高迁移率AlGaN-GaN二维电子气

用金属有机物气相外延方法在（０００１）蓝宝石衬底上生长了ＡｌｘＧａ１－ｘＮ／ＧａＮ二维电子气结构。Ａｌ０．１３Ｇａ０．８７Ｎ（７００ｎｍ）／ＧａＮ（６００ｎｍ）异质结的室温电子迁移率达１０２４ｃｍ＾２／Ｖｓ,而ＧａＮ体材料的室温电子迁移率为３９０ｃｍ＾２／Ｖｓ;该异质结的７７Ｋ电子迁移率达３５００ｃｍ＾２／Ｖｓ,而ＧａＮ体材料的电子迁移率在１８５Ｋ下达到峰值,为４９０ｃｍ＾２／Ｖｓ,７７Ｋ下下降到     

调制掺杂AlxGa1-xN/GaN异质结磁输运研究

通过低温和高磁场下的磁输运测量,首次在Ａｌ０．２２Ｇａ０．７８Ｎ／ＧａＮ异质结中观察到了舒勃尼科夫－德哈斯振荡的双周期特性,发现在Ａｌ０．２２Ｇａ０．７８Ｎ／ＧａＮ异质结的三角势阱中产生了二维电子气（２ＤＥＧ）的第二子带占据,发生第二子带占据的阈值２ＤＥＧ浓度估算为７．２＊１０＾１２ｃｍ＾－２,在阈值２ＤＥＧ浓度下第一子带和第二子带能级的距离计算为７５ｍｅＶ。     

GaN和AlxGa1—xN薄膜材料研究进展

ＧａＮ及ＡｌｘＧａ１－ｘＮ是发兰光的关键材料，是目前光电子材料中最引人注目，必须攻克的课题。本文综述了ＧａＮ及ＡｌｘＧａ１－ｘＮ材料的研究现状重点介绍了ＧａＮ及ＡｌｘＧａ１－ｘＮ材料近年来在性能评价，生长技术和应用开发方面的进展。     

GaN和Al_xGa_(1-x)N薄膜材料研究进展

ＧａＮ及ＡｌｘＧａ１－ｘＮ是发兰光的关键材料，是目前光电子材料中最引人注目、必须攻克的课题。本文综述了ＧａＮ及ＡｌｘＧａ１－ｘＮ材料的研究现状，重点介绍了ＧａＮ及ＡｌｘＧａ１－ｘＮ材料近年来在性能评价、生长技术和应用开发方面的进展     

AlGaN／GaN异质结2DEG载流子输运

本言语采用雷－丁平衡方程理论,考虑杂质散射、声学波形变势散射、声学波压电散射、极化光学波散射等散射机制,计算了ＡｌＧａＮ／ＧａＮ异质结二维电子气（２ＤＥＧ）在０－３００Ｋ温度范围内的低场迁率以及电子漂移速度和电子温度随外加电场的变化关系,同时本文计算了有隔离层的调制掺杂异质结构（ＭＤＨ）中低温下（Ｔ＝４Ｋ）低场迁移率随隔离层厚度的变化关系。计算结果表明在低温下ＡｌＧａＮ／ＧａＮ异质结构的低场迁移率     

GaN材料的GSMBE生长

在国内首次用ＮＨ３作氮源的ＧＳＭＢＥ方法在α－Ａｌ２Ｏ３衬底上生长出了ＧａＮ单昌外延膜。ＧａＮ生长速率可达０．５μｍ／ｈ。ＧａＮ外延膜的（０００２）双晶Ｘ射线衍射峰回摆曲线的半高宽最窄为８ａｒｃｍｉｎ。霍尔迁移率为５０ｃｍ＾２／Ｖ．ｓ。对质量好的ＧａＮ膜，室温阴性发光谱上只有一个强而锐的近岸边发光峰，谱峰位于３７２ｎｍ处，谱峰半高宽为１４ｎｍ（１２５ｍｅＶ）。     

