适用于太阳电池的nc-Si:H薄膜及 nc-Si/c-Si异质结的研究

该文介绍了使用改进的PECVD薄膜沉积设备,制备出掺杂氢化纳米硅(nc-SiH)薄膜,并在此基础上制备了纳米硅/晶体硅(nc-Si/c-Si)异质结;研究了其光学和电学特性.实验表明nc-Si/c-Si异质结具有良好的光电转换性能和稳定性,适用于制造太阳电池.     

氢注入在硅异质结太阳电池a-Si:H窗口层中的研究

基于热丝化学气相沉积(Cat-CVD)系统开展氢注入对超薄(<10 nm)氢化非晶硅(a-Si:H)薄膜特性改善的研究,发现适当的氢注入可提高薄膜内的氢含量、降低其微结构因子并展宽其光学带隙.将该方法用于处理硅异质结(SHJ)太阳电池入光侧的本征非晶硅(i-a-Si:H)及N型非晶硅(n-a-Si:H)薄膜钝化层,可显...     

高效薄膜硅/晶体硅异质结电池的研究

一引言用薄膜工艺在晶体硅衬底上制备非晶、纳米晶薄膜,可获得异质结电池,该类电池有以下优点:(1)材料消耗少;晶硅片厚度≤200μm,通常晶硅电池厚度为350μm;     

热丝化学气相沉积n型nc-Si:H薄膜及nc-Si:H/c-Si异质结太阳电池

采用热丝化学气相沉积(HWCVD)技术制备n型纳米晶硅(nc-Si∶H)薄膜,系统地研究了沉积参数,特别是掺杂浓度对薄膜微结构、电学性质和缺陷态的影响,获得了器件质量的n型nc-Si∶H薄膜。制备了nc-Si∶H/c-Si HIT(Heterojunction with Intrinsic Thin-layer)结构太阳电池,研究了异质结结构参数对电池性能的影响,初步得到电池性能参数如下:Voc=483mV、Jsc=29.5mA/cm2、FF=70%、η=10.2%。     

用于晶硅异质结太阳电池的透明导电薄膜研究进展

提升晶硅异质结（HJT）太阳电池的电流有望进一步提高电池效率,透明导电氧化物薄膜（TCO）是影响HJT太阳电池电流的重要功能层。该文首先介绍了TCO薄膜的自身特性,包括掺杂元素和掺杂比例、制备技术对薄膜特性的影响。同时总结了薄膜特性对HJT太阳电池性能的影响。最后阐述了TCO薄膜应用的最新进展及发展趋势,增加盖帽层或多层TCO薄膜有望改善薄膜整体特性及电池性能。以期指导TCO薄膜特性的优化,从而进一步提高HJT太阳电池效率,加快HJT太阳电池产业化进程。     

非晶硅/晶体硅异质结太阳电池计算机模拟

运用AMPS程序模拟计算了p-型非晶硅/n-型晶体硅HIT(Heterojunction with Intrinsic Thin layer)异质结太阳电池的光伏特性.通过对不同带边补偿情况下的计算结果同文献报道相比较,得出导带补偿小部分(0.18eV),价带补偿大部分(0.5eV)的基本结论.同时还证实,界面态是决定电池性能的关键因素,显著影响电池的开路电压(Voc)和填充因子(FF).最后计算了这种电池理想情况下(无界面态、有背面场、正背面反射率分别为0和1)的理论效率Eff=27%(AM1.5 100MW/cm2 0.40～1.10μm波段).     

AFORS-HET软件模拟N型非晶硅/p型晶体硅异质结太阳电池

运用AFORS-HET程序模拟计算了不同本征层厚度、能隙宽度、发射层厚度、能带失配以及不同界面态密度等参数对N型非晶硅/p型晶体硅异质结太阳电池光伏特性的影响.结果表明,在其它参数条件不变的情况下,插入较薄本征层,转换效率增加,但本征层厚度继续增加时,短路电流密度减少、效率也随之降低.本征层能隙宽度的变化对短路电流影响很大,随能隙宽度增加,短路电流先增加,但当能隙宽度大于某一特定值时,短路电流开始下降.在不插入本征层的情况下,N型发射层的能带失配对短路电流几乎无影响,而开路电压随导带失配的增大逐渐增大,界面态密度会导致开压迅速下降.     

