基于SnS2/InSe异质结的高性能宽带光电探测器(英文)

我们报道了一种基于SnS₂/InSe垂直异质结的宽带光电探测器,其光谱范围为365-965 nm。其中,InSe作为光吸收层,有效扩展了光谱范围,SnS₂作为传输层,与InSe形成异质结,促进了电子-空穴对的分离,增强了光响应。该光电探测器在365 nm下具有813 A/W的响应度。并且,在965nm光照下它仍然具有371 A/W的高响应度,1.3×10⁵%的外量子效率,3.17×10¹² Jones的比探测率,以及27 ms的响应时间。该研究为高响应宽带光电探测器提供了一种新的方法。     

亚稳相Ga2O3异质外延的研究进展

作为一种新兴的超宽禁带半导体材料,氧化镓(Ga₂O₃)被认为是下一代高功率电力电子器件领域的战略性先进电子材料。相较于热稳定的β-Ga₂O₃,亚稳相Ga₂O₃表现出更为新颖的物理性质,逐渐受到关注。通过异质外延生长高质量的亚稳相Ga₂O₃单晶薄膜是实现亚稳相Ga₂O₃基功率电子、微波射频和深紫外光电信息感知器件的重要前提。重点阐述了亚稳相Ga₂O₃的晶体结构、电子能带结构以及相关物理性质,总结了近年来亚稳相Ga₂O₃异质外延和能带工程的研究进展,并对未来亚稳相Ga₂O₃材料和器件的发展趋势进行了展望。     

固体C70/Si异质结的界面电子态

用深能级瞬态谱和高频电容-电压技术研究了固体C70/Si异质结的界面电子态.研究结果表明在C70/Si的界面上明显存在三个电子陷阱Eit1(0.194)、Eit2(0.262),Eit3(0.407)和一个空穴陷阱Hit1(0.471),以及在C70/Si界面附近存在着固体C70的电子和空穴陷阱引起的慢界面态.结果还表明C70膜的生长温度对C70/Si的电学性质有重大影响,200℃生长的C70/Si界面远优于室温生长的.     

SiGe/SiHBT异质界面与pn结界面的相对位移的影响

从模拟和实验两方面研究了SiGe/Si HBT发射结中pn结界面和SiGe/Si界面的相对位置对器件的电流增益和频率特性的影响.发现两界面偏离时器件性能会变差.尤其是当pn结位于SiGe/Si界面之前仅几十?就足以产生相当高的电子寄生势垒,严重恶化器件的性能.据此分析了基区B杂质的偏析和外扩对器件的影响以及SiGe/Si隔离层的作用.     

固体C_(70)/Si异质结的界面电子态

用深能级瞬态谱和高频电容 -电压技术研究了固体 C70 /Si异质结的界面电子态 .研究结果表明在 C70 /Si的界面上明显存在三个电子陷阱 Eit1( 0 .1 94)、Eit2 ( 0 .2 62 ) ,Eit3( 0 .40 7)和一个空穴陷阱 Hit1( 0 .471 ) ,以及在 C70 /Si界面附近存在着固体 C70 的电子和空穴陷阱引起的慢界面态 .结果还表明 C70 膜的生长温度对 C70 /Si的电学性质有重大影响 ,2 0 0℃生长的 C70 /Si界面远优于室温生长的     

增强型β-Ga2O3/4H-SiC异质结VDMOS的设计与研究

由于β-Ga₂O₃材料难以形成P型掺杂,目前β-Ga₂O₃功率器件大多为无结耗尽型。为了解决β-Ga₂O₃器件难以形成增强型的问题,提出了一种具有β-Ga₂O₃/4H-SiC异质结的纵向双扩散金属-氧化物-半导体场效应晶体管(VDMOS)。添加P型4H-SiC后,利用形成的PN结的单向导通性得到了正阈值电压,实现了增强型器件。使用Sentaurus TCAD仿真软件模拟了器件结构并研究了其电学特性,通过调节SiC厚度、SiC沟道浓度、外延层厚度和外延层浓度四个重要结构参数,对器件的功率品质因数进行优化设计。优化后的器件具有1.62 V的正阈值电压、39.29 mS/mm的跨导以及5.47 mΩ·cm²的比导通电阻。最重要的是器件的关态击穿电压达到了1838 V,功率品质因数高达617 MW/cm²。结果表明,该β-Ga₂O₃/...     

