宽带偏振不灵敏InGaAs半导体光放大器

采用压应变InGaAs量子阱和张应变InGaAs准体材料交替混合的有源结构,研制了宽带偏振不灵敏的半导体光放大器.此放大器在100～250mA的工作电流范围内,获得了大于70nm的3dB光带宽;在0～250mA工作电流和3dB光带宽波长范围内,偏振灵敏度小于1dB.对于1.55μm的信号光,在200mA的注入电流下获得了15.6dB的光纤到光纤的增益、小于0.7dB的偏振灵敏度和4.2dBm的饱和输出功率.     

高增益偏振不灵敏InGaAs/InP体材料半导体光放大器

采用三元InGaAs体材料为有源区，通过直接在InGaAs体材料中引入0．20％张应变来加强TM模的增益，研制了一种适合于作波长变换器的偏振不灵敏半导体光放大器(SOA)。在低压金属有机化学气相外延(LPMOVPE)的过程中，只需调节三甲基Ga的源流量便可获得所要求的张应变量。制作的半导体光放大器在200mA的注入电流下，获得了50nm宽的3dB光带宽和小于0．5dB的增益抖动；重要的是，半导体光放大器能在较大的电流和波长范围里实现小于1．1dB的偏振灵敏度。对于1．55gm波长的信号光，在200mA的偏置下，其偏振灵敏度小于1dB，同时获得了大于14dB光纤到光纤的增益，3dBm的饱和输出功率和大于30dB的芯片增益。用作波长变换器，可获得较高的波长变换效率。进一步提高半导体光放大器与光纤的耦合效率，可得到性能更佳的半导体光放大器。     

宽带偏振不灵敏张应变InGaAs半导体放大器光开关

研制了一种张应变准体InGaAs半导体放大器光开关.该结构具有显著的带填充效应,从而导致在80mA的注入电流下,器件的3dB光带宽大于85nm(1520～1609nm).该带宽几乎同时全部覆盖了C带(1525～1565nm)和L带(1570～1610nm).最为重要的是,在3dB光带范围内,光开关的偏振灵敏度小于0.7dB;光纤到光纤无损工作电流在70～90mA之间;消光比大于50dB.通过降低了载流子寿命,开关速度有所提高.在未来密集波分复用通信系统中,这种宽带偏振不灵敏半导体放大器光开关很有实用前景.     

InP基应变补偿结构偏振不灵敏半导体光放大器制作的研究

为了制备偏振不灵敏的半导体光放大器(SOA)，将有源区设计为由4个压应变、3个张应变阱层及晶格匹配的垒层InGaAsP交替组合而成的应变补偿结构。器件做成带有倾角的扇形脊形波导结构，避免了常规制作SOA的复杂工艺。对样品3在80～125mA电流范围内，获得了偏振灵敏度≤0．6dB．最小可达0．1dB；较大的电流范围内FWHM值为40nm。     

低偏振灵敏度半导体光放大器

报道了基于混合应变量子阱材料的半导体光放大器 (SOA)。利用张应变量子阱加强了TM模的增益 ,使之接近TE模的增益 ,从而使SOA的偏振灵敏度大为降低。在 150mA的偏置下 ,获得了 2 4dB的小信号增益和 1dB的偏振灵敏度。     

渐变应变偏振不灵敏半导体光学放大器

采用渐变应变有源区结构,制备出偏振不灵敏半导体光学放大器,工作电流在60～160mA范围内,其3dB带宽范围不小于35nm,偏振不灵敏度小于0.35dB,自发发射出光功率为0.18～3.9mW.     

渐变应变偏振不灵敏半导体光学放大器

采用渐变应变有源区结构,制备出偏振不灵敏半导体光学放大器,工作电流在60～160mA范围内,其3dB带宽范围不小于35nm,偏振不灵敏度小于0.35dB,自发发射出光功率为0.18～3.9mW.     

1.3μm高增益偏振无关应变量子阱半导体光放大器

采用低压金属有机化学气相外延法 (LP MOVPE)生长并制作了 1 3μm脊型波导结构偏振无关半导体光放大器 (SOA) ,有源区为基于四个压应变量子阱和三个张应变量子阱交替生长的混合应变量子阱 (4C3T)结构 ,压应变阱宽为 6nm ,应变量 1 0 % ,张应变阱宽为 11nm ,应变量 - 0 95 % ;器件制作成 7°斜腔结构以有效抑制腔面反射。半导体光放大器腔面蒸镀Ti3 O5/Al2 O3 减反 (AR)膜以进一步降低腔面剩余反射率至 3× 10 -4以下 ;在 2 0 0mA驱动电流下 ,光放大器放大的自发辐射 (ASE)谱的 3dB带宽大于 5 0nm ,光谱波动小于 0 4dB ,半导体光放大器管芯的小信号增益近 30dB ,在 12 80～ 1340nm波长范围内偏振灵敏度小于 0 6dB ,饱和输出功率大于 10dBm ,噪声指数 (NF)为 7 5dB。     

