硬质合金表面TiAlZrCr/(Ti,Al,Zr,Cr)N梯度膜的微结构与力学性能

采用多弧离子镀技术,使用Ti-Al-Zr合金靶和Cr单质靶,在wc-8％co硬质合金基体上制备了TiAlZrCr／(Ti,Al,Zr,Cr)N多组元梯度膜.分析了梯度膜的成分、结构和微观组织,并研究了梯度膜的显微硬度和膜／基结合力.研究结果表明,该多组元梯度膜为Bl-NaCl型的TiN面心立方结构;薄膜的成分是以TiAlZrCr合金为过渡层的(Ti,Al,Zr,Cr)N梯度膜;薄膜的组织致密均匀,是典型的柱状晶结构;沉积偏压为-50～-200V时,梯度膜均可获得比(Ti,Al,Zr,Cr)N单层膜更高的硬度(最高值为HV4000)和膜／基结合力(临界载荷大于200 N).     

多弧离子镀(Cr,Ti,Al,Zr)N多组元超硬梯度膜的结构及性能

(Cr,Ti,Al,Zr)N梯度膜性能优异。采用多弧离子镀技术,使用Ti-Al-Zr合金靶和Cr单质靶在高速钢表面制备(Cr,Ti,Al,Zr)N多元超硬梯度膜,利用扫描电镜、能谱、X射线衍射仪、硬度计、划痕仪对膜层形貌、成分、结构、硬度、附着力进行分析,并通过热震性能试验考察了膜层的抗热震性能。结果表明:制备的膜层为面心立方结构,择优生长取向为(220)面;与TiN,(Ti,Al)N,(Ti,Cr)N,(Ti,Al,Zr)N等硬质膜相比,制备的(Cr,Ti,Al,Zr)N多元梯度膜具有更高的硬度和膜/基附着力,硬度可达4400HV,膜/基附着力大于200N,实现了从硬质膜到超硬膜的转变;膜层中N含量梯度可有效减少应力集中,Cr,Al含量的增加有利于提高膜层抗热震性能;负偏压对膜层硬度影响较大,对膜层成分、结构、抗热震性能影响较小,对膜/基附着力基本无影响。     

(Ti,Al, Cr)N膜系的研究进展

总结了(Ti,Al,Cr)N膜系的沉积方法并讨论了化学成分、N2流量以及基底偏压等工艺参数对薄膜产生的影响,针对(Ti,Al,Cr)N膜系的相组成与膜层成分、抗氧化性、耐腐蚀性、显微硬度、抗摩擦磨损性能以及膜基结合力等方面进行了详细阐述.在此基础上,对(Ti,Al,Cr)N膜系的未来发展进行了展望,以期为多组元氮化物硬质膜的研究提供参考.     

(Ti,Al,Zr)N多元氮梯度硬质反应膜的组织结构和性能

采用多弧离子镀技术和Ti-Al合金靶及Zr单质靶的组合,在高速钢基体上制备了(Ti,Al,Zr)N多元N梯度硬质反应膜.分别用扫描电镜、X射线衍射仪观察测定(Ti,Al,Zr)N梯度膜膜层的表面、断面形貌、成分以及相结构,研究了(Ti,Al,Zr)N多元氮梯度硬质反应膜的组织结构和性能.结果表明,与TiN、(Ti,Al...     

