物理冶金多晶硅太阳电池叠层钝化减反射结构模拟

采用PC1D模拟软件对p型物理冶金多晶硅太阳电池的SiO2/Si Nx/SiNx叠层钝化减反射结构进行了计算模拟。结果表明:在SiNx/Si Nx双层减反射结构中引入SiO2钝化层后可以明显改善电池的外量子效率与表面减反射效果,并最终提高电池转换效率;随着SiO2膜厚度的增加,电池表面反射率呈先降低后增加的趋势,而电池外量子效率及转换效率则呈现出相反的趋势。二氧化硅膜厚度在2~8 nm时,电池转换效率变化不大,并在6 nm时效率达到最大值18.04%,当二氧化硅膜厚度大于8 nm后电池转换效率会出现明显下降。     

用于四结太阳电池的多对TiO2/SiO2减反膜系的研究

随着GaInP/GaInAs/GaInNAs/Ge四结太阳电池的快速发展,设计并镀制可与四结太阳电池更加匹配的光学减反膜系变得尤为重要.实验中通过TFCale软件理论模拟了3对TiO2/SiO2(6层)减反膜系,其中理论模拟膜系与实际镀制膜系反射率曲线重合性良好.实际制备并讨论了离子源功率、薄膜物理厚度等参数对减反膜系反射率的影响.发现得到优异反射率的关键在于对第二层SiO2薄膜物理厚度的控制,尤其是在400～1 000 nm波段内.实验中制备的3对TiO2/SiO2(6层)减反膜系在280～1 400 nm波段内其反射率均小于10％,特别是在影响四结太阳电池限流结的GaInAs/GaInNAs两结波段(670～900 nm/900～1 100 nm)内,其反射率均在5％以下.     

连续激光辐照三结GaAs太阳电池温度场仿真

为了研究真空环境下1070nm连续激光辐照对三结GaAs太阳电池输出性能的影响,利用COMSOL软件构建了相应物理模型,通过数值仿真研究了激光功率密度、光斑半径、减反膜和热辐射热对流对温度场的影响。结果表明,吸收系数、热导率和光电转换效率是温度演变的3个主要因素;温升幅度随激光功率密度增大而增大;光斑半径越小使得电池表面温差越大;拥有减反膜结构可有效地提高太阳电池转换效率,但也使电池温度较高;热对流散热在电池较低温度（300K~400K）情况下占据主导作用;当入射功率密度为16.7W/cm2、光斑半径与电池半径相同时,经20s后,电池中心温度达到501.521K,导致光电转换效率为0。该数值模拟结果与实验结果基本相符,对激光损伤太阳电池机理研究提供一定的理论依据。     

工作温度对硅基太阳电池转换效率的影响

基于wxAMPS软件建立硅基太阳电池一维物理模型,在温控条件下分别模拟计算了单晶硅电池和非晶硅电池的输出特性,并利用太阳能综合测试平台在温控条件下测试了单晶硅和非晶硅电池的输出特性.模拟结果表明非晶硅电池在温度升高过程中的光电转换效率下降幅度显著降低,与实验结果吻合.     

晶硅太阳电池上表面增透膜研究

利用传递矩阵法(TMM)优化设计多种介质膜材料的单层、双层增透膜结构。利用Silvaco软件的ATLAS器件仿真模块建立基于优化增透膜结构的二维晶硅太阳电池结构。对比分析了具有不同单层、双层增透膜结构的晶硅太阳电池的光谱响应情况。结果表明:在200~1100 nm波长范围内,由多种不同介质材料组成的双层增透膜比单层增透膜具有更小的光反射损耗;双层增透膜结构可有效降低晶硅太阳电池的光谱响应损耗,且性能优于单层增透膜情况。其中MgF2/ZnS双层增透膜减反效果最好,对380~1000 nm波长范围的入射光,可将上表面光反射率降低到5%以下。     

双层氮化硅减反、钝化结构对多晶硅太阳电池性能的影响

探究了多晶硅太阳电池表面双层氮化硅减反、钝化结构的产线工艺.示范性实验结果表明,直接与多晶硅接触的底层氮化硅的厚度是双层氮化硅减反、钝化能力的一个关键因素.相对于单层氮化硅减反、钝化的多晶硅太阳电池,厚度优化的双层氮化硅减反、钝化电池片的短路电流和开路电压均有所改善,相应的光电转换效率提升超过0.2％.光电转换效率的提升归因于双层氮化硅减反、钝化结构有利于降低光损失和表面钝化.     

