applied voltage of 5 V. Finally, the leakage current mechanism was studied.     

Structural and electrical studies of Cd<Subscript>1−x</Subscript>Zn<Subscript>x</Subscript> Te thin film by vacuum evaporation technique

Cd_1−xZn_xTe (where x = 0.02, 0.04, 0.06, 0.08) thin film have been deposited on glass substrate at room temperature by thermal evaporation technique in a vacuum at 2 × 10⁻⁵ torr. The structural analysis of the films has been investigated using X-ray diffraction technique. The scanning electron microscopy has been employed to know the morphology behaviour of the thin films. The temperature dependence of DC electrical conductivity has been studied. In low temperature range the thermal activation energy corresponding to the grain boundary—limited conduction are found to be in the range of 38–48 μeV, but in the high temperature range the activation energy varies between 86 and 1.01 meV. The built in voltage, the width of the depletion region and the operating conduction mechanism have been determined from dark current voltage (I–V) and capacitor-voltage (C–V) characteristics of Cd_1−xZn_xTe thin films.     

Characterization of poly(vinylidene fluoride-trifluoroethylene) 50/50 copolymer films as a gate dielectric

Thin films of poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) 50/50 copolymer were prepared by spin coating on p-Si substrate. Thermal behavior of the film was observed by measuring the film thickness with ellipsometry as a function of the temperature and abrupt volume expansion was observed at 130–150 °C. Capacitance-voltage (C-V) and current-voltage (I-V) behavior of the aluminum/P(VDF-TrFE)/p-Si MIS (metal-insulator-semiconductor) structures were studied and dielectric constant of the P(VDF-TrFE) film was measured to be about 15.3 at optimum condition. No hysteresis was observed in the C-V curve for films as deposited and annealed (70–200 °C). Films annealed at temperatures higher than the volume expansion temperature showed substantial surface roughness due to the crystallization. Flat band voltage (V_FB) of the MIS structure with as deposited films was about −0.3 V and increased up to −2.0 V with annealing. This suggested that positive charges were generated in the film. Electronic properties of the annealed P(VDF-TrFE) film at above melting temperature were degraded substantially with larger shift in flat band voltage, low dielectric constant and low breakdown voltage. Organic thin film transistor with pentacene active layer and P(VDF-TrFE) as a gate dielectric layer showed a mobility of 0.31 cm²/V·s and threshold voltage of −0.45 V.     

Studies on tin oxide films prepared by electron beam evaporation and spray pyrolysis methods

Transparent conducting tin oxide thin films have been prepared by electron beam evaporation and spray pyrolysis methods. Structural, optical and electrical properties were studied under different preparation conditions like substrate temperature, solution flow rate and rate of deposition. Resistivity of undoped evaporated films varied from 2.65 × 10⁻² ω-cm to 3.57 × 10⁻³ ω-cm in the temperature range 150–200°C. For undoped spray pyrolyzed films, the resistivity was observed to be in the range 1.2 × 10⁻¹ to 1.69 × 10⁻² ω-cm in the temperature range 250–370° C. Hall effect measurements indicated that the mobility as well as carrier concentration of evaporated films were greater than that of spray deposited films. The lowest resistivity for antimony doped tin oxide film was found to be 7.74 × 10⁻⁴ ω-cm, which was deposited at 350°C with 0.26 g of SbCl₃ and 4 g of SnCl₄ (SbCl₃/SnCl₄ = 0.065). Evaporated films were found to be amorphous in the temperature range up to 200°C, whereas spray pyrolyzed films prepared at substrate temperature of 300– 370°C were poly crystalline. The morphology of tin oxide films was studied using SEM.     