类p-I-n结构n+(μc-Si∶H)/p(poly-Si)/p+(poly-Si)薄膜太阳电池的热平衡态特性数值分析

通过应用Scharfetter-Gummel解法,数值求解Poisson方程,对热平衡态n+(μc-Si∶H)/p(poly-Si)/p+(poly-Si)薄膜太阳电池进行计算机数值模拟.说明类p-i-n结构设计使电池获得了较高的短路电流JSC,而中间层p(poly-Si)的掺杂有利于提高电池的短波量子效率特性,还讨论了n+(μc-Si∶H)和p+(poly-Si)等层厚度对光生载流子收集的影响.     

异质结太阳电池测试标准的研究进展

针对异质结(HJT)太阳电池在I-V测试中遇到的主要问题,归纳总结了迟滞效应的成因和解决方法,以及双面HJT太阳电池的测试标准和评价体系,研究了不同测试参数对迟滞误差的影响,分析了测试台反射率及接触方式对HJT太阳电池I-V测试结果的影响,并通过简述HJT太阳电池亚稳态特性的研究进展,找出HJT太阳电池精确测试的方法,...     

晶硅异质结太阳电池nc-Si:H/nc-SiOx:H叠层窗口层研究

该研究制备高电导、高透明的磷掺杂氢化纳米晶硅氧(nc-Si O_x:H)薄膜,应用于晶硅异质结(SHJ)太阳电池的窗口层以替代传统的氢化非晶硅(a-Si:H)薄膜。与以a-Si:H薄膜为窗口层的电池相比,短路电流密度提高0.5 m A/cm²,达到38.5 m A/cm²,填充因子为82.7%,光电转换效率为23.5%。实验发现,在nc-Si O_x:H薄膜沉积前对本征非晶硅层表面进行处理,沉积1 nm纳米晶硅(nc-Si:H)种子层,可改善nc-Si O_x:H薄膜的晶化率,降低薄膜中的非晶相含量。与单层nc-Si O_x:H窗口层的电池相比,nc-Si:H/nc-Si O_x:H叠层结构提高电池填充因子,达到83.4%,光电转换效率增加了0.3%,达到23.8%。     

Preparation of (n) a-Si: H/(p) c-Si heterojunction solar cells

Heterojunction solar cells have been manufactured by depositing n-type a-Si: H on p-type 1–2Ω cm CZ single crystalline silicon substrates. Although our cell structure is very simple - neither a BSF nor a surface texturing is used - a conversion efficiency of 13.1% has been achieved on an area of 1 cm². In this paper the technology is described and the dependence of the solar cell parameters on the properties of the n-type a-Si: H layer is discussed. It is shown that this cell type exhibits no degradation under light exposure.     

Single-crystalline silicon solar cell with pp heterojunction of c-Si substrate and μc-Si : H film

Annealing effects of the single-crystalline silicon solar cells with hydrogenated microcrystaline silicon (μc-Si : H) film were studied to improve the conversion efficiency. Boron-doped (p⁺) μc-Si : H film was deposited in a RF plasma enhanced chemical vapor deposition system (RF plasma CVD) on the rear surface of the cell. With the optimized annealing conditions for the substrate, the conversion efficiency of 21.4% (AM1.5, 25°C, 100 mW/cm²) was obtained for 5 × 5 cm² area single crystalline-solar cell.     

Enhanced absorption in Au nanoparticles/a-Si:H/c-Si heterojunction solar cells exploiting Au surface plasmon resonance

Au nanoparticles (NPs)/(n-type)a-Si:H/(p-type)c-Si heterojunctions have been deposited combining plasma-enhanced chemical-vapour deposition (PECVD) with Au sputtering. We demonstrate that a density of 1.3×10¹¹ cm⁻² of Au nanoparticles with an approximately 20 nm diameter deposited onto (n-type)a-Si:H/(p-type)c-Si heterojunctions enhance performance exploiting the improved absorption of light by the surface plasmon resonance of Au NPs. In particular, Au NPs/(n-type)a-Si:H/(p-type)c-Si show an enhancement of 20% in the short-circuit current, J_SC, 25% in the power output, P_max and 3% in the fill factor, FF, compared to heterojunctions without Au NPs. Structures have been characterized by spectroscopic ellipsometry, atomic force microscopy and current–voltage (I–V) measurements to correlate the plasmon resonance-induced enhanced absorption of light with photovoltaic performance.     

Numerical modelling of trap-assisted tunnelling mechanism in a-Si:H and μc-Si n/p structures and tandem solar cells

The trap-assisted tunnelling theory was developed to describe the tunnelling of charge carriers via bandgap energy levels in structures based on hydrogenated amorphous silicon and microcrystalline silicon. Its implementation into ASPIN numerical simulator is explained. Models that were verified on n/p single junctions were applied in the tunnel recombination junction area of a tandem solar cell. Thus, it is possible to study a multi-layer solar cell without separately simulating any of its components.     