n型GaSb,InGaAsSb的MBE生长和特性研究

本文报导了非故意掺杂ＩｎＧａＡｓＳｂ本底浓度的降低和掺Ｔｅｎ型ＧａＳｂ和ＩｎＧａＡｓＳｂ的ＭＢＥ生长与特性的研究结果。结果表明，通过生长工艺的优化，ＧａＳｂ和ＩｎＧａＡｓＳｂ的背景空穴浓度可分别降至１．１×１０~（１６）ｃｍ~（－３）和４×１０~（１６）ｃｍ~（－３），室温空穴迁移率分别为９４０ｃｍ２／ｖ．ｓ和２６０ｃｍ~２／ｖ．ｓ。用Ｔｅ作ｎ型掺杂剂，可获得载流子浓度在１０~（１６）～１０~（１８）ｃｍ~（－３）的优质ＧａＳｂ和ＩｎＧａＡｓＳｂ外延层，所研制的材料已成功地制备出Ｄ_λ~＊＝４×１０~（１０）ｃｍＨｚ~（１／２）／Ｗ的室温ＩｎＧａＡｓＳｂ红外探测器和室温脉冲ＡｌＧａＡｓＳｂ／ＩｎＧａＡｓＳｂ双异质结激光器。     

应用量子化学研究Ca2Fe2—xAl2O5的水化活性

用量子化学ＳＣＣ－ＤＶ－Ｘα方法分析了Ｃａ２Ｆｅ２－ｘＡｌｘＯ５体系听ａ２Ｆｅ２Ｏ５，Ｃａ２Ｆ３１．４３Ａｌ０．５７Ｏ５和Ｃａ２Ｆ３１．２８Ａｌ０．７２Ｏ５，认为它们的水化活性随Ａｌ的增加而提高的原因是：（１）Ａｌ的净电荷比Ｆｅ高，易吸收水分子的弧对电子；（２）Ａｌ－Ｏ键比Ｆｅ－Ｏ键弱，易断裂而容易与水反应。     

氮化镓基电子与光电子器件

ＧａＮ具有宽禁带、高击穿电压、异质结沟道中高峰值电子漂移速度和高薄层电子浓度等特点,是大功率和高温半导体器件的理想化合物半导体材料。宽禁带Ⅲ－Ⅴ族化合物半导体的性能和研究进展已经使大功率紫外光／蓝光／绿光光发射二极管走向商业市场,证明ＩｎＧａＡｓ／ＧａＮ／ＡｌＧａＡｓ紫罗兰色异质结激光器能够在室温和脉冲或连续波条件下工作,是性能优越的光电器件的理想材料。本文综述了上述研究成果。     

δ－掺杂GaAs／AlxGa_（1－x）As二维电子气结构材料的GSMBE生长与特性

本文用ＧＳＭＢＥ技术生长纯度ＧａＡｓ和δ－掺杂ＧａＡｓ／Ａｌ_ｘＧａ_（１－ｘ）Ａｓ结构二维电子气材料并对其电学性能进行了研究。对于纯度ＧａＡｓ的ＧＳＭＢＥ生长和研究，在低掺Ｓｉ时，载流子浓度为２×１０~（１４）ｃｍ~（－３），７７Ｋ时的迁移率可达８４，０００ｃｍ~２／Ｖ．ｓ。对于用ＧＳＭＢＥ技术生长的δ－掺杂ＧａＡｓ／Ａｌ_ｘＧａ_（１－ｘ）Ａｓ二维电子气材料，在优化了材料结构和生长工艺后，得到了液氮温度和６Ｋ迁移率分别为１７３，５８３ｃｍ~２／Ｖ．５和７．６７×１０~５ｃｍ~２／Ｖ．ｓ的高质量ＧａＡｓ／Ａｌ_ｘＧａ_（１－ｘ）Ａｓ二维电子气材料。     

Optical properties and carrier dynamics of self-assembled GaN/Al(0.11)Ga(0.89)N quantum dots

GaN quantum dots were grown on an Al(0.11)Ga(0.89)N buffer layer by using flow rate modulation epitaxy. The Stranski-Krastanov growth mode was identified by an atomic force microscopy study. The thickness of the wetting layer is about 7.2 monolayers. The temperature dependent photoluminescence studies showed that at low temperature the localization energy, which accounts for de-trapping of excitons, decreases with the reducing dot size. The decrease in emission efficiency at high temperature is attributed to the activation of carriers from the GaN dot to the nitrogen vacancy (V(N)) state of the Al(0.11)Ga(0.89)N barrier layer. The activation energy decreases with reducing dot size.     

