Influence of gamma radiation on the optical properties of ZnSe nanocrystalline thin films

The effect of gamma (γ) irradiation on the absorption spectra and the optical energy bandwidth of ZnSe nanocrystalline thin films have been studied. Thin films of different thicknesses from 20 to 120 nm were deposited by Inert gas condensation technique at constant temperature of 300 K and under pressure 2 × 10⁻³ Torr of Argon gas flow. The optical transmission (T) and optical reflection (R) in the wavelength range 190–2,500 nm of ZnSe nanocrystalline thin films were measure for unirradiated and irradiated films. The dependence of the absorption coefficient α on photon energy hν was determined for different γ-doses irradiated films. The ZnSe thin films show direct allowed interband transition by γ-doses. Both the absorption coefficient (α) and optical energy bandwidth were found to be γ-dose dependent. The optical energy band width has been decreased by irradiated of γ-doses. The E_gn values of irradiated thin films by 34.5 Gy of γ-doses were recovered to nearly their initial values after 100 days at 300 K.     

Chemical bath deposition and characterization of CdSe thin films for optoelectronic applications

Cadmium selenide (CdSe) thin films of high crystalline quality on glass substrate have been prepared by chemical bath deposition technique from an aqueous bath containing tetramine cadmium and sodium selenosulphate. Structural analysis using XRD shows that the film is single phase, crystallized in hexagonal structure with preferred growth in (111) direction. The energy band gap calculated from the absorption spectra of unannealed CdSe thin films shows an optical band gap of 1.8 eV and absorption coefficient near band edge (α)—0.58 × 10⁵ cm⁻¹. The conductivity of CdSe thin films is n-type.     

Impact of various irradiation photon energies and gamma doses on the optical properties of ZnSe nanostructure thin film

ZnSe thin films were prepared by thermal evaporation technique under high vacuum (10⁻⁶ Torr) at 300 K and different film thickness. The structure of thin films was measured using grazing incident in-plane X-ray diffraction (GIIXD) and shows single phase zinc blende structure. The particle sizes of the deposited films were estimated for low film thickness by TEM and high film thickness by GIIXD. The particle size of ZnSe films was decreased from ~8.53 to 3.93 nm as film thickness lowered from 200 to 20 nm which ensures the nanocrystalline structure. The optical transmission (T) and reflection (R) in the wavelength range 190–2,500 nm for irradiated and unirradiated ZnSe thin films under investigation were measured. The effect of irradiation of different energies in range (0.1–1.25 MeV) from X-ray, ¹³⁷Cs and ⁶⁰Co irradiation sources were studied for ZnSe thin films of 100 and 200 nm thicknesses. The dependence of the absorption spectra and refractive index were investigated for different energies irradiation sources. The ZnSe films show direct allowed interband transition. The effect of particle size of nanocrystalline ZnSe thin films for unirradiated and irradiated by gamma (γ) doses from ¹³⁷Cs on the optical properties was studied. Both the optical energy bandwidth and absorption coefficient (α) were found to be (γ) dose dependent.     

Synthesis and Optical Studies of Superconducting MgB<Subscript>2</Subscript> Thin Films

Synthesis and optical transmission of MgB₂ thin films on optically transparent glass are reported. In the 400–1000 nm regime as deposited films show high metallic reflectivity and very little transmission. After deposition, the films were annealedex situ and rendered superconducting withT _c of 38 K, approaching that of the bulk material. The reaction conditions where quite soft ∼ 10 min at 550°C. The optical absorption coefficient,α and photon energy,E followed a Tauc-type behavior, (αE)^1/2=β _T(E −E _g). The band gap (E _g) was observed to peak at 2.5 eV; but, the slope parameterβ _Tbehaved monotonically with reaction temperature. Our results indicate that an intermediate semiconducting phase is produced before the formation of the superconducting phase; also optical measurements provide valuable information in monitoring the synthesis of MgB₂ from its metallic constituents. In addition these films have interesting optical properties that may be integrated into optoelectronics.     

