Structural,optical and electrical studies on nanocrystalline tin oxide (SnO<Subscript>2</Subscript>) thin films by electron beam evaporation technique

Nanocrystalline tin oxide (SnO₂) thin films were coated using electron beam evaporation technique on glass substrates. To study the gleaming out look of the structure and surface morphological changes, the films were annealed in the temperature 350–550 °C for 1 h. The annealed films were subjected to X-ray diffraction (XRD) and atomic force microscopy (AFM) studies. The XRD patterns of SnO₂ thin films as-deposited and annealed at 350 °C illustrate that the films were amorphous, and beyond 350 °C and thereafter they became polycrystalline with tetragonal structure. The crystallite size of the annealed films, obtained through the XRD analysis, increased with the increasing annealing temperature, and it was found to be from 3.6 to 12 nm. The photoluminescence (PL) studies on these films were also carried out. The origin of luminescence was assigned to the defects of the nanocrystalline SnO₂ films. The Optical studies (UV-VIS) were performed and the optical band gab energy (Eg) calculations, the dependence of absorption coefficient on the photon energy at short wavelengths, were found to be increasing from 3.65 to 3.91 eV is also investigated.     

Influence of the film thickness on structural and optical properties of CdTe thin films electrodeposited on stainless steel substrates

CdTe thin films of different thicknesses were deposited by electrodeposition on stainless steel substrates (SS). The dependence of structural and optical properties on film thickness was evaluated for thicknesses in the range 0.17–1.5 μm. When the film is very thin the crystallites lack preferred orientation, however, thicker films showed preference for (111) plane. The results show that structural parameters such as crystallite size, lattice constant, dislocation density and strain show a noticeable dependence on film thickness, however, the variation is significant only when the film thickness is below 0.8 μm. The films were successfully transferred on to glass substrates for optical studies. Optical parameter such as absorption coefficient (α), band gap (E_g), refractive index (n), extinction coefficient (k_e), real (?_r) and imaginary (?_i) parts of the dielectric constant were studied. The results indicate that all the optical parameters strongly depend on film thickness.     

Influence of laser-irradiation on the optical constants Se75S25 − xCdx thin films

Amorphous thin films of glassy alloys of Se₇₅S_25 − xCd_x (x = 2, 4 and 6) were prepared by thermal evaporation onto chemically cleaned glass substrates. Optical absorption and reflection measurements were carried out on as-deposited and laser-irradiated thin films in the wavelength region of 500-1000 nm. Analysis of the optical absorption data shows that the rule of no-direct transitions predominates. The laser-irradiated Se₇₅S_25 − xCd_x films showed an increase in the optical band gap and absorption coefficient with increasing the time of laser-irradiation. The results are interpreted in terms of the change in concentration of localized states due to the shift in Fermi level. The value of refractive index increases decreases with increasing photon energy and also by increasing the time of laser-irradiation. With the large absorption coefficient and change in the optical band gap and refractive index by the influence of laser-irradiation, these materials may be suitable for optical disc application.     

Effects of Al content on the properties of ZnO:Al films prepared by Al<Subscript>2</Subscript>O<Subscript>3</Subscript> and ZnO co-sputtering

Aluminum doped zinc oxide (AZO) films were deposited on quartz substrates by radio-frequency magnetron co-sputtering method with ZnO and Al₂O₃ ceramic targets. The structural, optical and electrical properties of these films as a function of the Al content were investigated. XRD results reveal that the AZO films are wurtzite structure with (002) preferred orientation. The average transmittance of all the films is higher than 80% in a wide wavelength range from 400 to 1,500 nm. The band gap energy, calculated from their optical absorption spectra, is in the range of 3.50–3.66 eV depending on the Al content. Doping of Al³⁺ in the ZnO makes the film surface roughness decrease. The dopant Al³⁺ acts as electron donor by which the electrical conductivity and carrier concentration of the films are obviously increased until the Al³⁺ reaches its saturation content of about 4.50 at.%.     

