焦耳热效应引发的晶须生长机理研究

研究了Cu/Sn3.8Ag0.7Cu/Cu一维焊点在电流密度为5×103 A/cm2、环境温度为100℃作用下晶须的生长机理。研究结果表明,通电300 h后,在Cu/Sn3.8Ag0.7Cu/Cu焊点的阳极界面出现了一些小丘,而在焊点的阴极出现了一些裂纹;通电500 h后,焊点阴极界面的裂纹进一步扩展,而且在裂纹处发现了大量纤维状Sn晶须,其长度超过10μm;继续通电达到700 h后,Sn晶须的数量没有增加,同时停止生长。由于电迁移的作用,金属原子在电子风力的作用下由焊点的阴极向阳极进行了扩散迁移,进而在阴极处形成裂纹。随着裂纹逐渐扩展,导致该区域处的电流密度急剧增大,焦耳热聚集效应明显,为了释放应力,形成了纤维状的晶须。     

SnAgCu焊点电迁移诱发IMC阴极异常堆积

为了研究电迁移过程中焊点与焊盘界面金属问化合物(IMC)的变化,在28℃下,对无铅Sn3.0Ag0.5Cu焊点进行了6.5A直流电下的电迁移实验.结果发现,通电144h后,阳极侧IMC层变厚,平均达到10.12 μm;阴极侧IMC层大部分区域变薄至0.86μm,局部出现Cu焊盘的溶解消失,但在界面边缘处出现Cu3Sn5...     

典型Sn基焊料凸点互连结构电迁移异同性

研究了Sn37Pb,Sn3.0Ag0.5Cu和Sn0.7Cu三种焊料BGA焊点在电迁移作用下界面的微观组织结构.在60℃,1×103 A/cm2电流密度条件下通电187h后,Sn37 Pb焊点阴极界面已经出现了空洞,同时在阳极有Pb的富集带;Sn3.0Ag0.5Cu焊点的阴极界面Cu基体大量溶解,阳极金属间化合物层明显比阴极厚;对于Sn0.7Cu焊料,仅发现阳极金属间化合物层厚度比阴极厚,阴极Cu基体的溶解不如SnAgCu明显,电迁移破坏明显滞后.     

典型Sn基焊料凸点互连结构电迁移异同性

研究了Sn37Pb,Sn3.0Ag0.5Cu和Sn0.7Cu三种焊料BGA焊点在电迁移作用下界面的微观组织结构.在60℃,1×103 A/cm2电流密度条件下通电187h后,Sn37 Pb焊点阴极界面已经出现了空洞,同时在阳极有Pb的富集带;Sn3.0Ag0.5Cu焊点的阴极界面Cu基体大量溶解,阳极金属间化合物层明显比阴极厚;对于Sn0.7Cu焊料,仅发现阳极金属间化合物层厚度比阴极厚,阴极Cu基体的溶解不如SnAgCu明显,电迁移破坏明显滞后.     

电流密度对电-热耦合下微焊点界面形貌的影响北大核心CSCD

针对电子封装器件中Cu/焊料/Ni焊点结构的电-热耦合效应问题,通过回流焊工艺制备Cu/Sn3.0Ag0.5Cu-0.01BP/Ni微焊点,在焊点电-热耦合实验平台上进行了四种电流密度下的热电应力实验。采用SEM和EDS研究了电流密度对电-热耦合下微焊点界面形貌的影响,探讨了阴极和阳极两侧电迁移行为以及IMC层生长机制。结果表明,当电子从阴极Cu端流向阳极Ni端时,在电子流的作用下Cu原子的移动速度加快,并阻碍阳极界面Ni原子流向Cu端。单纯热时效状态下,阳极和阴极界面厚度增长缓慢,而高电流密度下则快速增厚。无电流时,阳极端生成(Cu_(x),Ni_(y))_(6)Sn_(5)的驱动力来源于Cu、Ni两端之间的温度梯度和浓度梯度;当电-热耦合产生效应时,相对于温度梯度和浓度梯度,电流应力逐步起主导作用,改变了阴极和阳极界面IMC层的主生长机制。     

Sb掺杂对SnAgCu无铅焊点电迁移可靠性的影响

向Sn3.8Ag0.7Cu无铅焊膏中添加质量分数为1%的Sb金属粉末,研究了其焊点在电流密度为0.34×104A/cm2、环境温度150℃下的电迁移行为。通电245h后,阴极处钎料基体与Cu6Sn5IMC之间出现一条平均宽度为16.9μm的裂纹,阳极界面出现凸起带,钎料基体内部也产生了裂纹。结果表明:1%Sb的添加使焊点形成了SnSb脆性相,在高电流密度和高温环境下产生裂纹,缩短了焊点寿命,降低了电迁移可靠性。     

