Layout Design and Optimization of RF Spiral Inductors on Silicon Substrate

使用三维电磁场模拟的方法对相同硅衬底结构下不同布图结构的螺旋电感进行了模拟和分析.通过改变电感匝数、电感金属的宽度和间隔以及电感的内径,模拟和分析了电感性能的变化.给出了引起电感性能变化的原因.结果表明优化电感的几何参数可以有效地改善电感性能.得出了一些实用的设计原则,可有效地指导射频集成电路中集成电感的设计.     

衬底结构特征对硅基螺旋电感性能的影响

使用三维电磁场模拟的方法对不同硅衬底结构螺旋电感进行了模拟和分析.通过改变衬底的电导率、隔离层的厚度以及隔离层的材料、衬底引入硅锗合金层等模拟,分析了电感性能的变化.结果表明随着电导率的减小,电感的性能会增强,但改善的幅度会逐渐减小.厚的SiO2隔离层有利于减小衬底损耗,但是会给工艺增加难度.采用低k材料作为隔离层是改善电感性能的一种比较理想的方法.     

衬底结构特征对硅基螺旋电感性能的影响

使用三维电磁场模拟的方法对不同硅衬底结构螺旋电感进行了模拟和分析.通过改变衬底的电导率、隔离层的厚度以及隔离层的材料、衬底引入硅锗合金层等模拟,分析了电感性能的变化.结果表明随着电导率的减小,电感的性能会增强,但改善的幅度会逐渐减小.厚的SiO2隔离层有利于减小衬底损耗,但是会给工艺增加难度.采用低k材料作为隔离层是改善电感性能的一种比较理想的方法.     

基于SOI衬底的射频电感优化设计

比较了SOI RF电感与体硅电感的性能,并根据模拟结果分析了电感中空面积,电感形状结构,金属宽度、间距对SOI电感品质因数Q、自谐振频率、电感量L的影响,最后提出了一种基于SOI衬底RF电感的优化设计原则.以往射频集成电感性能的比较并不固定电感值,而文中全部参数的变化都是在电感值相同的情况下进行比较.     

基于SOI衬底的射频电感优化设计

比较了SOIRF电感与体硅电感的性能 ,并根据模拟结果分析了电感中空面积 ,电感形状结构 ,金属宽度、间距对SOI电感品质因数Q、自谐振频率、电感量L的影响 ,最后提出了一种基于SOI衬底RF电感的优化设计原则 .以往射频集成电感性能的比较并不固定电感值 ,而文中全部参数的变化都是在电感值相同的情况下进行比较     

RF集成电感的设计与寄生效应分析

分析了体硅 CMOS RF集成电路中电感的寄生效应 ,以及版图参数对电感品质因数 Q的影响 ,并通过Matlab程序模拟了在衬底电阻、金属条厚度、氧化层厚度改变时电感品质因数的变化 ,分析了不同应用频率时版图参数在寄生效应中所起的作用 ,得出了几条实用的设计原则并进行了实验验证 ,实验结果与模拟值符合得很好 ,表明此模拟方法与所得结论均可有效地用于指导射频 (RF)集成电路中集成电感的设计     

基于CMOS工艺的高Q值集成电感设计

采用三维全波电磁场模拟软件HFSS作为分析工具,对八边形差分对称结构电感和单端结构电感进行对比研究,提出利用多层金属并联布线、渐变线宽和图案接地屏蔽(PGS)等结构与差分对称结构集成来提高片上电感性能的设计方案.此方案能与标准硅基CMOS工艺兼容.仿真结果表明,该方案能有效提高集成电感的Q值.     

硅衬底上射频集成电感研究

在分析硅衬底上射频螺旋电感物理模型的基础上,从几何参数、工艺参数及电感组成形式考虑,用模拟软件ASITIC(Analysis and Simulation of Spiral Inductors and Transformers for Ics)对影响电感值和Q值及谐振频率的各参数进行全面详尽的模拟,得出了几条实用的设计原则且用此模拟方法与所得结论均可有效地指导射频集成电路中集成电感的设计。     

应用于无线收发机前端的片上螺旋型电感的研究

这篇文章探讨了在现在的标准工艺条件下片上集成电感的设计和分析问题,包括片上螺旋型电感的有关版图、损耗机制、模型和参数提取问题,最后以一种被学术界广泛接受的模拟工具对电感的有关设计进行了模拟,给出了模拟结果,并进行了分析,给出了设计片上电感应遵循的原则.随着工艺技术和人们对电感的寄生效应的认识的加深,可以相信片上集成电感在高频电路中的应用将越来越广泛.     

CMOS伪差分E类射频功率放大器设计

分析了E类功放的非理想因素,其中着重分析寄生电感对系统性能的影响,采用伪差分E类功放结构有效地抑制寄生电感的影响。最后基于理想的设计方程和Load Pull技术,采用 0.18 μm CMOS工艺,设计出高效率的差分E类功率放大器。在电源电压1.8 V,温度25 ℃,输入信号0 dBm条件下,具有最大输出功率26.1 dBm,PAE为60.2%。     

A lumped scalable model for silicon integrated spiral inductors

A lumped scalable model for spiral inductors in silicon bipolar technology has been developed. The effect of three different cross sections on inductor performance was first investigated by comparing experimental measurements. Using both the results of this analysis and three-dimensional electromagnetic simulation guidelines, several circular inductors were integrated on a radial patterned ground shield for model validation purposes. The model employs a novel equation for series resistance with only one fitting parameter extracted from experimental measurements. All other model elements were related to technological and geometrical data by using rigorous analytical equations. The model was validated using one- and two-port measured performance parameters of 45 integrated inductors, and excellent agreement was found for all considered geometries up to frequencies well above self-resonance.     

