梯度折射率宽带减反射光伏玻璃研究

采用二次腐蚀法制备了梯度折射率减反射光伏玻璃。SEM分析表明,多孔减反射层的微结构尺度在20～30nm左右,膜层厚度为100～300nm。通过计算模拟,确定了膜层折射率分布形式为Gaussian-like型。制备的梯度折射率减反射光伏玻璃透过率>96%的带宽超过了1200nm;在390～1022nm波段的透过率>99%;在350～1084nm的双面反射率<1%,其中624～922nm的双面反射率低于0.2%。     

太阳电池组件上纳米多孔SiO_2减反射膜的制备和增透性能研究

采用溶胶-凝胶法制备纳米多孔SiO_2减反射薄膜,通过对不同制备工艺的探索(如陈化时间、提拉速度)以及所制备的纳米SiO_2薄膜的微观结构的研究,探究SiO_2溶胶特性对薄膜结构的影响以及薄膜纳米结构对其光透过率的影响,寻找最优化的制备工艺制备纳米多孔SiO_2减反射薄膜,进一步提高太阳电池组件上超白玻璃的透过率问题. 结果表明以氨水为催化剂、陈化时间为4天、提拉速度为1.25mm/s的工艺制备减反射薄膜效果最好. 在超白玻璃盖板上镀减反射膜后, 透过率 (400～1100nm)由90%提高到96%,对太阳电池组件应用可进一步增加6%左右的可见光利用.     

SiO2纳米球的粒径均一性研究及其在硅光学共振纳米柱阵列中的应用

近年来, 半导体纳米结构材料的光学共振效应作为一种重要的光调控手段被广泛应用于各类光电子器件。本文用改进的两步Stober法制备了粒径在270~330 nm之间的单分散二氧化硅纳米球, 通过优化工艺参数有效改善了纳米球的粒径均一性。采用恒温加热蒸发引诱自组装方法将纳米球在硅半导体上自组装成单层膜作为掩膜, 采用感应耦合等离子体技术刻蚀制备了硅纳米柱阵列并测试了其光反射谱。光谱结果表明直径在300~325 nm之间的硅纳米柱阵列可以激发四极子Mie光学共振, 其在可见光波段的最低反射率低于5%, 具有良好的光调控性能。     

GaAs半导体激光器腔面膜的制备

研究高反射、减反射薄膜的膜系设计、薄膜材料的选取以及薄膜的制备工艺。以GaAs为基底用TXX-700箱式真空镀膜机通过电子束真空蒸度技术制备出808-850nm波段的高反膜、增透膜。反射镜波长在808-850nm范围内,平均反射率R>99.9%;增透膜具有高透射性能,输出镜波长在808-850nm范围内,T>98%。     

自清洁SiO2/TiO2减反膜的制备与性能研究

采用溶胶-凝胶技术制备了SiO₂溶胶和TiO₂溶胶，利用浸渍提拉法在光伏玻璃上制备了SiO₂/TiO₂减反膜。用光谱透射比测量仪和椭偏仪测定了薄膜的透光率和折射率，通过场发射扫描电子显微镜观察了薄膜的形貌结构，最后考察了薄膜的自洁性能和耐候性能。结果表明：随着溶胶中TiO₂浓度的升高，SiO₂/TiO₂减反膜的厚度不断增加，而透光率逐渐减小，折射率逐渐增大。在波长为600nm时，TiO₂浓度最低的减反膜(ST-300)的透光率为94.4%,折射率为1.33。ST-300减反膜的表面平整，结构致密。光催化2h后，ST-300减反膜可将10mg/L的甲基蓝溶液降解11.2%,经过耐候处理后，其透光率衰减值仅0.08%～0.15%。     

溶胶-凝胶法制备TiO_2薄膜及其光学性能的研究

采用溶胶-凝胶法在K9玻璃上制备了均匀、透明、裂纹较少的纳米TiO2薄膜,以无水乙醇用量、涂层数、煅烧温度为影响因素,设计L9(3)4正交试验,以薄膜的透明度、微观致密程度作为评价标准,讨论了无水乙醇用量、涂层数和煅烧温度对制备TiO2薄膜光学性能的影响。用反射式椭圆偏振光谱仪测试最佳制备工艺下制得的TiO2薄膜的椭偏参数,并用Cauchy模型对椭偏参数进行数据拟合。结果表明,薄膜最优制备工艺参数为无水乙醇用量30 m L、涂层数为2层、煅烧温度为550℃;Cauchy模型能较好的描述溶胶-凝胶薄膜在300~700 nm波段的光学性能;薄膜的折射率和消光系数都有随波长增大而减小的趋势且制备的薄膜具有随着膜层数的增加,折射率增加,而最大峰值透光率、孔隙率减小的规律。     

