沉积角度对MgO介质保护膜性能的影响

由于介质保护膜的特性极大地影响交流等离子体显示器(AC-PDP)的寿命、功耗和显示质量,所以研究介质保护膜的制备工艺是十分重要的。本文利用电子束加热蒸镀法,在不同沉积角度下制备了MgO介质保护膜和宏单元气体放电屏。利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)对制备的介质保护膜样品的微观结构和表面特征进行了表征,并且,利用宏单元气体放电实验屏研究了介质保护膜的气体放电特性。结果表明:在沉积角度为15°下制备的MgO介质保护膜,薄膜的着火电压最低,晶粒最大,并且结晶取向最强。     

The enhancement of wear properties of compressor oil using MoS2 nano-additives

MoS₂ nanoparticles have been considered valuable materials in lubricating applications due to their layered morphology. This work synthesized spherical MoS₂ nanoparticles that held many nanosheets through the hydrothermal method. The thickness of these sheets is between 10 and 25 nm, and their length is estimated to be about 200 nm. The effect of nanoparticles concentration on wear properties was investigated in this research. The four-ball test measured the wear performance of nano lubricants. The results showed that all nano lubricants had better wear performance than the base lubricant (Behran Compressor 68). However, molybdenum disulfide nanoparticles synthesized as nanosheets with a thickness of 10 nm had the best performance. At a concentration of only 0.05 wt-%, the resulting nano lubricant reduced the wear width and friction coefficient by about 50%. The thermal conductivity coefficient results also showed that nanoparticles increased this coefficient. As the lubricant temperature increases, the difference between the nano and base lubricant's thermal conductivity increases.     

离子镀 Ti-N 涂层界面结构的电镜研究

采用透射电镜及 μ-μ-Diff.技术,通过对平行和垂直基体表面薄膜试样的观察,确定了离子镀 Ti-N 涂层中 α-Fe 基材—α-Ti 底层及 α-Ti 底层—TiN 层之间 FeTi、Ti_2N 界面相的存在。进一步的 μ-μ-Diff.分析,得到了α-Fe-FeTi、FeTi-α-Ti、α-Ti-Ti_2N、Ti_2N-TiN 各相间的取向关系。并由此推断了涂层相界的原子排列结构。最后,简单地讨论了界面相的形成机制及其对界面结合强度的作用。     

Effects of temperature and ion-to-atom ratio on the orientation of IBAD MoS2 coatings

MoS₂ coatings, 55–800 nm thick, were grown by ion-beam-assisted deposition (IBAD) using different ion-to-atom ratios and deposition temperatures. Crystallinity and orientation of the IBAD MoS₂ coatings were determined by X-ray diffraction (XRD). Only XRD peaks corresponding to (00l), (hk0), and amorphous MoS₂, and a previously unreported low-2Θ peak (2Θ ≈ 10.7 °) were observed. The basal (002) peak intensities varied primarily with ion-to-atom ratio; the greatest basal intensity occurred when the ion-to-atom ratio produced about 1 displacement per atom. Although a secondary factor in basal intensity, deposition temperature was the primary factor in edge (100) intensity. Edge intensity increased with increasing temperature; it appears that the increases are due to annealing of randomly-oriented MoS₂, which converts to edge orientation. The origin of the low-2Θ peak is unknown, but appears to be associated with the basal planes of MoS₂.     

Effective shape-controlled growth of monolayer MoS2 flakes by powder-based chemical vapor deposition

In the recent years, transition-metal dichalcogenides such as MoS₂ have attracted considerable attention owing to their unique structure and electronic properties. Chemical vapor deposition (CVD) is a popular method for producing MoS₂ flakes with different shapes. Here, we report an effective method for achieving a broad range of shape evolution in CVD-grown monolayer MoS₂ flakes. By controlling the S and MoO₃ temperatures, the shape of the monolayer MoS₂ flakes was varied from hexagonal to triangular via intermediate shapes such as truncated and multi-apex triangles. The shape evolution of the MoS₂ flakes can be explained by introducing the term “nominal Mo:S ratio”, which refers to the amount of loaded MoO₃ and evaporated S powders. By using the nominal Mo:S ratio, we predicted the potential reaction atmosphere and effectively controlled the actual proportion of MoO_3−x with respect to S in the growth region, along with the growth temperature. From the systematic investigation of the behavior of the shape evolution, we developed a shape-evolution diagram, which can be used as a practical guide for producing CVD-grown MoS₂ flakes with desired shapes.

     

生长温度对CVD金刚石薄膜的影响

系统研究了ＣＶＤ金刚石薄膜成膜过程中生长温度对薄膜质量、生长率和力学性能的影响。研究结果表明：在典型沉积条件下，生长温度愈高、薄膜的晶体质量愈好；但薄膜的应力状况和附着性能变坏；在８００℃时，金刚石薄膜的生长速率最大。讨论了ＣＶＤ金刚石薄膜作为机械工具涂层的最佳生长温度。     

等离子体聚合工艺对聚合沉积速率的影响

利用等离子体聚合的方法对两种有机单体(正丙醇和丙烯醇)进行了等离子体聚合,成功地在Si基体上沉积了高分子薄膜.利用XPS研究了薄膜的结构和不同工艺对沉积速度的影响.研究表明,随着功率的增加或工作气压的增加,沉积速率增加;偏压的增加使等离子体聚合的沉积速率减小.研究还发现,丙烯醇含有双键结构,其沉积速率比正丙醇大.     