多弧离子镀(Ti,Al,Zr)N多元超硬梯度膜的制备及力学性能研究

采用多弧离子镀技术并使用合金靶Ti-Al-Zr制备(Ti,Al,Zr)N多元超硬梯度膜。利用扫描电镜、X衍射仪对(Ti,Al,Zr)N膜层表面、断面形貌、成分、结构进行观察测定;系统考察了沉积工艺对(Ti,Al,Zr)N膜层质量、膜/基附着力和硬度的影响;并对膜层抗热震性进行了研究。通过与TiN,(Ti,Al)N,(Ti,Zr)N等硬质膜进行比较,发现采用Ti-Al-Zr合金靶制备的(Ti,Al,Zr)N多元梯度膜有更高的硬度和膜/基附着力,硬度可达4000 HV,实现了从硬质膜到超硬膜的转变;膜/基附着力大于200 N,同时对沉积工艺有较强的适应性。     

离子束辅助中频反应溅射 (Cr,Ti,Al)N薄膜的研究

为了提高工模具的服役性能,采用中频反应溅射,无灯丝离子源辅助的方法沉积了(Cr,Ti,Al)N多元硬质薄膜.分别用电子能谱、X-射线衍射、显微硬度计、划痕仪和干涉显微镜分析了薄膜的成分、相组成、硬度、膜/基结合力及膜层厚度.结果表明用此法制备的薄膜为含有多相结构的(Cr,Ti,Al)N多元硬质膜,晶粒细小,沉积速率快,显微硬度高达35 GPa,结合强度高度达80 N,综合性能优异.     

射频磁控溅射制备(AlCrTiZrNb)N高熵合金薄膜的微观组织和力学性能

研究了氮含量对(Al Cr Ti Zr Nb)N高熵合金薄膜微观结构和力学性能的影响,利用射频磁控溅射工艺在不同N2和Ar流量比下制备了(Al Cr Ti Zr Nb)N高熵合金薄膜。结果表明,随着氮气流量的升高,(Al Cr Ti Zr Nb)N薄膜的沉积速率逐渐下降,Al Cr Ti Zr Nb合金薄膜的结构由非晶态转变为由Me-N(金属氮化物)构成的面心立方固溶体结构,(Al Cr Ti Zr Nb)N薄膜的择优生长取向为(200)晶面。同时随着N2流量的增加,(Al Cr Ti Zr Nb)N高熵合金薄膜的硬度首先快速升高,随后略微降低。当N2∶Ar=1∶1时,(Al Cr Ti Zr Nb)N薄膜硬度最大值28.324 GPa,此时(Al Cr Ti Zr Nb)N薄膜呈现单一的面心立方固溶体结构,饱和Me-N相的形成与各元素的固溶强化作用是其硬度的增长的主要原因。     

多弧离子镀制备TiN/TiAlN多层薄膜性能研究

采用多弧离子镀技术选取钛靶电流分别为60A、70A、80A和基体偏压分别为-240V、-300V、-360V在高速钢基体上制备Ti N/Ti Al N多层薄膜。使用划痕仪、显微硬度计、摩擦磨损试验机和马弗炉对膜层的膜基结合力、显微硬度、摩擦磨损性能和热震性能进行检测。结果表明:在钛靶电流为70A和基体偏压为-240V时膜基结合力最高,同时显微硬度也较高;在基体偏压为-300V的条件下,钛靶电流为70A时的摩擦系数最小,其耐磨性能良好;基体偏压为-240V时的抗热震性能良好。     

(Ti,Al,Zr)N多元硬质膜的退除方法与工艺研究

利用多弧离子镀技术并使用Ti-Al(原子百分比50∶50)合金靶与Zr单质靶组合在高速钢基体上镀覆(Ti,Al,Zx)N硬质反应膜.使用螯合剂、氧化剂、缓蚀剂及氢氧化钠配制膜层退除液,通过改变退除液各组元的浓度、退除液PH值和退膜温度等影响因素,考查(Ti,Al,Zr)N硬质反应膜的退除效果.分析了高速钢基体和退膜前后试样的表面形貌、成分和粗糙度.比较了退除液组元的不同组合、不同浓度、退除液不同PH值条件下镀膜试样表面形貌随时间的变化,进而确定了退除液的最佳组元组合及最佳退除膜层工艺,实现了高速钢基体上(Ti,Al,ZOr)膜的完全退除,退膜后的试样表面光亮,无腐蚀损伤.     