氧化锌/二氧化硅复合膜的结构色研究

采用静电自组装技术,以氧化锌（ZnO）和二氧化硅（SiO2）溶胶颗粒为前驱体,通过控制双组分膜层的不同厚度,制备出结构色鲜艳的ZnO/SiO2复合膜,并利用分光测色仪、多角度分光光度仪及扫描电子显微镜等研究复合膜的颜色、微观结构和形态特征。研究结果发现,ZnO/SiO2复合膜的亮度和色度均较单一组分薄膜的高,复合薄膜的颜色仍随厚度和观察角度的变化而变化。通过对薄膜的微观结构分析,结合其厚度随周期数的变化规律,发现复合薄膜的厚度随着自组装循环次数的增加而增加,薄膜中的纳米粒子并没有形成明显的高低折射率交替分布的双层结构,可能形成的是高折射率层（H层）、有效折射率层（eff层）和低折射率层（L层）的多层微观结构。这种特殊的多层结构与光作用发生干涉,形成了鲜亮度和饱和度更高的结构色。     

宽波段减反膜实现23.9%效率的平面异质结构钙钛矿太阳能电池

虽然钙钛矿太阳能电池效率的发展令人鼓舞,但是由于光反射造成的器件基底界面的光子损失等问题仍然没有解决.光管理是降低反射损失并提高器件效率的有效途径.因此,我们设计了双层减反膜以涂敷在(FAPbI₃)_x(MAPbBr₃)_1-x钙钛矿太阳能电池的玻璃基底外侧,以期达到增加光吸收和提高器件效率的目的.该研究中的减反膜底层由硅聚合物构成,上层由氟代硅聚合物和六甲基二硅氧烷/介孔二氧化硅纳米粒子复合而成.通过精确调控上下层的折射率及厚度,我们在宽波段范围内实现了玻璃基底透过率从最高约90%显著提升到95%.在电池器件的玻璃基底外侧溶液涂膜制备减反膜后,(FAPbI₃)_x(MAPbBr₃)_1-x钙钛矿太阳能电池在保持填充因子和开路电压不变的情况下,短路电流和效率分别从25.5 mA cm^-2和22.7%提高到26.5 mA cm^-2和23.9%.本研究提出了一种简单、高效的通过双层减反膜的光管理提高太阳能电池效率的方法,且此方法可拓展到其他类型太阳能电池体系.     

低折射率疏水SiO_2薄膜的制备和表征

为了制备低折射率疏水SiO_2薄膜,将正硅酸乙酯(TEOS)和二甲基二乙氧基硅烷(DDS)在碱性条件下共水解缩聚,再以六甲基二氮硅烷(HMDS)做进一步的改性,采用提拉浸渍工艺在玻璃基底上制备单层增透膜。通过对溶胶粘度随老化时间的变化规律及HMDS添加对薄膜接触角影响等的分析与研究,制备了接触角最大的低折射率薄膜;同时对薄膜的红外特性、透过率、折射率进行了表征。结果表明:TEOS和DDS共水解缩聚提高了膜层疏水性,经HMDS改性后,薄膜的接触角为149°,折射率为1.12。     

减反射可见光与反射近红外线双功能镀膜玻璃

采用溶胶-凝胶工艺,用提拉法在光伏玻璃上制备了玻璃/TiO2-SiO2/SnO2∶F/SiO2减反射可见光与反射近红外双功能膜。用拟合方法研究了TiO2掺量对TiO2-SiO2膜层折射率的影响、以及溶胶中水含量对SiO2膜层折射率的影响;研究了快速热处理温度对SnO2∶F膜结构和方块电阻的影响,用紫外-可见光谱(UV-Vis)测试了膜层的透射率,用扫描电镜(SEM)观察了膜层的表面形貌。结果表明,TiO2掺量可以使TiO2-SiO2膜层的折射率在1.49~1.97之间变化,SiO2溶胶中的水含量能够在膜面上形成微孔,降低SiO2膜层的折射率。通过优化工艺,制备出了在可见光范围平均透过率约为96%、1120nm波长近红外起始反射的双功能复合膜。对得到的结果进行了讨论。     

