Subsurface crack damage in silicon wafers induced by resin bonded diamond wire sawing

In order to optimize the process of wire sawing, this work studied the subsurface crack damage in silicon wafers induced by resin bonded diamond wire sawing using theoretical and experimental methods. A novel mathematical relationship between subsurface crack damage depth and processing parameters was established according to the indentation fracture mechanics. Sawing experiment using resin bonded diamond wire saw was performed on a wire saw machine. The validity of the proposed model was conducted by comparing with the experimental results. At last, the influences of processing parameters on subsurface damage depth were discussed. Results indicate that the median cracks are mainly oblique cracks which generate the subsurface crack damage. On the diamond wire saw cross section, the abrasives with the position angle 78° between abrasive position and vertical direction generate the largest subsurface damage depth. Furthermore, abrasives, generating the subsurface damage, tend away from the bottom of diamond wire with the increase of wire speed or decreases with the increase of feed rate. However, the wire speed and feed rate have opposite effects on the subsurface crack damage depth. In addition, the subsurface crack damage depth is unchanged when the ratio of feed rate and wire speed does not change.     

半导体晶体线锯切割工艺研究

线锯切割技术在半导体晶体切割领域已经得到了广泛应用。对传统内圆切割技术进行了介绍,并针对新兴线锯切割技术的现有分类和研究水平做了总结,阐述了自由磨料线锯切割和固结磨料线锯切割两大类别的工作原理和研究进展。自由磨料线锯切割是取代内圆切割的一种广泛技术,而固结磨料线锯切割则是针对高切割效率要求的重要改进。针对晶体线锯切割技术所做的综述,有助于研究者了解前沿研究进展,把握晶体线锯切割的发展方向。     

碳化硅金刚线切割表面粗糙度的研究

碳化硅是新兴的第三代半导体材料。用固定磨料金刚线切割机对其进行切割加工,分析了加工过程的各项参数对晶片表面粗糙度的影响,为优化碳化硅金刚线切割过程提出依据。     

Characterization of polycrystalline silicon wafers for solar cells sliced with novel fixed‐abrasive wire

For slicing crystalline silicon ingots, we have developed a novel fixed‐abrasive wire where diamond grit is fixed onto a bare wire by resin bonding. The properties of the wafers sliced using a multi‐wire saw with the fixed‐abrasive wire have been investigated. When compared with the wafers sliced with the loose‐abrasive wire, the slicing speed is improved by approximately 2.5‐fold and the thicknesses of saw‐damage layers are reduced by more than a factor of two. Polycrystalline silicon solar cells have been fabricated for the first time utilizing the wafers sliced with the fixed‐abrasive wire, and the cells with the saw‐damage etching depth of 7 µm have shown photovoltaic properties comparable to those prepared using the wafers sliced with the loose‐abrasive wire and subsequently etched to remove the damage layers up to 15 µm. It has been clarified that wafer slicing using the fixed‐abrasive wire is promising as a next‐generation slicing technique for fabrication of solar cells, particularly thin silicon cells where the wafer thicknesses approach or become less than 150 µm. Copyright © 2010 John Wiley & Sons, Ltd.     

金刚石多线切割设备在SiC晶片加工中的应用

介绍了金刚石多线切割设备的原理,并采用直径为250μm的金刚石线进行切割工艺实验。使用不同的工艺参数,比较了不同工艺参数对晶片TTV(整体厚度偏差)的影响,给出了实验比较结果,通过改变工艺参数可以使各切割片的TTV控制在25μm之内。     

Mechanisms of wafer sawing and impact on wafer properties

Silicon wafer wire‐sawing experiments were realized with different sets of sawing parameters, and the thickness, roughness, and cracks depth of the wafers were measured. The results are discussed in relation to assumptions underlying the rolling–indenting model, which describes the process. It was also found that the silicon surface at the bottom of the sawing groove is different from the wafer surface, implying different sawing conditions in the two positions. Furthermore, the measured parameters were found to vary along the wire direction, between the entrance of the wire in the ingot and its exit. Based on these observations, some improvements for the wire‐sawing model are discussed. Copyright © 2010 John Wiley & Sons, Ltd.     