脉冲偏压对304不锈钢表面多弧离子镀CrAlN薄膜结构和耐蚀性能的影响

目前,鲜见有关脉冲偏压对多弧离子镀Cr Al N薄膜耐蚀性能影响的报道。以不同的脉冲偏压在304不锈钢表面多弧离子镀Cr Al N薄膜。采用扫描电镜、显微镜、X射线衍射仪、硬度仪、粗糙度仪分析了Cr Al N薄膜的表面形貌、相结构、硬度、表面粗糙度及耐蚀性能,分析了脉冲偏压对相关性能的影响。结果表明:随着脉冲偏压幅值的增大,Cr Al N薄膜表面大颗粒及凹坑尺寸和数量减少,薄膜质量提高;Cr Al N薄膜主要由(Cr,Al)N相组成,随着偏压增加,Cr Al N薄膜出现(220)择优取向;Cr Al N薄膜表面粗糙度随脉冲偏压增大而减小,显微硬度随脉冲偏压的增大而增大;Cr Al N薄膜在3.5%Na Cl溶液中的耐蚀性随着脉冲偏压的增大而增大,脉冲偏压为400 V时,Cr Al N薄膜与基体304不锈钢的腐蚀速率之比为0.34,薄膜的综合性能最好。     

Effects of bias voltage on the microstructure and mechanical properties of (Ti,Al,Cr)N hard films with N-gradient distributions

(Ti,Al,Cr)N hard reactive films were deposited on high speed steel substrates by multi-arc ion plating (MAIP) technology using pure Cr and Ti-50Al(at.%) alloy targets. The partial pressure of N₂ was raised step by step in each deposition process. The surface morphology, the cross-sectional morphology of fracture sample, the surface compositions and the phase structure of the (Ti,Al,Cr)N films were investigated by scanning electronic microscope (SEM) and X-ray diffraction (XRD). The dense columnar microstructure was obtained in all of the (Ti,Al,Cr)N films, though micro-droplets evidently existed on the surface of the films. The micro-hardness of the film surface, the adhesive strength of the film/substrate and the thermal shock resistance were investigated. The results revealed the effects of bias voltage on the composition, phase structure, and mechanical properties. The improved balanced properties of a micro-hardness of about 50 GPa, an adhesive strength larger than 200 N and a thermal shock resistance of 7-8 cycles were reached at a bias voltage of 150 V. The present super-hard (Ti,Al,Cr)N films with N-gradient distribution may be an actual substitution of TiN, (Ti,Al)N, (Ti,Cr)N and single-layer (Ti,Al,Cr)N hard films.     

Effect of bias voltage on microstructure and mechanical properties of arc evaporated (Ti, Al)N hard coatings

In the present study, authors report on the effect that substrate bias voltage has on the microstructure and mechanical properties of (Ti, Al)N hard coatings deposited with cathodic arc evaporation (CAE) technique. The coatings were deposited from a Ti _{0· 5}Al _{0· 5} powder metallurgical target in a reactive nitrogen atmosphere at three different bias voltages: U _B ?=??? 25, ?50 and ?100 V. The coatings were characterized in terms of compositional, microstructural and mechanical properties. Microstructure of the coatings was investigated with the aid of X-ray diffraction in glancing angle mode, which revealed information on phase composition, crystallite size, stress-free lattice parameter and residual stress. Mechanical properties were deduced from nano-indentation measurements. The residual stress in all the coatings was compressive and increased with increasing bias voltage in a manner similar to that reported in literature for Ti–Al–N coatings deposited with CAE. The bias voltage was also found to significantly influence the phase composition and crystallite size. At ?25 V bias voltage the coating was found in single phase fcc-(Ti, Al)N and with relatively large crystallites of ~ 9 nm. At higher bias voltages (?50 and ?100 V), the coatings were found in dual phase fcc-(Ti, Al)N and fcc-AlN and the size of crystallites reduced to approximately 5 nm. The reduction of crystallite size and the increase of compressive residual stress with increasing bias voltage both contributed to an increase in hardness of the coatings.     