NiS/TiO2/Ti3C2三元异质结结构的构筑及光催化产氢性能

二维过渡金属碳化物MXene(Ti₃C₂)因其优良二维层状结构及导电性被认为是一种理想的光催化材料。采用两步水热法结合原位自氧化方法合成了NiS/TiO₂/Ti₃C₂(TCTNS)三元复合光催化剂。运用多种分析手段(场发射扫描电子显微镜(FESEM)、X射线衍射仪(XRD)、紫外-可见光(UV-Vis)吸收光谱仪及光电流测试)对其结构进行了表征,研究了其光催化分解水产氢的活性,探讨了材料的组成、结构与性能之间的相互影响。结果表明,与单一NiS和二元TiO₂/Ti₃C₂催化剂相比,复合光催化剂具有更高的光电性能。其可见光驱动的光催化H₂产氢速率可达3 269μmol/(g·h),是二元TiO₂/Ti₃C₂产氢速率的约19倍。实验结果表明,由于NiS和TiO₂纳米颗粒覆盖重建的多异质结界面,以及TCTNS复合...     

阳极刻蚀提升Ga2O3肖特基势垒二极管击穿特性

提出了一种采用阳极刻蚀提升Ga₂O₃肖特基势垒二极管(SBD)击穿特性的新方法。基于氢化物气相外延(HVPE)法生长的Ga₂O₃材料制备了Ga₂O₃纵向SBD。在完成阳极制备后,对阳极以外的Ga₂O₃漂移区进行了不同深度的刻蚀,刻蚀完成后,在器件表面生长了SiO₂介质层,随后制备了场板结构。测试结果显示,刻蚀后器件的比导通电阻小幅上升,而反向击穿电压均大幅提升。刻蚀深度为300 nm的β-Ga₂O₃ SBD具有最优特性,其比导通电阻(R_{on, sp})为2.5 mΩ·cm²,击穿电压(V_br)为1 410 V,功率品质因子(FOM)为795 MW/cm²。该研究为高性能Ga₂O₃ SBD的制备提供了一种新方法。     

易回收型Ag/BiOCl/Bi2O3/CNF异质结光催化剂的制备及降解性能研究

针对传统粉体光催化剂难以回收的问题,以电纺碳纤维(CNF)为基底,通过两步溶剂热法和光还原反应,制备了Ag/BiOCl/Bi₂O₃/CNF异质结光催化剂。BiOCl/Bi₂O₃异质结可有效提升光生载流子的分离能力,Ag修饰增强了电荷传输,使复合光催化剂对有机污染物的降解性能大幅提升。通过吸附-降解协同作用,Ag/BiOCl/Bi₂O₃/CNF对10 mg·L^-1罗丹明B (RhB)经光照120 min后的移除率高达91.1%,对20 mg·L^-1盐酸四环素(TCH)经光照160 min后的移除率达85.3%。Ag/BiOCl/Bi₂O₃/CNF不仅可快速处理有机污染物,还具有循环稳定、便捷回收的特点,可克服现有粉体光催化剂难以重复利用的缺点,具有实际应用潜力。     

0.3K下的GaAs/Al_xGa_(1-x)As异质结中的分数量子霍耳效应

本文从实验上比较了低浓度 GaAs/Al_xGa_(1-x)As异质结样品在4.2K、1.3K和0.34K 温度下的整数量子霍耳效应,报道了填充因子v=2/3的分数量子霍耳效应的实验观察结果.讨论了低浓度GaAs/Al_xGa_(1-x)As样品中宏观不均匀性对实验结果的影响.     

一种柔性自供电Ga2O3基日盲光电探测器的设计及性能研究北大核心CSCD

近年来,氧化镓(Ga2O3)日盲光电探测器因其高灵敏度和低虚警率及广泛的应用前景,受到了科学家们的高度关注.为了满足现代社会对低损耗、环保、高集成、轻便和柔性器件的需求,可自供电的柔性器件备受关注.然而,到目前为止,Ga2O3基柔性自供电光电探测器鲜有报道.本文通过原位生长技术在耐高温的柔性衬底玻璃纤维布上生长了β-Ga2O3纳米线,并构筑Ag/β-Ga2O3肖特基结.在肖特基结的作用下,光生载流子可在无外加偏压下分离和传输,并展现出超低的暗电流(0.2 pA)、高光暗比(～500)、快响应时间(0.46/0.41 s)和高探测率(6.8×109 Jones).该探测器也表现出良好的机械性能.结果表明,Ag/β-Ga2O3肖特基结探测器在深紫外探测器领域具有广阔的应用前景,为柔性自供电探测技术的发展提供了新的思路.     