Optical properties of CeO<Subscript>2</Subscript> thin films

Cerium oxide (CeO₂) thin films have been prepared by electron beam evaporation technique onto glass substrate at a pressure of about 6 × 10⁻⁶ Torr. The thickness of CeO₂ films ranges from 140–180 nm. The optical properties of cerium oxide films are studied in the wavelength range of 200–850 nm. The film is highly transparent in the visible region. It is also observed that the film has low reflectance in the ultra-violet region. The optical band gap of the film is determined and is found to decrease with the increase of film thickness. The values of absorption coefficient, extinction coefficient, refractive index, dielectric constant, phase angle and loss angle have been calculated from the optical measurements. The X-ray diffraction of the film showed that the film is crystalline in nature. The crystallite size of CeO₂ films have been evaluated and found to be small. The experimental d-values of the film agreed closely with the standard values.     

The effects of native and light induced defects on optoelectronic properties of hydrogenated amorphous silicon–germanium (a-SiGe:H) alloy thin films

Effects of native and light induced defects states in hydrogenated amorphous silicon–germanium alloy thin films with different Ge concentrations have been investigated by using steady-state photoconductivity, dual beam photoconductivity (DBP), transmission spectroscopy and photothermal deflection spectroscopy (PDS) techniques. In the annealed state, sub-bandgap absorption spectra obtained from both PDS and DBP overlap very well at energies above 1.4 eV. However, differences in α (hν) spectrum exist in the lower energy part of absorption spectrum. The α (hν) value measured at 1.0 eV is the lowest for 10% Ge sample and increases gradually as Ge content of the sample increases. In the light soaked state, time dependence of photoconductivity decay obeys to t ^−x power law, where x changes from 0.30 to 0.60 for samples with low Ge content and 0.05–0.1 for samples with high Ge content. Correspondingly, the increase of the sub-bandgap absorption coefficient at lower energies obeys to t ^y power law, where y values are lower than the x value of the same sample. It can be inferred that sub-bandgap absorption and photoconductivity measurements are not controlled by the same set of defects created in the bandgap of alloys.     

Synthesis and Optical Studies of Superconducting MgB2 Thin Films

Synthesis and optical transmission of MgB₂ thin films on optically transparent glass are reported. In the 400–1000 nm regime as deposited films show high metallic reflectivity and very little transmission. After deposition, the films were annealed ex situ and rendered superconducting with T _c of 38 K, approaching that of the bulk material. The reaction conditions where quite soft ∼10 min at 550°C. The optical absorption coefficient, α and photon energy, E followed a Tauc-type behavior, = _T (E - E_g )(\alpha E)^{1/2} = \beta _T (E - E_{\rm g} ). The band gap (E _g) was observed to peak at 2.5 eV; but, the slope parameter β _T behaved monotonically with reaction temperature. Our results indicate that an intermediate semiconducting phase is produced before the formation of the superconducting phase; also optical measurements provide valuable information in monitoring the synthesis of MgB₂ from its metallic constituents. In addition these films have interesting optical properties that may be integrated into optoelectronics.     

Effect of annealing on phase transition in poly(vinylidene fluoride) films prepared using polar solvent

The γ-phase poly (vinylidene fluoride) (PVDF) films are usually prepared using dimethyl sulfoxide (DMSO) solvent, regardless of preparation temperature. Here we report the crystallization of both α and γ-phase PVDF films by varying preparation temperature using DMSO solvent. The γ-phase PVDF films were annealed at 70, 90, 110, 130 and 160°C for five hours. The changes in the phase contents in the PVDF at different annealing conditions have been described. When thin films were annealed at 90°C for 5 h, maximum percentage of β-phase appears in PVDF thin films. The γ-phase PVDF films completely converted to α-phase when they were annealed at 160°C for 5 h. From X-ray diffraction (XRD), Fourier transform infrared spectrum (FTIR), differential scanning calorimetry (DSC) and Raman studies, it is confirmed that the PVDF thin films, cast from solution and annealed at 90°C for 5 h, have maximum percentage of β-phase. The β-phase PVDF shows a remnant polarization of 4.9 μC/cm² at 1400 kV/cm at 1 Hz.     

