Orientation and strain rate dependent tensile behavior of single crystal titanium nanowires by molecular dynamics simulations

Molecular dynamics simulation was employed to study the tensile behavior of single crystal titanium nanowires(NWs)with1120,1100and[0001]orientations at different strain rates from 10~8s~(-1)to10~(11)s~(-1).When strain rates are above 10~(10)s~(-1),the state transformation from HCP structure to amorphous state leads to super plasticity of Ti NWs,which is similar to FCC NWs.When strain rates are below 10~(10)s~(-1),deformation mechanisms of Ti NWs show strong dependence on orientation.For1120orientated NW,1011compression twins(CTs)and the frequently activated transformation between CTs and deformation faults lead to higher plasticity than the other two orientated NWs.Besides,tensile deformation process along1120orientation is insensitive to strain rate.For 1100orientated NW,prismaticaslip is the main deformation mode at 10~8s~(-1).As the strain rate increases,more types of dislocations are activated during plastic deformation process.For[0001]orientated NW,1012extension twinning is the main deformation mechanism,inducing the yield stress of[0001]orientated NW,which has the highest strain rate sensitivity.The number of initial nucleated twins increases while the saturation twin volume fraction decreases nonlinearly with increasing strain rate.     

p-Type ZnO nanowire arrays

Well-aligned ZnO nanowire (NW) arrays with durable and reproducible p-type conductivity were synthesized on alpha-sapphire substrates by using N2O as a dopant source via vapor-liquid-solid growth. The nitrogen-doped ZnO NWs are single-crystalline and grown predominantly along the [110] direction, in contrast to the [001] direction of undoped ZnO NWs. Electrical transport measurements reveal that the nondoped ZnO NWs exhibit n-type conductivity, whereas the nitrogen-doped ZnO NWs show compensated highly resistive n-type and finally p-type conductivity upon increasing N2O ratio in the reaction atmosphere. The electrical properties of p-type ZnO NWs are stable and reproducible with a hole concentration of (1-2) x 10(18) cm(-3) and a field-effect mobility of 10-17 cm2 V(-2) s(-1). Surface adsorptions have a significant effect on the transport properties of NWs. Temperature-dependent PL spectra of N-doped ZnO NWs show acceptor-bound-exciton emission, which corroborates the p-type conductivity. The realization of p-type ZnO NWs with durable and controlled transport properties is important for fabrication of nanoscale electronic and optoelectronic devices.     

Field effect transistor from individual trigonal Se nanowire

Trigonal Se nanowires (NWs) were fabricated through a high-yield chemical solution process. The morphology and structural characterization of the Se NWs were investigated using transmission electron microscopy (TEM), high-resolution TEM (HRTEM), and x-ray diffraction (XRD). The results indicated that the Se NWs grow along the crystallographic c-axis, the direction of which is parallel to the helical chains of Se atoms. Single Se NW field effect transistor (FET) devices were prepared through photolithographic patterning. The device performance shows that the Se NWs are p-type semiconductors displaying mobility up to 30?cm(2)?V(-1)?s(-1). This finding on the Se NW FETs has broad implications and provides very useful fundamental information necessary for future applications in the fabrication of high-quality NW FETs and other electronic devices.     

Lateral self-aligned p-type In2O3 nanowire arrays epitaxially grown on Si substrates

Lateral orientated growth of In2O3 nanowire (NW) and nanorod (NR) arrays has been achieved by a vapor transport and condensation method on (001) and (111) surfaces of Si substrates. The single crystalline In2O3 NWs and NRs were grown along [211] in parallel to the Si +/-[110] and lying in the substrate plane. The electrical measurements show that the In2O3 NWs are p-type semiconductor. By N+ doping, the resistivity of the In2O3 NWs has been tuned. The lateral self-aligned In2O3 NW and NR arrays on Si can offer some unique advantages for fabricating parallel nanodevices that can be integrated directly with silicon technology.     

三方晶硒纳米线的大面积合成及其场效应晶体管特性

采用液相反应成功制备了高质量硒纳米线。利用透射电镜（TEM）、高分辨透射电镜（HRTEM）以及X射线衍射仪（XRD）研究了纳米的形貌结构特征。结果表明,硒纳米线为单晶结构,生长方向沿[001]面,平行于螺旋轴。结合光刻技术及磁控溅射镀膜技术,成功制备了硒纳米线场效应晶体管器件。初步测试表明,这种硒纳米线为p型半导体。     

Atomistic studies of stress effects on self-interstitial diffusion in α-titanium*

