Fabrication and characteristics of A Te-Se-CdO structure

A Te-Se-CdO layer structure has been fabricated by epitaxial growth of a selenium film on a monocrystalline tellurium substrate, followed by deposition of the counterelectrode by reactive sputtering from a cadmium target in the presence of a trace of air. Examination by RHEED has shown the counterelectrode to be CdO in polycrystalline form and the selenium film to be monocrystalline. The structures were found to give a maximum photovoltaic responsivity near 550 nm, at which wavelength the quantum efficiency was around 60% for a CdO thickness of 0.2 micron. The responsivity was affected by the CdO film thickness and the contacts to it but was insensitive to conditions relating to the selenium film, with variations in the thickness up to 10 microns, in the orientation between the (0001) and planes and in the polishing conditions of the tellurium stustrate. Values of equivalent series and shunt resistance were determined from output current-voltage results by curve fitting and the shunt resistance was found to vary inversely with illuminance.     

Fabrication and characteristics of GaP-AlGaP tapered waveguide semiconductor Raman amplifiers

We have fabricated GaP-AlGaP tapered waveguide semiconductor Raman amplifiers, and analyzed the effect of tapering in pulse-pumped high-gain operation. The finesse measurement and 80-ps pulse pumped Raman amplification experiment were performed. Although the tapering has caused additional optical loss, the highest gain of 23 dB has been obtained for a tapered waveguide with input facet of 6.0 /spl mu/m/sup 2/ and back facet of 2.9 /spl mu/m/sup 2/ at averaged input power of 170 mW (peak power 26 W). It is shown that the optical loss of the pump light is more severe than the linear optical loss of the signal light when the gain is higher than 20 dB.     

Fabrication and performance characteristics of InGaAsP ridge-guide distributed-feedback multiquantum-well lasers

The fabrication and performance characteristics of InGaAsP ridge-guide distributed-feedback lasers with multiquantum-well active layers are reported. The lasers are 320 ?m long and have four active wells (?300 ? thick). The lasers have threshold current ?100 mA at 30°C, external differential quantum efficiency ?0.1 mW/mA/facet at 30°C and To? 60 K and can be operated in the same DFB mode up to 70°C. The measured frequency chirp is about a factor of 3 smaller than that for conventional double-heterostructure lasers. The smaller chirp should allow larger repeater spacing for high-bit-rate long-distance fibre transmission systems applications.     

Fabrication and analysis of high-efficiency polycrystalline siliconsolar cells

Phosphorus and aluminum gettering conditions were optimized to achieve high-frequency polycrystalline silicon cells. In order to take advantage of intense gettering without the harmful effects of the emitter dead layer, a deep phosphorus diffusion at 930°C was performed, followed by a partial etch-back of the n⁺ region. The optimum aluminum treatment for these cells included 1.2-μm-thick Al deposition followed by 850°C, 35-min drive-in. Oxide passivation was found to be effective in cells made on these polysilicon wafers. A combination of optimum phosphorus and aluminum getting, oxide passivation, and double-layer antireflection coating resulted in record 17.7% efficient, 1-cm², cells under one sun illumination. Cell model calculations were performed ignoring the grain boundary effects, but using a measured effective lifetime in the cell. A good correlation was found between measured and calculated cell parameters of the 17.7% efficient polycrystalline silicon cell. Model calculations were extended to outline an approach toward achieving greater than 20% efficient cells     

单面键合面发射激光器的研制与分析

键合长波长垂直腔面发射激光器(VCSEL)的研制对于光通信的发展具有重要意义,可以有效克服传统外延生长方法的诸多难題.文章通过对布喇格反射镜、有源区和光学腔的设计,结合键合技术进行工艺设计,研制出单面键合长波长垂直腔面发射激光器,并对器件进行了光泵浦测试与分析.器件的光泵激射证明结构及工艺设计是合理的,键合后的界面可以承受腐蚀、剥离、氧化等后续工艺,且键合界面未对器件光学性能造成明显不良影响.     