Characteristics of strontium-doped ZnO films on love wave filter applications

The effect of dopant concentrations in strontium-doped ZnO films on Love wave filter characteristics was investigated. Strontium-doped ZnO films with a c-axis preferred orientation were grown on ST-cut quartz by radio frequency magnetron sputtering. The crystalline structures and surface morphology of films were studied by X-ray diffraction, scanning electron microscopy and atomic force microscopy. The electromechanical coupling coefficient, dielectric constant, and temperature coefficient of frequency of filters were then determined using a network analyzer. A uniform crystalline structure and smooth surface of the ZnO films were obtained at the 1-2 mol% strontium dopant level. The electromechanical coupling coefficient of the 1 mol% strontium-doped ZnO film reaches a maximum of 0.61%, and the temperature coefficient of frequency declines to + 12.87 ppm/°C at a 1.5 mol% strontium dopant level.     

Some physical properties of copper oxide films: The effect of substrate temperature

In this work, copper oxide films were deposited at different substrate temperatures of 200, 250, 300 and 350 ± 5 °C by ultrasonic spray pyrolysis technique and the effect of substrate temperature on the structural, surface, optical and electrical properties of the films was presented. The film structures were studied by X-ray diffraction (XRD). To obtain information about structural properties in detail, the grain size (D), dislocation density (δ) and lattice parameters (a = b = c for cubic structure) for preferential orientations were calculated. The surface properties and elemental analyses were characterised using scanning electron microscopy and energy dispersive X-ray spectroscopy, respectively. Optical properties of the films were analyzed by transmission, linear absorption coefficient and reflection spectra, and the optical method was used to determine the band gaps of the films. The current–voltage values were measured with two-probe technique, and the electrical conductivities were calculated. Consequently, it was determined that substrate temperature has a strong effect on the structural, surface, optical and electrical properties of copper oxide films.     

Ultra-thin zinc oxide film on Mo(100)

Zinc oxide films on a single crystal Mo(100) substrate were fabricated by annealing the pre-deposited metal Zn films in 10^− 5-10^− 4 Pa O₂ ambience at 300-525 K, and were characterized by in situ Auger electron spectroscopy, electron energy loss spectroscopy, low energy electron diffraction and high-resolution electron energy loss spectroscopy. The results show that the atomic ratio of oxygen to zinc in zinc oxide film is significantly dependent on sample annealing temperature and O₂ pressure. A stoichiometric zinc oxide film has been obtained under ∼10^− 4 Pa O₂ at about 400 K. A redshift of Fuchs-Kliewer phonon energy correlated with surface oxygen deficiency is observed.     

Electrical and optical properties of nanostructured VOX thin films prepared by direct current magnetron reactive sputtering and post-annealing in oxygen

Nanostructured vanadium oxide (nano-VO_X) thin films were prepared by direct current magnetron reactive sputtering in mixed O₂/Ar discharges and subsequent annealing in oxygen atmosphere. X-ray diffraction and field emission scanning electron microscope were employed to characterize the crystal structures and morphologies, respectively. Fourier transform infrared spectroscopy was applied to analyze the vanadium-oxygen bonds of films. X-ray photoelectron spectroscopy revealed the compositions of the surface and inner portion of nano-VO_X thin films. It was shown that the as-deposited films were amorphous, and in-situ annealing of these films in ambient oxygen for 10 min can lead to the growth of nano-VO_X thin films. Results of electrical studies indicated that the absolute values of temperature coefficient of resistance and activation energy of films increased significantly after oxygen annealing. Optical investigations carried out in the UV-visible range showed that the absorption edges of nano-VO_X films exhibited large red shifts compared with as-deposited film, and that dual optical absorptions were observed in nano-VO_X films.     