Improved Tribocorrosion Properties of Ti6Al4V Alloy by Anodic Plasma Electrolytic Oxidation

Ti6Al4V alloy has good corrosion resistance due to the formation of the passive oxide films on the surface of Ti6Al4V alloy. However, Ti6Al4V alloy has poor tribocorrosion resistance in the seawater environment. Herein the present work, plasma electrolytic oxidation (PEO) with the electrolyte of glycerol and sodium borate is used to generate PEO coatings on the surface of Ti6Al4V alloy to improve its tribocorrosion properties. The microstructure and tribocorrosion properties of PEO coatings are investigated by using scanning electron microscopy, X-ray diffraction, and tribometer, respectively. The growth kinetics and the tribocorrosion mechanisms of PEO coatings are discussed in detail. It is shown in the results that PEO coatings deposited on the surface of Ti6Al4V alloy are composed of rutile and anatase phases. The surface hardness and thickness of PEO coatings are enhanced with the increase of the voltage and time. The wear rate of Ti6Al4V alloy with PEO coatings is significantly reduced in artificial seawater.     

Al含量对（Ti,Al）N薄膜微观结构与性能的影响

研究发Ａｌ含量对（Ｔｉ７Ａｌ）Ｎ薄膜微观结构与性能的影响，实验结果表明：同ＴｉＮ薄膜相同，在（Ｔｉ７ＡＤＮ系薄膜中存在着（１１１），（２００）和（２２０）三咱择优取向，随着Ａｌ含量的增加这三种取向的衍射强度呈不同的变化趋势，而这三种取向的面间距则都呈先降后升的趋势，利用上述微观结构的变化可合理地解释（Ｔ。ｌ，ＡＤＮ薄膜的硬度随Ａｌ含量的增加呈先升后降的现象。     

V含量对磁控溅射CrAlVN涂层微观结构及力学和摩擦学性能的影响

采用磁控共溅射工艺在火炮身管PCrNi3Mo钢材料表面沉积了(Cr0.5Al0.5)1-xVxN(x=0%~10.6%,原子分数)涂层。利用电子探针显微分析仪(EPMA)、X射线衍射仪(XRD)、扫描电镜(SEM)对涂层的组成、微观形貌与相结构进行了表征,研究了V含量对涂层微观结构和形貌的影响。结果表明V的加入使得涂层中出现了CrVN新晶相,且随着V含量的增加CrVN特征峰越来越明显,晶粒簇尺寸减小,V元素起到了一定的细化晶粒簇作用。利用纳米压痕仪及摩擦试验机对涂层的硬度、弹性模量和摩擦系数进行了测试,研究了V含量对(Cr0.5Al0.5)1-xVxN涂层性能的影响。结果表明V含量在7.2%时涂层硬度和弹性模量达到最大值,分别为21.36GPa和297.8GPa;随着V含量的增加,涂层的摩擦系数逐渐减小,当V含量在10.6%时,涂层摩擦系数平均值为0.094,表现出良好的摩擦磨损性能。     

A comparative study of the impurity segregation from commercially pure Ti, Ti6Al4V and Ti3Al8V6Cr4Zr4Mo

The surface composition of commercially pure Ti, Ti6Al4V and Ti3Al8V6Cr4Zr4Mo during annealing at different constant temperatures was experimentally investigated. Auger electron spectroscopy was used to monitor the APPHs of the specified elements present on the surfaces. The surfaces of Ti and its alloys were contaminated by oxygen and carbon, and the contamination is attributed to the continual uptake of the background gases, even in the UHV chamber. It was found that mainly C and S segregated at 400 °C, and Cl at higher temperatures (500–630 °C) for commercially pure Ti. However, S was the main segregating species for all three samples. The segregation of Al was measured for the Ti6Al4V and Ti3Al8V6Cr4Zr4Mo samples at higher temperatures. The linear least-square fit method was employed to determine the contribution of pure Ti and TiC from the measured APPH's. The AES fitting confirmed the formation of TiC on the surface at temperatures 400–500 °C.     

