荷能离子束沉积的氧化物膜光学性质

报道在不加热的基底上,由双离子束溅射或离子辅助的电子束蒸发技术制的ＺｒＯ２和ＴｉＯ２单摹光学性质,并提供卫工艺参数和离子束设备的说情。这两种荷 能离子束工艺已被用于光学多层膜,如减反射膜和短波通滤光片的制备     

用离子束溅射法制备长波段X射线多层膜

叙述了用离子束溅射镀膜机ＯＸＦＯＲＤ进行Ｘ射线长波段多层膜实验及制备Ｘ射线多层膜光学元件方面的工作。简述离子束溅射镀膜机的工作原理,Ｘ射线多层膜的制备过程,主要工艺参数,以及用Ｘ射线小角衍射仪对制备样品周期结构的检测和用软Ｘ射线反射率计测反射率的部分结果。     

用离子束溅射法制备长波段X射线多层膜

叙述了用离子束溅射镀膜机ＯＸＦＯＲＤ进行Ｘ射线长波段多层实验及制备Ｘ躬一多层膜光学元件方面的工作。简述离子束溅射镀膜机的工作原理,Ｘ射线多摹制备过程,主要工艺参数,以及用Ｘ射线小角衍射仪对制备样品周期结构的检测和用软Ｘ射线反射率计测反射率的部分结果。     

大尺寸衍射光学元件的扫描离子束刻蚀

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展。针对自行研制的KZ-400离子束刻蚀装置,提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性,目前在450mm尺寸内的刻蚀深度均匀性最高可达±1%。建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统,实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制,提高了元件离子束刻蚀工艺的成功率。利用上述技术,成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件。     

Ion beam etching of large aperture diffractive optical elements

总结了大尺寸衍射光学元件离子束刻蚀技术的研究进展.针对自行研制的KZ-400离子束刻蚀装置,提出了组合石墨束阑结构和多位置分步刻蚀策略来提高离子束刻蚀深度的均匀性,目前在450 mm尺寸内的刻蚀深度均匀性最高可达±1％.建立了针对多层介质膜光栅的衍射强度一维空间分布在线检测系统以及用于透射衍射光学元件离子束刻蚀深度的等厚干涉在线检测系统,实现了对大尺寸衍射光学元件离子束刻蚀终点的定量、科学控制,提高了元件离子束刻蚀工艺的成功率.利用上述技术,成功研制出一系列尺寸的多层介质膜光栅、光束采样光栅、色分离光栅以及同步辐射光栅等多种衍射光学元件.     

用离子束溅射法制备X射线多层膜的实验和工艺

叙述了用离子束溅射镀膜机进行X射线波段多层膜镀膜实验及制备X射线多层膜光学元件方面的工作,简述离子束溅射镀膜机的工作原理,X射线多层膜的制备过程,主要工艺参数及注意事项,以及用X射线小角衍射仪对制备样品进行检测的部分结果。     

用离子束溅射法制备X射线多层膜的实验和工艺

叙述了用离子束溅射镀膜机进行X射线波段多层膜镀膜实验及制备X射线多层膜光学元件方面的工作，简述离子束溅射镀膜机的工作原理，X射线多层膜的制备过程，主要工艺参数及注意事项，以及用X射线小角衍射仪对制备样品进行检测的部分结果。     

束流参数对光学镜面离子束加工去除函数的影响分析

在离子束光学镜面修形加工中,束函数的形状和大小决定了加工的修形能力和加工效率.虽然束函数的形状和大小可以通过一组工艺参数进行调节,然而,这组工艺参数对束函数影响的理论计算较为复杂,而且理论计算值与实验值也吻合的通常存在差异.为了找出工艺参数对束函数的影响规律,本文通过实验研究了离子束的几个主要的工艺参数(屏栅电压、屏栅电流、加速栅电压、中和极功率、氩气流量)对束函数的影响规律,建立了光学镜面离子束加工基本工艺参数数据库,为光学镜而离子束修形加工的工艺参数选择提供了指导依据.     

热处理对SiO2—ZrO2两层减反射膜的影响

文章指出了ＳｉＯ２－ＺｒＯ２两层减反射膜经过热处理后光学性能发生变化的规律，并对之进行了分析研究，从而应用到实践中解决了生产中出现的问题。     

双离子束溅射技术制备带通滤光片

研究了采用双离子束溅射沉积技术、以沉积时间作为膜厚控制手段制备带通滤光片的工艺。简要介绍了离子束溅射系统的基本工作原理和膜厚控制技术,描述了分别在K9玻璃和有色玻璃上制备由多层Ta2O5和SiO2薄膜组成的滤光片以及短波通和长波通的工艺过程,最后测试并分析了由短波通和长波通组成带通滤光片的光学性能。实验结果表明,采用双离子束溅射技术,以沉积时间作为膜厚监控手段能够制备出具有优良光性能并满足应用设计要求的带通滤光片。     

Ultrastructural comparison of ion beam and radiofrequency plasma etching effects on biological tissue sections

Three dry etching techniques (Ar+ ion beam, O₂+ ion beam, O₂ radiofrequency electrodeless discharge) were compared with respect to preferential etching and damage to the ultrastructure of glutaraldehyde-fixed Epon-embedded frog skeletal muscle sections. SEM and TEM studies were performed on both unstained and stained (osmium tetroxide, uranyl acetate) sections. Etching effects were observed to differ for the various ion beam or plasma etching techniques. Whereas selective retention of electron dense structures (e.g. Z lines, nuclear heterochromatin) was observed for oxygen plasma etching, preferential etching of these components was observed using O₂+ ion beam bombardment. Selectively etched Z lines and etch-resistant nucleoli were observed for both reactive (O₂+) and inert (Ar+) ion beam sputtering after sufficiently high ion doses. The above suggest that selective etching under keV ion beam irradiation is related more to physical sputtering processes (momentum transfer) than to the chemical reactivity of the incident ion. Heavy metal post-fixation and staining had no qualitative effect on the nature of the selective etching phenomena. The above findings are significant in that they potentially influence both electron and ion microprobe measurements of etched biological specimens.     

