Heterostructures of metamorphic GaInAs photovoltaic converters fabricated by MOCVD on GaAs substrates

Heterostructures of metamorphic GaInAs photovoltaic converters (PVCs) are on GaAs substrates by the metal-organic chemical vapor deposition (MOCVD) method. It is shown that using a multilayer metamorphic buffer with a step of 2.5% in indium content and layer thicknesses of 120 nm provides the high quality of bulk layers subsequently grown on the buffer up to an indium content of 24%. PVCs with a long-wavelength photosensitivity edge up to 1300 nm and a quantum efficiency of ~80% in the spectral range 1050–1100 nm are fabricated. Analysis of the open-circuit voltage of the PVCs and diffusion lengths of minority carriers in the layers demonstrates that the density of misfit dislocations penetrating into the bulk layers increases at an indium content exceeding 10%.     

Extremely low noise InGaAs/InAlAs HEMT grown by MOCVD

MOCVD-grown InGaAs/InAlAs HEMTs with excellent noise performance comparable to that of MBE-grown devices have been successfully fabricated. A minimum noise figure lower than 0.30 dB has been obtained with an associated gain of approximately 15 dB at 12 GHz. Furthermore, devices in ceramic packages have exhibited a minimum noise figure of 0.42 dB.<>     

An improved inverted δ-doped GaAs/InGaAs pseudomorphicheterostructure grown by MOCVD

This letter demonstrates a novel GaAs/In_0.25Ga_0.75 As/GaAs pseudomorphic heterostructure with δ-doping on the buffer prepared by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The proposed device with a 1.5×80 μm² gate reveals an extrinsic transconductance as high as 250 (305) mS/mm and a saturation current density as high as 790 (890) mA/mm at 300 (77) K. Significantly improvements on forward gate voltage swing (up to 3 V) and on reverse leakage current (smaller than 10 μA/mm at -6.5 V) are demonstrated due to inverted parallel conduction (IPC) effect. We also carried out secondary-ion mass spectrometry (SIMS) profiles to confirm the quality of the proposed device     

Ion beam mixing characteristics of MOCVD grown InGaAs/GaAs superlattices

The ion beam mixing behavior of InGaAs/GaAs strained layer superlattice structures grown by metalorganic chemical vapor deposition was studied using secondary ion mass spectroscopy and Rutherford backscattering channeling. The fluence dependence of intermixing by MeV Kr⁺ irradiation has been investigated. Significant intermixing occurs for fluences much lower than for similar intermixing in other superlattice systems (i.e. ALAs/GaAs). The intermixing exhibits no temperature dependence for fluences of 2 x 10¹⁵ to 5 x 10¹⁵ cm⁻² which sharply contrasts with the behavior of the AlAs/GaAs superlattice system which shows a strong temperature dependence, including a miscibility gap, in the temperature range 523 to 973K. Samples irradiated at 573K retain a high degree of crystallinity when compared to lower temperature irradiations indicating that the InGaAs/GaAs superlattice can be disordered and still retain crystallinity.     

Alloy broadening effect on optical properties of InGaAs grown by MOCVD with TMAs precursor

We investigate the MOCVD growth characteristic of the In_0.47Ga_0.53As layers lattice matched to InP using TMAs as an alternative source of arsine. Improvement of the InGaAs quality was studied by means of PL lines, the origin of photoluminescence (PL), atomic force microscopy. Low temperature PL spectra exhibit a broad this broadening was analyzed using quantitative models for the linewidth of band exciton based on compositional fluctuations within the crystal volume. This statistical fluctuation of the composition affects not only the PL line width but also structural properties of the InGaAs epilayer. Furthermore, by increasing V/III ratio, a degradation of the InGaAs optical and structural quality was observed.     

InGaAs photodiodes prepared by low-pressure MOCVD

InGaAs/InP double-heterostructure PIN photodiodes are demonstrated using the low-pressure MOCVD growth technique. Several types of detectors are reported, ranging from small-area ones suitable for PINFET implementation to broad-area general-purpose devices for both long- and short-wavelength applications. These diodes have performances equivalent to those obtained when using conventional growth techniques.     

