Novel synthesis of aligned Zinc oxide nanorods on a glass substrate by sonicated sol-gel immersion

For the first time, aligned ZnO nanorod structured thin films have been synthesized on a glass substrate, which had been coated with an Al-doped ZnO thin film, using the sonicated sol-gel immersion method. These nanorods were found to have an average diameter of 100 nm and an average length of 500 nm, with hexagonal wurtzite phase grew preferentially along the c-axis direction. A sharp ultra-violet (UV) emission centred at 383 nm corresponding to the free exciton recombination was observed in a room temperature photoluminescence (PL) spectrum. The prepared ZnO nanorod structured thin film is transparent in the visible region with an average transmittance of 78% in the 400-800 nm wavelength range and high absorbance properties in the UV region (< 400 nm). The results indicate that the prepared ZnO nanorods are suitable for ultra-violet photoconductive sensor applications.     

Fabrication of TiO2 nanotube film by well-aligned ZnO nanorod array film and sol-gel process

High density TiO₂ nanotube film with hexagonal shape and narrow size distribution was fabricated by templating ZnO nanorod array film and sol-gel process. Well-aligned ZnO nanorod array films obtained by aqueous solution method were used as template to synthesize ZnO/TiO₂ core-shell structure through sol-gel process. Subsequently, TiO₂ nanotube array films survived by removing the ZnO nanorod cores using wet-chemical etching. Polycrystalline anatase TiO₂ nanotube films were ∼ 1.5 μm long and ∼ 100 nm in inter diameter with a wall thickness of ∼ 10 nm.     

Sulfidation growth and characterization of nanocrystalline ZnS thin films

Nanocrystalline ZnS thin films are prepared on glass and quartz substrates by sulfurizing ZnO thin films in the H₂S-containing mixture at 500 °C. These films are investigated by X-ray diffraction, scanning electron morphology, optical transmittance and photoluminescence spectra. The results show that the ZnS thin films have the hexagonal structure with a c-axis preferred orientation. Also, these nanostructure ZnS thin films with the grain size of ∼50 nm along the c-axis, exhibit the optical transparency as high as ∼80% in the visible region. It is found that sulfur replacement of oxygen sites in crystal lattices and recrystallization can take place during sulfidation, resulting in an evident increase of the grain size for the sulfurized films. Under the optimum sulfidation time of 2 h, the resultant ZnS thin films have a high crystallinity, low defect concentration and good optical properties with the band gap of 3.66 eV.     

Study on ZnO thin films deposited on sol-gel grown ZnO buffer by RF magnetron sputtering

ZnO thin films with preferential C-orientation and dense microstructure have been prepared using RF magnetron sputtering method by the insertion of a sol-gel grown ZnO buffer layer. The XRD results show that the C-orientation of the film deposited on ZnO buffer is obviously better than that deposited directly on lime-glass substrate. With an increase of the RF power from 100 to 380 W, C-orientation of the films with ZnO buffer improves and the grain size increases. When the RF power equals 550 W, the orientation of the film changes to (1 0 0) and the grain size decreases. The crystalline and microstructure quality of the films can be improved after annealing, however, the grain size is not much dependent on the annealing temperature in the range of 560-610 °C.     

Rapid preparation, characterization, and photoluminescence of ZnO films by a novel chemical method

A novel and simple chemical route was developed for the deposition of ZnO film from aqueous solution, integrating the merits of successive ionic layer adsorption and reaction and chemical bath deposition. ZnO thin films on glass and Si(1 0 0) substrates were deposited with the precursor of zinc-ammonia complex. As-deposited ZnO film exhibits good crystallinity with the hexagonal wurtzite crystalline structure and the preferential orientation along (0 0 2) plane. With a dense and continuous appearance, the film is composed of ZnO particles in even size of 200-300 nm. Under the excitation of 340 nm, strong and sharp near band gap emission (∼391 nm) dominates the photoluminescence spectra with several weak emission peaks related to the deep level (∼450-500 nm). In addition, the mechanism for the deposition process of ZnO from aqueous solution was preliminarily discussed.     

