PbTe films grown by hot wall epitaxy on sapphire substrates

A ‘hot wall epitaxy’ is applied to grow PbTe thin films on sapphire substrates with BaF₂ buffer layer deposited by molecular beam epitaxy (MBE). The microstructural and strain state characteristics of PbTe layer were examined with high resolution X-ray diffraction techniques. The epilayer is composed of two (111)PbTe‖(0001)Al₂O₃ epitaxially oriented domain variants. The domains are azimuthally rotated and their interfacial directions relative to the substrate are [011?]PbTe‖Al₂O₃ and [1?54?]PbTe‖Al₂O₃, respectively. Another possible alignment of the domain variant corresponds to PbTe‖Al₂O₃ orientation. The strain state analysis of PbTe layer points to its relaxation via domain formation and high dislocation density generation in the lattice. Despite the domains formation the measured mobility of electron carriers is approximately 1600 cm²/V s and 30 000 cm²/V s at 300 K and 77 K, respectively. The theoretical analysis of the measured electrical properties indicates that the scattering by acoustic and optical phonons is the factor affecting the conduction process.     

Effects of sapphire substrates surface treatment on epitaxial ZnO thin films grown by MOCVD

The surface treatment effects of sapphire substrate on the quality of epitaxial ZnO thin films grown by metal-organic chemical vapor deposition (MOCVD) were studied. The sapphire substrates have been investigated by means of atomic force microscopy (AFM) and X-ray diffraction rocking curves (XRCs). The results show that sapphire substrate surfaces have the best-quality by CMP with subsequent chemical etching. The surface treatment effects of sapphire substrate on the ZnO thin films were examined by X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence (PL) measurements. Results show that the intensity of (002) diffraction peak of ZnO thin films on sapphire substrates treated by CMP with subsequent chemical etching is strongest. FWHM of (002) diffraction peak is narrowest and the intensity of UV peak of PL spectrum is strongest, indicating surface treatment on sapphire substrate preparation may improve ZnO thin films crystal quality and photoluminescent property.     

Effect of thin intermediate-layer of InAs quantum dots on the physical properties of InSb films grown on (001) GaAs

In this study the formation of a semiconducting InSb layer, preceded by the growth of an intermediate layer of InAs quantum dots, is attempted on (001) GaAs substrate. From the analysis of atomic-force-microscopy and transmission-electron-microscopy images together with Raman spectra of the InSb films, it is found that there exists a particular layer-thickness of ~ 0.5 μm above which the structural and transport qualities of the film are considerably enhanced. The resultant 2.60-μm-thick InSb layer, grown at the substrate temperature of 400 °C and under the Sb flux of 1.5 × 10^− 6 Torr, shows the electron mobility as high as 67,890 cm²/Vs.     

Effect of VI/II ratio upon photoluminescence and electrical properties of phosphorus-doped ZnTe films grown by metalorganic vapor phase epitaxy

We have investigated photoluminescence and electrical properties of P−doped ZnTe layers grown by metalorganic vapor phase epitaxy as a function of VI/II ratio. Near band-edge emissions are strongly influenced by VI/II ratio. The low VI/II ratio corresponding to Zn-rich condition brings about heavy p-type doping with P as compared to Te-rich condition. The best VI/II ratio for obtaining high quality layer is one. A maximum carrier concentration of 5.4 × 10¹⁸ cm⁻³ is attained even for as-grown ZnTe layer. In this sample, the carrier concentration is almost independent of the measurement temperature, indicating conduction in an impurity band formed by shallow acceptor.     