InP衬底上InAlAs异变缓冲层和高铟组分InGaAs的生长温度优化

利用气态源分子束外延技术在InP衬底上生长了包含InAlAs异变缓冲层的In0.83Ga0.17As外延层.使用不同生长温度方案生长的高铟InGaAs和InAlAs异变缓冲层的特性分别通过高分辨X射线衍射倒易空间图、原子力显微镜、光致发光和霍尔等测量手段进行了表征.结果表明, InAlAs异变缓冲层的生长温度越低, X射线衍射倒易空间图 (004) 反射面沿Qx方向的衍射峰半峰宽就越宽, 外延层和衬底之间的倾角就越大, 同时样品表面粗糙度越高.这意味着材料的缺陷增加, 弛豫不充分.对于生长在具有相同生长温度的InAlAs异变缓冲层上的In0.83Ga0.17As外延层, 采用较高的生长温度时, X射线衍射倒易空间图 (004) 反射面沿Qx方向的衍射峰半峰宽较小, 77K下有更强的光致发光, 但是表面粗糙度会有所增加.这说明生长温度提高后, 材料中的缺陷得到抑制.     

In-situ monitoring and control for MOCVD growth of AlGaAs and InGaAs

We have used spectroscopic ellipsometry to perform real-time monitoring during metalorganic chemical vapor deposition growth of AlGaAs (on GaAs) and InGaAs (on GaAs and InP). Optical constants for these materials were obtained up to growth temperatures of 600 to 700°C. This information permits real-time extraction of composition and layer thickness from the raw ellipsometric data at sample rates on the order of 0.5 Hz. We describe closed-loop control of composition and total layer thickness on AlGaAs-based structures, including Bragg reflectors. In-situ data obtained on double-heterostructure quantum-well laser structures demonstrate that spectroscopic ellipsometry is an extremely powerful monitoring and quality-control tool, giving important real-time information on complex structures that would be difficult and time-consuming to obtain after growth.     

Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD

The stresses, structural and electrical properties of n-type Si-doped GaN films grown by metalorganic chemical vapor deposition (MOCVD) are systemically studied. It is suggested that the main stress relaxation is induced by bending dislocations in low doping samples. But for higher doping samples, as the Si doping concentration increases, the in-plane stresses in the grown films are quickly relaxed due to the rapid increase of the edge dislocation densities. Hall effect measurements reveal that the carrier mobility first increases rapidly and then decreases with increasing Si doping concentration. This phenomenon is attributed to the interaction between various scattering process. It is suggested that the dominant scattering process is defect scattering for low doping samples and ionized impurity scattering for high doping samples.     

金属有机物化学气相淀积法生长的Si掺杂GaN薄膜的应力，结构与电学特性研究

The stresses, structural and electrical properties of n-type Si-doped GaN films grown by metaiorganic chemical vapor deposition （MOCVD） are systemically studied. It is suggested that the main stress relaxation is induced by bending dislocations in low doping samples. But for higher doping samples, as the Si doping concentration increases, the in-plane stresses in the grown films are quickly relaxed due to the rapid increase of the edge dislocation densities. Hall effect measurements reveal that the carrier mobility first increases rapidly and then decreases with increasing Si doping concentration. This phenomenon is attributed to the interaction between various scattering process. It is suggested that the dominant scattering process is defect scattering for low doping samples and ionized impurity scattering for high doping samples.     

Exciton electroabsorption at room temperature in InGaAs/InP multiquantum-well structures grown by atmospheric-pressure MOCVD

Sharp excitonic absorption features have been observed in MOCVD-grown InGaAs/InP multiquantum-well structures via a study of the spectral dependence of the photocurrent characteristics of a PIN diode containing the multiquantum wells in the intrinsic region. The first observation of a shift of excitonic peak wavelength with an applied electric field is reported for this material system.     

Investigation of the blueshift in electroluminescence spectra from MOCVD grown InGaAs quantum dots

The electroluminescence of a quantum-dot (QD) laser diode was found to blueshift as the injection current is increased. The carrier distribution within the QD layers was modeled and the Stark shift, measured from photocurrent, was used to explain the large blueshift seen in the electroluminescence. The built-in electric dipole was found to be dependant on growth conditions.     

Morphology and growth mechanism of aligned ZnO nanorods grown by catalyst-free MOCVD

We report on ZnO nanorods grown by catalyst-free metal-organic chemical vapour deposition (MOCVD) in a commercial Epigress reactor using diethylzinc and N₂O as precursors. Well-aligned ZnO nanorods with uniform diameter, length and density have been grown perpendicularly to the sapphire (0 0 0 1) surface. Scanning electron microscopy (SEM) has been used to observe the morphology of the ZnO nanorods and X-ray diffraction and transmission electron microscopy (TEM) to investigate the crystalline structure of the nanorods. TEM observation as well as photoluminescence measurements confirm the very good crystalline quality of the nanorods. SEM observation on samples that have been prepared with various deposition times has been used in order to investigate the growth mechanism. Three types of ZnO morphologies have been identified: a thin two-dimensional ZnO layer formed at the sapphire surface, covered by three-dimensional hexagonal-shaped islands and hexagonal nanorods on top of them.     