活塞环表面CrN基复合膜的组织结构与摩擦副匹配机理研究

为降低活塞环与缸套摩擦副的磨损及延长活塞环的使用寿命,本文采用多弧离子镀在活塞环表面制备了CrN及CrTiAlN复合膜,比较研究了Cr电镀层与CrN,CrTiAlN复合膜的纳米硬度及高温摩擦磨损性能,采用X射线衍射、扫描电子显微镜、能谱仪、纳米硬度仪和发动机台架试验装置,系统分析了CrTiAlN复合膜的成分、相结构、表面形貌、纳米硬度和抗高温摩擦磨损性能,研究结果表明:CrTiAlN复合膜的主要组成成分为Cr,Ti,Al,N,复合膜中含有CrN,Cr2N,TiN和非晶的AlN相。CrTiAlN复合膜表面组织致密,均匀分布着许多颗粒,最大的达400 nm以上,而最小的仅几十纳米。断面结构为纤维状的柱状晶组织。CrN,CrTiAlN复合膜比电镀Cr具有较优的力学性能和高温摩擦磨损性能,与缸套匹配性能良好,最后对三种活塞环涂层的摩擦副匹配机理进行了分析讨论。     

Effect of negative bias voltage on mechanical and electrochemical nature in Ti–W–N coatings

Mechanical and electrochemical surface properties of Si (100) and AISI D3 steel substrates-coated Ti–W–N, deposited by r.f. magnetron sputtering process from a binary (50% Ti, 50% W) target in an Ar/N₂ (90%/10%) mixture, have been studied using nanoindentation, Tafel polarization curves and electrochemical impedance spectroscopy (EIS). The crystallinity of the coatings was analyzed via X-ray diffraction (XRD) and the presence of TiN(111), TiN(200), WN₂(107), and W₂N(220) phases were determined. Depth sensing nanoindentation measurements were used to investigate the elasto-plastic behavior of Ti–W–N coatings. Each group of samples was deposited under the same experimental conditions (power supply, Ar/N₂ gas mixture and substrate temperature), except the d.c. negative bias voltage that varied (0, ?50, and ?100 V) in order to study its effect on the mechanical and electrochemical properties of AISI D3 steel coated with Ti–W–N coatings. The measurements showed that the hardness and elastic modulus increase from 19 to 30 GPa and from 320 to 390 GPa, respectively, as a function of the increasing negative bias voltage. Coating track and coating-substrate debonding have been observed with atomic force microscopy (Asylum Research MFP-3D^®) on the indentation sites. Finally, the corrosion resistance of Ti–W–N coatings in 3.5 wt% NaCl solution was obtained from electrochemical measurements in relation to the increase of the negative bias voltage. The obtained results have shown that at the higher negative bias voltage (?100 V), the steel coated with Ti–W–N coatings presented the lower corrosion resistance. The corrosion resistance of Ti–W–N in 3.5 wt% NaCl solution was studied in relation to the increase of the bias voltage.     

铝含量对（Ti,Al）N镀层结构及耐磨性的影响

运用多弧离子镀在Ｗ６Ｍｏ５Ｃ４Ｖ２高速钢表面沉积了（Ｔｉ,Ａｌ）Ｎ镀层,并经ＳＥＭ,ＸＲＤ和ＥＤＳ等方法分析表明,多靶联合工作获得的（Ｔｉ,Ａｌ）Ｎ镀层,其成分可连续变化,随弧流增大,铝含量增多;随负偏压增大,铝含是降低。弧流与偏压二者对镀层的成分均有影响,其中弧流较为显著。