Thermionic emission from the 2DEG assisted by image-charge-induced barrier lowering in AlInN/AlN/GaN heterostructures

The effect of image charges on current transport mechanisms investigated at the nanoscale in Al(1-x)In(x)N/GaN heterostructures was studied. Current-voltage (I-V) measurements were performed locally using a conductive AFM-tip as a nanoprobe and the conduction mechanism was modeled to explain the observed behavior. This model suggests that current transport is controlled by thermionic emission (TE) of the two-dimensional electron gas (2DEG) across the potential barrier at the heterointerface, where the image charges generated by the 2DEG induce a barrier lowering at the Al(1-x)In(x)N/GaN interface, enhancing electron transport. This barrier lowering depends on the 2DEG characteristics, such as 2DEG density n(2D), first subband energy E? and the average distance x? of the 2DEG from the interface. By fitting the experimental I-V curves with the present model the 2DEG density was evaluated. The obtained results were in very good agreement with the Hall measurements.     

Screening effect in contactless electroreflectance spectroscopy observed for AlGaN/GaN heterostructures with two dimensional electron gas

AlGaN/GaN heterostructures with a two dimensional electron gas (2DEG) at the interface have been investigated by contactless electroreflectance (CER) and photoreflectance (PR) spectroscopies. It has been shown that the 2DEG effectively screens the GaN layer and hence no signal related to a bandgap transition in the GaN layer is observed in CER spectra whereas the CER signal related to a bandgap transition in the AlGaN layer is very strong. The screening phenomenon is unimportant for PR spectroscopy due to different mechanism of the electromodulation. As a result both GaN and AlGaN related transitions are clearly observed in PR spectra. It has been proposed that the screening phenomena observed in CER can find application in contactless detection of the 2DEG in AlGaN/GaN heterostructures.     

Band-edge luminescence from SrTiO3: No polaron effect

We studied the band-edge photoluminescence (PL) of electron-doped SrTiO₃ and strongly photoexcited SrTiO₃ crystals. Two band-edge PL peaks are clearly observed at low temperatures. The PL peak energies coincide with the high- and low-temperature onsets of the optical absorption, corresponding to the phonon-assisted band-to-band optical transition. This result is the direct evidence that the free electrons and holes exist in the conduction and valence bands, and radiative recombination of free electrons and free holes causes the band-edge PL.     

Surface morphology of Al0.3Ga0.7N/Al2O3-high electron mobility transistor structure

We present surface properties of buffer films (AIN and GaN) and Al0.3Gao.zN/Al2O3-High Electron Mobility Transistor (HEMT) structures with/without AIN interlayer grown on High Temperature (HT)-AIN buffer/Al2O3 substrate and Al2O3 substrate. We have found that the GaN surface morphology is step-flow in character and the density of dislocations was about 10(8)-10(9) cm(-2). The AFM measurements also exhibited that the presence of atomic steps with large lateral step dimension and the surface of samples was smooth. The lateral step sizes are in the range of 100-250 nm. The typical rms values of HEMT structures were found as 0.27, 0.30, and 0.70 nm. HT-AIN buffer layer can have a significant impact on the surface morphology of Al0.3Ga0.7N/Al2O3-HEMT structures.     

氢化气相外延氮化镓生长中气氛的作用研究

报告了氢化物气相外延技术中，在载气氮气氛中加入氢气对材料表面形貌及材料性质的影响。实验发现生长气氛中氛的存在会显著改进材料的质量，这种作用被归之于氢气氛下氮气在气相中的反应下降以及生长表面较低的氮的活动能力。     

Polarity determination by electron energy-loss spectroscopy: application to ultra-small III-nitride semiconductor nanocolumns

Channeling-enhanced electron energy-loss spectroscopy is applied to determine the polarity of ultra-small nitride semiconductor nanocolumns in transmission electron microscopy. The technique demonstrates some practical advantages in the nanostructure analysis, especially for feature sizes of less than 50 nm. We have studied GaN and (Al, Ga)N nanocolumns grown in a self-assembled way by molecular beam epitaxy directly on bare Si(111) substrates and on AlN buffer layers, respectively. The GaN nanocolumns on Si show an N polarity, while the (Al, Ga)N nanocolumns on an AlN buffer exhibit a Ga polarity. The different polarities of nanocolumns grown in a similar procedure are interpreted in terms of the specific interface bonding configurations. Our investigation contributes to the understanding of polarity control in III-nitride nanocolumn growth.     

P型GaN和AlGaN外延材料的制备

研究了MOVPE方法外延P型GaN和Al0.13Ga0.87N的生长工艺,包括掺杂剂量和热退火条件,对材料电学性质的影响,得到了优良的P型材料,并研制了InGaN/AlGaN双异质结蓝发光二极管。