Gray-scale masks for diffractive-optics fabrication: II. Spatially filtered halftone screens

Fabrication of diffractive optics with binary masks requires multiple photolithographic processes to produce efficient, continuous profile elements (kinoforms). Alignment or etching errors at any stage of fabrication decrease the efficiency of the element. We developed two accessible procedures that minimize fabrication complexity, component turnaround time, and cost. The first technique [Appl. Opt. 34, 7507-7517 (1995)] uses gray-scale masks produced by commercial slide-imager systems. Here, we report on an alternative technique for producing gray-scale masks by spatial filtering of halftone screens. Using the photoreduced gray-scale patterns as lithographic masks, we fabricated diffractiveoptic blazed gratings and lens arrays in both photoresist and quartz. First-order efficiencies as high as 70% are reported. Also, the strengths and limitations of this technique are compared with the previously reported slide-imager method as well as other fabrication methods.     

Fabrication of holographic blazed grating with Fourier synthesis exposure

A simple, direct, and universal fabrication method for holographic blazed gratings is proposed and a 79 lines/mm holographic echelle grating with 4 μm depth quasi-triangular grooves experimentally demonstrated as an example of a blazed grating fabricated directly by Fourier synthesis exposure. With the method, we converted a periodic grating groove profile into the exposure energy spatial distribution on the surface of a photoresist with the response characteristics of the particular photoresist. Then the exposure energy could be decomposed into a series of sinusoidal functions using Fourier series, and realized by superposing a series of two-beam interference patterns. In contrast with mechanically ruled gratings, the fabrication process of holographic gratings is quite quick and low cost, and especially no Rowland ghosts appear in their dispersion spectrum. The reported work will offer a new approach for blazed grating fabrication with a holographic process.     

电寻址空间光调制器制作灰度掩模技术的研究

介绍了制作微光学元件灰度掩模的两种方案,它们分别使用TFT-LCD(薄膜晶体管液晶显示器)和DMD(数字微镜器件)两种电寻址空间光调制器,采用并行直写和实时掩模技术,提高了灰度掩模制作的速度和灵活性。刷新率的变化和黑栅衍射效应将导致衍射效率下降,使得曝光深度误差增加。前者可延长曝光时间来消除,后者可通过高填充因子和放大滤波电路予以有效抑制。与LCD掩模相比,用DMD掩模制作的闪耀光栅的衍射效率提高了10%以上。     

Modeling and observations of phase-mask trapezoidal profiles with grating-fiber image reproduction

We report on an investigation of the trapezoidal design and fabrication defects in phase masks used to produce Bragg reflection gratings in optical fibers. We used a direct visualization technique to examine the nonuniformity of the interference patterns generated by several phase masks. Fringe patterns from the phase masks are compared with the analogous patterns resulting from two-beam interference. Atomic force microscope imaging of the actual phase gratings that give rise to anomalous fringe patterns is used to determine input parameters for a general theoretical model. Phase masks with pitches of 0.566 and 1.059 mum are modeled and investigated.     

Scanning methods for production of blazed relief gratings

Abstract

New methods for the production of blazed relief grating profiles using grating masks with either binary or harmonic transmittance have been developed. These methods are based on the recording of a scanning wave, properly modulated by a mask, through a grating period into photoresist. The applicability of the gratings produced by this method would be especially in the infrared or near-infrared wavelength regions in the reflection mode. These methods have been theoretically analysed and the principal ideas of the methods were experimentally verified.     

Diffraction efficiency of 200-nm-period critical-angle transmission gratings in the soft x-ray and extreme ultraviolet wavelength bands

We report on measurements of the diffraction efficiency of 200-nm-period freestanding blazed transmission gratings for wavelengths in the 0.96 to 19.4 nm range. These critical-angle transmission (CAT) gratings achieve highly efficient blazing over a broad band via total external reflection off the sidewalls of smooth, tens of nanometer thin ultrahigh aspect-ratio silicon grating bars and thus combine the advantages of blazed x-ray reflection gratings with those of more conventional x-ray transmission gratings. Prototype gratings with maximum depths of 3.2 and 6 μm were investigated at two different blaze angles. In these initial CAT gratings the grating bars are monolithically connected to a cross support mesh that only leaves less than half of the grating area unobstructed. Because of our initial fabrication approach, the support mesh bars feature a strongly trapezoidal cross section that leads to varying CAT grating depths and partial absorption of diffracted orders. While theory predicts broadband absolute diffraction efficiencies as high as 60% for ideal CAT gratings without a support mesh, experimental results show efficiencies in the range of ～50-100% of theoretical predictions when taking the effects of the support mesh into account. Future minimization of the support mesh therefore promises broadband CAT grating absolute diffraction efficiencies of 50% or higher.     

