ZnO纳米线的低温生长及其发光特性

采用电场辅助电化学沉积的方法在阳极氧化铝模板中沉积出ZnO纳米线阵列.透射电子显微镜和X射线衍射测试结果表明,制备的纳米线是单晶ZnO纳米线,形貌均匀,直径大约为60nm,并且择优于(101)晶面.对生长过程中所加的辅助电场的作用给出了初步解释.光致发光谱表明,在350～650nm范围内存在一个很宽的发光峰.     

催化剂辅助化学气相沉积法制备准单晶ZnO纳米线

利用Au催化辅助化学气相沉积生长技术,在n-Si(111)衬底上制备了准单晶的ZnO纳米线.X射线衍射分析的结果表明, ZnO纳米线具有明显的沿(0001)方向定向生长的特征.扫描电子显微镜分析表明,ZnO纳米线的典型直径约为100 nm,长度为2～5 μm.讨论了Au催化辅助化学气相沉积生长技术制备ZnO纳米线的原理.     

掺锂氧化锌纳米线的光致发光特性

氧化锌（ZnO）是直接宽带隙半导体材料,有高达60meV的激子束缚能,是下一代短波长光电材料的潜在材料。首先制备了优良的多孔氧化铝（Anodic Aluminum Oxide）有序孔洞阵列;以其为模板,采用直流电化学沉积的方法,在其规则排列的孔中沉积得到锌的纳米线;然后将其在高温下氧化,得到氧化锌的纳米线。XRD图显示Li掺杂前后的ZnO纳米线具有较好的晶态结构。对Li掺杂前后的ZnO纳米线进行光学特性测量,结果表明,ZnO纳米线有两个发光峰,分别位于382nm和508nm处;Li掺杂较大地改善了ZnO纳米线的发光性能,本征发光峰移到395nm处,蓝绿发光强度也有了很大程度的提高。     

模板合成法制备ZnO纳米线的研究

在草酸和硫酸电解液中分别制备了孔径为40 nm和20 nm左右的多孔氧化铝模板,用直流电化学沉积的方法,在模板孔洞内电解沉积Zn,对其进行高温下的氧化,可得到高度有序的ZnO纳米线.扫描电子显微镜观察显示,多晶的Zn纳米线均匀地填充到多孔氧化铝六角排布的孔洞里,直径与模板孔径相当.X射线衍射谱测量证实,制备的Zn纳米线和ZnO纳米线均为多晶结构,并且对比了模板孔径对纳米线结构的影响.测量了多孔氧化铝厚膜和Zn/Al2O3组装体的吸收光谱,发现其在红外波段的吸收系数有逐渐降低的趋势.     

蓝宝石衬底上水平生长ZnO纳米线及紫外敏感性能研究

在无催化剂条件下,采用化学气相沉积(CVD)方法在蓝宝石(110)衬底上制备了ZnO纳米线.X射线衍射(XRD)图谱上只有ZnO的(100)衍射峰和(110)衍射峰.扫描电子显微镜分析表明,ZnO纳米线在蓝宝石衬底上水平生长.在样品上蒸镀了金叉指电极,以256nm的紫外光作为光源,测试了样品的紫外光敏感性能,研究表明水平生长的ZnO纳米线对紫外光具有较快的响应,在5V偏压下,光电流与暗电流比为30;当波长为354nm时光响应度达到最大值为0.56A/W.     

蓝宝石衬底上水平生长ZnO纳米线及紫外敏感性能研究

在无催化剂条件下,采用化学气相沉积(CVD)方法在蓝宝石(110)衬底上制备了ZnO纳米线.X射线衍射(XRD)图谱上只有ZnO的(100)衍射峰和(110)衍射峰.扫描电子显微镜分析表明,ZnO纳米线在蓝宝石衬底上水平生长.在样品上蒸镀了金叉指电极,以256nm的紫外光作为光源,测试了样品的紫外光敏感性能,研究表明水平生长的ZnO纳米线对紫外光具有较快的响应,在5V偏压下,光电流与暗电流比为30;当波长为354nm时光响应度达到最大值为0.56A/W.     

