共查询到20条相似文献,搜索用时 15 毫秒
1.
Hudait M.K. Andre C.L. Kwon O. Palmisiano M.N. Ringel S.A. 《Electron Device Letters, IEEE》2002,23(12):697-699
In/sub 0.53/Ga/sub 0.47/As-based monolithic interconnected modules (MIMs) of thermophotovoltaic (TPV) devices lattice-matched to InP were grown by solid source molecular beam epitaxy. The MIM device consisted of ten individual In/sub 0.53/Ga/sub 0.47/As TPV cells connected in series on an InP substrate. An open-circuit voltage (V/sub oc/) of 4.82 V, short-circuit current density (J/sub sc/) of 1.03 A/cm/sup 2/ and fill factor of /spl sim/73% were achieved for a ten-junction MIM with a bandgap of 0.74 eV under high intensity white light illumination. Device performance uniformity was better than 1.5% across a full 2-in InP wafer. The V/sub oc/ and J/sub sc/ values are the highest yet reported for 0.74-eV band gap n-p-n MIM devices. 相似文献
2.
Yee M. Ng W.K. David J.P.R. Houston P.A. Tan C.H. Krysa A. 《Electron Devices, IEEE Transactions on》2003,50(10):2021-2026
The avalanche multiplication and impact ionization coefficients in In/sub 0.53/Ga/sub 0.47/As p-i-n and n-i-p diodes over a range of temperature from 20-400 K were measured and shown to have negative temperature dependence. This is contrary to the positive temperature dependence of the breakdown voltage measured on InP/In/sub 0.53/Ga/sub 0.47/As heterojunction bipolar transistors (HBTs) in this and previous works. It is shown that the collector-base dark current and current gain can be the overriding influence on the temperature dependence of breakdown in InP/In/sub 0.53/Ga/sub 0.47/As HBTs and could explain previous anomalous interpretations from the latter. 相似文献
3.
An MSM Schottky barrier photodetector based on p-type In/sub 0.53/Ga/sub 0.47/As suitable for detection in the 0.8-1.7 wavelength range is reported. Aluminium metallisation was used. The large area devices exhibited responsivity of about 0.4 A/W at 1.3 mu m and tau /sub on/> 相似文献
4.
Presents threshold voltage data for Al/sub 0.48/In/sub 0.52/As/Ga/sub 0.47/In/sub 0.53/As/InP heterostructure insulated gate FETs (HIGFETs) with gate lengths from 1.2 mu m to 0.4 mu m. The refractory-gate, self-aligned fabrication process was applied to MBE-grown structures with 300 AA Ga/sub 0.47/In/sub 0.53/As channels and semi-insulating superlattice buffers to achieve sharp pinchoff with excellent threshold uniformity. HIGFETs with L/sub g/=1.2 mu m showed a threshold voltage of -0.076+or-0.019 V, making them well-suited to application in direct-coupled FET logic (DCFL) circuits.<> 相似文献
5.
Ng J.S. Tan C.H. David J.P.R. Hill G. Rees G.J. 《Electron Devices, IEEE Transactions on》2003,50(4):901-905
Electron and hole ionization coefficients in In/sub 0.53/Ga/sub 0.47/As are deduced from mixed carrier avalanche photomultiplication measurements on a series of p-i-n diode layers, eliminating other effects that can lead to an increase in photocurrent with reverse bias. Low field ionization is observed for electrons but not for holes, resulting in a larger ratio of ionization coefficients, even at moderately high electric fields than previously reported. The measured ionization coefficients are marginally lower than those of GaAs for fields above 250 kVcm/sup -1/, supporting reports of slightly higher avalanche breakdown voltages in In/sub 0.53/Ga/sub 0.47/As than in GaAs p-i-n diodes. 相似文献
6.
