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1.
本文研究了SiO_2掩蔽膜硼离子注入硅的卤钨灯辐照快速退火,测量了注入层表面薄层电阻与退火温度及退火时间的关系,得到了最佳的退火条件。对于采用920(?)SiO_2膜,25keV、1×10~(15)cm~(-2)的~(11)B离子注入样品,经不同时间卤钨灯辐照退火后,测量了注入层的载流子浓度分布,并与950℃、30分钟常规炉退火作了比较。结果表明,卤钨灯辐照快速退火具有电激活率高、注入杂质再分布小以及快速、实用等优点。  相似文献   

2.
人们发现,在高温下氨气中进行SiO_2的热氮化,可以形成有用的薄栅绝缘物,具有热氮化SiO_2膜的MOS二极管的界面特性明显地受氮化条件的影响。在900℃左右,由于氨气分介产生氢气使原来SiO_2膜的性质发生变化导致了平带电压有一个负的漂移,大于1100℃氮化时,得到一个极好的MOS二极管特性,避免了由原先介质击穿所产生的高电场不稳定性。在硅的间隙中央和绝缘物中的电荷可以忽略的情况下,获得了低于10~(10)cm~(-2)电子伏~(-1)的表面态密度。在SiO_2膜上形成一个防止沾污的高势垒。甚至于采用钠沾污栅,MOS二极管的可动离子密度  相似文献   

3.
本文介绍用四乙基正硅酸盐(TEOS)等离子体加速化学气相淀积SiO_2膜的试验研究情况。发现,当采用氧作氧化剂的时候,所产生的膜大约含有1个原子百分比浓度(a/o)的氮或碳。在反应中采用N_2O时,膜中氮浓度略有增加,达到2(a/o)。然而,在没有氧化剂的条件下,氮和碳浓度大致分别为18(a/o)和6(a/o)。膜的台阶覆盖(不考虑氧化剂)接近34%,与主要用硅烷的化学方法淀积的SiO_2膜所达到的10%相比较,有显著的改进。折射率、红外光谱和膜密度,似乎可表征淀积SiO_2膜的特征。TEOS-O_2膜的电特性产生大于6MV/cm的击穿电场,在1MV/cm下,漏电流密度为8×10~(-9)A/cm~2。具有同等厚度的热生长SiO_2的击穿电场和漏电流密度,分别为8MV/cm~2和2×10~(-9)A/cm~2。  相似文献   

4.
本文用雪崩热电子注入技术与MOS C-V技术,研究了软X射线辐照引入于SiO_2中的中性陷阱的性质.给出陷阱俘获截面σ为10~(-15)~10~(-16)cm~2,有效陷阱密度为10~(11)~10~(12)cm~(-2).发现陷阱密度随辐照时间的增加而升高,但很快趋于饱和;陷阱密度并随辐照强度的提高而增大.文中研究了室温及77°K下中性陷阱的俘获特性以及陷阱的解陷作用.还给出了陷阱的退火实验结果.  相似文献   

5.
本文报导丁GaAs表面上淀积液态源PECVD-SiO_2膜掩蔽Zn扩散的规律,估算了Zn在SiO_2膜和GaAs中扩散系数的比值为(1.04~1.85)×10~(-3),在700℃下Zn在GaAs中的横向扩散为结深的3~7倍。这种方法制备的SiO_2膜已应用于GaAs电调变容二极管和LPE-Ga_(1-x)Al-xAs/GaAs DH激光器的研制。  相似文献   

6.
冯文修  陈蒲生  田浦延  刘剑 《半导体学报》2001,22(11):1411-1415
用卤素钨灯作辐射热源快速热氮化 (RTN) 10 nm Si O2 膜 ,制备了〈10 0〉和〈111〉晶向 Si衬底上的 Si- Si Ox Ny-Al电容结构 .研究了电子从〈10 0〉和〈111〉不同晶向 N型硅积累层到 RTN后 Si O2 膜 (或原始 Si O2 膜 )的漏电流和高场 F- N隧穿电流 .研究结果表明 :经 RTN Si O2 膜比原始 Si O2 膜从低场到隧穿电场范围都明显地看到电导增强现象 .比较 RTN后两种不同晶向样品 ,低场漏电流没有多大的差别而在高场从〈10 0〉晶向比从〈111〉晶向 Si隧穿Si Ox Ny 膜的 F- N电流却明显增加 ,借用一种基于横向晶格动量守恒的理论模型解释了这种现象  相似文献   

7.
用卤素钨灯作辐射热源快速热氮化(RTN)10 nm SiO2膜,制备了<100>和<111>晶向Si衬底上的Si-SiOxNy-Al电容结构.研究了电子从〈100〉和〈111>不同晶向N型硅积累层到RTN后SiO2膜(或原始SiO2膜)的漏电流和高场F-N隧穿电流.研究结果表明:经RTN SiO2膜比原始SiO2膜从低场到隧穿电场范围都明显地看到电导增强现象.比较RTN后两种不同晶向样品,低场漏电流没有多大的差别而在高场从<100>晶向比从<111>晶向Si隧穿SiOxNy膜的F-N电流却明显增加,借用一种基于横向晶格动量守恒的理论模型解释了这种现象.  相似文献   

8.
研究了在光学元件上的氧离子辅助淀积SiO_2和TiO_2膜层与离子能量(30-500电子伏特)和离子流密度(0-300微安/厘米~2)的关系。证实了低能和高能离子轰击场能改善SiO_2膜的化学配比,而在低能情况其改善略为大些。对于TiO_2膜,低能轰击能改善化学配比,而高能轰击反而导致明显不利。在高能离子辅助淀积的SiO_2薄膜中氢含量减少到1/10。在低温基片上(50-100℃)制备了牢固的膜层。讨论了膜层的内应力特性。  相似文献   

9.
一、前言 硅放在空气中会氧化,在其表面生成SiO_2膜,这种膜厚度一般是30~50埃,是空气中氧和硅进行反应的结果。进行高温加热时可以得到更厚的SiO_2膜。 众所周知,这种硅氧化膜与水晶或石英相同。它作为电绝缘材料具有最高的电阻率(~10~(18)Ωcm(参见第5讲中的图10),而热膨胀系数又小到5~7×10~(-7),以及可利用压电效应作稳定的振荡子等,因而一般说来其应用范围是广泛的。 如表1和表2所示,在硅器件及其制作中,SiO_2作为主要成份材料(二氧化硅玻璃)是何等重要,可以说是不可缺少的。  相似文献   

10.
本文研究了γ辐照对光通信用1.3μm InGaAsP/InP双异质结发光管特性的影响,结果表明:在辐照剂量1×10~5—1×10~7rad范围内,辐照前后器件的光功率和电带宽未发生明显变化;当辐照剂量>1×10~7rad后,器件的光功率下降,电带宽上升。器件在辐照前后的l-V特性和EL图象未发生变化。用少子寿命的变化度(τ/τ_0)讨论了有关结果。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

13.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

14.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

15.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

16.
Waveguide multilayer optical card (WMOC) is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling & processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic (VB) language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.  相似文献   

17.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

18.
The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.  相似文献   

19.
Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.  相似文献   

20.
An insert layer structure organic electroluminescent device(OLED) based on a new luminescent material (Zn(salen)) is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn(salen)/Liq/LiF/A1/CuPc/NPD/Zn(salen)/Liq/LiF/A1. Effective insert electrode layers comprising LiF(1nm)/Al(5 nm) are used as a single semitransparent mirror, and bilayer cathode LiF(1 nm)/A1(100 nm) is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.  相似文献   

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