Fabrication and analysis of deep submicron strained-Si n-MOSFET's

Deep submicron strained-Si n-MOSFETs were fabricated on strained Si/relaxed Si_0.8Ge_0.2 heterostructures. Epitaxial layer structures were designed to yield well-matched channel doping profiles after processing, allowing comparison of strained and unstrained Si surface channel devices. In spite of the high substrate doping and high vertical fields, the MOSFET mobility of the strained-Si devices is enhanced by 75% compared to that of the unstrained-Si control devices and the state-of-the-art universal MOSFET mobility. Although the strained and unstrained-Si MOSFETs exhibit very similar short-channel effects, the intrinsic transconductance of the strained Si devices is enhanced by roughly 60% for the entire channel length range investigated (1 to 0.1 μm) when self-heating is reduced by an ac measurement technique. Comparison of the measured transconductance to hydrodynamic device simulations indicates that in addition to the increased low-field mobility, improved high-field transport in strained Si is necessary to explain the observed performance improvement. Reduced carrier-phonon scattering for electrons with average energies less than a few hundred meV accounts for the enhanced high-field electron transport in strained Si. Since strained Si provides device performance enhancements through changes in material properties rather than changes in device geometry and doping, strained Si is a promising candidate for improving the performance of Si CMOS technology without compromising the control of short channel effects     

Fabrication and polarising characteristics of D-shaped opticalfibre coated with chromium film

The fabrication process, numerical analysis and polarising characteristics of the D-shaped optical fibre coated with chromium film have been investigated. An optical fibre polariser was fabricated by coating the flat side of the D-shaped fibre, which was obtained by drawing the side-cut D-shaped preform made from the MCVD process, with chromium metal film. The maximum extinction ratio of the fibre polariser was found to be ~55 dB     

Fabrication and electrical characteristics of Schottky diode based on organic material

The current-voltage (I-V), capacitance-voltage (C-V) and capacitance-frequency (C-f) characteristics of Al/Orange G/n-Si/AuSb structure were investigated at room temperature. A modified Norde’s function combined with conventional forward I-V method was used to extract the parameters including barrier height (BH) and the series resistance. The barrier height and series resistance obtained from Norde’s function was compared with those from Cheung functions, and it was seen that there was a good agreement between series resistances from both methods. The C-V characteristics were performed at 10 kHz and 500 kHz frequencies, and C-f characteristics were performed 0.0 V, +0.4 V and −0.4 V.     

PCR生物芯片微反应腔的制作及其热分析

在PCR生物芯片的制作过程中，微反应腔制作是关键部分之一。本文利用硅基微机械加工工艺，分别采用湿法化学腐蚀、干法等离子体刻蚀及两者相结合的方法进行了微反应腔的制作。通过扫描电镜分析，证明干法和湿法腐蚀相结合的制作工艺能加工出较理想的微反应腔体。本文还利用ANSYS软件对微反应腔进行温度分布和热特性分析。     

PCR生物芯片微反应腔的制作及其热分析

在PCR生物芯片的制作过程中 ,微反应腔制作是关键部分之一。本文利用硅基微机械加工工艺 ,分别采用湿法化学腐蚀、干法等离子体刻蚀及两者相结合的方法进行了微反应腔的制作。通过扫描电镜分析 ,证明干法和湿法腐蚀相结合的制作工艺能加工出较理想的微反应腔体。本文还利用ANSYS软件对微反应腔进行温度分布和热特性分析。     

Fabrication and characteristics of ion-implanted GaAs/GaAlAs integrated injection logic inverter

An integrated injection logic inverter has been realised in GaAs/GaAlAs material using ion implantation and Zn diffusion. Si ions have been implanted to merge the current source with the switching transistor, whereas the Be implantation provides the base contact. The shallow p+-emitter of the pnp current source has been fabricated by Zn diffusion. Instead of a lateral pnp transistor, which is typical in I2L technology, a vertical arrangement has been used. This type of transistor shows a better current efficiency and can be fabricated with a better uniformity in terms of base width. First results of an I2L inverter with a vertical pnp transistor are shown.     

Fabrication techniques and characteristics of Al-SiO2laminated optical polarizers

Techniques for fabricating laminated polarizers (LAMIPOLs), which consist of alternating laminated layers of aluminum and silica, for the wavelength region λ>1 μm, are investigated. The oxidation of Al films is prevented by a suitable choice of deposition conditions. The surfaces of SiO₂ films are smoothed by bias sputtering. A 10 μm thick LAMIPOL was obtained having an insertion loss of 0.15 dB and an extinction ratio of greater than 60 dB at the wavelength of 1.3 μm. These characteristics can be estimated from the attenuated constants of the fundamental modes even when higher modes are considered     

二维亚波长抗反射光栅的制作及其特性分析

运用等效介质理论研究了占空比随深度变化的二维亚波长光栅的抗反射原理。对全息干涉法制得的正弦型光栅进行了详细分析,表明这类光栅形成了渐变折射率的抗反膜结构。设计并利用两柬相干光对称入射到记录介质（光刻胶）分两次曝光的全息方法制备了适用于可见波段的周期为310nm的二维正交正弦型光栅。测试结果表明这种光栅在整个可见光波段具有增透作用,有潜力作为传统抗反膜的替代品。将具有浮雕结构的记录介质为母版并采用模压或浇铸等方法,可将结构复制到其它材料上。这类抗反射材料具有制作简单、成本低、可大批量生产等优点。     