SnAgCu无铅焊点的电迁移行为研究

电迁移引发的焊点失效已经成为当今高集成度电子封装中的最严重的可靠性问题之一。应用SnAgCu无铅焊膏焊接微米级铜线,进行电迁移实验。结果表明:焊点形貌从原来的光滑平整变得凹凸不平,阴极处出现了裂纹和孔洞,并且在铜基板和Cu6Sn5金属间化合物(IMC)之间出现薄薄的一层Cu3Sn金属间化合物,由ImageJ软件测量其平均厚度约为2.11μm;而在阳极附近没有明显的Cu3Sn金属间化合物形成。     

Ni颗粒对SnBi焊点电迁移的抑制作用

为抑制芯片中微小焊点的电迁移,向共晶SnBi钎料中添加微米级Ni颗粒,并在φ0.5mm铜线接头上形成焊点。结果表明:当电流密度为104A/cm2、通电96h后,阳极附近没有出现富Bi层,即电迁移现象得到抑制。这是由于Ni颗粒与Sn形成了IMC,阻挡了Bi沿Sn基体扩散的快速通道,防止了两相分离,提高了焊点可靠性。     

微量Ag、Bi、Ni对无铅微焊点固-液界面扩散的影响

为了获得微量元素Ag、Bi、Ni对无铅微焊点固-液界面扩散行为的影响规律,以低银无铅微焊点Cu/SAC0705+Bi+Ni/Cu为主要研究对象,并与Cu/SAC0705/Cu及高银钎料Cu/SAC305/Cu进行对比。研究了三种成分焊点固-液扩散后界面IMC的生长演变行为,并分析了Ag、Bi、Ni对微焊点固-液扩散的影响。研究结果表明:钎料中微量元素Ag、Bi、Ni添加可细化界面IMC晶粒,对提高界面强度有利。长时间的固-液时效过程中,界面IMC的生长速率主要取决于界面IMC的晶粒尺寸。Cu/SAC0705+Bi+Ni/Cu焊点界面IMC晶粒尺寸最小,界面IMC生长速率最大,为11.74μm/h。Cu/SAC0705/Cu焊点界面IMC晶粒尺寸最大,界面IMC生长速率最慢,其数值为1.24μm/h。     

Sn0.7Cu-xEr/Cu焊点界面反应及其化合物层生长行为研究

通过回流焊工艺制备了Sn0.7Cu-x Er/Cu(x=0,0.1,0.5)钎焊接头,研究钎焊温度及等温时效时间对接头的界面金属间化合物(IMC)的形成与生长行为的影响。结果表明:Sn0.7Cu钎料中微量稀土Er元素的添加,能有效抑制钎焊及时效过程中界面IMC的形成与生长。在等温时效处理过程中,随着时效时间的延长,界面反应IMC层不断增厚,在相同时效处理条件下,Sn0.7Cu0.5Er/Cu焊点界面IMC层的厚度略小于Sn0.7Cu0.1Er/Cu焊点界面的厚度。通过线性拟合方法,得到Sn0.7Cu0.1Er/Cu和Sn0.7Cu0.5Er/Cu焊点界面IMC层的生长速率常数分别为3.03×10–17 m2/s和2.67×10–17 m2/s。     

SnAgCu无铅焊点原位电迁移IMC演变

在28℃.3.25A直流电下,对Cu/Sn3.0Ag0.5Cu/Cu对接无铅焊点进行原位电迁移实验,观察了通电120,168,384和504 h后焊点横截面的微观组织形貌.结果表明,电迁移初期,Cu<,6>Sn<,5>化合物遍布整个焊点截面,随时间延长,不断从阴极向阳极迁移聚集;当通电504 h后,焊点内已看不到金属间...     

室温下Cu/Sn3.5Ag焊点/Cu体系中电迁移引发裂纹的形成

Electromigration （EM） behavior of Cu/Sn3.5Ag/Cu solder reaction couple was investigated with a high current density of 5 × 10^3 A/cm^2 at room temperature. One dimensional structure, copper wire/solder ball/copper wire SRC was designed and fabricated to dissipate the Joule heating induced by the current flow. In addition, thermomigration effect was excluded due to the symmetrical structure of the SRC. The experimental results indicated that micro-cracks initially appeared near the cathode interface between solder matrix and copper substrate after 474 h current stressing. With current stressing time increased, the cracks propagated and extended along the cathode interface. It should be noted that the continuous Cu6Sn5 intermetallic compounds （IMCs） layer both at the anode and at the cathode remained their sizes. Interestingly, tiny cracks appeared at the root of some long columntype Cu6Sn5 at the cathode interface due to the thermal stress.     