Dark I–V–T measurements and characteristics of (n) a-Si/(p) c-Si heterojunction solar cells

Heterojunction solar cells have been manufactured by depositing n-type a-Si:H on p-type 1–2 Ω cm Cz single-crystalline silicon substrates. An efficiency of 14.2% has been obtained for 1 cm² solar cells by using a simple (Al/(p) c-Si/(n) a-Si:H/ITO/metal grid) structure. With an additional surface texturing, we have reached an efficiency of 15.3% for 1 cm² solar cells. We have investigated the dark IV-curves in order to contribute to a better understanding of the basis of solar cells.     

Advances in a-Si:H/c-Si heterojunction solar cell fabrication and characterization

Our progress in amorphous/crystalline silicon (a-Si:H/c-Si) heterojunction solar cell technology and current understanding of fundamental device physics are presented. In a-Si:H/c-Si cells, device performance is strongly dependent on the quality of the a-Si:H/c-Si heterojunction. Four topics are crucial to minimize recombination at the junction and thereby maximize cell efficiency: wet-chemical pre-treatment of the c-Si surface prior to a-Si:H deposition; optimum a-Si:H doping; thermal and plasma post-treatments of the a-Si:H/c-Si structure. By optimizing these aspects using specifically developed characterization methods, we were able to realize (n)a-Si:H/(p)c-Si and (p)a-Si:H/(n)c-Si cells with up to 18.5% and 19.8% efficiency, respectively.     

Light soaking effect in a-Si:H based n–i–p and p–i–n solar cells

Hydrogenated amorphous silicon solar cells have been realised in both a p–i–n configuration on a Corning glass substrate as well as in a n–i–p configuration on stainless-steel substrate. The performance degradation of the two kinds of cell under solar illumination has been examined for a 140 h period. During degradation, the two devices were kept under load in the maximum power condition that is normally used in a solar plant. The performance of the Corning glass deposited device exhibited a higher rate of degradation with respect to the other cell. A discussion on the possible reasons for this behaviour is given.     

Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power

The intrinsic a-Si:H passivation layer inserted between the doped a-Si:H layer and the c-Si substrate is very crucial for improving the performance of the a-Si:H/c-Si heterojunction (SHJ) solar cell. The passivation performance of the a-Si:H layer is strongly dependent on its microstructure. Usually, the compact a-Si:H deposited near the transition from the amorphous phase to the nanocrystalline phase by plasma enhanced chemical vapor deposition (PECVD) can provide excellent passivation. However, at the low deposition pressure and low deposition power, such an a-Si:H layer can be only prepared in a narrow region. The deposition condition must be controlled very carefully. In this paper, intrinsic a-Si:H layers were prepared on n-type Cz c-Si substrates by 27.12 MHz PECVD at a high deposition pressure and high deposition power. The corresponding passivation performance on c-Si was investigated by minority carrier lifetime measurement. It was found that an excellent a-Si:H passivation layer could be obtained in a very wide deposition pressure and power region. Such wide process window would be very beneficial for improving the uniformity and the yield for the solar cell fabrication. The a-Si:H layer microstructure was further investigated by Raman and Fourier transform infrared (FTIR) spectroscopy characterization. The correlation between the microstructure and the passivation performance was revealed. According to the above findings, the a-Si:H passivation performance was optimized more elaborately. Finally, a large-area SHJ solar cell with an efficiency of 22.25% was fabricated on the commercial 156 mm pseudo-square n-type Cz c-Si substrate with the opencircuit voltage (V_oc) of up to 0.732 V.     

Phase engineering of a-Si:H solar cells for optimized performance

Until recently, the advances in hydrogenated amorphous silicon (a-Si:H) solar cell performance and stability have been achieved materials prepared with hydrogen dilution following primarily empirical approaches. This paper discusses the recently obtained insights into the growth, microstructure and nature of these materials. Such protocrystalline Si:H materials are more ordered than the a-Si:H obtained without dilution and evolve with thickness from an amorphous phase into first a mixed amorphous–microcrystalline and subsequently into a single microcrystalline phase. The development of deposition phase diagrams, characterize their microstructural evolution during growth which can be used to guide the fabrication of solar cell structures in a controlled way. Examples are presented and discussed of their application in solar cell fabrication to obtain a fundamental understanding of the properties of the phase transitions as well as the systematic optimization of cell performance.