Structural,optical and microscopic properties of chemically deposited In<Subscript>2</Subscript>Se<Subscript>3</Subscript> thin films

Solar cell technologically important binary indium selenide thin film has been developed by relatively simple chemical method. The reaction between indium chloride, tartaric acid, hydrazine hydrate and sodium selenosulphate in an aqueous alkaline medium at room temperature gives deposits In₂Se₃ thin film. Various preparative parameters are discussed. The as grown films were found to be transparent, uniform, well adherent, red in color. The prepared films were studied using X-ray diffraction, scanning electron microscopy, atomic absorption spectroscopy, Energy dispersive atomic X-ray diffraction, optical absorption and electrical conductivity properties. The direct optical band gap value E_g for the films was found to be as the order of 2.35 eV at room temperature and having specific electrical conductivity of the order of 10⁻² (Ω cm)⁻¹ showing n-type conduction mechanism. The utility of the adapted technique is discussed from the point of view of applications considering the optoelectric and structural data obtained.     

Effect of oxygen partial pressure on the electrical and optical properties of highly (200) oriented p-type Ni<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>O films by DC sputtering

Thin films of NiO (bunsenite) with (200) preferential orientation were synthesized on glass substrates by direct current sputtering technique in Ar+O₂ atmosphere. Nanostructural properties of the NiO films were investigated by X-ray diffraction and also by atomic force microscopic (AFM) studies. Electrical and optical properties of the deposited films were investigated as a function of different partial pressure of oxygen in the sputtering gas mixture during deposition. The films showed p-type electrical conduction and the conductivity depends on the partial pressure of oxygen. The electrical conductivity (σ_RT) was found to be .0615 S cm⁻¹ for films deposited with 100% O₂ and its value sharply decreased with the decrease the partial pressure of O₂; for example σ_RT for 50% O₂ was 6.139 × 10⁻⁵ S cm^-1. The mechanism of the origin of p-type electrical conductivity in the NiO film is discussed from the viewpoint of nickel or oxygen vacancies, which generate holes and electrons respectively. X-ray photoelectron spectroscopic studies supported the above argument. Corresponding optical properties showed that the transparency decreases with increasing oxygen partial pressure and the bandgap also decreases.     

Amorphous Li–B–W–O solid-state electrolyte thin film for a solid-state ionic power sources

Li–B–W–O thin film serving as a solid-state electrolyte layer for a solid-state thin film battery has been deposited on a stainless steel (SUS)/Si substrate by thermal evaporation deposition at room temperature. By energy dispersive X-ray spectroscopy and inductively coupled plasma-atomic emission spectrometer measurements, the as-grown thin film showed a stoichiometry of Li_2.99BW_1.8O₉. The as-grown Li–B–W–O solid-state electrolyte thin film possessed an amorphous structure as confirmed by X-ray diffraction. Field emission scanning electron microscopy measurements of the film cross section showed a dense structure that did not have any large defects such as cracks or voids. For a cell structure of SUS/Li–B–W–O/SUS/Si, an impedance measurement conducted at room temperature revealed an ionic conductivity of 2.15 × 10⁻⁷ S cm⁻¹ with activation energy of 0.52 eV, which suggests that Li–B–W–O thin film can possibly be used as an electrolyte in solid-state thin film batteries.     

Characterization of Tin disulphide thin films prepared at different substrate temperature using spray pyrolysis technique

Thin films of tin disulphide on glass substrates were prepared by spray pyrolysis technique using precursor solutions of SnCl₂·2H₂O and n–n dimethyl thiourea at different substrate temperatures varied in the range 348–423 K. Using the hot probe technique the type of conductivity is found to be n type. X ray diffraction analysis revealed the polycrystalline nature with increasing crystallinity with respect to substrate temperature. The preferential orientation growth of SnS₂ compound having hexagonal structure along (002) plane increased with the substrate temperature. The size of the tin disulphide crystallites with nano dimension were determined using the Full Width Half Maximum values of the Bragg peaks and found to increase with the substrate temperature. The surface morphology had been observed on the surface of these films using scanning electron microscope. The optical absorption and transmittance spectra have been recorded for these films in the wavelength range 400–800 nm. Thickness of these films was found using surface roughness profilometer. The absorption coefficient (α) was determined for all the films. Direct band gap values were found to exist in all the films deposited at different substrate temperatures. The value of room temperature resistivity in dark decreased from 5.95 × 10³ Ω cm for the amorphous film deposited at low temperature (348 K) to 2.22 × 10³ Ω cm for the polycrystalline film deposited at high temperature (423 K) whereas the resistivity values in light decreased from 1.48 × 10³ to 0.55 × 10³ Ω cm respectively, which is determined using the four probe method. Activation energy of these thin films was determined by Arrhenius plot.     