On-axis beam extinction through diffraction design and analysis

To optimize the functions of the surface-relief diffractive optical elements for optical limiters and other applications, we present a systematic design and analysis with numerical illustrations of the transmission properties of different surface-relief phase gratings and Fabry-Perot elements. The spectral response and the tolerance of fabrication errors have been included. An analysis shows that the blazed grating and the echelon grating, a multilevel element as a substitute of the blazed grating, can make the on-axis transmittance very low (less than 1% with one grating) over the broad visible band with a large tolerance of fabrication errors. The results are highly significant for the design of optical-limiting devices.     

Surface relief zone plates fabricated with photographic emulsions

The use of photographic emulsions as a photoresist medium for fabricating relief blazed zone plates is described. Lithographic methods with masks with 256 gray levels were used in the fabrication process. An example of a zone plate working in the reflection mode at 45 degrees and having 82% diffraction efficiency is shown.     

Two-beam-current method for e-beam writing gray-scale masks and its application to high-resolution microstructures

A two-beam-current method is introduced for e-beam writing in the fabrication of gray-scale masks. Compared with the simpler single-current method, the two-beam-current method offers two important advantages: (a) it can achieve a much larger dynamic range for e-beam exposure; (b) the writing time for a gray-scale mask can be reduced when a large pattern is to be written. Here, the new method is first described in detail and its application to the fabrication of our new gray-scale mask is demonstrated. Then, the improved gray-scale masks were employed to fabricate large dynamic range, high-resolution micro-optical elements of less than a couple of micrometers depth, using deep ultraviolet lithography at 248 nm wavelength and an inductively coupled plasma reactive ion etching system.     

负性SiO2/ZrO2光敏凝胶薄膜上引入微结构的研究

以锆酸丁酯及乙酰丙酮、苯甲酰丙酮为原料，经溶胶-凝胶工艺，制备具有负性光刻胶性质的ZrO2光敏溶胶，在将其与正硅酸乙酯通过水解缩聚反应复合，采用浸渍提拉法在基片上制得折射率在1．463-1．647之间连续可调的SiO2／ZrO2二元光敏凝胶薄膜．其敏感波长在335nm附近．通过FTIR分析，发现凝胶薄膜中含有Si-O-Zr、Zr-O的特征振动峰，证明SiO2与ZrO2两相在分子尺度上形成了微观组分均匀的薄膜．利用掩模板结合紫外曝光及显影工艺在凝胶膜上转移了光栅等表面微结构图形．     

基于光束扫描方法制作取样光栅的实验研究

报道了一种基于光束扫描方法采用普通均匀相位模板和连续的 2 4 4nm倍频氩离子激光器 ,制作波长间隔为 0 .8nm和 1.6nm取样光栅的新技术 ,并对得到的实验结果进行了分析。研制的取样光栅波长间隔均匀 ,具有良好的谱特性。采用的方法操作简单、灵活 ,可方便地制作不同类型的取样光栅。     

Technique for detecting flaws in metallic surfaces using an optical system with phase-type blazed gratings

In this paper, we evaluate a novel flaw-detection technique for metallic surfaces based on the use of phase-type blazed gratings. Transparent blazed gratings were prepared by the soft nanoimprint method involving the transfer of a template (a reflective grating structure used for spectroscopy) onto silicone rubber. The blazed gratings were then integrated into an imaging system to observe the reflective metal sample. Due to the low-pass-filtering properties of the gratings, the captured image was notably blurred. This characteristic aids in flaw detection on metallic surfaces because the captured image is adequate to distinguish flaws in the targeted area on the basis of the texture of the rough surface, including any other structures that were unintended. The use of double-sided gratings with crossing grating vectors was found to be efficient for homogenous low-pass filtering. Such flaw-detection techniques are expected to be useful for conducting quality inspections of rolled steel plates since the surface contains both a rough surface and undesirable flaws.     

Fabrication and simulation of diffractive optical elements with superimposed antireflection subwavelength gratings

With the aim of reducing surface reflections and increasing the diffraction efficiency we investigated the superposition of subwavelength phase gratings onto blazed phase gratings. With direct-write electron-beam lithography bare blazed gratings and blazed gratings carrying subwavelength gratings were fabricated and their optical performances compared. For TE polarization the subwavelength-carrying gratings showed a maximum diffraction efficiency of 90.6%, whereas the corresponding maximum value for the bare grating was 86.3%. The experiment was simulated with rigorous diffraction theory.     