热压工艺对Ni—MoS2自润滑复合材料组织与性能的影响

采用热压法制备了具有不同ＭｏＳ２含量的Ｎｉ－ＭｏＳ２自润滑复合材料。研究了热压工艺对复合致密度硬度，显微组织和自润滑性能的影响。结果表明，适当提高热压温度和坟压力有助于提高复合材料的硬度和自润滑性能。     

沉积条件对CVD-SiC沉积热力学与形貌的影响

以CH3SiCl3为源物质，H2为载气，Ar气为稀释气体，研究了沉积温度和沉积气氛压力对SiC沉积形貌的影响。应用晶体成核－长大理论和SiC沉积热力学理论，解释了SiC沉积的各种形貌。研究表明：降低系统压力和提高沉积温度，能减小SiC在气相中形核所需的最大能量，促进形核。SiC沉积热力学随沉积条件的改变决定了SiC沉积形貌的改变。     

Simulation of Particle Deposition Behavior in Cold-Sprayed Mg Anticorrosion Coating

In this work, finite-element analysis method is adopted to simulate Al particle deposition behavior on Mg substrate by cold spray. The effects of particle parameters such as incident velocities and angles, particle sizes, and number and types of incident particles on impacting character are analyzed. The particle energy, effective plastic strain, and its temperature distribution are discussed. Results reveal that increasing the particle incident velocity can intensify the deformation of both particle and substrate. The bonding will also be strengthened. Incident angles will also affect the bonding between particles and substrate. In multiple particle deposition process, the compaction effect of subsequent particles can promote the deformation of former particles and its bonding with substrate. Temperature distribution and the effective plastic strain distribution are consistent: temperature is higher in the area where the plastic deformation and stress is higher. Local melting may occur in that area at high temperature.     

沉积速率及相关工艺条件对直流反应磁控溅射制备TiO2薄膜性质的影响

在玻璃基板上用直流反应磁控溅射钛靶的方法制备TiO2 薄膜。在溅射总气压为 0 4Pa ,氧氩比分别为 1∶9,1∶5及 1∶3 2的情况下 ,调节溅射功率使沉积速率由 0 99nm/min变化到 12 12nm/min ,而且当基板温度为 34 0℃时 ,薄膜在可见光范围内的平均折射率基本不变 ,为 2 48± 0 0 3,而薄膜的表面形貌却有明显变化。XRD表明 ,在pO2 /pAr为 1∶9的条件下 ,薄膜中出现了TiOx(x <2 )的晶粒 ,但这对薄膜的光学性质并无影响。另外对TiO2 薄膜用于多层光学薄膜也作了初步试验及讨论     

沉积条件和表面改性对磁控溅射法制备TiO2薄膜性能的影响

TiO2薄膜具有许多独特的性能，作为一种令人满意的材料被应用于诸多领域。磁控溅射作为制备这种多功能薄膜的一种主要方法，也越来越引起人们的关注。TiO2薄膜的结构和性能是由沉积条件决定的。通过改变沉积速度、溅射气体、靶温度、退火过程以及采用其它溅射技术，可以得到金红石、锐钛矿或是非晶的TiO2膜，同时具有不同的光催化、光学及电学性能，能够满足不同应用领域的需要。同时，表面改性可以克服TiO2薄膜的应用局限性，使之具有更佳的使用性能。     

离子束增强沉积工艺参数对Cr-N膜层组织结构的影响

利用离子束增强沉积技术, 在 Ｓｉ （１１１） 和 Ｇ Ｃｒ１５ 轴承钢基体上沉积 Ｃｒ Ｎ 镀层研究氮分压、 Ｎ^＋ ＋ Ｎ^＋_２ 离子轰击能量和 Ｎｉｏｎｓ Ｃｒ ａｔｏｍｓ 到达比对镀层组织结构的影响结果表明, Ｃｒ- Ｎ 镀层组织对氮分压敏感, 随着氮分压的增加, 镀层中 Ｃｒ Ｎ 组份增加, 金属 Ｃｒ 及 Ｃｒ_２ Ｎ 组份减少; 随着氮离子轰击能量的增加, Ｃｒ- Ｎ 镀层中 Ｃｒ Ｎ （２００） 择优生长; 但当 Ｎ ｉｏｎｓ/Ｃｒ ａｔｏｍｓ 比从１４５ ×１０ ^{－ ２} 增至５.８７ ×１０ ^{－ ２} 时, 镀层中 Ｃｒ Ｎ 组份非但没有增多, 反而使镀层中的 Ｃｒ 以 Ｃｒ_２ Ｏ_３ 形态存在.     

热处理温度对溶胶-凝胶法制备ZnO薄膜晶体结构和发光特性的影响

采用溶胶-凝胶(Sol-Gel)旋涂法在Si(100)衬底上制备ZnO薄膜,利用X射线衍射(XRD)、光致发光谱(PL)、扫描电子显微镜(SEM)等手段分析制得的ZnO薄膜的晶体结构和发光特性。着重考察了热分解温度对ZnO薄膜晶体结构和发光特性的影响。结果表明,溶胶-凝胶旋涂法制备的ZnO薄膜样品厚度约为220nm,属六方纤锌矿结构,其c轴取向度与热分解温度有很大关系;ZnO薄膜在室温下均有较强的紫外带边发射峰,且紫外带边发射峰与样品c轴取向度没有直接关系,与缺陷有关的可见发射带很弱。