Highly luminescent columnar ZnO films grown directly on n-Si and p-Si substrates by low-temperature electrochemical deposition

In this study, nanocolumnar zinc oxide thin films were catalyst-free electrodeposited directly on n-Si and p-Si substrates, what makes an important junction for optoelectronic devices. We demonstrate that ZnO thin films can be grown on Si at low cathodic potential by electrochemical synthesis. The scanning electron microscopy SEM showed that the ZnO thin films consist of nanocolumns with radius of about 150 nm on n-Si and 200 nm on p-Si substrates, possess uniform size distribution and fully covers surfaces. X-ray diffraction (XRD) measurements show that the films are crystalline material and are preferably grown along (0 0 2) direction. The impact of thermal annealing in the temperature range of 150-800 °C on ZnO film properties has been carried out. Low-temperature photoluminescence (PL) spectra of the as-prepared ZnO/Si samples show the extremely high intensity of the near bandgap luminescence along with the absence of visible emission. The optical quality of ZnO thin films was improved after post-deposition thermal treatment at 150 °C and 400 °C in our experiments, however, the luminescence intensity was found to decrease at higher annealing temperatures (800 °C). The obtained results indicate that electrodeposition is an efficient low-temperature technique for the growth of high-quality and crystallographically oriented ZnO thin films on n-Si and p-Si substrates for device applications.     

Nanostructures and sensing properties of ZnO prepared using normal and oblique angle deposition techniques

Nanostructured zinc oxide (ZnO) for gas sensing application has been prepared by using normal and oblique angle sputtering deposition techniques under different substrate temperatures. Oblique angle plasma beam deposition is demonstrated effectively growing large-area uniformly aligned and inclined ZnO nanorod arrays on catalyst-free silicon substrate due to a self-shadowing mechanism, whereas normal radio frequency sputtering deposition yields nanoparticles as island growth mode. Furthermore, the density of the nanorod arrays is dependent on the incident angle of ZnO plasma beam. With an increase of the incident flux angle, large inter spacing was induced, resulting in sparser nanorod arrays. The nanorod arrays grown with an incident angle of 70° have an average diameter of ∼ 150-300 nm and length of ∼ 700-750 nm. The experimental data from characterization of the samples indicates that the obtained samples at different substrate temperatures and incident angles have wurtzite structure with a c-axis orientation.Sensing characterization reveals that the nanorod-based sensor shows higher sensitivity, faster response and recovery time, as well as better reproducibility than that of nanoparticle-based gas sensor to 100 ppm hydrogen and methane at low operating temperature below 150 °C due to the porosity and large grain boundaries of the nanorod arrays. It demonstrates that oblique angle of sputtering deposition is a simple, inexpensive synthesis process to get high-porosity nanostructures and as a result, improves the sensing properties of fabricated ZnO sensors, which permits us to obtain sensors with high sensitivity, low operating temperature and stability.     

The effects of substrate temperature on the structure and properties of ZnO films prepared by pulsed laser deposition

ZnO thin films were prepared by pulsed laser deposition (PLD) on glass substrates with growth temperature from room temperature (RT) to 500 °C. The effects of substrate temperature on the structural and optical properties of ZnO films have been investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission spectra, and RT photoluminescence (PL) measurements. The results showed that crystalline and (0 0 2)-oriented ZnO films were obtained at all substrate temperatures. As the substrate temperature increased from RT to 500 °C, the ratio of grain size in height direction to that in the lateral direction gradually decreased. The same grain size in two directions was obtained at 200 °C, and the size was smallest in all samples, which may result in maximum E_g and E₀ of the films. UV emission was observed only in the films grown at 200 °C, which is probably because the stoichiometry of ZnO films was improved at a suitable substrate temperature. It was suggested that the UV emission might be related to the stoichiometry in the ZnO film rather than the grain size of the thin film.     