溅射气压对氧化镓薄膜光学特性的影响

采用射频磁控溅射法在石英衬底上制备了氧化镓(Ga2O3)薄膜.利用X射线衍射仪和紫外-可见-红外分光光度计分别对Ga2O3薄膜的晶体结构和光学带隙进行了表征,并在室温下测量了 Ga2O3薄膜的光致发光(PL)谱.结果表明:制备的Ga2O3薄膜呈非晶态.吸收边随着溅射气压的增加先蓝移后红移,光学带隙值范围为5.06～5.37 eV,溅射气压为1 Pa时,制备的Ga2O3薄膜具有最大的光学带隙.在325 nm激光激发下,400 nm附近和525 nm附近处出现与缺陷能级相关的发光峰.     

Excellent performance of gas sensor based on In2O3-Fe2O3 nanotubes

In₂O₃-Fe₂O₃ nanotubes are synthesized by an electrospinning method. The as-synthesized materials are characterized by scanning electron microscope and X-ray powder diffraction. The gas sensing results show that In₂O₃-Fe₂O₃ nanotubes exhibit excellent sensing properties to acetone and formaldehyde at different operating temperatures. The responses of gas sensors based on In₂O₃-Fe₂O₃ nanotubes to 100 ppm acetone and 100 ppm formaldehyde are 25 (240℃) and 15 (260℃), and the response/recovery times are 3/7 s and 4/7 s, respectively. The responses of In₂O₃-Fe₂O₃ nanotubes to 1 ppm acetone (240℃) and formaldehyde (260℃) are 3.5 and 1.8, respectively. Moreover, the gas sensor based on In₂O₃-Fe₂O₃ nanotubes also possesses an excellent selectivity to acetone and formaldehyde.     

Characterization and ellipsometric investigation of high-quality ZnO and ZnO(Ga2O3) thin alloys by reactive electron-beam co-evaporation technique

High-quality ZnO(Ga₂O₃) thin films have been co-evaporated by reactive electron-beam evaporation in an oxygen environment. The effect of Ga₂O₃ on the structural and optical properties has been investigated. X-ray diffraction (XRD) measurements have shown that the ZnO(Ga₂O₃) alloys are c-axis-oriented. The alloy containing 28% of Ga₂O₃ showed the best crystallinity. Photoluminescence on ZnO(28%Ga₂O₃) reveals an enhancement of the ultraviolet near band edge emission at 380 nm while the intensity of the deep-level emissions weakens. A reduction of the oxygen vacancies as well as the reduction of the zinc interstitials with gallium may explain this effect. Thus, the possibility of transitions of electron in the conduction band to a deep acceptor level due to zinc interstitials may decrease. Finally, ellipsometric measurements show that the optimum weight concentration of gallium oxide in the alloys is 28%, thus correlating with the XRD and photoluminescence measurements.     

Co3O4/Fe2O3异质结复合材料的制备及其紫外光光电探测性能

分别采用旋涂法和水热法在FTO衬底上制备Co₃O₄种子层和Co₃O₄薄膜,再在Co₃O₄薄膜上水热生长Fe₂O₃纳米棒,获得了高质量的Co₃O₄/Fe₂O₃异质结复合材料。通过改变Fe₂O₃前驱体溶液浓度来改变异质结复合材料中Fe₂O₃组分的含量。结果表明,Fe₂O₃纳米棒覆盖在呈网状结构的Co₃O₄薄膜上,随着Fe₂O₃前驱体溶液浓度即Fe₂O₃组分含量的增加,Co₃O₄/Fe₂O₃异质结复合材料对紫外光的响应逐渐增强,当Fe₂O₃前驱体溶液浓度为0.015mol/L时,异质结复合材料有着很好的光电稳定性,并表现出较高的响应率(12.5mA/W)和探测率(4.4×10¹⁰Jones)。     