Influence of gamma radiation on the optical properties of ZnSe nanocrystalline thin films

The effect of gamma (γ) irradiation on the absorption spectra and the optical energy bandwidth of ZnSe nanocrystalline thin films have been studied. Thin films of different thicknesses from 20 to 120 nm were deposited by Inert gas condensation technique at constant temperature of 300 K and under pressure 2 × 10⁻³ Torr of Argon gas flow. The optical transmission (T) and optical reflection (R) in the wavelength range 190–2,500 nm of ZnSe nanocrystalline thin films were measure for unirradiated and irradiated films. The dependence of the absorption coefficient α on photon energy hν was determined for different γ-doses irradiated films. The ZnSe thin films show direct allowed interband transition by γ-doses. Both the absorption coefficient (α) and optical energy bandwidth were found to be γ-dose dependent. The optical energy band width has been decreased by irradiated of γ-doses. The E_gn values of irradiated thin films by 34.5 Gy of γ-doses were recovered to nearly their initial values after 100 days at 300 K.     

Properties of transparent conducting oxides formed from CdO alloyed with In2O3

The structure, optical and electrical properties of transparent conducting oxide films depend greatly on the methods of preparation, heat treatment, type and level of dopant. Thin films of (CdO)_1−x(In₂O₃)_x have been grown by electron beam evaporation technique for different concentrations of In₂O₃ (x = 0, 0.05, 0.1, 0.15 and 0.2). Increase of doping led to increased carrier concentration as derived from optical data and hence to increased electrical conductivity, which degraded the transparency of the films. An improvement of the electrical and optical properties of Cadmium indium oxide (CdIn₂O₄) has been achieved by post-deposition annealing. A resistivity value of 7 × 10^− 5 Ω cm and transmittance of 92% in the near infrared region and 82% in the visible region have been obtained after annealing at 300 °C for 90 min in air.     

Structural, electrical, and optical properties of copper indium diselenide thin film prepared by thermal evaporation method

Stoichiometric compound of copper indium diselenide (CuInSe₂) was synthesized by direct reaction of high-purity elemental copper, indium and selenium in an evacuated quartz ampoule. The phase structure and composition of the synthesized pulverized material analyzed by X-ray diffraction (XRD) and energy dispersive analysis of X-rays (EDAX) revealed the chalcopyrite structure and stoichiometry of elements. Thin films of CuInSe₂ were deposited onto organically cleaned soda lime glass substrates held at different temperatures (i.e. 300 K to 573 K) using thermal evaporation technique. CuInSe₂ thin films were then thermally annealed in a vacuum chamber at 573 K at a base pressure of 10^− 2 mbar for 1 h. The effect of substrate temperature (T_s) and thermal annealing (T_a) on structural, compositional, morphological, optical and electrical properties of films were investigated using XRD, transmission electron microscopy, EDAX, atomic force microscopy (AFM), optical transmission measurements and Hall effect techniques. XRD and EDAX studies of CuInSe₂ thin films revealed that the films deposited in the substrate temperature range of 423-573 K have preferred orientation of grains along the (112) plane and near stoichiometric composition. AFM analysis indicates that the grain size increases with increase of T_s and T_a. Optical and electrical characterizations of films suggest that CuInSe₂ thin films have high absorption coefficient (10⁴ cm^− 1) and resistivity value in the interval 10^− 2-10¹ Ω cm influenced by T_s and T_a.     

Effect of cadmium oxide incorporation on the microstructural and optical properties of pulsed laser deposited nanostructured zinc oxide thin films

CdO doped (doping concentration 0, 1, 3 and 16 wt%) ZnO nanostructured thin films are grown on quartz substrate by pulsed laser deposition and the films are annealed at temperature 500 °C. The structural, morphological and optical properties of the annealed films are systematically studied using grazing incidence X-ray diffraction (GIXRD), energy dispersive X-ray analysis (EDX), scanning electron microscopy (SEM), atomic force microscopy (AFM), Micro-Raman spectra, UV–vis spectroscopy, photoluminescence spectra and open aperture z-scan. 1 wt% CdO doped ZnO films are annealed at different temperatures viz., 300, 400, 500, 600, 700 and 800 °C and the structural and optical properties of these films are also investigated. The XRD patterns suggest a hexagonal wurtzite structure for the films. The crystallite size, lattice constants, stress and lattice strain in the films are calculated. The presence of high-frequency E₂ mode and the longitudinal optical A₁ (LO) modes in the Raman spectra confirms the hexagonal wurtzite structure for the films. The presence of CdO in the doped films is confirmed from the EDX spectrum. SEM and AFM micrographs show that the films are uniform and the crystallites are in the nano-dimension. AFM picture suggests a porous network structure for 3% CdO doped film. The porosity and refractive indices of the films are calculated from the transmittance and reflectance spectra. Optical band gap energy is found to decrease in the CdO doped films as the CdO doping concentration increases. The PL spectra show emissions corresponding to the near band edge (NBE) ultra violet emission and deep level emission in the visible region. The 16CdZnO film shows an intense deep green PL emission. Non-linear optical measurements using the z-scan technique indicate that the saturable absorption (SA) behavior exhibited by undoped ZnO under green light excitation (532 nm) can be changed to reverse saturable absorption (RSA) with CdO doping. From numerical simulations the saturation intensity (I_s) and the effective two-photon absorption coefficient (β) are calculated for the undoped and CdO doped ZnO films.     