Physical and sensing properties of ZnO:F:Al thin films deposited by sol-gel

Fluorine and aluminum-doped zinc oxide thin films, ZnO:F:Al, were prepared on soda-lime glass substrates by the sol-gel method and repeated dip-coating. The effect of the solution ageing and film thickness on the physical characteristics of the films was studied. Two ageing times, namely, two and seven days, and three different thicknesses, in the order of 220, 330, and 520 nm, were the main variables used in this work. As-deposited ZnO:F:Al films showed a high electrical resistivity, however after a vacuum thermal treatment, it was registered a significant decrease. Structural, optical, and morphological characterizations were carried out in vacuum-annealed films. The X-ray diffraction (XRD) patterns revealed that both as-deposited and vacuum-annealed ZnO:F:Al thin films were polycrystalline with a hexagonal wurtzite-type structure with a well-defined (002) diffraction peak, irrespective of the ageing time of the starting solution. The (002) peak shows a proportional increase with the thickness magnitude. An average crystallite size of about 20 nm was estimated using the well-known Scherrer's formula. From the surface morphological study it was observed that the grain size is almost independent of the ageing time of the starting solution, and the film thickness. Films presented an average optical transmittance in the visible range (400-700 nm) in the order of 90%, as well as a band gap of 3.3 eV. The gas-sensing properties of ZnO:F:Al thin films in an atmosphere containing different concentrations of carbon monoxide, and at different operation temperatures were probed. The highest sensitivity registered was of the order of 93%.     

The fabrication and application of ZnO:Al thin films in low-frequency inductively coupled plasma fabricated silicon solar cell

A home-made radio frequency magnetron sputtering is used to systematically study the structural, electrical, and optical properties of aluminum doped zinc oxide (ZnO:Al) thin films. The intensity of the (002) peak exhibits a remarkable enhancement with increasing film thickness. Upon optimization, we achieved low resistivity of 4.2 × 10^− 4 Ω cm and high transmittance of ~ 88% for ZnO:Al films. Based on the present experimental data, the carrier transport mechanism is discussed. It is found that the grain boundary scattering needs to be considered because the mean free path of free carrier is comparable to the grain size. The 80 nm-ZnO:Al thin films are then deposited onto low-frequency inductively coupled plasma fabricated silicon solar cells to assess the effect of ZnO:Al thin films on the performance of the solar cells. Optimized ZnO:Al thin films are identified as transparent and conductive oxide thin film layers.     

Growth specificity of vertical ZnO nanorods on patterned seeded substrates through integrated chemical process

A simple and cost effective method has been employed for the random growth and oriented ZnO nanorod arrays over as-prepared and patterned seeded glass substrates by low temperature two step growth process and growth specificity by direct laser writing (DLW) process. Scanning electron microscopy (SEM) images and X-ray diffraction analysis confirm the growth of vertical ZnO nanorods with perfect (0 0 2) orientation along c-axis which is in conjunction with optimizing the parameters at different reaction times and temperatures. Transmission electron microscopy (TEM) images show the formation of vertical ZnO nanorods with diameter and length of ∼120 nm and ∼400 nm respectively. Photoluminescence (PL) spectroscopic studies show a narrow emission at ∼385 nm and a broad visible emission from 450 to 600 nm. Further, site-selective ZnO nanorod growth is demonstrated for its high degree of control over size, orientation, uniformity, and periodicity on a positive photoresist ZnO seed layer by simple geometrical (line, circle and ring) patterns of 10 μm and 5 μm dimensions. The demonstrated control over size, orientation and periodicity of ZnO nanorods process opens up an opportunity to develop multifunctional properties which promises their potential applications in sensor, piezoelectric, and optoelectronic devices.     

Optical and photoluminescence studies of gold nanoparticles embedded ZnO thin films

Gold nanoparticles (AuNPs) embedded ZnO thin films were prepared by sandwiching a thin thermally evaporated Au film between two sputtered ZnO films. The films were characterized by high resolution transmission electron microscopy (HRTEM), glancing angle X-ray diffraction (GXRD), optical absorption and photoluminescence (PL) measurements. GXRD data exhibited peaks which were attributed to the reflections from various ZnO and Au planes. Size dependence of the plasmon absorption was studied by forming nanoparticles with various sizes. Optical absorption spectra showed strong absorption due to localized surface plasmons at about 608, 638 and 676 nm for films having average AuNPs sizes of 27, 40 and 67 nm respectively. AuNPs embedded ZnO film showed a strong reduction in the intensity of photoluminescence, which was prominent in the case of pure ZnO film. The rise in temperature at a single nanoparticle site was calculated to be 22 K for a particle size of 80 nm.     