Effects of buffer layer thickness on properties of ZnO thin films grown on porous silicon by plasma-assisted molecular beam epitaxy

ZnO thin films with different buffer layer thicknesses were grown on Si and porous silicon (PS) by plasma-assisted molecular beam epitaxy (PA-MBE). The effects of PS and buffer layer thickness on the structural and optical properties of ZnO thin films were investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), and photoluminescence (PL). The ZnO buffer layers, the intensity of the (002) diffraction peak for the ZnO thin films and its full width at half maximum (FWHM) decreased with an increase in the thickness of the ZnO buffer layers, indicating an improvement in the crystal quality of the films. On introducing PS as a substrate, the grain sizes of the ZnO thin films became larger and their residual stress could be relaxed compared with the ZnO thin films grown on Si. The intensity ratio of the ultraviolet (UV) to visible emission peak in the PL spectra of the ZnO thin films increased with an increase in buffer layer thickness. Stronger and narrower UV emission peaks were observed for ZnO thin films grown on PS. Their structural and optical properties were enhanced by increasing the buffer layer thickness. In addition, introduction of PS as a substrate enhanced the structural and optical properties of the ZnO thin films and also suppressed Fabry-Perot interference.     

Monocrystalline thin films of ZnSe and ZnO grown by atomic layer epitaxy

We report on the growth of monocrystalline thin films of ZnSe and ZnO by atomic layer epitaxy by simple reaction between elemental precursors. Structural and optical properties of these films are discussed with reference to the investigations performed with atomic force microscopy, scanning electron microscopy, cathodoluminescence and photoluminescence.     

Characterization of MgxZn1 − xO thin films grown on sapphire substrates by metalorganic chemical vapor deposition

Wurtzite-structure Mg_xZn_1 − xO materials with five different compositions of x from 0 to 0.14 were grown on sapphire substrates by metalorganic chemical vapor deposition. It was found that increasing Mg content in the Mg_xZn_1 − xO not only increased the band gap energy of the film but was also beneficial to the epitaxial growth of p-type Mg_xZn_1 − xO without using any doping sources. In addition, the combined ultraviolet photoluminescence (PL) and Raman scattering spectra were measured with PL-Raman signals obtained together, showing a blue-shift of PL band and variation of resonant Raman multi-order longitudinal optical phonon modes with an increase of Mg content.     

Characterization of an AlN buffer layer and a thick-GaN layer grown on sapphire substrate by MOCVD

An AlN buffer layer and a thick-GaN layer for high-electron-mobility transistors (HEMTs) were grown on sapphire substrate by metal–organic chemical vapor deposition (MOCVD). The structural and morphological properties of the layers were investigated by high resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM) techniques. The optical quality of the thick-GaN layer was also evaluated in detail by a photoluminescence (PL) measurement. It was found that the AlN buffer layer possesses high crystal quality and an atomically flat surface with a root-mean-square (rms) roughness of 0.16 nm. The screw- and edge-type dislocation densities of the thick-GaN layer were determined as 5.4 × 10⁷ and 5.0 × 10⁹ cm⁻² by means of the mosaic crystal model, respectively. It was observed that the GaN layer has a smooth surface with an rms of 0.84 nm. Furthermore, the dark spot density of the GaN surface was estimated as 6.5 × 10⁸ cm⁻² over a scan area of 4 μm².     

用氢化物气相外延(HVPE)法生长的氮化铟薄膜的性质研究

在自制设备上用氢化物气相外延(HVPE)方法在α-Al2O3以及GaN/α-Al2O3衬底上生长了InN薄膜,并对其性质进行了研究.重点研究了生长温度的变化对所获得的InN薄膜的影响,并利用X射线衍射研究了InN薄膜的结构,用扫描电子显微镜研究了其表面性质,用霍尔测量研究了其电学性质.X射线衍射的结果表明,直接在α-Al2O3上生长得到的是InN多晶薄膜;而在GaN/α-Al2O3上得到的InN薄膜都只有(0002)取向,并且没有金属In或是In相关的团簇存在.综合分析可以发现,在650℃时无法得到InN薄膜,而在温度550℃时生长的InN薄膜具有光滑的表面和最好的晶体质量.     

Preparation and properties of YBa2Cu3O7 thin films on sapphire with Yttria-stabilized zirconia buffer layer

YBa₂Cu₃O₇ superconducting thin films were deposited onR-plane sapphire substrates with Yttria-stabilized zirconia buffer layer by laser ablation. The structure of the films was characterized by X-ray diffraction. Superconducting transitional temperatures as high as ≥90 K and critical current densities up to 2.2×10⁶ A/cm² (77 K) were achieved. The results of Auger depth profile showed that no obvious diffusion occurred between the substrate and the YBa₂Cu₃O₇ thin film.     