PIN型非晶硅薄膜太阳电池仿真研究

运用AMPS软件,对TCO/p-a-SiC:H/i-a-Si:H/n-a-Si:H/metal型非晶硅薄膜太阳电池进行了仿真研究,重点模拟和分析了电池性能参数随i层和n层厚度变化的规律.结果表明,为了获得电池转换效率和短路电流密度的最大值,n 层非晶硅薄膜应尽可能地减小厚度,而i层非晶硅薄膜厚度最好控制在500～700 nm范围内.     

面向高效单结GaInP太阳电池的介质复合纳米结构的仿真研究

以实现宽谱减反介质复合纳米结构表面的高 效单结GaInP太阳电池为目标,利用严格耦合波分析理论, 仿真研究了该电池表面的介质复合纳米结构对太阳电池宽谱减反、归一化吸收、最大化理想 效率的影响。该介质复 合纳米结构从上往下依次为SiO₂纳米锥、SiO₂介质层和SiNx介质层,通过对SiO₂纳米锥占空比、深宽比以及对SiO₂和SiNx介质层厚度等参数的系列仿真最终优化出适用于单结Ga InP电池的表面结构。结果表明:当SiO₂纳米锥底部 直径D=550nm、高度H=650 nm、SiN x介质层厚度为60 nm时电池具有最高的 最大化理想转换效率为28.58%。上述结果为后期实验以及该类电池 实现规模化生产奠定了基础。     

N 型背接触晶硅太阳电池前表面场研究

利用 Silvaco 公司的 Athena 工艺仿真软件和 Atlas 器件仿真软件,对 N 型插指背结背接触(InterdigitatedBack Contact,IBC)晶硅太阳电池普遍采用的前表面场（FSF）结构进行研究,详细分析了 IBC 晶硅电池 FSF 表面掺杂浓度及扩散深度对电池性能的影响。结果表明：具有不同表面掺杂浓度和扩散深度的 FSF 对 IBC 晶硅太阳电池短路电流密度(Jsc)、开路电压(Voc)和填充因子(FF)产生显著影响,从而影响电池的转换效率(Eff)。具有较低表面浓度、深扩散 FSF 结构的 IBC 晶硅太阳电池可获得较高转换效率,当表面掺杂浓度为 5×1017cm–3时,电池转换效率Eff最高,且随 FSF 扩散深度增加略有增加,最高转换效率可达 22.3%。     

n型异质结背接触太阳电池前表面的场钝化

利用Silvaco-TCAD仿真软件建立二维模型,对n型异质结背接触(HBC)单晶硅太阳电池前表面场进行模拟研究。通过在n型单晶硅衬底正面分别引入一层较薄的本征非晶硅层和一层n+非晶硅层对电池前表面进行高质量的场钝化,分析了n+非晶硅层的厚度和掺杂浓度以及本征非晶硅层的厚度和带隙宽度对电池电学性能的影响。模拟结果表明:当n+非晶硅层厚度小于6 nm,掺杂浓度为1×1019 cm-3,本征非晶硅层的厚度为3 nm,带隙宽度大于1.5 eV时,电池前表面实现了良好的场钝化效果,HBC太阳电池获得了24.5%的转换效率。     

Performance enhancement of multicrystalline silicon solar cells and modules using double‐layered SiNx:H antireflection coatings

