理论分析辉光放电对碳纳米管生长速率的影响

利用负偏压增强热丝化学气相沉积 ,在沉积过渡层Ta和催化剂NiFe层的Si衬底上制备了碳纳米管 ,并用扫描电子显微镜研究了它们的形貌。发现辉光放电后 ,碳纳米管的平均长度比无辉光放电时大 ,并且随着负偏压的增大而增大 ,即辉光放电增大了它们的生长速率。结合辉光放电和扩散理论分析了辉光放电对碳纳米管生长速率的影响 ,结果表明在生长碳纳米管的过程中 ,由于辉光放电的产生 ,碳在催化剂中的活度得到增强 ,从而增大了碳纳米管的生长速率。     

理论分析辉光放电对碳纳米管生长速率的影响

利用负偏压增强热丝化学气相沉积，在沉积过渡层Ta和催化剂NiFe层的Si衬底上制备了碳纳米管，并用扫描电子显微镜研究了它们的形貌。发现辉光放电后，碳纳米管的平均长度比无辉光放电时大，并且随着负偏压的增大而增大，即辉光放电增大了它们的生长速率。结合辉光放电和扩散理论分析了辉光放电对碳纳米管生长速率的影响，结果表明在生长碳纳米管的过程中，由于辉光放电的产生，碳在催化剂中的活度得到增强，从而增大了碳纳米管的生长速率。     

辉光放电和压强对准直碳纳米管生长的影响

利用负偏压增强热丝化学气相沉积系统在沉积有过渡层Ta和催化剂层NiFe的Si村底上制备出准直碳纳米管，并用扫描电子显微镜研完了它们的生长和结构，结果表明辉光放电和压强对其生长和结构有极大的影响。若无辉光放电产生，碳纳米管是弯曲的，有辉光放电时，碳纳米管是准直的。当压强较大时，准直碳纳米管较容易生长，并且随着压强的减小，其平均直径减小和平均长度增大。但压强为5Pa时，准直碳纳米管却不能够生长。最后，分析和讨论了辉光放电和压强对准直碳纳米管生长和结构的影响。     

Si(111)衬底上多层石墨烯薄膜的外延生长

利用固源分子束外延(SSMBE)技术, 在Si(111)衬底上沉积碳原子外延生长石墨烯薄膜, 通过反射式高能电子衍射(RHEED)、红外吸收谱(FTIR)、拉曼光谱(RAMAN)和X射线吸收精细结构谱(NEXAFS)等手段对不同衬底温度(400、600、700、800℃)生长的薄膜进行结构表征. RAMAN和NEXAFS结果表明: 在800℃下制备的薄膜具有石墨烯的特征, 而 400、600和700℃生长的样品为非晶或多晶碳薄膜. RHEED和FTIR结果表明, 沉积温度在600℃以下时C原子和衬底Si原子没有成键, 而衬底温度提升到700℃以上, 沉积的C原子会先和衬底Si原子反应形成SiC缓冲层, 且在800℃沉积时缓冲层质量较好. 因此在Si衬底上制备石墨烯薄膜需要较高的衬底温度和高质量的SiC缓冲层.     

衬底温度对碳纳米管生长和结构的影响

用CH4、NH3和H2为反应气体,利用等离子体增强热丝化学气相沉积在沉积有Ta缓冲层和Ni催化剂层的Si衬底上制备了准直碳纳米管,并用扫描电子显微镜和透射电子显微镜研究了它们的生长和结构随温度的变化.结果表明生长的准直碳纳米管是竹节型结构,其直径随衬底温度的降低而减小,生长速率随衬底温度的升高有一极值.从催化剂在衬底温度作用下的变化开始,分析了衬底温度对碳纳米管生长和结构的影响.     