Experiment study on electroplated diamond wire saw slicing single-crystal silicon

This paper conducted the slicing experiments of single-crystal silicon using a reciprocating electroplated diamond wire saw. The machined wafer topography and wire wear were observed by using scanning electron microscope (SEM). The influences of process parameters and cutting fluids on single-crystal silicon wafer surface roughness (SR), subsurface micro-crack damage (SSD) depth, total thickness variation (TTV) and warp were investigated. The bonded interface sectioning technique was used to examine the cut wafers SSD depth. Study results show that a higher wire speed and lower ingot feed speed can produce lower wafer SR and SSD; the lower warp of wafer needs lower wire speed and ingot feed speed; and low wafer TTV can be obtained by an appropriate matching relationship between wire speed and ingot feed speed. The synthetic cutting fluid has a better total effect to improve the wafer quality. The pulled-out of diamond abrasives is the main wear form of wire, which indicates that more research on improving the abrasives retaining strength on wire surface should be investigated in fixed-abrasive wire manufacturing process, in order to improve the wire life and wire saw machining process.     

Effect of laminated wafer toward dicing process and alternative double pass sawing method to reduce chipping

Thin wafers of 100-/spl mu/m thickness laminated with die-attach film (DAF) was diced using a standard sawing process and revealed a low chipping crack resistance. Wafers laminated with conductive DAF shows greater chipping compared to nonconductive DAF and bare silicon wafer. It was found through scanning electron microscopy (SEM) micrographs, energy dispersive X-ray (EDX) analysis, and atomic force microscopy (AFM) that silver fillers in the conductive DAF was the cause of excessive blade loading which resulted in bad chipping quality. To reduce chipping/cracking induced by sawing, an alternative double-pass sawing method was developed and is explained in the paper. The methodology of this study discusses a double-pass method, where the first pass dice through the wafer and varied the percentage of DAF thickness cut. Best results were achieved when dicing through the wafer and 0% of DAF, followed by a full separation in the second pass. Approximately 80% of chipping reduction compared to conventional single pass.     

多线切割机的切割运动分析

半导体晶圆不断向大直径方向发展,内圆刀具的单片切割方式已经不能满足大直径晶圆的切片要求,随着多线锯切割技术的完善,多线切割机已经是半导体材料切片的主流设备。对砂粒在切割过程中的运动进行了分析,同时对钢线张力、切削进给运动进行了理论分析。     

线锯切割失效机理的研究

通过对多线切割机切割工艺过程中失效机理的分析研究,提出了影响线锯切割失效的因素且分析了锯丝断线的主要原因和砂浆磨粒丧失切削力的过程,并提出了相应的预防改进措施。     

Investigation and modelling of hybrid laser-waterjet micromachining of single crystal SiC wafers using response surface methodology

A hybrid laser-waterjet micromachining technology was proposed to implement near damage-free and high-efficient micromachining of thermal-sensitive hard and brittle materials. A new material removal concept was used where a waterjet is applied off-axially to expel the “softened” elemental material by laser radiation and cool the material to eliminate thermal damages during the material removal process. The present study investigates the effect of process parameters and their interaction on the cutting depth, cutting width and the material removal rate in the hybrid laser-waterjet micromachining of single crystal SiC wafers. The analysis of variance (ANOVA) indicates that waterjet inclination angle, waterjet offset distance, nozzle stand-off distance, traverse speed of hybrid cutting head, average laser power and waterjet pressure are the significant terms on cutting depth, cutting width as well as material removal rate. The quadratic backward-eliminated regression models are developed using response surface methodology (RSM). The models show that the material removal ability and the material removal rate increase with the increased average laser power and decrease with the increased nozzle stand-off distance and waterjet pressure. Waterjet offset distance has a knee-point value on the machining results. Cutting depth and width decrease with the increased traverse speed of hybrid cutting head but material removal rate increases with the increased traverse speed when the traverse speed is smaller than a certain value. The turbulent water breaks down the laser optically and weakens its heating ability. The critical waterjet offset distance can also be changed since the interactive effect of the process parameters. The verification results show the models can perform predictions with acceptable errors. Moreover, as compared to laser dry ablation, the photographs of the machined surface and its 3D profile illustrate that hybrid laser-waterjet micromachining can obtain much deeper and wider groove with V-sharp cross-sectional profile. It can significantly reduce or even eliminate thermal damages such as heat-affected zone (HAZ) and re-solidified layer by using the hybrid laser-waterjet micromachining technology.     

多线切割工艺中晶片翘曲度的控制

翘曲度是鉴别晶片几何参数好坏的重要指标之一.采用逐点扫描法对多线切割制备的晶片翘曲度分布进行了测量.通过对切割线张力、砂浆使用次数、切割速度等影响翘曲度的主要因素进行实验分析,阐述了产生的原因,并得出了翘曲度的分布规律.针对影响翘曲度的主要因素,根据其分布规律调整相应的切割工艺条件,可较好地控制晶片的翘曲度.虽是针对Si单晶加工中出现的实验情况进行分析,但该结论完全可用于Ge、GaAs等其他晶体的加工中.     