宽带偏振不灵敏张应变InGaAs半导体放大器光开关

研制了一种张应变准体In Ga As半导体放大器光开关.该结构具有显著的带填充效应,从而导致在80 m A的注入电流下,器件的3d B光带宽大于85 nm(1 5 2 0～1 6 0 9nm ) .该带宽几乎同时全部覆盖了C带(1 5 2 5～1 5 6 5 nm )和L带(1 5 70～1 6 1 0 nm ) .最为重要的是,在3d B光带范围内,光开关的偏振灵敏度小于0 .7d B;光纤到光纤无损工作电流在70～90 m A之间;消光比大于5 0 d B.通过降低了载流子寿命,开关速度有所提高.在未来密集波分复用通信系统中,这种宽带偏振不灵敏半导体放大器光开关很有实用前景     

适于InGaAsP光放大器偏振不灵敏的增益介质

研制了适于InGaAsP光放大器偏振不灵敏的增益介质 ,采用有源区内交替的张应变和压应变排列的混合应变量子阱结构 ,器件做成带有倾角的扇形。实验中发现该结构既抑制了激射又改善了器件的偏振灵敏性 ,实现了偏振灵敏度小于 0 5dB ,10 0mA偏置时可达 0 1dB。在较大的电流范围内 ,峰的半高全宽 (FWHM)为 4 0nm。     

Critical thickness of GaAs/InGaAs and AlGaAs/GaAsP strained quantum wells grown by organometallic chemical vapor deposition

In this paper we describe a study of strained quantum wells (QWs) as a means to experimentally observe the critical thickness (h _c) for the formation of interfacial misfit dislocations. Two material systems were investigated: GaAs/In_0.11Ga_0.89As, in which the QW layers are under biaxialcompression, and Al_0.35Ga_0.65As/GaAs_0.82P_0.18, in which the QW layers are under biaxialtension. Samples were grown by atmospheric pressure organometallic chemical vapor deposition, and characterized by low-temperature photoluminescence (PL), x-ray diffraction, optical microscopy, and Hall measurements. For both material systems, the observed onset of dislocation formation agrees well with the force-balance model assuming a double-kink mechanism. However, overall results indicate that the relaxation is inhomogeneous. Annealing at 800–850° C had no significant effect on the PL spectra, signifying that even layers that have exceededh _c and have undergone partial relaxation are thermodynamically stable against further dislocation propagation.     

Type I and Type II Alignment of the Light Hole Band in In0.15Ga0.85As/GaAs and in ln0.15Ga0.85As/Al0.15Ga0.85As Strained Quantum Wells

We present results of photoluminescence and cathodoluminescence measurements of strained undoped In_0.15Ga_0.85As/GaAs and In_0.15Ga_0.85As/Al_0.15Ga_0.85As quantum well structures, designed to throw light on the current controversy over light-hole band alignment at low In content. We compare these data with theoretical calculations of the confined state energies within the eight band effective mass approximation. Our analysis shows that for In_0.15Ga_0.85As/GaAs, the observed two transitions are consistent with either type I or type II alignment of the light hole band for band offset ratios within the accepted range. In the case of In_0.15Ga_0.85As/Al_0.15Ga_0.85As, however, our results clearly indicate type II alignment for the light hole band. We derive the band offset ratio Q, defined here as Q = δE_c/δE_g where δE_c is the conduction band offset and δE_g is the bandgap difference between the quantum well and the barrier in the presence of strain, for the In_0.15Ga_0.85As/Al_0.15Ga_0.85As system to be Q = 0.83 and discuss it in the context of the common anion rule.     

MBE-grown Ridge-waveguide InGaAs/InGaAsP Strained Quantum Well Lasers at 2 μm Wavelength

The result of molecular beam epitaxy (MBE)-grown ridge-waveguide InGaAs/ InGaAsP/InP strained quantum well lasers at 2 μm wavelength is reported. The pulsed electrical luminescence spectrum at room temperature is observed with peak wavelength of about 1.98 μm. At 77 K the lasers become lasing in pulse regime, with threshold current of about 18～30 mA, peak wavelength of about 1.87～ 1. 91 μm, and single longitudinal mode operation in the current range of 160～230 mA.     