ZnO纳米线的快速生长机理及其场发射性能研究

为了快速制备具有优良场发射性能的ZnO纳米线,对ZnO纳米线的生长机理及场发射性能进行研究。首先采用优化的两步法制备出高长径比的ZnO纳米线,其次采用SEM对ZnO的微观形貌进行表征,然后,在分析形貌特点的基础上,说明了强碱体系下ZnO纳米线薄膜的快速生长机理。最后,对典型样品的场发射性能进行了测试。测试果表明,优化后的两步法,只需3h即可获得直径为40~50nm,长度为2.2~2.7μm,长径比高达54的纳米线。薄膜的开启电场为3.6V/μm,阈值场强为9.1V/um,场增强因子β高达3 391。研究表明,高pH值溶液可以加快ZnO纳米线沿C轴方向的择优生长,获得高长径比的ZnO纳米线,进而获得优良的场发射性能。     

图形化氧化锌纳米线的合成和场发射性能研究

通过简单的热蒸发在ITO电极上合成图形化氧化锌纳米线,利用SEM,XRD,EDX和PL光谱分析氧化锌纳米线的表面形貌、微观结构和光学特性,并测试其场发射性能。SEM表明,ZnO纳米线的直径约为100-200nm,长度大于5um,且均匀长在ITO电极表面。场发射测试表明,图形化ZnO纳米线的开启电场和阈值电场分别为1.6 V/m和4.92 V/m,在电场强度为5.38 V/m时发射电流高达 2.26 mA/cm2,经4.5h场发射测试后发射电流的浮动低于5%。低的开启电场、高的发射电流和好的稳定性表明图形化氧化锌纳米线是一种应用前景广阔的场发射材料。     

自催化方式制备ZnO纳米线及光致发光特性

采用化学气相沉积法,不用催化剂,在Si(111)基片上制备了ZnO纳米线。扫描电子显微镜(SEM)表征发现ZnO纳米线的直径在100nm左右。X射线衍射(XRD)图谱上只存在ZnO的(002)衍射峰。室温下光致发光谱(PL)中出现了389nm和357nm的紫外峰以及五个蓝光峰(450,468,474,481和491nm)。389nm峰为自由激子复合发射357nm峰是在LO声子的参与下,自由载流子碰撞形成自由激子过程的发光行为;468nm峰系电子从氧空位形成的浅施主能级向价带跃迁发光;450nm峰系电子从导带向锌空位形成的浅受主能级跃迁发光;474,481和491nm峰是声子伴线。     

ZnO纳米线的气相沉积制备及场发射特性

运用气相沉积方法分别在硅片表面和钨针尖上制备了非取向生长的ZnO纳米线,并通过场发射显微镜研究了纳米线样品的平面场发射特性和针尖场发射特性.结果显示,非取向生长的ZnO纳米线薄膜场发射的开启电压和阈值电压所对应的场强分别为4.7和7.6V/μm,场增强因子达103量级,具有较阵列生长的ZnO纳米线更为优异的场发射能力.非取向生长ZnO纳米线薄膜场发射能力的增强归因于其所具有的稀疏结构避免了强场作用下屏蔽效应的产生,有效地提高了薄膜场发射的电流密度.将ZnO纳米线组装在钨针尖上能够明显地改善针尖的场发射性能,在超高分辨显微探针领域具有良好应用前景.     

Synthesis of sulfur-doped ZnO nanowires by electrochemical deposition

Sulfur-doped zinc oxide (ZnO) nanowires have been successfully synthesized by an electric field-assisted electrochemical deposition in porous anodized aluminum oxide template at room temperature. X-ray diffraction and the selected area electron diffraction results show that the as-synthesized nanowires are single crystalline and have a highly preferential orientation. Transmission electron microscopy observations indicate that the nanowires are uniform with an average diameter of 70 nm and length up to several tens of micrometers. X-ray photoelectron spectroscopy further reveals the presence of S in the ZnO nanowires. Room-temperature photoluminescence is observed in the doped ZnO nanowires, which exhibits a violet emission and blue emissions besides the typical photoluminescence spectrum of a single crystal ZnO.     

Structure study of electrodeposited ZnO nanowires

In this work, we report on the structure study of electrodeposited ZnO nanowires. The samples were mounted as a working electrode and the deposition was performed in a classical three electrodes electrochemical cell. For obtaining ZnO nanowires, the working electrode was a polycarbonate membrane with a random distribution of nanometric pores, gilded one side to ensure electric contact. The morphology and structure characterizations of the different diameters ZnO nanowires were carried out by transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM). The electrons pattern diffraction confirmed the same crystal structure of electrodeposited ZnO nanowires indexed by X-ray diffraction (XRD) on electrodeposited ZnO thin films: hexagonal ZnO phase with cell parameters a=0.32584 nm and c=0.52289 nm. Both TEM investigations and HRTEM images reveal a monocrystalline structure for electrodeposited ZnO nanowires. A roughness of few nanometers on the wire surface was observed. Meanwhile, no preferential growth direction has been obviously detected.     