Enhanced resonant tunneling real-space transfer in δ-dopedGaAs/InGaAs gated dual-channel transistors grown by MOCVD

We report the observation of pronounced N-shaped negative differential resistance (NDR) and negative transconductance at high drain and gate fields in δ-doped GaAs/InGaAs gated dual-channel transistors (DCTs) by tunneling real-space transfer (TRST). By virtue of varying the sheet density of the δ-doping layer as well as the thickness of the GaAs barrier, pronounced multiple-state NDR characteristics were obtained accompanying the gate current characteristic at room temperature. A peak-to-valley current ratio (PVR) of 15 was obtained which, to our knowledge, is the highest among the reported TRST devices at room temperature. The proposed devices possess potential advantages of ease of growth and fabrication     

Quantum cascade lasers grown by MOCVD

Sharing the advantages of high optical power, high efficiency and design flexibility in a compact size, quantum cascade lasers(QCLs) are excellent mid-to-far infrared laser sources for gas sensing, infrared spectroscopic, medical diagnosis, and defense applications. Metalorganic chemical vapor deposition(MOCVD) is an important technology for growing high quality semiconductor materials, and has achieved great success in the semiconductor industry due to its advantages of high efficiency, short m...     

GaN的低压MOCVD生长模型

用停滞边界层理论分析了低压 MOCVD外延 Ga N的生长模型。通过优化反应室结构和工艺条件 ,成功生长了厚度均匀、晶体质量优良的 Ga N外延层     

Surface photoabsorption monitoring of the growth of GaAs and InGaAs at 650°C by MOCVD

By monitoring the cyclic behavior of surface photoabsorption (SPA) reflectance changes during the growth of GaAs at 650°C and with sufficient H₂ purging time between the supply of trimethylgallium and AsH₃, we have been able to achieve controlled growth of GaAs down to a monolayer. Our results show, as confirmed by photoluminescence (PL) measurements, the possibility of growing highly accurate quantum well heterostructures by metalorganic chemical vapor deposition at conventional growth temperatures. We also present our PL measurements on the InGaAs single quantum wells grown at this temperature by monitoring the SPA signal.     

InGaAs/InP材料的MOCVD生长研究

研究了InGaAs/InP材料的MOCVD生长技术和材料的性能特征。InP衬底的晶向偏角能够明显影响外延生长模型以及外延层的表面形貌,用原子力显微镜(AFM)观察到了外延层表面原子台阶的聚集现象(step-bunching现象),通过晶体表面的原子台阶密度和二维生长模型解释了台阶聚集现象的形成。对外延材料进行化学腐蚀,通过双晶X射线衍射(DCXRD)分析发现异质结界面存在应力,用异质结界面岛状InAs富集解释了应力的产生。通过严格控制InGaAs材料的晶格匹配,并优化MOCVD外延生长工艺,制备出厚层InGaAs外延材料,获得了低于1×1015cm-3的背景载流子浓度和良好的晶体质量。     

Passivation of carbon acceptors during growth of carbon-doped GaAs,InGaAs, and HBTs by MOCVD

Carbon dopedp-type GaAs and In_0.53Ga_0.47As epitaxial layers have been grown by low-pressure metalorganic chemical vapor deposition using CC1₄ as the carbon source. Low-temperature post-growth annealing resulted in a significant increase in the hole concentration for both GaAs and In_0.53Ga_0.47As, especially at high doping levels. The most heavily doped GaAs sample had a hole concentration of 3.6 × 10²⁰ cm⁻³ after a 5 minute anneal at ≈400° C in N₂, while the hole concentration in In_0.53Ga_0.47As reached 1.6 × 10¹⁹ cm⁻³ after annealing. This annealing behavior is attributed to hydrogen passivation of carbon acceptors. Post-growth cool-down in an AsH₃/H₂ ambient was found to be the most important factor affecting the degree of passivation for single, uncapped GaAs layers. No evidence of passivation is observed in the base region of InGaP/GaAs HBTs grown at ≈625° C. The effect ofn-type cap layers and cool-down sequence on passivation of C-doped InGaAs grown at ≈525° C shows that hydrogen can come from AsH₃, PH₃, or H₂, and can be incorporated during growth and during the post-growth cool-down. In the case of InP/InGaAs HBTs, significant passivation was found to occur in the C-doped base region.