The authors have fabricated monolithically integrated In/sub 0.53/Ga/sub 0.47/As/In/sub 0.52/Al/sub 0.48/As 0.25 mu m gate modulation-doped field effect transistor (MODFET) oscillators. The results of direct optical subharmonic injection locking of these oscillator circuits at 10.159 and 19.033 GHz are presented.<> 相似文献
7.
The authors have experimentally studied the optical control and optical tuning characteristics of monolithically integrated In/sub 0.53/Ga/sub 0.47/As/In/sub 0.52/Al/sub 0.48/As modulation-doped field-effect transistor (MODFET) oscillators operating in the X and R bands. For a 20 mu W intrinsic photoexcitation on the device, the maximum frequency shift for the X- and R-band oscillators was 8.7 and 11.7 MHz, respectively.<> 相似文献
8.
Gong-Ru Lin Hao-Chung Kuo Chi-Kuan Lin Feng M. 《Quantum Electronics, IEEE Journal of》2005,41(6):749-752
A novel top-illuminated In/sub 0.53/Ga/sub 0.47/As p-i-n photodiodes (MM-PINPD) grown on GaAs substrate by using linearly graded metamorphic In/sub x/Ga/sub 1-x/P (x graded from 0.49 to 1) buffer layer is reported. The dark current, optical responsivities, noise equivalent power, and operational bandwidth of the MM-PINPD with aperture diameter of 60 /spl mu/m are 13 pA, 0.6 A/W, 3.4/spl times/10/sup -15/ W/Hz/sup 1/2/, and 7.5 GHz, respectively, at 1550 nm. The performances of the MM-PINPD on GaAs are demonstrated to be comparable to those of a similar device made on InGaAs-InP substrate. 相似文献
9.
Averin S.V. Kohl A. Muller R. Mesquida Kusters A. Wisser J. Heime K. 《Electronics letters》1992,28(11):992-995
The p/sup +/-cap layer was used to fabricate a metal-semiconductor-metal (MSM) interdigitated photodetector on Ga/sub 0.47/In/sub 0.53/As. The measured barrier height was Phi /sub Bn=/0.52 V, the ideality factor n=1.1 and average dark current density 2 mA/cm/sup 2/. A rise time of 45 ps at lambda =1.3 mu m under 2 V bias was measured for an MSM photodiode with 3 mu m finger width and finger gaps and an active area of 100*100 mu m/sup 2/.<> 相似文献
10.
Zheng X.G. Hsu J.S. Hurst J.B. Li X. Wang S. Sun X. Holmes A.L. Jr. Campbell J.C. Huntington A.S. Coldren L.A. 《Quantum Electronics, IEEE Journal of》2004,40(8):1068-1073
Large-area (500-/spl mu/m diameter) mesa-structure In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiodes (APDs) are reported. The dark current density was /spl sim/2.5/spl times/10/sup -2/ nA//spl mu/m/sup 2/ at 90% of breakdown; low surface leakage current density (/spl sim/4.2 pA//spl mu/m) was achieved with wet chemical etching and SiO/sub 2/ passivation. An 18 /spl times/ 18 APD array with uniform distributions of breakdown voltage, dark current, and multiplication gain has also been demonstrated. The APDs in the array achieved 3-dB bandwidth of /spl sim/8 GHz at low gain and a gain-bandwidth product of /spl sim/120 GHz. 相似文献
11.
The RF noise characteristics of lattice-matched and strained In/sub 0.52/Al/sub 0.48/As/In/sub x/Ga/sub 1-x/As HEMTs grown by MBE have been investigated. The indium composition of the In/sub x/Ga/sub 1-x/As channel was varied from x=0.53 to 0.80. While the gain and speed performance were significantly improved with the increase of indium composition as expected, the noise characteristics showed that the microwave noise increases with the increase of the indium composition.<> 相似文献
12.