Spectral properties of aluminium doped zinc oxide thin films prepared by SILAR method

The spectral properties of undoped and Al doped ZnO nano thin films prepared using double dip method otherwise called SILAR method (Successive Immersion Layer Adsorption Reaction) are reported. The thin films were having polycrystalline hexagonal structure. The optical properties of these films are studied and reported. The optical constants like the band gap (E _g ), refractive indices (n, k), dielectric constant (ε), optical conductivity (σ), were estimated using an approximation algorithm developed from established procedures using transmittance spectrum of the thin films. The average excitation energy (E ₀), oscillator strength (E _d ), effective mass (m*), plasma frequency (ω _p ), static dielectric constant (ε_∞) and carrier concentration (N) are also estimated and reported. The highly transparent thin films showed nanowires protruding from stacked nanorods on SEM inspection that signifies the suitability of these thin films for gas sensors.     

Optical and photoelectric properties of α-Dy<Subscript>2</Subscript>S<Subscript>3</Subscript> and α-Dy<Subscript>2</Subscript>S<Subscript>3</Subscript>〈Pb〉 films

A process is described for the growth of thin crystalline α-Dy₂S₃ films by thermal evaporation from separate dysprosium and sulfur sources. The films were doped with Pb, and their reflection and transmission spectra were measured at room temperature and photon energies in the range (0.3−5.2) × 10⁻¹⁹ J. The α-Dy₂S₃ films were shown to have an exponential absorption edge. The photoconductivity of the doped films was measured at photon energies in the range (0.3−5.2) × 10⁻¹⁹ J and temperatures from 115 to 400 K.     

Temperature dependence of absorption edge in MOCVD grown GaN

We have studied the temperature dependence of absorption edge of GaN thin films grown on sapphire substrate by metal-organic chemical vapor deposition using optical absorption spectroscopy. A shift in absorption edge of about 55 meV has been observed in temperature range 273–343 K. We have proposed a theoretical model to find the energy gap from absorption coefficient using α = α_max + (α_min − α_max)/[1 + exp 2(E − E_g + KT)/KT]. Temperature dependence of band gap has also been studied by finding an appropriate theoretical fit to our data using E_g(T) = E_g(273 K) − (8.8 × 10⁻⁴T²)/(483 + T) + 0.088 (Varshni empirical formula) and E_g(T) = E_g(273 K)−0.231447/[exp(362/T)−1] + 0.082 relations. It has been found that data can be fitted accurately after adding a factor ∼0.08 in above equations. Debye temperature (483 K) and Einstein temperature (362 K) in the respective equations are found mutually in good agreement.     

Comparative study of the properties of ZnO thin films deposited on poly propylene carbonate (PPC) and glass substrates

In this study, we report a comparative study of the structural, morphological, and optical properties of the deposited ZnO thin films on Poly Propylene Carbonate (PPC) and glass substrates by direct current (DC) sputtering technique. X-ray diffraction (XRD) spectra of the films on PPC and glass substrates show mainly the ZnO (002) diffraction peaks at 2θ = 34.1 and 34.3^o with full width at half maximum (FWHM) of 0.31 and 0.34^o, respectively. Scanning electron microscopy (SEM) images show that both ZnO thin films have smooth surface. Photoluminescence (PL) spectra show two peaks, the first intense peak was found in the UV region. The second weak peak was observed in the visible region. The transmission and absorption spectra of the ZnO thin films deposited on both substrates showed that the films have good transmission in the visible region and a good absorption in the UV region. The optical energy gap (E _g) values of the deposited ZnO thin films on PPC plastic and glass substrates were derived from absorption measurements and it found to be 3.38 and 3.40 eV, respectively.     