Substrate influence on the morphological and conductive properties of modified iron-phthalocyanine thin films

In this work, molecular thin films prepared with the cyano(phthalocyaninate)iron(III) [PcFeCN] _n macrocycle axially modified with the 1,8-dihydroxyanthraquinone ligand were studied. The films were formed by using electrodeposition and evaporation techniques onto Si(001) and 7059 Corning glass substrates in order to investigate the influence of the substrate and the preparation method on the morphological and conductive properties of the films. In this study, Fourier transform infrared spectroscopy, scanning electron microscopy, energy-dispersive spectroscopy and atomic force microscopy (AFM) techniques were employed. From AFM measurements, it was found that the evaporated films exhibited a more regular distribution with low roughness values in contrast with the electrodeposited films. The electrical conductivity results for the evaporated films exhibited semiconductor behaviours with conductivity values at room-temperature of 10⁻⁶ Ω⁻¹cm⁻¹. Better conductivity results were obtained for films onto glass substrates.     

Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films

Tantalum oxide (Ta₂O₅) films were formed on silicon (111) and quartz substrates by dc reactive magnetron sputtering of tantalum target in the presence of oxygen and argon gases mixture. The influence of substrate bias voltage on the chemical binding configuration, structural, electrical and optical properties was investigated. The unbiased films were amorphous in nature. As the substrate bias voltage increased to −50 V the films were transformed into polycrystalline. Further increase of substrate bias voltage to −200 V the crystallinity of the films increased. Electrical characteristics of Al/Ta₂O₅/Si structured films deposited at different substrate bias voltages in the range from 0 to −200 V were studied. The substrate bias voltage reduced the leakage current density and increased the dielectric constant. The optical transmittance of the films increased with the increase of substrate bias voltage. The unbiased films showed an optical band gap of 4.44 eV and the refractive index of 1.89. When the substrate bias voltage increased to −200 V the optical band gap and refractive index increased to 4.50 eV and 2.14, respectively due to the improvement in the crystallinity and packing density of the films. The crystallization due to the applied voltage was attributed to the interaction of the positive ions in plasma with the growing film.     

Anisotropic behaviors in polycrystalline Cd-doped GaSe thin films

GaSe thin films were deposited by thermal evaporation technique with Cd doping. X-ray diffraction analysis showed that Cd-doped films have polycrystalline structure with the preferred orientation along (008) direction. Temperature dependent electrical conductivity measurements were carried out in the temperature range of 100–400 K along perpendicular and parallel directions to the growth direction for the films exhibiting p-type conduction determined by hot probe technique. The room temperature conductivity values of the films were found to be as 1.5 × 10⁻⁸ and 4.9 × 10⁻¹² (Ω cm)⁻¹ due to the measurements along both perpendicular and parallel directions, respectively. The difference in the conductivity values is the indication of electrical anisotropy in the samples. Carrier conduction in the films was provided by the thermionic emission in the high temperature region (310–400 K) with almost the same activation energies in both directions. Space charge limited current analysis at different temperatures reveals the existence of two discrete sets of trap levels for both perpendicular and parallel directions. Calculated trap levels and trap concentrations are 99 meV, 3.5 × 10¹² cm⁻³ and 418 meV, 2.2 × 10⁵ cm⁻³ for perpendicular direction, 58 meV, 2.1 × 10¹⁸ cm⁻³ and 486 meV, 1.4 × 10¹² cm⁻³ for parallel direction. The differences in the values of the trap levels and concentrations for both directions confirm the existence of electrical anisotropy in Cd-doped GaSe thin films, because of the structural anisotropy between and inside the crystallites.