Joshi A.M. Olsen G.H. Ban V.S. Mykietyn E. Sr. Lange M.J. Mohr D.T. 《Electron Devices, IEEE Transactions on》1993,40(2):303-308
A significant (2-5*) reduction in 1/f noise was observed in In/sub 0.53/Ga/sub 0.47/As photodetector arrays read out by a PMOS multiplexer, when the epitaxial InP cap layer doping was changed from undoped to sulfur-doped n type of about 3*10/sup 16/ cm/sup -3/. A further decrease was observed when the InP buffer layer was also changed from undoped to sulfur-doped n type of about 5*10/sup 17/ cm/sup -3/. Data was presented for the variation of 1/f noise, within a temperature range of 18 degrees C to -40 degrees C. Surface states at the InP cap/SiN interface appears to be the primary source of 1/f noise, with the bulk states at the n/sup -/In/sub 0.53/Ga/sub 0.47/As buffer hetero-interface as a secondary source. Increased n-type doping in the high-bandgap InP cap and buffer layers may reduce electron trapping, and thus 1/f noise. The measured noise spectrum of InGaAs photodetectors varies as f/sup y/ with y being approximately -0.45 for device structures with doped and undoped InP can layers. For a doped InP buffer layer, this value of y is -0.3.<> 相似文献
13.
Kyono C.S. Binari S.C. Kruppa W. Ikossi-Anastasiou K. Hier H.S. 《Electronics letters》1992,28(15):1388-1390
A seven monolayer AlAs layer was used as an etch stop at the emitter-base heterojunction of an Npn In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As HBT. The etch-stop HBTs displayed higher DC gain and similar microwave performance when compared to devices without the AlAs layer.<> 相似文献
14.
We report a 1 cm/spl times/1 cm array of 100 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiodes (APD). The average breakdown voltage was 28.7 V with a standard deviation of less than 0.5 V. The distribution of breakdown voltage across the area followed a radial pattern consistent with a slight epitaxial growth nonuniformity. The mean dark current at a gain of 10, or 6.1 A/W, was 10.3 nA, and none of the 100 APDs had a dark current of more than 25 nA. The bandwidth at a gain of 10 was 6.2 GHz, and the maximum gain-bandwidth product was 140 GHz. This technology is ideally suited for next-generation three-dimensional imaging applications. 相似文献
15.
Data are presented on single quantum barrier AlAs/In/sub 0.53/Ga/sub 0.47/As varactor diodes intended as submillimetre wavelength frequency multipliers that exhibit extremely high breakdown voltage and excellent capacitance modulation characteristics. Record breakdown voltages as high as 12 V were achieved with a composite 50AA/50AA/50AA thick In/sub 0.52/Al/sub 0.48//AlAs/In/sub 0.52/Al/sub 0.48/As barrier sandwiched between 3000 AA(1.2*10/sup 17/ cm/sup -3/) In/sub 0.53/Ga/sub 0.47/As depletion regions.<> 相似文献
16.
Elgaid K. McLelland H. Holland M. Moran D.A.J. Stanley C.R. Thayne I.G. 《Electron Device Letters, IEEE》2005,26(11):784-786
GaAs-based transistors with the highest f/sub T/ and lowest noise figure reported to date are presented in this letter. A 50-nm T-gate In/sub 0.52/Al/sub 0.48/As/In/sub 0.53/Ga/sub 0.47/As metamorphic high-electron mobility transistors (mHEMTs) on a GaAs substrate show f/sub T/ of 440 GHz, f/sub max/ of 400 GHz, a minimum noise figure of 0.7 dB and an associated gain of 13 dB at 26 GHz, the latter at a drain current of 185 mA/mm and g/sub m/ of 950 mS/mm. In addition, a noise figure of below 1.2 dB with 10.5 dB or higher associated gain at 26 GHz was demonstrated for drain currents in the range 40 to 470 mA/mm at a drain bias of 0.8 V. These devices are ideal for low noise and medium power applications at millimeter-wave frequencies. 相似文献
17.