The diffusion anisotropy of intrinsic point defects is an important factor governing the behavior of the HCP metals bombarded by energetic particles. The effects of stress on the diffusion and its anisotropy, although known to be important, have not been well understood. In this paper, we use a combination of molecular dynamics and molecular statics methods to investigate energy states of a self-interstitial in α-titanium, a typical HCP metal. Our calculation shows that the most stable configuration of the self-interstitial is the basal-split dumbbell configuration on the basal plane. Compression along the [0001] or the [1ˉ100] directions leads to an insignificant change in the migration energies, while compression along the [11ˉ20] direction leads to a larger migration energy. A significant change of the diffusion anisotropy is observed when a uni-axial compressive stress of 200 MPa is applied along the [11ˉ20] direction. Similar stress along the other two directions does not produce substantial changes of the anisotropy. We also show that an applied hydrostatic stress can significantly change the diffusion anisotropy of HCP metals and alloys. Thus, under irradiation, a hydrostatic stress can produce a significant creep-like deformation (i.e., with a deviatoric strain rate) through a stress-dependent change of the growth rate. This revised version was published online in June 2006 with corrections to the Cover Date.     

Growth of high-density titanium silicide nanowires in a single direction on a silicon surface

Understanding the growth mechanisms of nanowires is essential for their successful implementation in advanced devices applications. In situ ultrahigh-vacuum transmission electron microscopy has been applied to elucidate the interaction mechanisms of titanium disilicide nanowires (TiSi2 NWs) on Si(111) substrate. Two phenomena were observed: merging of the two NWs in the same direction, and collapse of one NW on a competing NW in a different direction when they meet at the ends. On the other hand, as one NW encounters the midsection of the other NW in a different direction, it recedes in favor of bulging of the other NW at the midsection. Since crystallographically the nanowires are favored to grow on Si(110) only in the [1 -1 0] direction, this crucial information has been fruitfully exploited to focus on the growth of a high density of long and high-aspect-ratio Ti silicide NWs parallel to the surface on Si(110) in a single direction. The achievement in growth of high-density NWs in a single direction represents a significant advance in realizing the vast potential for applications of silicide NWs in nanoelectronics devices.     

Mechanical properties of ZnO nanowires under different loading modes

A systematic experimental and theoretical investigation of the elastic and failure properties of ZnO nanowires (NWs) under different loading modes has been carried out. In situ scanning electron microscopy (SEM) tension and buckling tests on single ZnO NWs along the polar direction [0001] were conducted. Both tensile modulus (from tension) and bending modulus (from buckling) were found to increase as the NW diameter decreased from 80 to 20 nm. The bending modulus increased more rapidly than the tensile modulus, which demonstrates that the elasticity size effects in ZnO NWs are mainly due to surface stiffening. Two models based on continuum mechanics were able to fit the experimental data very well. The tension experiments showed that fracture strain and strength of ZnO NWs increased as the NW diameter decreased. The excellent resilience of ZnO NWs is advantageous for their applications in nanoscale actuation, sensing, and energy conversion.      

The growth of porous ZnO nanowires by thermal oxidation of ZnS nanowires

The growth of porous ZnO nanowires (NWs) via phase transformation of ZnS NWs at 500-850 degrees C in air was studied. The ZnS NWs were first synthesized by thermal evaporation of ZnS powder at 1100 degrees C in Ar. On subsequent annealing at 500 degrees C in air, discrete ZnO epilayers formed on the surface of ZnS NWs. At 600 degrees C, polycrystalline ZnO and the crack along the (0001) interface between the ZnO epilayer and ZnS NW were observed. At 700-750 degrees C ZnS NWs transformed to ZnO NWs, meanwhile nanopores and interfacial cracks were observed in the ZnO NWs. Two factors, the evaporation of SO2 and SO3 and the stress induced by the incompatible structure at the interface of ZnO epilayer and ZnS NW, can be responsible for the formation of porous ZnO NWs from ZnS NW templates on annealing at 700-750 degrees C in air. Rapid growth of ZnO at 850 degrees C could heal the pores and cracks and thus resulted in the well-crystallized ZnO NWs.     

Stable p-type conduction from Sb-decorated head-to-head basal plane inversion domain boundaries in ZnO nanowires

We report that Sb-decorated head-to-head (H-H) basal plane inversion domain boundaries (b-IDBs) lead to stable p-type conduction in Sb-doped ZnO nanowires (NWs) due to Sb and O codoping. Aberration-corrected Z-contrast scanning transmission electron microscopy shows that all of the Sb in the NWs is incorporated into H-H b-IDBs just under the (0001) NW growth surfaces and the (0001) bottom facets of interior voids. Density functional theory calculations show that the extra basal plane of O per H-H b-IDB makes them electron acceptors. NWs containing these defects exhibited stable p-type behavior in a single NW FET over 18 months. This new mechanism for p-type conduction in ZnO offers the potential of ZnO NW based p-n homojunction devices.     

