共查询到18条相似文献,搜索用时 140 毫秒
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Fabrication of an AlAs/In0.53Ga0.47As/InAs Resonant Tunneling Diode on InP Substrate for High-Speed Circuit Applications 总被引:2,自引:2,他引:0
在InP衬底上采用感应耦合等离子体刻蚀技术制备了高性能的AlAs/In0.53Ga0.47As/InAs共振隧穿二极管.正向偏压下PVCR=7.57,Jp=39.08kA/cm2;反向偏压下PVCR=7.93,Jp=34.56kA/cm2.在未去除测试电极和引线等寄生参数影响下,面积为5μm×5μm的RTD的阻性截止频率为18.75GHz.最后对非对称的I-V特性进行了分析讨论. 相似文献
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报道了一种垂直入射的InP基InGaAs pin光电探测器,介绍了它的制备和测试方法并对器件所展示出的高效,高速,高线性度特性进行了分析。器件的暗电流密度在0和-5V偏压时分别为1.37×10-5 A/cm2和93×10-5 A/cm2;在1.55μm波长,-3V偏压下,器件的线性光响应高达28mW,相应的最大线性电流为17mA,响应度达到0.61A/W(无减反射膜);在-5V偏压下,器件获得高达17.5GHz的3dB带宽。 相似文献
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利用InP基共振隧穿二极管(RTD)和加载硅透镜的片上天线设计实现了超过1 THz的振荡器。采用Silvaco软件对RTD模型进行仿真研究,分析了不同发射区掺杂浓度、势垒层厚度、隔离层厚度以及势阱层厚度等对器件直流特性的影响规律。对研制的RTD器件直流特性测试显示:峰值电流密度Jp为359.2 kA/cm2,谷值电流密度Jv为135.8 kA/cm2,峰谷电流比PVCR为2.64,理论计算得到的器件最大射频输出功率和振荡频率(fmax)分别为1.71 mW和1.49 THz。利用透镜封装的形式对采用Bow-tie片上天线和RTD设计的太赫兹振荡器进行封装,测试得到振荡频率超过1 THz,输出功率为2.57μW,直流功耗为8.33 mW,是国内首次报道超过1 THz的振荡器。 相似文献
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采用n型掺杂的AlGaAs/GaAs和AlGaAs/InGaA多量子阱材料,基于MOCVD外延生长技术,利用成熟的GaAs集成电路加工工艺,设计并制作了不同结构的中波-长波双色量子阱红外探测器(QWIP)器件,器件采用正面入射二维光栅耦合,光栅周期设计为4μm,宽度2μm;对制作的500μm×500μm大面积双色QWIP单元器件暗电流、响应光谱、探测率进行了测试和分析。在-3V偏压、77K温度和300K背景温度下长波(LWIR)和中波(MWIR)QWIP的暗电流密度分别为0.6、0.02mA/cm2;-3V偏压、80K温度下MWIR和LWIR QWIP的响应光谱峰值波长分别为5.2、7.8μm;在2V偏压、65K温度下,LWIR和MWIR QWIP的峰值探测率分别为1.4×1011、6×1010cm.Hz1/2/W。 相似文献
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设计并用分子束外延技术生长了InP基InGaAs/AlAs体系RTD材料,采用传统湿法腐蚀、光学接触式光刻、金属剥离、台面隔离和空气桥互连工艺,研制出了具有优良负阻特性和较高阻性截止频率的InP基RTD单管,器件正向PVCR为17.5,反向PVCR为28,峰值电流密度为56kA/cm^2,采用RNC电路模型进行数据拟合后得到阻性截止频率为82.8GHz,实验为今后更高性能RTD单管的研制,以及RTD与其他高速高频三端器件单片集成电路的设计与研制奠定了基础。 相似文献
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Self-consistent transit-time model for a resonant tunnel diode 总被引:1,自引:0,他引:1
We present a self-consistent compact model for the small-signal impedance of a resonant tunnel diode (RTD) with a finite collector transit time. The effect of the collector transit time on the device impedance is described for three In/sub 0.53/Ga/sub 0.47/AsAlAs-InAs RTDs with current densities ranging from 14 kA/cm/sup 2/ to 570 kA/cm/sup 2/ with various collector spacer lengths for dc biasing in both the positive and negative differential resistance regions. 相似文献
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Nine-state resonant tunneling diode memory 总被引:1,自引:0,他引:1
The authors demonstrate an epitaxial series combination of eight pseudomorphic AlAs/In0.53Ga0.47As/InAs resonant tunneling diodes (RTDs) grown by molecular beam epitaxy on InP. This series RTD produces an eight-peak multiple negative differential resistance characteristic with a peak-to-valley current ratio (PVR) exceeding 2 per peak at a peak current density of approximately 6 kA/cm 2. Hysteresis in the current-voltage characteristic is reduced by uniformly Si doping the double-barrier resonant tunneling region at a density of 5×1016 cm-3. Using this multiple-peak RTD in series with a field-effect transistor load, a nine-state multivalued memory circuit is demonstrated 相似文献
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Han Chunlin Chen Chen Zou Penghui Zhang Yang Zeng Yiping Xue Fangshi Gao Jianfeng Zhang Zheng Geng Tao 《半导体学报》2009,30(6)
We have fabricated Ino.53Ga0.47As/AlAs/InP resonant tunneling diodes (RTDs) based on the air-bridge technology by using electron beam lithography processing. The epitaxial layers of the RTD were grown on semiinsulating (100) InP substrates by molecular beam epitaxy. RTDs with a peak current density of 24.6 kA/cm2 and a peak-to-valley current ratio of 8.6 at room temperature have been demonstrated. 相似文献