Role of GaAs bounding layers in improving OMVPE growth and performance of strained-layer inGaAs/AIGaAs quantum-well diode lasers

In the growth of organometallic vapor phase epitaxy of InGaAs/AIGaAs single-quan-tum-well heterostructures for strained-layer diode lasers, the growth temperature is 100 to 200° C lower for the InGaAs quantum-well layer than for the AlGaAs cladding layers. Earlier studies showed that laser performance is greatly improved by sandwiching the InGaAs layer between lower and upper GaAs bounding layers that are grown during the times before and after InGaAs growth when the substrate temperature is decreased and increased, respectively. In this investigation, it has been found that laser performance is influenced mainly by the upper bounding layer rather than the lower one. By using Auger analysis in combination with Ar-ion sputtering to determine the composition depth profile of In_0.2Ga_0.8As/GaAs test structures layer without AlGaAs layers, it has been shown that the role of the upper bounding layer is to prevent the evaporation of In from the InGaAs quantum-well layer during the interval before the deposition of the upper AlGaAs cladding layer.     

大应变InGaAs/GaAs/AlGaAs微带超晶格中波红外QWIP的MOCVD生长

基于中波红外(峰值响应波长4.5μm)量子阱红外探测器QWIP进行了大应变In0.34Ga0.66As/GaAs/Al0.35Ga0.65As微带超晶格结构的MOCVD外延生长研究。通过对生长温度、生长速率、Ⅴ/Ⅲ比以及界面生长中断时间等生长参数的系统优化,获得了高质量的外延材料。     

Effect of growth temperature on performance of AIGaAs/lnGaAs/GaAs QW laser diodes

Growth and characterization results are presented for high-power laser diodes with AlGaAs cladding and waveguide layers and strained In_1-xGa_xAs quantum wells with 0.09 < x < 0.25 grown by metalorganic vapor phase epitaxy at different temperatures. Photoluminescence at 300 and 10K, Auger spectroscopy, and high-resolution x-ray measurements are discussed. Broad area laser diodes have been fabricated with different cavity length and threshold current densities, absorption coefficients, internal efficiencies, and degradation rates have been measured.     

Highly strained ln0.35Ga0.65As/GaAs layers grown by molecular beam epitaxy for high hole mobility transistors

We have grown highly strained In_0.35Ga_0.65As layers on GaAs substrates by molecular beam epitaxy to improve the performance of high hole mobility transistors (HHMTs). The mobility and sheet hole concentration of double side doped pseudomorphic HHMT structures at room temperature reached 314 cm2/V-s and 1.19 × 10¹² cm⁻², respectively. Photoluminescence measurements at room temperature show good crystalline quality of the In^0.35Ga_0.65As layers. This study suggests that the performance of HHMTs can be improved by using high-quality In_0.35Ga_0.65As layers for the channel of double side doped heterostructures pseudomorphically grown on GaAs substrates.     

MOCVD生长InGaAs／Alj0.2Ga0.8As应变多量子阱

用MOCVD方法生长了3种InGaAs/Al0.2Ga0.8As应变多量子阱（MQWs）样品，用于研究在气相中TMIn的含量对MQWs的发光波长和半峰宽（FWHM）以及在X射线中零级峰位的影响。研究表明，随着In组分在MQW中的增加，MQWs中应变也随之增加，这是造成FWHM增大的原因。同时也研究了应变MQWs中In组分与气相中TMIn含量的关系，为准确设计和控制MQWs的组分提供了依据。     

InGaAs/GaAs应变量子阱激光器MOCVD生长研究

采用金属有机物化学气相淀积(MOCVD)方法生长了InGaAs/GaAs应变量子阱(QW),通过降低生长温度、提高生长速度以及采用应变缓冲层(SBL)结构,改善了应变QW生长表面质量和器件荧光(PL)谱特性,实验表明,通过优化工艺条件和采用SBL等手段提高了应变QW质量。生长的QW结构用于1054 nm激光器的制作,经测试,器件具有较低的阈值电流和较高的单面斜率效率,性能较好。     

Realization of in-situ sub two-dimensional quantum structures by strained layer growth phenomena in the InxGa1- xAs/GaAs system

We confirm that as the misfit strain in pseudomorphic epitaxial layer increases, surface thermodynamics controlled growth modes can change from a layer-by-layer to a three-dimensional (3-D) island mode. Both in-situ reflection high energy electron diffraction studies and in-situ scanning tunneling microscopy studies are utilized to demonstrate this transition to 3-D growth. This concept allows one to grow GaAs/In_xGa_1-xAs/GaAs heterostructures where the electrons in In_xGa_1-xAs are possibly confined in lower dimensions.