Silicon nitride coating deposited by the plasma‐enhanced chemical vapor deposition method is the most widely used antireflection coating for crystalline silicon solar cells. In this work, we employed double‐layered silicon nitride coating consisting of a top layer with a lower refractive index and a bottom layer (contacting the silicon wafer) with a higher refractive index for multicrystalline silicon solar cells. An optimization procedure was presented for maximizing the photovoltaic performance of the encapsulated solar cells or modules. The dependence of their photovoltaic properties on the thickness of silicon nitride coatings was carefully analyzed. Desirable thicknesses of the individual silicon nitride layers for the double‐layered coatings were calculated. In order to get statistical conclusions, we fabricated a large number of multicrystalline silicon solar cells using the standard production line for both the double‐layered and single‐layered antireflection coating types. On the cell level, the double‐layered silicon nitride antireflection coating resulted in an increase of 0.21%, absolute for the average conversion efficiency, and 1.8 mV and 0.11 mA/cm² for the average open‐circuit voltage and short‐circuit current density, respectively. On the module level, the cell to module power transfer factor was analyzed, and it was demonstrated that the double‐layered silicon nitride antireflection coating provided a consistent enhancement in the photovoltaic performance for multicrystalline silicon solar cell modules than the single‐layered silicon nitride coating. Copyright © 2015 John Wiley & Sons, Ltd.     

空间高效硅太阳电池减反射膜设计与数值分析

结合AM0太阳光谱特性对空间硅太阳电池的减反射膜进行了设计分析,得到了最小反射时的最佳膜厚.分别讨论了单、双、三层减反射膜厚度变化对反射率的影响,并对有钝化层的Si O2 (94 nm) / Ti O2 (6 0 nm)双层减反射膜进行了优化设计,优化后硅太阳电池的短路电流和效率分别提高了2 .1%和1.4 % .     

Influence of window layer thickness on double layer antireflection coating for triple junction solar cells

The optimization of a SiO₂/TiO₂,SiO₂/ZnS double layer antireflection coating（ARC）on Ga_0.5In_0.5P/In_0.02Ga_0.98As/Ge solar cells for terrestrial application is discussed.The Al_0.5In_0.5P window layer thickness is also taken into consideration.It is shown that the optimal parameters of double layer ARC vary with the thickness of the window layer.     

Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating

Hot‐wire chemical vapor deposition (HWCVD) is a promising technique for very fast deposition of high quality thin films. We developed processing conditions for device‐ quality silicon nitride (a‐SiN_x:H) anti‐reflection coating (ARC) at high deposition rates of 3 nm/s. The HWCVD SiN_x layers were deposited on multicrystalline silicon (mc‐Si) solar cells provided by IMEC and ECN Solar Energy. Reference cells were provided with optimized parallel plate PECVD SiN_x and microwave PECVD SiN_x respectively. The application of HWCVD SiN_x on IMEC mc‐Si solar cells led to effective passivation, evidenced by a V_oc of 606 mV and consistent IQE curves. For further optimization, series were made with HW SiN_x (with different x) on mc‐Si solar cells from ECN Solar Energy. The best cell efficiencies were obtained for samples with a N/Si ratio of 1·2 and a high mass density of >2·9 g/cm³. The best solar cells reached an efficiency of 15·7%, which is similar to the best reference cell, made from neighboring wafers, with microwave PECVD SiN_x. The IQE measurements and high V_oc values for these cells with HW SiN_x demonstrate good bulk passivation. PC1D simulations confirm the excellent bulk‐ and surface‐passivation for HW SiN_x coatings. Interesting is the significantly higher blue response for the cells with HWCVD SiN_x when compared to the PECVD SiN_x reference cells. This difference in blue response is caused by lower light absorption of the HWCVD layers (compared to microwave CVD; ECN) and better surface passivation (compared to parallel plate PECVD; IMEC). The application of HW SiN_x as a passivating antireflection layer on mc‐Si solar cells leads to efficiencies comparable to those with optimized PECVD SiN_x coatings, although HWCVD is performed at a much higher deposition rate. Copyright © 2007 John Wiley & Sons, Ltd.     