Metal organic chemical vapor deposition and investigation of ZnO thin films grown on sapphire

A new type of large area metal organic chemical vapor deposition (MOCVD) system for the growth of high quality and large size ZnO materials is introduced. Materials properties of the un-doped, n- and p-doped ZnO epi-films grown on sapphire substrates by this MOCVD system are studied by various techniques, including high resolution X-ray diffraction (XRD), UV-Visible optical transmission (OT), photoluminescence (PL) and photoluminescence excitation (PLE), synchrotron radiation X-ray photoelectron spectroscopy (SR-XPS). The wurtzite (w) ZnO crystal structures grown with primary (0002) orientation were identified. Results have shown the high crystalline quality of MOCVD-grown ZnO films, indicated by the narrow XRD, PL and Raman line widths, strong PL signals, sharp OT edge and smooth surface. In particular, high p-type carrier concentration of > 10¹⁷ cm^− 3 have been achieved besides the good n-type doping in ZnO.     

Structural and optical properties of GaN films grown on GaAs substrates by molecular beam epitaxy

GaN films are grown on [0 0 1] GaAs substrates by plasma-assisted molecular beam epitaxy using a three-step process that consists of a substrate nitridation, deposition of a low-temperature buffer layer, and a high-temperature overgrowth. X-ray diffraction and transmission electron microscopy indicate that this method promotes prismatic growth of c-oriented α-GaN. Photoluminescence studies show that the emission from cubic β-GaN inclusions dominates the spectrum.     

Growth of ZnO crystal on sapphire and nitridated sapphire substrates at 1000 °C by halide vapor phase epitaxy

Using a halide vapor phase epitaxy (HVPE) technique in which the starting materials are ZnCl₂ generated by the reaction between high purity Zn metal (7 N grade) and Cl₂ gas, and H₂O, ZnO crystals have been grown at a high temperature of 1000 °C on sapphire substrates with and without surface nitridation treatment. It was found that the nitridation treatment resulted in a change of the (112?0) sapphire surface to a (0001) AlN structure, leading to two possible sets of orientations for (0001) ZnO crystals. In addition, the nitridation treatment leads to a smaller average ZnO grain size and a higher density of nuclei.     

Fourier transform infrared spectroscopy characterization of AlN thin films grown on sacrificial silicon oxide layers via metal organic vapor phase epitaxy

Aluminum nitride (AlN) films were grown using metal organic vapor phase epitaxy techniques on Si (111) substrates patterned with silicon oxide (SiO_x) stripes and the vibrational properties of these films were investigated by Fourier transform infrared (FTIR) techniques. The grown films contained a predominantly wurtzite AlN phase. The AlN film on SiO_x was prone to corrosion when subjected to wet etching in buffered hydrofluoric acid solution thereby changing the material properties of the AlN film on SiO_x. The change in the material properties of the AlN films on SiO_x can be gauged from the decrease in the relative integrated areas under the A1 (TO) and E1 (TO) modes of the AlN film. The analysis shows that FTIR is a viable tool for investigating the material properties of AlN thin film structures with lateral dimensions as low as 100 μm.     

Effect of a ZnO buffer layer on the characteristics of MgZnO thin films grown on Si (100) substrates by radio-frequency magnetron sputtering

This is a report on the effect of a ZnO buffer layer on the microstructures and optical properties of MgZnO thin films grown on Si (100) substrates by radio frequency magnetron sputtering. For the sample without the ZnO buffer layer, the microstructural analyses carried out by X-ray diffraction (XRD) and transmission electron microscopy (TEM) revealed the formation of Mg₂Si in the interface between the Si substrate and the MgZnO thin film. Mg₂Si induced the random oriented polycrystalline MgZnO thin film. For the sample with the ZnO buffer layer, a few Mg₂Si were observed. An epitaxial relationship between the Si substrate and the MgZnO thin film was formed. In both samples, the photoluminescence (PL) investigation showed a small blue shift of the emission peak, which was owing to the incorporation of Mg atoms in ZnO by co-sputtering the MgO and ZnO targets. In addition, the sample with the ZnO buffer layer showed the enhanced PL intensity, when compared with the sample without the buffer layer.     