Lateral, Ge, nanowire growth on SiO2

Vapor-liquid-solid (VLS) nanowires (NWs) typically grow in [111] directions. Previously, the authors have demonstrated guided Si NW growth, engineering the VLS NWs to grow in a [110] direction against a SiO(2) surface. In this work, the authors demonstrate guided high-quality Ge nanowire growth against a SiO(2) surface in the substrate plane to bridge between two Si mesas. The authors explore the interfaces between a Ge NW and the two Si device-layer mesas and report high-quality, epitaxial interfaces between the Ge NW and both Si mesas.     

Fabrication and structure characterization of te butterfly nanostructures

Te nanowires and butterfly nanostructures have been fabricated by template-free electrodeposition (TFED) in aqueous solution. By high-resolution transmission electron microscopy (HRTEM) study, the favored growth directions of the nanowires and the wings of the butterfly nanostructures were determined to be along the [0001] direction of trigonal Te, and the twinning plane of the butterfly nanostructures was (11-22). The cathodoluminescence measurements carried out at different positions of the butterfly nanostructure indicated that the twin boundaries influenced the photoemission efficiency.     

Rational synthesis of p-type zinc oxide nanowire arrays using simple chemical vapor deposition

We report, for the first time, the synthesis of the high-quality p-type ZnO NWs using a simple chemical vapor deposition method, where phosphorus pentoxide has been used as the dopant source. Single-crystal phosphorus doped ZnO NWs have their growth axis along the 001 direction and form perfect vertical arrays on a-sapphire. P-type doping was confirmed by photoluminescence measurements at various temperatures and by studying the electrical transport in single NWs field-effect transistors. Comparisons of the low-temperature PL of unintentionally doped ZnO (n-type), as-grown phosphorus-doped ZnO, and annealed phosphorus-doped ZnO NWs show clear differences related to the presence of intragap donor and acceptor states. The electrical transport measurements of phosphorus-doped NW FETs indicate a transition from n-type to p-type conduction upon annealing at high temperature, in good agreement with the PL results. The synthesis of p-type ZnO NWs enables novel complementary ZnO NW devices and opens up enormous opportunities for nanoscale electronics, optoelectronics, and medicines.     

Morphology control of layer-structured gallium selenide nanowires

Layer-structured group III chalcogenides have highly anisotropic properties and are attractive materials for stable photocathodes and battery electrodes. We report the controlled synthesis and characterization of layer-structured GaSe nanowires via a catalyst-assisted vapor-liquid-solid (VLS) growth mechanism during GaSe powder evaporation. GaSe nanowires consist of Se-Ga-Ga-Se layers stacked together via van der Waals interactions to form belt-shaped nanowires with a growth direction along the [11-20], width along the [1-100], and height along the [0001] direction. Nanobelts exhibit a variety of morphologies including straight, zigzag, and saw-tooth shapes. These morphologies are realized by controlling the growth temperature and time so that the actual catalysts have a chemical composition of Au, Au-Ga alloy, or Ga. The participation of Ga in the VLS catalyst is important for achieving different morphologies of GaSe. In addition, GaSe nanotubes are also prepared by a slow growth process.     

Layer-by-layer assembly of nanowires for three-dimensional, multifunctional electronics

We report a general approach for three-dimensional (3D) multifunctional electronics based on the layer-by-layer assembly of nanowire (NW) building blocks. Using germanium/silicon (Ge/Si) core/shell NWs as a representative example, ten vertically stacked layers of multi-NW field-effect transistors (FETs) were fabricated. Transport measurements demonstrate that the Ge/Si NW FETs have reproducible high-performance device characteristics within a given device layer, that the FET characteristics are not affected by sequential stacking, and importantly, that uniform performance is achieved in sequential layers 1 through 10 of the 3D structure. Five-layer single-NW FET structures were also prepared by printing Ge/Si NWs from lower density growth substrates, and transport measurements showed similar high-performance characteristics for the FETs in layers 1 and 5. In addition, 3D multifunctional circuitry was demonstrated on plastic substrates with sequential layers of inverter logical gates and floating gate memory elements. Notably, electrical characterization studies show stable writing and erasing of the NW floating gate memory elements and demonstrate signal inversion with larger than unity gain for frequencies up to at least 50 MHz. The ability to assemble reproducibly sequential layers of distinct types of NW-based devices coupled with the breadth of NW building blocks should enable the assembly of increasing complex multilayer and multifunctional 3D electronics in the future.     