Preparation and characterization of indium zinc oxide thin films by electron beam evaporation technique

In this work, the preparation of In₂O₃-ZnO thin films by electron beam evaporation technique on glass substrates is reported. Optical and electrical properties of these films were investigated. The effect of dopant amount and annealing temperature on the optical and electrical properties of In₂O₃-ZnO thin films was also studied. Different amount of ZnO was used as dopant and the films were annealed at different temperature. The results showed that the most crystalline, transparent and uniform films with lowest resistivity were obtained using 25 wt% of ZnO annealed at 500 °C.     

Effect of thermal annealing on some electrical properties and optical band gap of vacuum evaporated Se65Ga30In5 thin films

Electrical properties and optical band gap of amorphous Se₆₅Ga₃₀In₅ thin films, which were thermally evaporated onto chemically cleaned glass substrates, have been studied before and after thermal annealing at temperatures above the glass transition temperature and below the crystallization temperature. The I-V characteristics, which were recorded in the temperature range (200-300 K), were obtained at different voltages and exhibit an ohmic and non-ohmic behavior at low (0-5 V) and high (5-18 V) voltages, respectively, for annealed and as-prepared films. Analysis of the experimental data in the high voltage range confirms the presence of space charge limited conduction (SCLC) for annealed and as-prepared films. The dependence of DC conductivity on temperature in the low voltage region shows two types of conduction channels: The first is in the range 270-300 K and the other at the lower temperature range (200-270 K). The conduction in the first region is due to thermally activated process, while in the other is due variable range hopping (VRH) of charge carriers in the band tails of the localized states. After annealing, the conductivity has been found to increase but the activation energy decreases. This is attributed to rupturing of Se-In weak bonds and formation of Se-Ga strong bonds. This process changes the concentration of defects in the films which in turn decreases the density of states N(E_F) as predicted by Mott's VRH model. Analysis of the absorption coefficient of annealed and as-prepared films, in the wavelength range 300-700 nm, reveals the presence of parabolic densities of states at the edges of both valence and conduction bands in the studied films. The optical band gap (E_g) was obtained through the use of Tauc's relation and is found to decrease with annealing temperature.     

P-type transparent Ti-V oxides semiconductor thin film as a prospective material for transparent electronics

In this paper electrical and optical properties of mixed titanium and vanadium oxides (Ti-V oxides) thin films have been outlined. Thin films were deposited by sputtering of mosaic Ti-V target in reactive oxygen plasma using high energy magnetron sputtering process. From elemental analysis results, 19 at.% of vanadium was incorporated into thin films and X-ray diffraction investigations displayed their amorphous behavior. However, images obtained by the use of an atomic force microscope displayed a densely packed nanocrystalline structure. It has been found that V addition considerably improves the electrical conduction of prepared Ti-V oxide thin films as compared to undoped TiO₂ and results in p-type electrical conduction. Resistivity of Ti-V oxides thin films was found at the order of 10⁵ Ω cm. Optical measurements have shown the average transmission coefficient of about 73% in the visible spectral range and that the position of fundamental absorption edge has been shifted by 40 nm towards the longer wavelength as compared to the undoped TiO₂. The results testified that the prepared Ti-V oxides thin films might be considered as a p-type transparent oxide semiconductors for future application in transparent electronics.     