Ag颗粒表面等离子体增强GaAs太阳电池双层减反射膜的设计与模拟

Surface plasmon enhanced antireflection coatings for GaAs solar cells have been designed theoretically.The reflectance of double-layer antireflection coatings（ARCs） with different suspensions of Ag particles is calcu-lated as a function of the wavelength according to the optical interference matrix and the Mie theory.The mean dielectric concept was adopted in the simulations.A significant reduction of reflectance in the spectral region from 300 to 400 nm was found to be beneficial for the design of ARCs.A new SiO2/Ag-ZnS double-layer coating with better antireflection ability can be achieved if the particle volume fraction in ZnS is 1%-2%.     

Production of Silicon Nanoparticles for Use in Solar Cells

The technological process of the production of silicon nanoparticles from silicon monoxide and methods of the deposition of nanosilicon coatings onto solar cells are developed. The process makes it possible to control the particle dimensions in the range from 2 to 10 nm. The effect of such nanosilicon coatings on the efficiency of solar cells is studied. It is shown that nanosilicon films possess good antireflection and passivation properties and can be successfully used in the technology of the production of solar cells.     

Effect of antireflection coatings and coverglasses on silicon solar cell performance

The high reflectivity of the polished silicon surface of the newer N⁺/P silicon solar cells has emphasized the need for properly designed antireflection coatings to obtain improved solar cell performance. The problem is complicated by the facts that solar cells are generally tested in air, but are for their final application covered with a glass or quartz slide which is adhesive-bonded to the cell surface, and further, that solar cells operating in a nuclear particle radiation environment change their spectral response and are frequently optimized for performance at the end of design-life. Experiments have been performed to explore the antireflection characteristics of thin films of silicon monoxide which have been evaporated on the solar cell surface. The effect of the antireflection coating thickness on cell response as a function of wavelength has been determined and the improvement in cell short circuit current for Air Mass Zero space sunlight evaluated. Included in this study was the evaluation of the antireflection characteristics after the application of a coverglass with adhesive over the antireflection coating. For comparison, coverglasses were also applied to bare cells with no antireflection coating present. In all cases the various coating comparisons were based on the cell short-circuit current performance in Air Mass Zero sunlight.     

Spectral and photoelectric parameters of high-voltage multi-junction solar batteries

The test samples of silicon high-voltage multi-junction solar batteries (SHVMJSB) are investigated experimentally. It is shown that the efficiency of the transformation of sunlight by silicon high-voltage multi-junction solar batteries without special antireflection coatings is not high and equal to 8%. It is due to the fact that the recombination rate of the minor charge carries is high on the damaged layer surface. The surface refinement and the antireflection coating make it possible to increase the efficiency of the transformation of sunlight by the silicon high-voltage multi-junction solar batteries of up to 13%.     

Optimum antireflection coatings for heteroface AlGaAs/GaAs solar cells—Part I: The influence of window layer oxidation

This paper details both the theoretical and experimental results of a modified model for designing MgF₂/ZnS double-layer antireflection coatings for AlGaAs/GaAs heteroface solar cells. The main contribution of the model presented is that it takes into account the possible existence of an oxide layer in the AlGaAs window layer. In a first step the optical behavior of the oxide is modeled and that model is used to recalculate optimal double-layer antireflection coating when a thin AlGaAs oxide layer is present. Significant differences with classical double-layer antireflection coating design are found, such as, the antireflection properties of the oxide layer when formed onto originally thick windows or its equivalent role to that of the ZnS layer (as a high refractive index media) in the coating. Finally, an experimental analysis is carried out to assess empirically the conclusions of the model. These experiments have yielded an excellent agreement with the proposed theory.     

Use of porous silicon antireflection coating in multicrystallinesilicon solar cell processing

The latest results on the use of porous silicon (PS) as an antireflection coating (ARC) in simplified processing for multicrystalline silicon solar cells are presented. The optimization of a PS selective emitter formation results in a 14.1% efficiency multicrystalline (5×5 cm²) Si cell with evaporated contacts processed without texturization, surface passivation, or additional ARC deposition. Specific attention is given to the implementation of a PS ARC into an industrially compatible screen-printed solar cell process. Both the chemical and electrochemical PS ARC formation method are used in different solar cell processes, as well as on different multicrystalline silicon materials. Efficiencies between 12.1 and 13.2% are achieved on large-area (up to 164 cm² ) commercial Si solar cells