真空度对碳纳米管生长过程的影响

利用等离子体增强热丝化学气相沉积系统在沉积有过渡层Ta和催化剂层NiFe的Si衬底上制备出准直碳纳米管，并用扫描电子显微镜研究了它们的生长和结构，结果表明真空度对其生长和结构有较大的影响。当真空度为4000Pa和2000Pa时，准直碳纳米管较容易生长，并且真空度为2000Pa时生长的碳纳米管平均长度大于真空度为4000Pa时碳纳米管的平均长度。但真空度为667Pa时碳纳米管生长困难。根据热力学和辉光放电理论，分析了真空度对准直碳纳米管生长和结构的影响。     

沉积速率对ZnO薄膜生长过程和微结构影响的分子反应力场方法研究

应用基于反应力场的分子动力学方法研究了ZnO薄膜(001)表面作为衬底的薄膜沉积生长过程,初步讨论了500K时,沉积速率(1.5、2.5和3.5m/s)变化对沉积薄膜质量的影响。结果表明沉积速率约3.5m/s时,衬底结构最稳定,沉积原子结构径向分布函数曲线特征峰尖锐、明显,有序度较高;每原子层密度分析表明优化的沉积温度和沉积速率下,沉积形成的薄膜结构稳定而又致密。在预置衬底表面平坦的情况下薄膜呈现一种岛状的生长模式,近衬底区Zn—O键呈现理想的生长取向,而近表面区则两种生长取向共存,导致其生长前锋交汇处形成新的有序缺陷及氧空位。     

辉光放电气相沉积氮化钛薄膜

本文叙述了辉光放电气相沉积氮化钛薄膜的工艺。它具有物理气相沉积与化学气相沉积的综合特点。在此工艺中,辉光放电作为化学反应和沉积的介质,通过等离子体的激活作用,可在低气压下直流辉光放电的工件(阴极)表面上获得化合物薄膜。已在工艺实验中,工件表面上沉积了致密的氮化钛涂层。此工艺的沉积温度低、沉积速率较高。     

(111)晶面同质外延生长单晶金刚石的研究

利用微波等离子体化学气相沉积(MPCVD)法,在天然金刚石衬底的(111)晶面上同质外延生长单晶金刚石,研究了沉积温度、CH_4浓度以及小角度偏离(111)晶面的衬底对金刚石生长的影响。采用SEM和Raman对外延生长的金刚石进行表征,结果表明:高沉积温度、高CH_4浓度条件下,金刚石呈现出无序的多晶生长现象,随着沉积温度的降低,形貌和质量明显提高,在低沉积温度条件下金刚石表现出一致的单晶生长,但是表面形貌较为粗糙。进一步降低CH_4浓度可外延生长质量高、表面平整的单晶金刚石,速率达4.7μm/h.使用倾斜抛光方法将部分衬底面偏离(111)晶面约6°,对比实验发现,微小偏离(111)晶面的斜面衬底在高沉积温度、高CH_4浓度条件下也能生长出质量较好的单晶金刚石,生长速率明显提高,达到了9μm/h。     

MPCVD法同质外延生长单晶金刚石

利用微波等离子体化学气相沉积(MPCVD)法在高温高压(HPHT)下制备的单晶片上进行单晶金刚石同质外延生长,研究了甲烷浓度和衬底温度对金刚石生长的影响。利用扫描电子显微镜与激光拉曼光谱仪对生长前后的样品进行表征。结果表明,利用HPHT单晶片上生长时,主要为层状生长和丘状生长模式,丘状生长易出现多晶结构。降低甲烷浓度能够降低丘状生长密度,提高金刚石表面平整度;金刚石生长速率随甲烷浓度、工作气压和衬底温度的增加而提高,但过高的甲烷浓度(72%)和衬底温度(1 150℃)会降低金刚石的质量。所生长出的单晶金刚石质量较为理想,衬底与生长层之间过渡比较自然,金刚石结晶度高,缺陷密度小,但随膜层增厚,非晶碳含量有所增加。     