太阳电池用Si片切割过程中浆料作用研究

Si片生产技术及工艺的进步使得太阳电池用Si片的切片厚度不断降低,而超薄的太阳电池用Si片必须通过多线切割机进行切割.基于Si片切割过程中砂浆性能对Si片表面质量、Si片成片率和切割线寿命的影响,分析了多线切割机中切削液的性能,并采用不同工艺参数多次进行试验,总结出了砂浆对太阳电池用Si片切割状态的影响因素.通过分析,得出了改善砂浆性能来提高多线切割机切片性能并获得更高的Si晶片表面质量的方法.     

多线切割工艺中切割线直径对翘曲度影响的研究

目前,在硅单晶锭切割领域多线切割机已得到广泛的应用。切割砂浆及切割线在切割中有着极其重要的作用,不同的使用条件会直接影响切割晶片的几何参数。主要讨论切割线直径的不同对切割出晶片几何参数的影响。     

金刚线切割多晶硅片表面酸制绒效果研究

为了探索金刚线切割多晶硅片的表面制绒新技术,采用常规酸制绒、添加剂酸制绒和酸蒸气制绒三种方法对金刚线切割多晶硅片表面进行制绒处理,并用扫描电镜和光谱仪分析了三种制绒方法处理后多晶硅片的表面形貌和反射率比变化。结果表明,酸蒸气制绒能够更加有效地去除线锯切割产生的平行纹,降低表面反射率。通过调节蒸气源蒸发的温度,可以有效改善多晶硅的表面形貌,大幅降低入射光在多晶硅表面的反射率,300~1100nm波长范围内多晶硅样品的最低平均反射率达11.6%,有望用于制作高效多晶硅太阳电池。     

晶圆切割中背面崩裂问题的分析

半导体技术不断发展,越来越多的新材料、新工艺应用在晶圆制造中。这对封装核心工序的划片工艺提出了很大挑战。在划片工艺中背面崩裂的控制是一个难点。文章主要是从工艺材料、工艺条件、划片刀以及设备四方面分析产生背面崩裂的主要因素以及优化方法。同时介绍了两种控制背面崩裂较有效的切割工艺：减少应力的开槽切割工艺和DBG工艺。     

锗单晶切割工艺研究

多线切割机是一种将晶棒切割成晶片的设备,近年来得到大规模使用,其切割原理为利用高速运动的切割钢线将砂浆带入切割区,砂浆中的坚硬颗粒（主要为SiC）与晶棒进行磨削,进而起到切割作用。根据锗材料的特殊性,通过改变工艺参数（主轴平均转速,砂浆流量,砂浆供给方式等）与硅材料成熟切割工艺进行对比实验,进而稳定锗材料的切割工艺。     

Comparison of diamond wire cut and silicon carbide slurry processed silicon wafer surfaces after acidic texturisation

Our work focuses on the acidic etching of silicon wafers, cut via diamond wire (DW) or silicon carbide slurry process (SP). The DW and SP as-cut wafer surface structures have a significant impact on the evolution of the two resultant and different etched morphologies. The time-dependent development of the surface morphology for mono- and multi-crystalline wafers is compared and analyzed via etch rates, reflectivity measurements and confocal microscopy. The as-cut structure of the differently sawn wafers defines a template where the etch attack preferentially occurs and predetermines the texturisation of the etched surface. Based on the experimental results it is possible to lower the reflectivity of the SP-sawn wafers by varying the acidic mixture. On the contrary, the DW-sawn wafers obtain only a small enlargement of the folded surface area during acidic texturisation and no influence of different acidic etch solutions on the reflectivity values was found. To create homogeneously texturized DW-sawn wafers of low reflectivity, an adaptation of the sawing process as well as the development of new etchants and new etch conditions is necessary.     

DXQ-601型多线切割机关键技术研究

从SiC颗粒受力情况入手,建立理论模型,根据多线切割机锯切机理,分析了切削变形分力和摩擦力引起的锯切力以及锯切力与工件的厚度、工件进给速度、锯丝的锯切速度、工件材料的性质等的关系,为多线切割机研制提供理论依据。     

蓝宝石衬底表面的高精密加工工艺

为了获得优化的CMP参数变化,对实验进行了设计,并采用CMP方法在C6382I-W/YJ单面抛光机上对蓝宝石衬底表面进行了加工.根据蓝宝石衬底特性,选择了碱性抛光液,并选用SiO2胶体作为磨料.依据高去除的目的,对如底盘转速、抛光液流量、温度及压力等不同工艺参数进行了研究.根据实验结果,确定了蓝宝石衬底表面的CMP最佳工艺参数.