Low temperature annealing effects on the structure and optical properties of ZnO films grown by pulsed laser deposition

ZnO thin films were deposited on glass substrates at room temperature (RT) ∼500 °C by pulsed laser deposition (PLD) technique and then were annealed at 150-450 °C in air. The effects of annealing temperature on the microstructure and optical properties of the thin films deposited at each substrate temperature were investigated by XRD, SEM, transmittance spectra, and photoluminescence (PL). The results showed that the c-axis orientation of ZnO thin films was not destroyed by annealing treatments; the grain size increased and stress relaxed for the films deposited at 200-500 °C, and thin films densified for the films deposited at RT with increasing annealing temperature. The transmittance spectra indicated that E_g of thin films showed a decreased trend with annealing temperature. From the PL measurements, there was a general trend, that is UV emission enhanced with lower annealing temperature and disappeared at higher annealing temperature for the films deposited at 200-500 °C; no UV emission was observed for the films deposited at RT regardless of annealing treatment. Improvement of grain size and stoichiometric ratio with annealing temperature can be attributed to the enhancement of UV emission, but the adsorbed oxygen species on the surface and grain boundary of films are thought to contribute the annihilation of UV emission. It seems that annealing at lower temperature in air is an effective method to improve the UV emission for thin films deposited on glass substrate at substrate temperature above RT.     

A comparative study on the NO2 gas sensing properties of ZnO thin films, nanowires and nanorods

ZnO thin films were fabricated using the spin coating method, ZnO nanowires by cathodically induced sol-gel deposition by the means of an anodic aluminum oxide (AAO) template, and ZnO nanorods with the hydrothermal technique. For thin film preparation, a clear, homogeneous and stable ZnO solution was prepared by the sol-gel method using zinc acetate (ZnAc) precursor which was then coated on a glass substrate with a spin coater. Vertically aligned ZnO nanowires which were approximately 65 nm in diameter and 10 μm in length were grown in an AAO template by applying a cathodic voltage in aqueous zinc nitrate solution at room temperature. For fabrication of the ZnO nanorods, the sol-gel ZnO solution was coated on glass substrate by spin coating as a seed layer. Then ZnO nanorods were grown in zinc nitrate and hexamthylenetetramine aqueous solution. The ZnO nanorods are approximately 30 nm in diameter and 500 nm in length. The ZnO thin film, ZnO nanowires and nanorods were characterized by X-ray diffraction (XRD) analysis and scanning electron microscope (SEM). The NO₂ gas sensing properties of ZnO thin films, nanowires and nanorods were investigated in a dark chamber at 200 °C in the concentration range of 100 ppb-10 ppm. It was found that the response times of both ZnO thin films and ZnO nanorods were approximately 30 s, and the sensor response was depended on shape and size of ZnO nanostructures and electrode configurations.     

Microstructural and optical properties of Ga-doped ZnO semiconductor thin films prepared by sol-gel process

Transparent thin films of Ga-doped ZnO (GZO), with Ga dopant levels that varied from 0 to 7 at.%, were deposited onto alkali-free glass substrates by a sol-gel process. Each spin-coated film was preheated at 300 °C for 10 min, and then annealed at 500 °C for 1 h under air ambiance. The effects of Ga dopant concentrations on crystallinity levels, microstructures, optical properties, and electrical resistivities of these ZnO thin films were systematically investigated. Photoluminescence spectra of GZO thin films were examined at room temperature. XRD results revealed that the undoped ZnO thin films exhibited a preferred orientation along the (002) plane and that the ZnO thin films doped with Ga showed degraded crystallinity. Experimental results also showed that Ga doping of ZnO thin films could markedly decrease surface roughness, improve transparency in the visible range, and produce finer microstructures than those of undoped ZnO thin films. The most promising films for transparent thin film transistor (TTFT) application produced in this study, were the 3 and 5 at.% Ga-doped ZnO thin films, both of which exhibited an average transmittance of 90.6% and an RMS roughness value of about 2.0 nm.     

The role of the Zn buffer layers in the structural and photoluminescence properties of ZnO films on Zn buffer layers deposited by RF magnetron sputtering

Highly c-axis oriented ZnO thin films were grown on Si (100) substrates with Zn buffer layers. Effects of the Zn buffer layer thickness on the structural and optical qualities of ZnO thin films were investigated for the ZnO films with the buffer layers 90, 110, and 130 nm thick using X-ray diffraction (XRD), photoluminescence (PL) and atomic force microscopy (AFM) analysis techniques. It was confirmed that the quality of a ZnO thin film deposited by RF magnetron sputtering was substantially improved by using a Zn buffer layer. The highest ZnO film quality was obtained with a Zn buffer layer 110 nm thick. The surface roughness of the ZnO thin film increases as the Zn buffer layer thickness increases.     