Self-assembly of conductive Cu nanowires on Si(111)'5 × 5 '-Cu surface

Upon room-temperature deposition onto a Cu/Si(111)'5 × 5' surface in ultra-high vacuum, Cu?atoms migrate over extended distances to become trapped at the step edges, where they form Cu?nanowires (NWs). The formed NWs are 20-80?nm wide, 1-3?nm high and characterized by a resistivity of ～8?μΩ?cm. The surface conductance of the NW array is anisotropic, with the conductivity along the NWs being about three times greater than that in the perpendicular direction. Using a similar growth technique, not only the straight NWs but also other types of NW-based structures (e.g. nanorings) can be fabricated.     

Contactless monitoring of the diameter-dependent conductivity of GaAs nanowires

Contactless monitoring with photoelectron microspectroscopy of the surface potential along individual nanostructures, created by the X-ray nanoprobe, opens exciting possibilities to examine quantitatively size- and surface-chemistry-effects on the electrical transport of semiconductor nanowires (NWs). Implementing this novel approach-which combines surface chemical microanalysis with conductivity measurements-we explored the dependence of the electrical properties of undoped GaAs NWs on the NW width, temperature and surface chemistry. By following the evolution of the Ga 3d and As 3d core level spectra, we measured the position-dependent surface potential along the GaAs NWs as a function of NW diameter, decreasing from 120 to ?20 nm, and correlated the observed decrease of the conductivity with the monotonic reduction in the NW diameter from 120 to ~20 nm. Exposure of the GaAs NWs to oxygen ambient leads to a decrease in their conductivity by up to a factor of 10, attributed to the significant decrease in the carrier density associated with the formation of an oxide shell. Open image in new window     

Manipulation of crystalline orientation and optical absorption of Cu nanowire arrays embedded in anodic aluminum oxide templates

Cu nanowires (NWs) with controlled crystalline orientation were obtained via electrodeposition inside the nanochannels of anodic aluminum oxide templates. By adjusting electrolyte composition, the orientation of Cu NWs was manipulated between [100] and [110]. [100]- and [110]-oriented single-crystal Cu NWs were also achieved under lower electrodeposition voltages in sulfate electrolyte and citrite electrolyte, respectively. Optical absorption spectrum measurements reveal that the surface plasma resonance peak of the Cu NW arrays has an obvious blue-shift of 11 nm when the orientation of Cu NWs is turned from [100] to [110].     

Growth, defect formation, and morphology control of germanium-silicon semiconductor nanowire heterostructures

By the virtue of the nature of the vapor-liquid-solid (VLS) growth process in semiconductor nanowires (NWs) and their small size, the nucleation, propagation, and termination of stacking defects in NWs are dramatically different from that in thin films. We demonstrate germanium-silicon axial NW heterostructure growth by the VLS method with 100% composition modulation and use these structures as a platform to understand how defects in stacking sequence force the ledge nucleation site to be moved along or pinned at a single point on the triple-phase circumference, which in turn determines the NW morphology. Combining structural analysis and atomistic simulation of the nucleation and propagation of stacking defects, we explain these observations based on preferred nucleation sites during NW growth. The stacking defects are found to provide a fingerprint of the layer-by-layer growth process and reveal how the 19.5° kinking in semiconductor NWs observed at high Si growth rates results from a stacking-induced twin boundary formation at the NW edge. This study provides basic foundations for an atomic level understanding of crystalline and defective ledge nucleation and propagation during [111] oriented NW growth and improves understanding for control of fault nucleation and kinking in NWs.     

Self-assembled GaN nanowires on diamond

We demonstrate the nucleation of self-assembled, epitaxial GaN nanowires (NWs) on (111) single-crystalline diamond without using a catalyst or buffer layer. The NWs show an excellent crystalline quality of the wurtzite crystal structure with m-plane faceting, a low defect density, and axial growth along the c-axis with N-face polarity, as shown by aberration corrected annular bright-field scanning transmission electron microscopy. X-ray diffraction confirms single domain growth with an in-plane epitaxial relationship of (10 ?10)(GaN) [parallel] (01 ?1)(Diamond) as well as some biaxial tensile strain induced by thermal expansion mismatch. In photoluminescence, a strong and sharp excitonic emission reveals excellent optical properties superior to state-of-the-art GaN NWs on silicon substrates. In combination with the high-quality diamond/NW interface, confirmed by high-resolution transmission electron microscopy measurements, these results underline the potential of p-type diamond/n-type nitride heterojunctions for efficient UV optoelectronic devices.