沉积条件对碳纤维表面碳纳米管生长的影响

采用化学气相沉积(CVD)法在碳纤维(CF)表面原位生长碳纳米管(CNTs)。考察了不同催化剂、沉积温度、氢气流量以及样品距进气口距离等工艺参数对CNTs-CF生长的影响。利用SEM和高分辨透射电子显微镜(HRTEM)对CNTs-CF形貌和微结构进行了表征和分析。结果表明:在CF表面原位生长的CNTs为多壁结构,其中以Ni为催化剂得到的CNTs直径小、分布均匀;在600~750℃温度范围内,随着温度的升高,CNTs直径和长度减小,产量降低;随着氢气流量的增加,CNTs直径和长度均增加;距进气口30cm,在CF表面得到的CNTs覆盖率高、直径小且分布窄,有利于制备高质量CNTs。     

辅助气体对RF-PECVD制备碳纳米管薄膜形貌的影响

采用射频等离子体增强化学气相沉积(RF-PECVD)技术,以Ni为催化剂,经600℃裂解C2H2在Si基底上制备出定向碳纳米管薄膜。采用扫描电子显微镜(SEM)表征了刻蚀后Ni颗粒与沉积的碳纳米管薄膜的形貌。研究了辅助气体对等离子体预处理催化剂与碳纳米管生长的影响。结果表明:辅助气体(H2与N2)流量比对催化剂颗粒尺寸、分布以及碳纳米管生长有显著影响;合适的气体流量比有利于减少碳纳米管薄膜的杂质颗粒,促进其定向生长。预处理过程中气体流量比H2:N2=20:5时,预处理后催化剂Ni颗粒分布密度大、粒径小且分布范围窄,适合碳纳米管均匀着床;沉积生长碳纳米管薄膜时,H2:N2=20:15可得到纯度高、定向性好的碳纳米管。     

碳纳米团簇向碳纳米纤维相转变机理研究

为了能够快速且大面积生长碳纳米纤维,研究碳纳米纤维的形成、转变及在各种物理、化学环境下的反应机理,应用等离子化学气相沉积(PECVD)方法,以CH4为反应气体,FeCl2为催化剂在玻璃衬底上生长碳纳米薄膜.应用扫描电镜(SEM)观察了碳纳米纤维薄膜的表面形貌,拉曼(Raman)光谱分析了碳纳米纤维的结构组成.结果表明,无催化剂时薄膜主要由纳米团簇构成,而催化作用下薄膜呈纤维状生长,纳米纤维为典型的碳纳米管石墨特征峰.在温度,气压,催化剂等反应条件中,FeCl2催化剂对碳纳米薄膜的取向生长起决定性作用,通过调节催化剂的浓度与分布,可有效改变碳纳米纤维的密度与分布.     

Hierarchical composites of carbon nanotubes on carbon fiber: Influence of growth condition on fiber tensile properties

Growing carbon nanotubes (CNT) on the surface of high performance carbon fibers (CF) provides a means to tailor the thermal, electrical and mechanical properties of the fiber–resin interface of a composite. However, many CNT growth processes require pretreatment of the fiber, deposition of an intermediate layer, or harsh growth conditions which can degrade tensile properties and limit the conduction between the fiber and the nanotubes. In this study, high density multi-wall carbon nanotubes were grown directly on two different polyacrylonitrile (PAN)-based carbon fibers (T650 and IM-7) using thermal Chemical Vapor Deposition (CVD). The influence of CVD growth conditions on the single-fiber tensile properties and CNT morphology was investigated. The mechanical properties of the resultant hybrid fibers were shown to depend on the carbon fiber used, the presence of a sizing (coating), the CNT growth temperature, growth time, and atmospheric conditions within the CVD chamber. The CNT density and alignment morphology was varied with growth temperature and precursor flow rate. Overall, it was concluded that a hybrid fiber with a well-adhered array of dense MWCNTs could be grown on the unsized T650 fiber with no significant degradation in tensile properties.     