Preparation of aluminum doped zinc oxide films and the study of their microstructure, electrical and optical properties

Aluminum doped zinc oxide (AZO) polycrystalline thin films were prepared by sol-gel dip-coating process on optical glass substrates. Zinc acetate solutions of 0.5 M in isopropanol stabilized by diethanolamine and doped with a concentrated solution of aluminum nitrate in ethanol were used. The content of aluminum in the sol was varied from 1 to 3 at.%. Crystalline ZnO thin films were obtained following an annealing process at temperatures between 300 °C and 500 °C for 1 h. The coatings have been characterized by X-ray diffraction, UV-Visible spectrophotometry, scanning electron microscopy, and electrical resistance measurement. The ZnO:Al thin films are transparent (∼ 90%) in near ultraviolet and visible regions. With the annealing temperature increasing from 300 °C to 500 °C, the film was oriented more preferentially along the (0 0 2) direction, the grain size of the film increased, the transmittance also became higher and the electrical resistivity decreased. The X-ray diffraction analysis revealed single-phase ZnO hexagonal wurtzite structure. The best conductors were obtained for the AZO films containing 1 at.% of Al, annealed at 500 °C, 780 nm film thickness.     

Preparation,characterization, and photoluminescence study of PVA/ZnO nanocomposite films

ZnO nanoparticles with average diameter of 25 nm were synthesized by a modified sol–gel method and used in the preparation of (in wt.%) (100 − x) poly(vinyl alcohol) (PVA)/x ZnO nanocomposite films, with x = 0, 1, 2, 3, 4, and 5. The PVA/ZnO films were exposed to UV radiation for 96 h and their thermal, morphological, and spectroscopic properties were investigated. In inert atmosphere, the nanocomposite films showed lower thermal stability than the pure PVA film, and the calorimetric data suggest an interaction between PVA and ZnO in the nanocomposite films. Some crystalline phases could be seen in the films with ZnO, and a direct dependence on the ZnO concentration was also observed. The original structure of ZnO nanoparticles remained unaltered in the PVA matrix and they were uniformly distributed on the film surface. The roughness of the PVA film was not modified by the addition of ZnO; however, it increased after 96 h of UV irradiation, more significantly in the nanocomposite films. The films showed an absorption band centered at 370 nm and a broad emission band in the UV–vis region when excited at 325 nm.     

The properties of transparent semiconductor Zn1 − xTixO thin films prepared by the sol-gel method

Transparent semiconductor thin films of Zn_1 − xTi_xO (0 ≦ x ≦ 0.12) were deposited on alkali-free glass substrates by the sol-gel method. The effects of Ti addition on the crystallization, microstructure, optical properties and resistivity of ZnO thin films were investigated. The as-coated films were preheated at 300 °C, and then annealed at 500 °C in air ambiance. X-ray diffraction results showed all polycrystalline Zn_1 − xTi_xO thin films with preferred orientation along the (002) plane. Ti incorporated within the ZnO thin films not only decreased surface roughness but also increased optical transmittance and electrical resistivity. In the present study, the Zn_0.88Ti_0.12O film exhibited the best properties, namely an average transmittance of 91.0% (an increase of ~ 12% over the pure ZnO film) and an RMS roughness value of 1.04 nm.     

Mn-doped ZnO transparent conducting films deposited by DC magnetron sputtering

Mn-doped zinc oxide (ZnO:Mn) thin films with low resistivity and relatively high transparency were firstly prepared on glass substrate by direct current (DC) magnetron sputtering at room temperature. Influence of film thickness on the properties of ZnO:Mn films was investigated. X-ray diffraction (XRD) and scanning electron microscopy (SEM) show that all the deposited films are polycrystalline with a hexagonal structure and have a preferred orientation along the c-axis perpendicular to the substrate. As the thickness increases from 144 to 479 nm, the crystallite size increases while the electrical resistivity decreases. However, as the thickness increases from 479 to 783 nm, the crystallite size decreases and the electrical resistivity increases. When film thickness is 479 nm, the deposited films have the lowest resistivity of 2.1 × 10^− 4 Ω cm and a relatively high transmittance of above 84% in the visible range.