Electromigration behavior in Cu/Sn-8Zn-3Bi/Cu solder joint

Electromigration behavior in a one-dimensional Cu/Sn-8Zn-3Bi/Cu solder joint structure was investigated in ambient with a current density of 3.5 × 10⁴ A/cm² at 60 °C. Due to the compressive stress induced by volume expansion resulting from Cu-Zn intermetallic compound (IMC) growth, Cu₅Zn₈ IMC layers were squeezed out continuously along IMC/Cu interfaces at both the anode and the cathode with increasing the current stressing time, which was not only driven by the concentration gradient, but also accelerated by the electromigration. And a few voids propagated and formed at the anode and the cathode solder/IMC interfaces during electromigration. Additionally, Sn hillocks occurred in the bulk solder, and Sn hillocks formed at the anode side were larger than those at the cathode side.     

Electromigration-induced cracks in Cu/Sn3.5Ag/Cu solder reaction couple at room temperature

Electromigration (EM) behavior of Cu/Sn3.5Ag/Cu solder reaction couple was investigated with a high current density of 5× 103 A/cm2 at room temperature. One dimensional structure, copper wire/solder ball/copper wire SRC was designed and fabricated to dissipate the Joule heating induced by the current flow. In addition, thermomigration effect was excluded due to the symmetrical structure of the SRC. The experimental results in-dicated that micro-cracks initially appeared near the cathode interface between solder matrix and copper substrate after 474 h current stressing. With current stressing time increased, the cracks propagated and extended along the cathode interface. It should be noted that the continuous Cu6Sn5 intcrmetallic compounds (LMCs) layer both at the anode and at the cathode remained their sizes. Interestingly, tiny cracks appeared at the root of some long column-type Cu6Sn5 at the cathode interface due to the thermal stress.     

Cu5Zn8 Growth Reversion in Cu/Sn-8Zn-3Bi/Cu During Discontinuous Electromigration

A Cu/Sn-8Zn-3Bi/Cu structure was used to investigate the intermetallic compound (IMC) growth behavior during discontinuous electromigration under current density of 10⁴?A/cm² at 70°C. Cu₅Zn₈ IMC formed at both the anode and the cathode interfaces, and the thickness increased with the stressing time. With prolonging the current stressing time, a bulged Cu₅Zn₈ layer was squeezed out between the former Cu₅Zn₈ layer and Cu substrate in the samples to relax the excess compressive stress. Additionally, due to the back stress gradient built up by the Sn diffusion, the Zn atomic flux reacted with Cu to form Cu₅Zn₈ at the cathode side when the power was turned off. Finally, the total IMC thickness of the anode and the cathode under discontinuous current stressing showed a ??reversion?? in the 69?h and 310?h samples.     

Electromigration in Line-Type Cu/Sn-Bi/Cu Solder Joints

In this study, the different electromigration (EM) behaviors of eutectic Sn-Bi solder in the solid and molten states were clarified using line-type Cu/Sn-Bi/Cu solder joints. When the eutectic Sn-Bi solder was in the solid state during the EM test, a Bi-rich layer formed at the anode side while a Sn-rich band formed at the cathode side, and the intermetallic compound (IMC) at the cathode side was thicker than that at the anode side. The growth of the Bi-rich layer exhibited a linear dependence on the time of stressing. While the actual temperature of the solder joint increased to 140°C and the solder was in a molten state or partially molten state, two separate Bi-rich layers formed at the anode side and a great many Cu₆Sn₅ IMC precipitates formed between the two Bi-rich layers. Also, the IMC layer at the cathode side was thinner than that at the anode side. With a current-crowding-reduced structure, the products of diffusivity and effective charge number of Bi in the eutectic Cu/Sn-Bi/Cu solder joints stressed with current density of 5 × 10³ A/cm² at 35°C, 55°C, and 75°C were calculated.     

Electromigration-Induced Void Formation at the Cu<Subscript>5</Subscript>Zn<Subscript>8</Subscript>/Solder Interface in a Cu/Sn-9Zn/Cu Sandwich

The electromigration that occurs in a Cu/Sn-9Zn/Cu sandwich was investigated for void formation at room temperature with 10³ A/cm². A focused ion beam revealed that voids nucleated at the intermetallic compound (IMC)/solder interface regardless of the electron flow direction. The needle-like voids initiated at the cathode Cu₅Zn₈/solder interface due to the outward diffusion of Zn atoms in the Zn-rich phase and expanded as a result of the surface diffusion of Sn atoms upon current stressing.