Compositional dependence of the optical parameters for Bi5GexSe65−x (30 ≤ x ≤ 45) films

Different compositions of Bi₅Ge_xSe_95−x (x = 30, 35, 40 and 45 at %) thin films were deposited onto cleaned glass substrates by thermal evaporation method. The structural characterization revealed that, the as-prepared films of x = 30, 35 and 40 at. % are in amorphous state but there are few tiny crystalline peaks of relatively low intensity for the film with x = 45 at. %. The chemical composition of the as-prepared Bi₅Ge_xSe_65−x films has been checked using energy dispersive X-ray spectroscopy (EDX). The optical properties for the as-deposited Bi₅Ge_xSe_65−x thin films have been studied. The additions of Ge content were found to affect the optical constants (refractive index, n and the extinction coefficient, k). Tauc’s relation for the allowed indirect transition is successfully describing the mechanism of the optical absorption. It was found that, the optical energy gap (E_g) decreases with the increase in Ge content. These obtained results were discussed in terms of the chemical bond approach proposed by Bicermo and Ovshinsky. The composition dependence of the refractive index was discussed in terms of the single oscillator model.     

Effect of substrate temperatures on the optical properties of evaporated Sc2O3 thin films

Scandium oxide (Sc₂O₃) films were deposited by electron beam evaporation with substrate temperatures varying from 50 to 350 °C. X-ray diffraction, scanning electron microscopy, spectrometer, and optical profilograph were employed to investigate the structural and optical properties of the films. The refractive index and extinction coefficient were calculated from the transmittance and reflectance spectra, and then the energy band gaps were deduced and discussed. Laser induced damage threshold of the films were also characterized. Optical and structural properties of Sc₂O₃ films were found to be sensitive to substrate temperature.     

Temperature studies of optical parameters of (Ag3AsS3)0.6(As2S3)0.4 thin films prepared by rapid thermal evaporation and pulse laser deposition

(Ag₃AsS₃)_0.6(As₂S₃)_0.4 thin films were deposited using rapid thermal evaporation (RTE) and pulse laser deposition (PLD) techniques. Ag-enriched micrometre-sized cones (RTE) and bubbles (PLD) were observed on the thin film surface. Optical transmission spectra of the thin films were studied in the temperature range 77–300 K. The Urbach behaviour of the optical absorption edge in the thin films due to strong electron–phonon interaction was observed, the main parameters of the Urbach absorption edge were determined. Temperature dependences of the energy position of the exponential absorption edge and the Urbach energy are well described in the Einstein model. Dispersion and temperature dependences of refractive indices were analysed; a non-linear increase of the refractive indices with temperature was revealed. Disordering processes in the thin films were studied and compared with bulk composites, the differences between the thin films prepared by RTE and PLD were analysed.     

Influence of Nd dopant amount on microstructure and photoluminescence of TiO2:Nd thin films

TiO₂ and TiO₂:Nd thin films were deposited using reactive magnetron sputtering process from mosaic Ti–Nd targets with various Nd concentration. The thin films were characterized using X-ray diffraction (XRD), transmission electron microscopy (TEM) and spectroscopic techniques. Photoluminescence (PL) in the near infrared obtained upon 514.5 nm excitation was also examined. The relationship between the Nd concentration, structural, optical and photoluminescence properties of prepared thin films was investigated and discussed. XRD and TEM measurements showed that an increase in the Nd concentration in the thin films hinders the crystal growth in the deposited coatings. Depending on the Nd amount in the thin films, TiO₂ with the rutile, mixed rutile–amorphous or amorphous phase was obtained. Transmittance measurements revealed that addition of Nd dopant to titania matrix did not deteriorate optical transparency of the coatings, however it influenced on the position of the fundamental absorption edge and therefore on the width of optical band gap energy. All TiO₂:Nd thin films exhibited PL emission that occurred at ca. 0.91, 1.09 and 1.38 μm. Finally, results obtained for deposited coatings showed that titania with the rutile structure and 1.0 at.% of Nd was the most efficient in VIS to NIR photon conversion.