Characterization,design and modeling of on-chip interleaved transformers in CMOS RFICs

This paper discusses the impacts of key geometrical parameters on the performance of interleaved transformers in CMOS radio frequency integrated circuits (RFICs). It also presents a compact circuit model for the transformer based on the “2-π” model of on-chip spiral inductors. All the RLC circuit elements can be calculated from the transformer’s geometrical and process parameters. Verification with accurately calibrated electromagnetic (EM) simulation data demonstrates accurate performance prediction and good scalability for a wide range of transformers’ layout.     

A hybrid approach for the sensitivity analysis of integrated inductors

This paper proposes a hybrid methodology for the evaluation of integrated inductors sensitivity against technological/geometrical parameters variation. The obtained results are used in an optimization-based design environment for integrated inductors, as a way of guaranteeing that obtained solutions are robust against parameter variation. For the inductor characterization, a lumped element model is used, where each element value is evaluated through physics based equations. The sensitivity of the inductor characterization to parameter variations is evaluated at two levels. At the physical level, the sensitivity of the model element values to technological/geometrical parameters variations is computed through an equation-based strategy. Then, the sensitivity of the inductor characterization to the model parameter variations is obtained through a simulation-based approach, where the Richardson extrapolation technique is used for the calculation of the partial derivatives. Several examples considering the evaluation of sensitivity of both inductance and quality factor of two inductors in UMC130 technology are presented. Obtained results are compared against Monte-Carlo simulations.     

MEMS技术制作的螺线管微电感

考虑和分析了螺线管微电感的几何结构参数对微电感性能的影响,利用MEMS技术制作了四种不同几何结构的高性能射频螺线管微电感。这些微电感采用铜线圈,以减小线圈寄生电阻,且制作工艺简单,成本低,与IC相兼容。测试结果表明,微电感在较宽的工作频率范围内具有较高的Q值,在频率分别为6 GHz,4.4 GHz,5.8 GHz和5.6 GHz,微电感Q峰值为38,19.1,24.1和21.9,所对应的电感量为1.81 nH,1.07 nH,1.03 nH和1.17 nH。     

Analytical optimization of high-performance and high-yield spiral inductor in integrated passive device technology

The analytical optimization of several spiral inductors with different inner diameters, line widths, coil spacing, turn numbers, ring shapes, metal thicknesses, and substrates was performed by the measurement-derived inductance and Q-factor. Through the analytical optimization, a thick electroplated Cu/Au metal process and an additional sputter-etching strategy on a 200 μm finished SI-GaAs substrate with the suitable layout parameters have been proposed in order to obtain the higher performance and yield for the spiral inductors. The proposed physical layouts and fabrication parameters are an optimal solution for manufacturing spiral inductors in the integrated passive device (IPD) process that require high performance, stringent size, and volumetric efficiency.     

RF MEMS电感的研究与进展

无线通信的迅速发展,对高性能电感有迫切的需要。本文介绍了目前电感的发展状况,包括表面螺旋电感、垂直平面螺旋电感、悬浮螺旋电感和螺线管电感。对各种电感的性能进行了比较,讨论了电感设计所需考虑的问题及相关因素,对各种电感的加工工艺作了介绍。总结了各种电感的品种因数。     

新颖的常规硅工艺实现的侧向螺线型片上集成电感

提出了一种用常规硅工艺实现的片上集成电感的螺线型新结构．制造工艺使用标准双层金属布线的常规硅工艺．测量了螺线型集成电感的S参数，从测量数据计算了集成电感的参量．实验的侧向螺线型片上集成电感的Q值峰值为1.3，电感量为22nH．对用两层金属层实现的侧向螺线型片上集成电感和单层金属的常规平面螺旋电感的实验结果进行了比较，电感量和Q值与常规平面螺旋电感有可比性．     

Packaging-compatible high Q microinductors and microfilters forwireless applications

To meet requirements in mobile communication and microwave integrated circuits, miniaturization of the inductive components that many of these systems require is of key importance. At present, active circuitry is used which simulates inductor performance and which has high Q-factor and inductance; however, such circuitry has higher power consumption and higher potential for noise injection than passive inductive components. An alternate approach is to fabricate integrated inductors, in which lithographic techniques are used to pattern an inductor directly on a substrate or a chip. However, integrated inductors can suffer from low Q-factor and high parasitic effects due to substrate proximity. To expand the range of applicability of integrated microinductors at high frequency, their electrical characteristics, especially quality factor, should be improved. In this work, integrated spiral microinductors suspended (approximately 60 μm) above the substrate using surface micromachining techniques to reduce the undesirable effect of substrate proximity on the inductor performance are investigated. The fabricated inductors have inductances ranging from 15-40 nH and Q-factors ranging from 40-50 at frequencies of 0.9-2.5 GHz. Microfilters based on these inductors are also investigated by combining these inductors with integrated polymer filled composite capacitors