Groove profile modification of blazed gratings by dip coating with hardenable liquids

We modify groove profile of various blazed gratings with groove densities as great as 3600 lines/mm by dip coating with hardenable liquids with the aim of reducing the blaze angle. The groove profiles resulting from coatings with different layer thickness are measured by atomic force microscopy. A highly reproducible blaze angle reduction to as high as a factor of 6 is achieved with mechanically ruled as well as ion-beam-etched holographic blazed gratings. Blaze angles, to as small as 0.7 deg, which are required for vacuum-UV and soft-x-ray applications but can hardly be formed with sufficient groove profile accuracy by direct ruling, are realized with this coating technique.     

Characteristics of short-period blazed fiber Bragg gratings for use as macro-bending sensors

The characteristics of short-period blazed fiber Bragg gratings for use as macro-bending sensors are discussed. This sensor is able to detect macro bending with the transmitted power variation of the first side mode in the blazed fiber Bragg grating. Since an incident ray experiences different variations of tilt angles with respect to bending direction, the blazed fiber Bragg grating has different coupling efficiencies of the first side mode, which can be reduced considerably in the case of twisted blazed fiber Bragg gratings.     

Convex grating types for concentric imaging spectrometers

The properties of convex gratings fabricated by electron-beam lithography are investigated. Three grating types are shown. The first is a single-panel, true blazed grating in which the blaze angle stays constant relative to the local surface normal. This grating provides high peak efficiencies of approximately 88% in the first order and 85% in the second order. The second grating has two concentric panels, with each panel blazed at a different angle. This type permits flexibility in matching the grating response to a desired form. The third type has a groove shape that departs from the sawtooth blazed profile to increase the second-order bandwidth. All these types are difficult or impossible to produce with conventional techniques. The gratings compare favorably with conventional (holographic and ruled) types in terms of efficiency and scatter. Simple scalar models are shown to predict the wavelength response accurately. These gratings allow the optical designer to realize fully the considerable advantages of concentric spectrometer forms.     

Laminar and blazed type holographic gratings for a versatile soft x-ray spectrograph attached to an electron microscope and their evaluation in the 50-200 eV range

Laminar and blazed type holographic varied-line-spacing spherical gratings for use in a versatile soft x-ray flat-field spectrograph attached to an electron microscope are designed, fabricated, and evaluated. The absolute diffraction efficiencies of laminar (or blazed) master and replica gratings at 86.00° incidence evaluated by synchrotron radiation show over 5% (or 8%) in the 50-200 eV range with the maxima of 22% (or 26%-27%). Also the resolving power evaluated by a laser produced plasma source is in excess of 700 at the energy near the K emission spectrum of lithium (~55 eV) for all gratings. Moreover, the K emission spectrum of metallic Li with high spectral resolution is successfully observed with the spectrograph attached to a transmission electron microscope.     

Recording of concave diffraction gratings in counterpropagating beams using meniscus blanks

The most technological way of recording blazed concave holographic gratings is by using the direct- and back-reflected beams. Usually plano-concave blanks are used for diffraction grating fabrication. To compensate the refraction at the plane back surface of the blank, one has to use additional elements or two-step recording mountings. Another solution is to use diffraction grating blanks having zero optical power. A number of gratings with different groove frequencies have been fabricated using concave—convex blanks. The theoretical investigation of the aberration properties of the recording mountings, and the experimental study of the grating properties are discussed. Using the CODE V program it is shown that a significant reduction in the aberration size of the virtual recording source can be achieved by optimization of the radius of curvature of the blank back surface. The experimental results confirm the possibility of achieving gratings that can be used in flat-field spectrometers with a limit of resolution of about 2–3 nm even in the case where an aberrated virtual recording source is used.     

改善MEMS闪耀光栅衍射效率的研究

研究了在硅材料上利用MEMS (Micro-Electro-Mechanical System)的各向异性腐蚀技术制备 闪耀光栅。采用氧化削尖工艺去除光栅制备过程中掩膜在闪耀面上留下的平台,得到一个连续的闪耀面;同时对闪耀面进行表面抛光,改善闪耀面的粗糙度,减小对入射光的散射。理论分析和实验测试证明,该工艺方法能够将MEMS闪耀光栅的衍射效率提高10%左右。     

Interleaved,sampled fiber Bragg gratings for use in hybrid wavelength references

We discuss the design and fabrication of interleaved, sampled fiber Bragg gratings (ISFBGs) for use in hybrid wavelength calibration references covering the 1300-1600-nm region. We demonstrate use of sampled phase masks (SPMs) to make sampled gratings and ISFBGs. The success of the SPM technique suggests a single-exposure method with an interleaved, sampled phase mask to make ISFBGs.