共沉淀法制备Y2O2SO4:Eu3+荧光粉及其光致发光研究

采用商业Y(NO3)3·6H2O、Eu(NO3)3·6H2O、(NH4)2SO4和NaOH为实验原料,通过共沉淀法制备了Y2O2SO4:Eu3+荧光粉。利用热分析(DTA-TG-DTG)、傅里叶变换红外(FT-IR)光谱、X射线衍射(XRD)、扫描电子显微镜(SEM)和光致发光(PL)光谱等手段对合成的粉体进行了表征。结果表明,当(NH4)2SO4引入到反应体系中时,前驱体具有非晶态结构,且在空气气氛中800℃煅烧2h能转化为单相的Y2O2SO4粉体,该Y2O2SO4粉体呈准球形,粒径范围分布在0.5~1.0μm之间,团聚较严重。PL光谱分析表明,在270nm紫外光激发下,Y2O2SO4:Eu3+荧光粉呈红光发射,主发射峰位于620nm,归属于Eu3+的5D0→7F2跃迁。Eu3+的猝灭浓度是5 mol%,其对应的荧光寿命为1.22 ms。另外,当(NH4)2SO4未引入到反应体系中时,采用类似的方法合成了Y2O3:Eu3+荧光粉,并对Y2O2SO4:Eu3+和Y2O3:Eu3+荧光粉的PL性能进行了比较。     

Comparative study of AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with Al2O3 and HfO2 gate oxide

AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors (MOSHFETs) with Al₂O₃ gate oxide which was deposited by atomic layer deposition (ALD) were fabricated and their performance was then compared with that of AlGaN/GaN MOSHFETs with HfO₂ gate oxide. The capacitance (C)-voltage (V) curve of the Al₂O₃/GaN MOS diodes showed a lower hysteresis and lower interface state density than the C-V curve of the HfO₂/GaN diodes, indicating better quality of the Al₂O₃/GaN interface. The saturation of drain current in the I_D-V_GS relation of the Al₂O₃ AlGaN/GaN MOSHFETs was not as pronounced as that of the HfO₂ AlGaN/GaN MOSHFETs. The gate leakage current of the Al₂O₃ MOSHFET was five to eight orders of magnitude smaller than that of the HfO₂ MOSHFETs.     

用于GaAs射频集成电路的不同厚度氧化铝MIM 电容的研究

本文研究了不同厚度的氧化铝对MIM电容直流和射频特性的影响。在1MHz下,对于20nm氧化铝MIM电容,其拥有3850 pF/mm₂的高电容密度和可接受的681 ppm/V₂的VCC-α电压系数。1MHz时突出的74 ppm/V₂VCC-α电压系数,8.2GHz谐振频率以及2GHz时41的Q值可以从100nm氧化铝MIM电容获得。采用GaAs工艺以及原子层淀积制造的高性能ALD氧化铝MIM电容很有可能成为GaAs射频集成电路很有前景的候选器件。     

Ga2O3缓冲层厚度对柔性衬底沉积Cu/ITO薄膜性能的影响

Cu and Cu/ITO films were prepared on polyethylene terephthalate （PET） substrates with a Ga2O3 buffer layer using radio frequency （RF） and direct current （DC） magnetron sputtering. The effect of Cu layer thickness on the optical and electrical properties of the Cu film deposited on a PET substrate with a Ga2O3 buffer layer was studied, and an appropriate Cu layer thickness of 4.2 nm was obtained. Changes in the optoelectrical properties of Cu（4.2 nm）/ITO（30 nm） films were investigated with respect to the Ga2O3 buffer layer thickness. The optical and electrical properties of the Cu/ITO films were significantly influenced by the thickness of the Ga2O3 buffer layer. A maximum transmission of 86%, sheet resistance of 45 Ω/□ and figure of merit of 3.96 × 10^-3 Ω^ -1 were achieved for Cu（4.2 nm）/ITO（30 nm） films with a Ga2O3 layer thickness of 15 nm.     

氧化铟纳米管的制备及它的甲苯气敏特性研究

Abstract： The pristine In2O3 nanotubes were synthesized by electrospinning and subsequent calcination. Scanning electron microscope, X-ray powder diffraction and transmission electron micrograph were employed to analyze the morphology and crystal structure of the as-synthesized nanotubes. Gas-sensing properties of the as-synthesized In203 nanotubes were investigated by exposing the corresponding sensors to toluene, acetone, ethanol, formalde- hyde, ammonia and carbon monoxide at 340 ℃. The results show that the gas sensor possesses a good selectivity to toluene at 340 ℃. The response of the In2O3 nanotube gas sensor to 40 ppm is about 5.88. The response and recovery times are about 3 s and 17 s, respectively.