On the surface roughness and hydrophobicity of dual-size double-layer silica nanoparticles

An array of double-layer silica nanoparticles with two different length scales was introduced onto the glass substrates for investigating the effect of surface morphology on wettability. Silica nanoparticles of 7, 12, 20, and 40 nm in diameters were individually functionalized using 3-aminopropyltriethoxysilane or 3-glycidoxypropyltrimethoxysilane. Silica nanoparticles functionalized with the complementary amine and epoxy groups were deposited alternately on glass surfaces to obtain durable and covalently bound dual-size double-layer silica nanoparticle coatings. Order of the deposition of nanoparticles for the fabrication of dual-size double-layer coatings was found to be the most determinant factor on surface roughness and hence the wettability. Deposition of the bigger nanoparticles on top of smaller ones resulted in rougher surfaces and consequently higher hydrophobicity. Based upon these findings, it is now possible to fine-tune surface roughness and subsequent wettability by controlling the size ratio of dual-size double-layer silica nanoparticles.     

具有超亲水光催化性能的λ/4-λ/2型两层宽频增透膜的制备和性能研究

以多孔SiO₂/TiO₂复合膜为膜层材料, 采用溶胶-凝胶法制备得到λ/4-λ/2型无峰两层宽频增透膜, 此工艺制备过程简, 单且对膜层折射率要求较低, 镀制两层膜的K9基片在500~700 nm波段维持较高的透过率, 在此区间透过率平均值为99.4%, 在可见光区400~800 nm的平均透过率为99.0%。两层膜表现出优异的超亲水性能, 在无需紫外光照的条件下, 其在0.5 s的水接触角仅为2.2°, 且超亲水性能能够维持超过20 d。同时, 两层膜表现出一定的光催化降解有机污染物的能力。     

Optimization of PECVD silicon oxynitride films for anti-reflection coating

In this work, amorphous silicon oxynitride films were deposited on silicon substrates by plasma-enhanced chemical vapor deposition (PECVD). The main purpose was to use silicon oxynitride film as a single-layer anti-reflection coating for Si-based optoelectronic devices. The chemical information was measured by infrared spectroscopy. Surface and cross-section morphology was determined by a scanning electron microscope. Spectroscopic ellipsometry (SE) was applied to measure the refractive index, extinction coefficient and thickness. The results of SE presented the refractive indices varied in the range of 1.83-1.92 by altering SiH₄/NH₃ ratio. One-side polished silicon substrate coated with silicon oxynitride film exhibited low reflectance, and two-side polished silicon substrate coated with silicon oxynitride film exhibited high transmittance. The results suggested that silicon oxynitride film was a very attractive single-layer anti-reflection coating.     

具有梯度渐变折射率的超疏水减反膜的制备及其性能

具有梯度折射率的减反膜可以在更宽光谱波段和更大入射光角度实现减反射性能。本研究利用溶胶-凝胶和溶剂热法分别合成实心氧化硅(SiO₂)、空心氧化硅(H-SiO₂)和空心氟化镁(MgF₂)溶胶, 利用浸渍-提拉法在玻璃双面镀制SiO₂/H-SiO₂/MgF₂梯度折射率薄膜。结果表明, 在380~1600 nm波长, 镀膜基片在光垂直入射时透光率高达99.88%, 当光以0°~45°入射时, 平均透光率均高于97.85%, 即使光以75°入射时, 最高透光率仍达95.51%。同时发现, 经十六烷基三甲氧基硅烷(HDTMOS)修饰, 薄膜疏水角达到150.6°, 显示出良好的疏水自清洁效果。     

Design of multi-layer anti-reflection coating for terrestrial solar panel glass

To date, there is no ideal anti-reflection (AR) coating available on solar glass which can effectively transmit the incident light within the visible wavelength range. However, there is a need to develop multifunctional coating with superior anti-reflection properties and self-cleaning ability meant to be used for solar glass panels. In spite of self-cleaning ability of materials like TiO₂ and ZnO, these coatings on glass substrate have tendency to reduce light transmission due to their high refractive indices than glass. Thus, to infuse the anti-reflective property, a low refractive index, SiO₂ layer needs to be used in conjunction with TiO₂ and ZnO layers. In such case, the optimization of individual layer thickness is crucial to achieve maximum transmittance of the visible light. In the present study, we propose an omni-directional anti-reflection coating design for the visible spectral wavelength range of 400–700 nm, where the maximum intensity of light is converted into electrical energy. Herein, we employ the quarter wavelength criteria using SiO₂, TiO₂ and ZnO to design the coating composed of single, double and triple layers. The thickness of individual layers was optimized for maximum light transmittance using essential Mcleod simulation software to produce destructive interference between reflected waves and constructive interference between transmitted waves.     