A novel technique for the preparation of thin films for cross-sectional transmission electron microscopy

A method is described for the preparation of cross-sectional samples of thin films for transmission electron microscopy. The technique produces larger amounts of thin region as compared with ion milling and eliminates the problems associated with ion beam damage. The requirement is that the films or multilayers must initially be deposited on a water-soluble substrate such as single-crystal NaCl.     

离子束辅助真空电弧沉积Zr-Ni-N薄膜的研究

采用多弧离子镀技术在高速钢和单晶硅基体上制备Zr-Ni-N复合薄膜,研究了低能氮离子束对Zr-Ni-N涂层结构、表面形貌和硬度的影响。研究表明:用低能氮离子束辅助真空电弧沉积Zr-Ni-N膜,ZrN结构在(111)晶面出现一定的择优取向,并对Zr-Ni-N膜层有一定的强化作用,膜层表现出较高的显微硬度。     

Study on the sensitive element of ion beam etching depth

In this paper, a sensitive element of ion beam etching depth is studied and a formula is obtained. Experimental results show that the relative error of etching depth is smaller than 0.98%. This has a practical significance to ion beam micro-fabrication.     

Matrix based algorithm for ion-beam figuring of optical elements

An algorithm for solving the problem of local shape errors of optical surfaces correcting by a small-sized ion beam, based on the matrix representation is presented. The algorithm involves searching for points that rise relative to the average height on the surface, where exposure to an ion beam of a given shape will lead to a decrease in the RMS deviation of the surface shape from the calculated one. It is shown that the new approach makes it possible to significantly expand the range of spatial frequencies, in which the height of relief can be reduced using the given ion beam size, and provides better results than the method of minimizing the functional of convolution of the ion beam and the surface map. Moreover, the new approach does not lead to appearance of shape errors (concentric structure) defined by the ion beam size and scanning step. An experiment for minimizing of local surface shape errors based on an etching map calculated using new approach was done. Matrix algorithm allowed in one procedure to reduce surface shape errors for a concave spherical optical element made of fused silica with a diameter D = 100 mm and a radius of curvature R = −137.5 mm in the RMS by more than 3 times. The initial RMS was 4.5 nm, RMS after treatment is 1.36 nm.     

Effect of disk roughness and carbon impact energy on corrosion protection of magnetic recording films

Hard disks with different roughness levels have been coated with hydrogenated and/or nitrogenated carbon using magnetron sputtering and plasma beam based carbon guns. The plasma beam is generated by means of the self bias effect of an asymmetric, magnetically enhanced rf glow discharge. Acetylene is used in the sub-μbar pressure range. The ion impact energy was approx. 190 eV/carbon atom, as opposed to typically <10 eV for the sputtered atoms. Hard disks have been coated with 2–10 nm a-C:H. They were subjected to a hot–wet environment for 4 days. The corrosion was measured by the cobalt extraction test. For either mode of deposition it was confirmed that disk surface roughness considerably affects the corrosion protection achieved by the respective carbon top coat. Plasma beam deposition yielded a better corrosion protection than sputtering.     

Microstructure and Wear Properties Analysis of TiAlN Film Deposited on Cam Profile Using Ion Sputtering

In this study ion beam sputtering deposition was used as a new surface formation technology for strengthening cam surface during the manufacturing process of indexing cam mechanism. Phase exchanging deformation can be avoided in this manufacturing process. Compared to surface quenching processes, the shape accuracy and dimension accuracy can be improved using this method. The microstructure and properties of TiAlN composite film deposited on the profile surface of a cam (made of AISI 1045 steel) by ion beam sputtering deposition were discussed. The microstructural characterizations were analyzed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). It is shown that the fundamental Bragg peak of {111} in TiAlN coatings increased with a bias voltage reduction. The grain size is about 1 μm. The friction coefficient was tested by a rotating wear tester at different loads and speeds. The minimum friction coefficient can be achieved at 0.187.     

微透镜阵列的离子束溅射刻蚀研究

利用扫描电子显微镜(SEM)和表面探针测试,分析了采用离子束溅射刻蚀技术制作的石英微透镜阵列器件的表面微观形貌,讨论了引起微透镜表面缺陷的原因及所采取的改善表面形貌的措施,研究了采用不同层次的光致抗蚀剂微透镜图形的固化技术后,经离子束溅射刻蚀制作出的微透镜阵列器件的表面形貌差异,定性给出了表面探针测试的适用范围,此外还介绍了对所制样品所做的几项主要的处理操作。     

Microstructure and wear resistance of thermal sprayed steel coatings ion beam implanted with nitrogen

In the present study, the high-current-density nitrogen ion implantation technique is applied to enhance mechanical properties of thermal sprayed steel coatings. XRD measurements and optical microscopy of ion implanted coatings show clearly the presence of nitrogen solid solutions and precipitates of new phases in the surface layers of coatings. Phases formed are controlled by the temperature of ion beam processing, initial chemical composition and microstructure of coatings. Wear tests demonstrate that properly selected parameters of ion implantation dramatically improve wear and score-resistance of coatings. The influence of the microstructure and phase composition of nitrogen ion implanted layers on tribological properties is discussed.