Fabrication and characteristics of ion beam etched cavity InP/InGaAsP BH lasers

A low temperature ion beam etching (IBE) process is successfully applied to facet mirror fabrication of 1.3 μm InGaAsP/InP buried heterostructure (BH) lasers. Ar ion beam etching characteristics of InP are studied and masking conditions are optimized for obtaining low-damage, vertical, and smooth etched facets. Lasers fabricated by this technique have threshold currents and quantum efficiencies comparable to those of lasers with conventionally cleaved mirrors. CW operation at room temperature has been achieved. Initial experimental results of preliminary aging tests are also presented.     

Fabrication and electrical characteristics of Perylene-3,4,9,10-tetracarboxylic dianhydride/p-GaAs diode structure

This study aims to experimentally investigate whether Perylene-3,4,9,10-tetracarboxylic dianhydride (PTCDA) organic layer at p-GaAs/Ag interface affects electrical transport across this interface or not. The electronic properties of metal–organic semiconductor–inorganic semiconductor structure between p type GaAs and PTCDA organic film have been investigated via current–voltage (I–V) and capacitance–voltage (C–V) methods. The Ag/PTCDA/p-GaAs contact exhibits a rectification behavior with the barrier height of 0.74 eV and ideality factor value of 3.42. Modification of the potential barrier of Ag/p-GaAs diode was achieved by using thin interlayer of the PTCDA organic material. This was attributed to the fact that the PTCDA organic interlayer increased the effective barrier height by influencing the space charge region of GaAs. The low and high frequency capacitance–voltage plots were used to determine the interface state density of the diode.     

Fabrication tolerance analysis of an OEIC passive duplexer

A simulation method has been developed to study the fabrication tolerances of a passive duplexer on InP substrate which could be a part of an optoelectronic integrated circuit (OEIC) module. This method, based on a Taylor's series expansion, is fast enough to estimate the effect produced on the crossover power when a simultaneous variation of the duplexer parameters take place. It seems to be very useful, particularly during a repetitive control of the device characteristics     

Fabrication and characteristics of tapes and test magnets made from Ag-Clad Bi-2223 superconductors

Pb_0.4Bi_1.8Sr₂Ca_2.2Cu₃O_x (Bi-2223) precursor powder was prepared by a solid-state reaction of carbonates and oxides of lead, bismuth, strontium, calcium, and copper, and the powder was then used to fabricate silver-clad tapes by the powder-in-tube technique. Transport critical current density (J_c) values>4×10⁴ A/cm² at 77K and 2×10⁵ A/cm² at 4.2 and 27K have been achieved in short tape samples. Long lengths of tape were tested by winding them into pancake coils. Recently, we fabricated a test magnet by stacking ten pancake coils, each containing three 16m lengths of rolled tape, and tested it at 4.2, 27 and 77K. A maximum generated field of 2.6 T was measured in zero applied field at 4.2K and the test magnet generated significant self-field in background fields up to 20 T. The results are discussed in this paper.     

Fabrication of single crystal field-effect transistors with phenacene-type molecules and their excellent transistor characteristics

Single crystal field-effect transistors (FETs) using [6]phenacene and [7]phenacene show p-channel FET characteristics. Field-effect mobilities, μs, as high as 5.6 × 10^?1 cm² V^?1 s^?1 in a [6]phenacene single crystal FET with an SiO₂ gate dielectric and 2.3 cm² V^?1 s^?1 in a [7]phenacene single crystal FET were recorded. In these FETs, 7,7,8,8-tetracyanoquinodimethane (TCNQ) was inserted between the Au source/drain electrodes and the single crystal to reduce hole-injection barrier heights. The μ reached 3.2 cm² V^?1 s^?1 in the [7]phenacene single crystal FET with a Ta₂O₅ gate dielectric, and a low absolute threshold voltage |V_TH| (6.3 V) was observed. Insertion of 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F₄TCNQ) in the interface produced very a high μ value (4.7–6.7 cm² V^?1 s^?1) in the [7]phenacene single crystal FET, indicating that F₄TCNQ was better for interface modification than TCNQ. A single crystal electric double-layer FET provided μ as high as 3.8 × 10^?1 cm² V^?1 s^?1 and |V_TH| as low as 2.3 V. These results indicate that [6]phenacene and [7]phenacene are promising materials for future practical FET devices, and in addition we suggest that such devices might also provide a research tool to investigate a material’s potential as a superconductor and a possible new way to produce the superconducting state.