A 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode array
Zheng X.G. Hsu J.S. Sun X. Hurst J.B. Li X. Wang S. Holmes A.L.Jr. Campbell J.C. Huntington A.S. Coldren L.A. 《Quantum Electronics, IEEE Journal of》2002,38(11):1536-1540
We report a 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode (APD) array. The mean breakdown voltage of the APD was 57.9 V and the standard deviation was less than 0.1 V. The mean dark current was /spl sim/2 and /spl sim/300 nA, and the standard deviation was /spl sim/0.19 and /spl sim/60 nA at unity gain (V/sub bias/ = 13.5 V) and at 90% of the breakdown voltage, respectively. External quantum efficiency was above 40% in the wavelength range from 1.0 to 1.6 /spl mu/m. It was /spl sim/57% and /spl sim/45% at 1.3 and 1.55 /spl mu/m, respectively. A bandwidth of 13 GHz was achieved at low gain. 相似文献
18.
InP-In/sub 0.53/Ga/sub 0.47/As-InP double heterojunction bipolar transistors (DHBTs) were grown on GaAs substrates. A 284-GHz power-gain cutoff frequency f/sub max/ and a 216-GHz current-gain cutoff frequency f/sub /spl tau// were obtained, presently the highest reported values for metamorphic HBTs. The breakdown voltage BV/sub CEO/ was >5 V while the dc current gain /spl beta/ was 21. High thermal conductivity InP metamorphic buffer layers were employed in order to minimize the device thermal resistance. 相似文献
19.
Griffith Z. Rodwell M.J.W. Xiao-Ming Fang Loubychev D. Ying Wu Fastenau J.M. Liu A.W.K. 《Electron Device Letters, IEEE》2005,26(8):530-532
InP/In/sub 0.53/Ga/sub 0.47/As/InP double heterojunction bipolar transistors (DHBT) have been designed for increased bandwidth digital and analog circuits, and fabricated using a conventional mesa structure. These devices exhibit a maximum 450 GHz f/sub /spl tau// and 490 GHz f/sub max/, which is the highest simultaneous f/sub /spl tau// and f/sub max/ for any HBT. The devices have been scaled vertically for reduced electron collector transit time and aggressively scaled laterally to minimize the base-collector capacitance associated with thinner collectors. The dc current gain /spl beta/ is /spl ap/ 40 and V/sub BR,CEO/=3.9 V. The devices operate up to 25 mW//spl mu/m/sup 2/ dissipation (failing at J/sub e/=10 mA//spl mu/m/sup 2/, V/sub ce/=2.5 V, /spl Delta/T/sub failure/=301 K) and there is no evidence of current blocking up to J/sub e//spl ges/12 mA//spl mu/m/sup 2/ at V/sub ce/=2.0 V from the base-collector grade. The devices reported here employ a 30-nm highly doped InGaAs base, and a 120-nm collector containing an InGaAs/InAlAs superlattice grade at the base-collector junction. 相似文献
20.
Yu-Sheng Liao Gong-Ru Lin Hao-Chung Kuo Kai-Ming Feng Milton Feng 《Photonics Technology Letters, IEEE》2006,18(17):1822-1824
The SONET OC-192 receiving performance of In/sub 0.53/Ga/sub 0.47/As p-i-n photodiode grown on linearly graded metamorphic In/sub x/Ga/sub 1-x/P buffered GaAs substrate is reported. With a low-cost TO-46 package, such a device exhibits a frequency bandwidth up to 8 GHz, a bit-error rate (BER) of 10/sup -9/ at 10 Gb/s, a sensitivity of -17.8 dBm, and a noise equivalent power of 3.4/spl times/10/sup -15/ W/Hz/sup 1/2/ owing to its ultralow dark current of 3.6/spl times/10/sup -7/ A/cm/sup 2/. Eye diagram analysis at 10 Gb/s without transimpedance amplification reveals a statistically distributed Q-factor of 8.21, corresponding to a minimum BER of 1.1/spl times/10/sup -16/ at receiving power of -6 dBm. 相似文献