Electrolytic Metallic Coatings for Carbon Fibers

This paper concerns electrolytic metallic coatings for carbon fibers and the related processes. Plating bath design, electrolyte selection and other aspects were investigated. Experimental results especially in copper electroplating show that the uniformity of metallic coatings on carbon fibers can be improved by the modification of plating bath and the selection of electrolytes. Thus continuous and uniform metallic coatings can be obtained on carbon fibers, even if the cross section of carbon fibers has irregular shape. Polarization tests on different copper baths was performed. Electrodeposition of other metallic layers such as nickel, cobalt, and copper/tin duplex layer was also introduced. A process of two or more than two plating steps in which different electrolytes may be used for same metal deposition was proposed to expedite the coating procedure     

Growth of metal-free carbon nanotubes on glass substrate with an amorphous carbon catalyst layer

We have investigated the direct growth of metal-free carbon nanotubes (CNTs) on glass substrates with microwave-plasma enhanced chemical vapor deposition (MPECVD). Amorphous carbon (a-C) films were used as a catalyst layer to grow metal-free CNTs. The a-C films were deposited on Corning glass substrates using RF magnetron sputtering with the use of a carbon target (99.99%) at room temperature. They were pretreated with hydrogen plasma using a microwave PECVD at 600 degrees C. Then, CNTs were prepared using microwave PECVD with a mixture of methane (CH4) and hydrogen (H2) gases. The CNTs were grown at different substrate temperatures (400 degrees C, 500 degrees C, and 600 degrees C) for 30 minutes. Other conditions were fixed. The growth trends of CNTs against substrate temperature were observed by field emission scanning electron microscopy (FE-SEM). The structure of a-C catalyst layer and grown CNTs were measured by Raman spectroscopy. High-resolution transmission electron microscopy (HR-TEM) images showed that the CNTs had bamboo-like multi-walled structures. Energy dispersive spectroscopy (EDS) measurements confirmed that the CNTs consisted of only carbon.     

Spinodal decomposition of mono- to few-layer graphene on Ni substrates at low temperature

Mono to few-layer graphene were prepared on pre-annealed polycrystalline nickel substrates by chemical vapor deposition at a relatively low temperature of 800 degrees C using fast cooling rate. It was observed that the reduced solubility of Carbon in Ni at low temperature and an optimum gas mixing ratio (CH4:H2 = 60/80 (sccm)) can be used to synthesize mano-layer graphene that covers about 100 microm2 area. The number of graphene layers strongly depends upon the hydrogen and methane flow rates. An increase in the methane flow is found to increase the growth density of the single-layer graphene. The number of graphene layers was identified from micro-Raman spectra. The thinnest areas containing mono-layer graphene formed at small Ni grains surrounded by large Ni Grains can be explained in terms of Spinodal decomposition. Scanning tunneling microscopy observations of the graphene samples indicate that the graphene structure exhibits no defects, and extremely symmetry hexagon carbon at flat graphene surface is observed.     

用ECR-CVD方法制备定向碳纳米管

以FeaO4纳米粒子为催化剂,CH4和H2为气源,采用电子回旋共振微波等离子体化学气相沉积技术(ECR-CVD)在多孔硅基底上制备出定向生长的碳纳米管.研究了气氛组成、气压、温度和反应时间对碳纳米管生长特性的影响.使用扫描电子显微镜(SEM)、透射电子显微镜(TEM)和拉曼光谱(Raman spectrum)表征了样品的形貌和结构.结果表明:气氛组成和气压影响了反应腔内离解碳的浓度,从而影响碳纳米管的成核、生长速度及定向生长;温度的变化改变催化剂的尺寸从而改变碳纳米管的直径,在过低的温度下碳纳米管不能实现定向生长;碳纳米管随着反应时间的延长而不断增长,但超过一定时间后催化剂颗粒被碳包覆而失去催化作用,生长停止.