Room-temperature formation of low refractive index silicon oxide films using atmospheric-pressure plasma

This study aims to apply atmospheric-pressure (AP) plasma to the fabrication of single-layer anti-reflection (AR) coatings with porous silicon oxide. 150 MHz very high-frequency (VHF) excitation of AP plasma permits to enhance the chemical reactions both in the gas phase and on the film-growing surface, increasing deposition rate significantly. Silicon oxide films were prepared from silane (SiH4) and carbon dioxide (CO2) dual sources diluted with helium. The microstructure and refractive index of the films were studied using infrared absorption and ellipsometry as a function of VHF power density. It was shown that significant increase in deposition rate at room temperature prevented the formation of a dense SiO2 network, decreasing refractive index of the resulting film effectively. As a result, a porous silicon oxide film, which had the lowest refractive index of 1.24 at 632.8 nm, was obtained with a very high deposition rate of 235 nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave AR coating of a glass plate.     

NH3/HTMS气相法改性SiO2增透膜的耐环境稳定性

溶胶-凝胶法制备的二氧化硅增透膜因具有极低的折射率与较高的激光损伤阈值而被广泛应用于高功率激光系统中。但是, 激光系统工作环境中的水汽及挥发性有机污染物极易污染薄膜。本研究以正硅酸四乙酯为前驱体, 氨水为催化剂, 乙醇为溶剂制备了碱性催化的单分散SiO₂溶胶。采用提拉法在BK7玻璃基板表面镀制了SiO₂薄膜, 并对薄膜进行氨水气氛以及HTMS气氛联合处理改性。改性后的薄膜表现出了极佳的耐环境稳定性, 在高湿环境下放置2个月后膜层峰值透过率仅下降0.03%, 在低真空二甲基硅油污染环境下放置2个月后透过率光谱几乎无变化。NH₃/HTMS气相法联合处理可以有效延长SiO₂增透膜在高功率激光系统中的工作寿命。     

Sol–gel broadband anti-reflective single-layer silica films with high laser damage threshold

A simple processing of preparing broadband anti-reflective single-layer silica films is presented in this article. By adding polyvinylpyrrolidone (PVP) into reactant mixture, PVP-containing SiO₂ sol was obtained under base catalyzed hydrolysis and condensation of tetraethoxysilane. The spin-coating films and the dip-coating films were deposited on one side and two sides of quartz substrates. The anti-reflection band is 315 nm wide for dip-coating film and 559 nm wide for spin-coating film and the transmittance reached to 99.95 and 95.92% for dip-coating film and spin-coating film, respectively. By a Nd:YAG lasers the laser damage threshold of as-deposited films was measured at 1064 nm wavelength (1 ns pulse). It ranged from 24 to 33 J/cm² with an average of 28.7 J/cm². Compared to SiO₂ sol without PVP, not only was the anti-reflection band broadened but the anti-reflection and laser damage threshold were retained.     

辛基三甲氧基硅烷改性SiO2疏水减反膜的制备

以正硅酸乙酯为前驱体, 氨水为催化剂制备标准SiO₂溶胶, 然后在回流前后分别对普通SiO₂溶胶添加适量的辛基三甲氧基硅烷(OTMS)进行修饰, 得到OTMS改性SiO₂溶胶。用未进行OTMS修饰、回流前修饰和回流后修饰的溶胶分别制备减反膜, 并使用傅里叶变换红外光谱仪、核磁共振波谱仪、紫外-可见-近红外分光光度计、原子力显微镜和接触角测试仪对薄膜的结构和性能进行表征。结果表明: 回流前添加OTMS修饰剂制备的改性SiO₂减反膜具有最优异的耐潮湿环境稳定性能, 最高透过率可达99.7%以上; 与水的接触角达到120°, 在潮湿环境中放置4 w后, 透过率只下降0.23%。