Processing and magneto-electric properties of sol–gel-derived Pb(Zr0.52Ti0.48)O3–Ni0.8Zn0.2Fe2O4 2-2 type multilayered films

Pb(Zr_0.52Ti_0.48)O₃–Ni_0.8Zn_0.2Fe₂O₄ (PZT–NZFO) multilayered thin films with various volume fractions of the PZT phase (100, 74, 58, 48, 33, and 0%) were prepared on Pt/Ti/SiO₂/Si substrates using sol–gel spin-coating method. X-ray diffraction shows polycrystalline structure and scanning electron microscopy reveals good multilayer morphology of the composite thin film as annealed at 700 °C in air. The thickness of the composite films was estimated in the range of ~400 to ~600 nm. The ferroelectric and magnetic properties were measured as function of the volume fractions of the PZT phase. The magnetoelectric (ME) effect was investigated under various bias magnetic fields. The maximum ME voltage coefficient (α _E  = dE/dH) is 278 mV/cmOe for the composite film with the volume fractions of the PZT phase of ~48%.     

Effect of heat treatment on the structural and optical properties of CuInTe2 thin films

The CuInTe2 thin films were prepared by thermal vacuum evaporation of the bulk compound. The structural and optical properties in the temperature range 300–47 K of thin films grown on glass substrates and annealed in vacuum were studied. The films were investigated by X-ray diffraction and electron microscope techniques. The calculated lattice constants for CuInTe₂ powder were found to bea=0.619 nm andc –1,234 nm. From the reflection and transmission data, the optical constants, refractive indexn, absorption index,k, and the absorption coefficient, , werw computed. The optical energy gap was determined for CuInTe₂ thin films heat treated at different temparatures for different periods of time. It was found thatE _g increases with both increasing temperature and time of annealing.     

Investigation of annealing-treatment on structural and optical properties of sol-gel-derived zinc oxide thin films

The transparent ZnO thin films were prepared on Si(100) substrates by the sol-gel method. The structural and optical properties of ZnO thin films, submitted to an annealing treatment in the 400–700°C ranges are studied by X-ray diffraction (XRD) and UV-visible spectroscopic ellipsometry (SE). XRD measurements show that all the films are crystallized in the hexagonal wurtzite phase and present a random orientation. Three prominent peaks, corresponding to the (100) phase (2θ ≈ 31.8°), (002) phase (2θ ≈ 34.5°), and (110) phase (2θ ≈ 36.3°) appear on the diffractograms. The crystallite size increases with increasing annealing temperature. These modifications influence the optical properties. The optical constants and thickness of the films have been determined by analysing the SE spectra. The optical bandgap has been determined from the extinction coefficient. We found that the refractive index and the extinction coefficient increase with increasing annealing temperature. The optical bandgap energy decreases with increasing annealing temperature. These mean that the optical quality of ZnO films is improved by annealing.     

Synthesis of α″-Fe16N2 iron nitride by means of nitrogen-ion implantation into iron thin films

Nitrogen ions were implanted into [1 0 0] oriented α-Fe thin films on MgO (1 0 0) substrates at room temperature. The films were annealed at a low temperature of 473 K. α″-Fe₁₆N₂ and α′-martensite phases were formed and the volume fractions of these nitride phases were estimated from the X-ray diffraction patterns. When the film thickness was 250 nm, α″-Fe₁₆N₂ was formed directly by ion implantation and the maximum volume fraction was about 12%. For the case of 50 nm thick films, no α″-Fe₁₆N₂ but α′-martensite was formed after nitrogen-ion implantation, and the volume fraction of the martensite exceeded 90%. By post annealing at 473 K, α″-Fe₁₆N₂ was formed, when the implanted specimens were coated with gold or copper films. The volume fraction of α″-Fe₁₆N₂ reached about 36%. A SQUID magnetic measurement showed that the saturation magnetization of the nitrogen-implanted 250 nm thick iron films was a few per cent larger than that of unimplanted iron films. This revised version was published online in November 2006 with corrections to the Cover Date.     