Effect of AlN buffer layer on the microstructure and bandgap of AlN films deposited on sapphire substrates by pulsed laser deposition

AlN buffer layer is proposed to improve the growth of AlN films on the sapphire substrate by pulsed laser deposition. The buffer layers were pre-deposited under vacuum for different time, which was aimed to suppress the negative nitridation effect in the initial growth stage, and their effects on the surface morphology, crystal structure and bandgap of AlN films were characterized. It is found that AlN-buffered films exhibit a single (0002) preferred orientation and the crystallinity improves as the pre-deposition time increases from 5 to 20 min. Al-polarity AlN films are obtained at the pre-deposition time of 5 and 10 min, while the polarity inversion from the Al- to N-polarity is observed at 20 min. Based on the analysis of optical transmittance spectra, the bandgap of AlN films decreases with increasing pre-deposition time, which may be resulted from the decrease of axial ratio c/a.     

Structural, optical and electrical study of undoped GaN layers obtained by metalorganic chemical vapor deposition on sapphire substrates

We investigate optical, structural and electrical properties of undoped GaN grown on sapphire. The layers were prepared in a horizontal reactor by low pressure metal organic chemical vapor deposition at temperatures of 900 °C and 950 °C on a low temperature grown (520 °C) GaN buffer layer on (0001) sapphire substrate. The growth pressure was kept at 10,132 Pa. The photoluminescence study of such layers revealed a band-to-band emission around 366 nm and a yellow band around 550 nm. The yellow band intensity decreases with increasing deposition temperature. X-ray diffraction, atomic force microscopy and scanning electron microscopy studies show the formation of hexagonal GaN layers with a thickness of around 1 μm. The electrical study was performed using temperature dependent Hall measurements between 35 and 373 K. Two activation energies are obtained from the temperature dependent conductivity, one smaller than 1 meV and the other one around 20 meV. For the samples grown at 900 °C the mobilities are constant around 10 and 20 cm² V⁻¹ s^− 1, while for the sample grown at 950 °C the mobility shows a thermally activated behavior with an activation energy of 2.15 meV.     

Preparation of crystalline beta barium borate thin films on Sr-doped alpha barium borate substrates by liquid phase epitaxy

Thin films of beta barium borate have been prepared by liquid phase epitaxy on Sr²⁺-doped -BaB₂O₄ (-BBO, the high temperature phase of barium borate) (001) and (110) substrates. The results of X-ray diffraction indicate that the films show highly (00l) preferred orientation on (001)-oriented substrates while the films grown on (110) substrates are textured with (140) orientation. The crystallinity of these films was found to depend on growth temperature, rotation rate, dip time and orientation of substrate. Growth conditions were optimized to grow films with (00l) orientation on (001) substrates reproducibly. The films show second harmonic generation of 400 nm light upon irradiation with 800 nm Ti: Sapphire femtosecond laser light.     

Structural and photoluminescence study of thin GaN film grown on silicon substrate by metalorganic chemical vapor deposition

GaN epitaxial layer was grown on Si(111) substrate by metalorganic chemical vapor deposition (MOCVD). The structure consists of 50 nm thick high-temperature grown AlN buffer layer, 150 nm thick AlGaN layer, 30 nm low-temperature grown AlN layer, 300 nm GaN layer, 50 nm AlGaN superlattice layer, followed by 100 nm GaN epitaxial layer. The low-temperature AlN interlayer and AlGaN superlattice layer were inserted as the defect-blocking layers in the MOCVD grown sample to eliminate the dislocations and improve the structural and optical properties of the GaN layer. The dislocation density at the top surface was decreased to ∼ 2.8 × 10⁹/cm². The optical quality was considerably improved. The photoluminescence emission at 3.42-3.45 eV is attributed to the recombination of free hole-to-donor electron. The observed 3.30 eV emission peak is assigned to be donor-acceptor transition with two longitudinal optical phonon side bands. The relationship of the peak energy and the temperature is discussed.