Si基氨化ZnO／Ga2O3薄膜制备GaN纳米线

利用射频磁控溅射法在Si(111)衬底上溅射ZnO中间层和Ga2O3薄膜，然后在管式炉中常压下通氨气对ZnO/Ga2O3薄膜进行氨化，高温下ZnO层在氨气气氛中挥发，而Ga2O3薄膜和氨气反应合成出GaN纳米线．X射线衍射测量结果表明利用该方法制备的GaN纳米线具有沿c轴方向择优生长的六角纤锌矿结构．利用扫描电子显微镜、透射电子显微镜、傅里叶红外透射谱、能量弥散谱及选区电子衍射观测并分析了样品的形貌、成分和晶格结构．研究发现ZnO层的挥发有利于Ga2O3和NH3反应合成GaN纳米线．     

Catalyst-free growth of ZnO nanowires on various-oriented sapphire substrates by pulsed-laser deposition

Catalyst-free growth of one-dimensional zinc oxide (ZnO) nanowires is reported. ZnO nanowires were synthesized on ZnO buffer layers deposited on various-oriented sapphire substrates. Syntheses of ZnO buffer layers and nanowires were performed by ultraviolet pulsed-laser deposition. ZnO nanowire's number density was the lowest in the case of using m-cut sapphire substrates. ZnO nanowires grown on a-cut sapphire substrates had vertical alignment with distances of tens to hundreds of nanometers. On the other hand, ZnO nanowires grown on c-cut sapphire substrates had the biggest nucleation rate. The dependence of crystalline orientation of ZnO buffer layers on the orientation of sapphire substrates were investigated by electron back scatter diffraction measurement. From their results, the growth models of ZnO buffer layers were suggested and the variations in morphological properties of ZnO nanowires were discussed.     

氧化物缓冲层制备Si(111)基GaN纳米线

采用氧化物缓冲层,通过射频磁控溅射系统依次在n型Si(111)衬底上沉积Ga2O3/ZnO(Ga2O3/MgO)薄膜,然后将薄膜于950℃氨化合成GaN纳米结构,氨化时间为15min。采用X射线衍射(XRD)、傅里叶红外吸收谱(FTIR)和高分辨透射电镜(HRTEM)对样品的结构进行了分析,结果显示两种缓冲层下制备的样品均为六方纤锌矿单晶GaN纳米结构,且缓冲层的取向对纳米线的生长方向有很大影响;采用扫描电镜(SEM)对样品的形貌进行了测试,发现纳米线表面光滑,长度可达几十微米,表明采用氧化物缓冲层制备了高质量的GaN线。同时对GaN纳米线的生长机理进行了简单讨论。     

Characterization and Field‐Emission Properties of Needle‐like Zinc Oxide Nanowires Grown Vertically on Conductive Zinc Oxide Films

Needle‐like ZnO nanowires with high density are grown uniformly and vertically over an entire Ga‐doped conductive ZnO film at 550 °C. The nanowires are grown preferentially in the c‐axis direction. The X‐ray diffraction (XRD) θ‐scan curve shows a full width at half maximum (FWHM) value of 2°. This indicates that the c‐axes of the nanorods are along the normal direction of the substrate surface. The investigation using high‐resolution transmission electron microscopy (HRTEM) confirmed that each nanowire is a single crystal. A room‐temperature photoluminescence (PL) spectrum of the wires consists of a strong and sharp UV emission band at 380 nm and a weak and broad green–yellow band. It reveals a low concentration of oxygen vacancies in the ZnO nanowires and their high optical quality. Field electron emission from the wires was also investigated. The turn‐on field for the ZnO nanowires was found to be about 18 V μm^–1 at a current density of 0.01 μA cm^–2. The emission current density from the ZnO nanowires reached 0.1 mA cm^–2 at a bias field of 24 V μm^–1.     

一维ZnO纳米结构的电子场发射研究

在大量制备一维ZnO纳米结构的基础上,研究了这些纳米结构的场发射性能。对于四角状ZnO纳米结构,获得1.0m Ac/m2的电流密度只需要4.5V/μm的电场;对于线状Z nO纳米结构,获得1.0mAc/m 2的电流密度需要6.5V/μm的电场。由于其特殊的结构,四角状ZnO一维纳米结构在真空电子器件方面有很好的应用前景。     

准一维半导体纳米结构的电子显微学研究

本文总结了近年来我们在功能准一维纳米结构材料研究方面所获得的一些有意义的结果。借助于现代电子显微镜技术，不仅研究了硅、氮化稼、氧化锌等一维纳米材料的形貌和显微结构，还研究了其一维择优生长机理及小尺度效应。尤其是利用高能量分辨电子能量损失谱、高角环形暗场探头等先进技术，解决了一个传统X－光等结构分析手段所不能解决的难题，分析了一种SiOx/SiC复合纳米电缆的成份与结构。