Preparation and antibacterial activities of Ag-doped SiO<Subscript>2</Subscript>–TiO<Subscript>2</Subscript> composite films by liquid phase deposition (LPD) method

In the present study, Ag/SiO₂–TiO₂ thin films on ceramic tiles with glazed surface were successfully prepared by a liquid phase deposition method (LPD) at a low temperature. The Ag/SiO₂–TiO₂ thin films obtained were homogenous, well adhered and colored by interference of reflected light. The films were characterized by scanning electron microscopy and X-ray diffraction. From these analysis data, it was found that silver (Ag) nanoparticles were trapped in SiO₂–TiO₂ matrix. The antibacterial effects of Ag/SiO₂–TiO₂ thin films against S. aureus and E. coli were examined by the so-called antibacterial-drop test. The bactericidal activity for the above bacteria cells was estimated by relative number of bacteria survived calculated from the number of viable cells which form colonies on the nutrient agar plates. The Ag/SiO₂–TiO₂ thin films had an excellent antibacterial performance. Atomic absorption spectroscopy (AAS) was used for the quantitative determination of the Ag ion concentration releasing from the Ag/SiO₂–TiO₂ thin film. The releasing rate of Ag ions from the Ag/SiO₂–TiO₂ film is 0.123 μg/mL during 192 h. The antibacterial effect of Ag/SiO₂–TiO₂ thin film before and after aging in a weathering chamber for 48 h was compared and the results show that the antibacterial activity is not compromised after weathering.     

Characterization of Tin disulphide thin films prepared at different substrate temperature using spray pyrolysis technique

Thin films of tin disulphide on glass substrates were prepared by spray pyrolysis technique using precursor solutions of SnCl₂·2H₂O and n–n dimethyl thiourea at different substrate temperatures varied in the range 348–423 K. Using the hot probe technique the type of conductivity is found to be n type. X ray diffraction analysis revealed the polycrystalline nature with increasing crystallinity with respect to substrate temperature. The preferential orientation growth of SnS₂ compound having hexagonal structure along (002) plane increased with the substrate temperature. The size of the tin disulphide crystallites with nano dimension were determined using the Full Width Half Maximum values of the Bragg peaks and found to increase with the substrate temperature. The surface morphology had been observed on the surface of these films using scanning electron microscope. The optical absorption and transmittance spectra have been recorded for these films in the wavelength range 400–800 nm. Thickness of these films was found using surface roughness profilometer. The absorption coefficient (α) was determined for all the films. Direct band gap values were found to exist in all the films deposited at different substrate temperatures. The value of room temperature resistivity in dark decreased from 5.95 × 10³ Ω cm for the amorphous film deposited at low temperature (348 K) to 2.22 × 10³ Ω cm for the polycrystalline film deposited at high temperature (423 K) whereas the resistivity values in light decreased from 1.48 × 10³ to 0.55 × 10³ Ω cm respectively, which is determined using the four probe method. Activation energy of these thin films was determined by Arrhenius plot.     

Determination of optical constants of CdS x Se y electrodeposits

The optical constantsn(λ) and α(λ) have been determined for CdS_xSe _y films electrodeposited on to glass doped with SnO₂. From a (αhv)² versus photon energy plot, a value for the direct band gap of the electrodeposited polycrystalline semiconductor ofE _g=1.83 eV was obtained, which indicates a low proportion of S²⁻ in the thin films formed.     

Preparation and properties of Bi2−x As x S3 thin films by solution-gas interface technique

The solution gas interface technique by which thin films of Bi_2−x As _x S₃ were deposited is described in this paper. The semiconducting properties of the interface grown Bi_2−x As _x S₃ thin films are studied. The optical absorption, dark resistivity and thermoelectric power of the films were studied and results are reported.