Superstructured ordering in Al x Ga1 − x As and Ga x In1 − x P alloys

Epitaxial heterostructures produced on the basis of Al _x Ga_{1 ? x} As and Ga _x In_{1 ? x} P ternary alloys by metal-organic chemical vapor deposition are studied. The composition parameter x of the alloys was ～0.50. By X-ray diffraction studies, scanning electron microscopy, atomic force microscopy, and photoluminescence spectroscopy, it is shown that superstructured ordered phases with the stoichiometry composition III_{1 ? η}III_{1 + η}V₂ can be formed. As a consequence of this effect, not only does the cubic crystal symmetry change to the tetragonal type in the new compound, but also the optical properties become different from those of disordered alloy with the same composition.     

Growth and Characterization of In x Ga1−x N Multiple Quantum Wells Without Phase Separation

Efficient conversion of photon energy into electricity is a crucial step toward a sustainable solar-energy economy. Likewise, solid-state lighting devices are gaining prominence because of benefits such as reduced energy consumption and reduced toxicity. Among the various semiconductors investigated, In _x Ga_1–x N alloys or superlattices are fervently pursued because of their large range of bandgaps between 0.65 eV and 3.4 eV. This paper reports on the fabrication of multiple quantum wells on LiGaO₂ (001) substrates by plasma-assisted molecular beam epitaxy. Metal modulated epitaxy was utilized to prevent formation of metal droplets during the growth. Streaky patterns, seen in reflection high-energy electron diffraction, indicate two-dimensional growth throughout the device. Postdeposition characterization using scanning electron microscopy also showed smooth surfaces, while high-resolution x-ray diffraction and high-resolution transmission electron microscopy confirm the epitaxial nature of the overall quantum well structure.     

Width of the excitonic absorption line in Al x Ga1 − x as alloys

Experimental data on the width of the absorption line corresponding to the exciton ground state in high-quality samples of Al _x Ga_{1 ? x} As (x = 0.15) quasi-binary alloy, obtained by Seisyan et al. (2005), are analyzed. The line corresponding to the 1s state is divided into separate components taking into account strain-induced splitting; Lorentzian- and Gaussian-shape contributions to the absorption curve; and overlap with the continuum absorption band, which broadens with increasing temperature. Analysis of the integrated absorption, relying on the fact that the temperature dependence of the absorption is typical of exciton polaritons in media possessing spatial dispersion, was carried out with the following parameters: critical value of the dissipation damping of the exciton Γ_c = 0.32 meV and maximum value of the absorption coefficient K _max = 89.5 eV/cm. This analysis makes it possible to determine the homogeneous component of the line broadening, which, up to the critical temperature T _c = 155 K does not exceed 0.2 meV. It is found that the “natural” width of the 1s-exciton line does not exceed 2.6 meV at T = 1.7 K, which is in agreement with theoretical estimates. At T = 1.7–60 K, the inhomogeneous broadening of the exciton peak related to the exciton scattering and localization by fluctuations of the alloy composition exceeds contributions related to phonons and ionized impurities by more than an order of magnitude and is dominant, but does not affect the integrated absorption by excitonic polaritons.     

氨化Ga2O3/Mg薄膜制备簇状GaN纳米线

通过在1050°C时氨化Ga2O3/Mg薄膜制备出簇状GaN纳米线。用X射线衍射(XRD),傅里叶红外吸收光谱(FTIR)扫描电子显微镜(SEM)和高分辨电子显微镜(HRTEM)对样品进行测试分析。结果表明,GaN纳米线为六万纤锌矿结构单晶相并且成族生长,直径在200～500nm米左右,其长度可达5～10μm。几乎所有纳米线的直径均有逐渐缩小的趋势。对Mg膜的作用进行了初步的分析。     

Si基氨化ZnO/Ga2O3薄膜制备GaN纳米线

利用射频磁控溅射法在Si(111)衬底上溅射ZnO中间层和Ga2O3薄膜,然后在管式炉中常压下通氨气对ZnO/Ga2O3薄膜进行氨化,高温下ZnO层在氨气气氛中挥发,而Ga2O3薄膜和氨气反应合成出GaN纳米线.X射线衍射测量结果表明利用该方法制备的GaN纳米线具有沿c轴方向择优生长的六角纤锌矿结构.利用扫描电子显微镜、透射电子显微镜、傅里叶红外透射谱、能量弥散谱及选区电子衍射观测并分析了样品的形貌、成分和晶格结构.研究发现ZnO层的挥发有利于Ga2O3和NH3反应合成GaN纳米线.     

Si基ZnO/Ga2O3氨化反应制备GaN薄膜

利用射频磁控溅射法在Si(111)衬底上先溅射ZnO缓冲层，接着溅射Ga2O3薄膜，然后ZnO／Ga2O3膜在开管炉中850℃常压下通氨气进行氨化，反应自组装生成GaN薄膜。XRD测量结果表明利用该方法制备的GaN薄膜是沿c轴方向择优生长的六角纤锌矿多晶结构的薄膜，利用傅里叶红外吸收光谱仪测量了薄膜的红外吸收谱，利用SEM和TEM观测了薄膜形貌，PL测量结果发现了位于350nm和421nm处的室温光致发光峰。     

Charge injection in metal/organic/metal structures with ZnO:Al/organic interface modified by Zn1−xMgxO:Al layer

Aluminum-doped zinc oxide (ZnO:Al, AZO) electrodes were covered with very thin (∼6 nm) Zn_1−xMg_xO:Al (AMZO) layers grown by atomic layer deposition. They were tested as hole blocking/electron injecting contacts to organic semiconductors. Depending on the ALD growth conditions, the magnesium content at the film surface varied from x = 0 to x = 0.6. Magnesium was present only at the ZnO:Al surface and subsurface regions and did not diffuse into deeper parts of the layer. The work function of the AZO/AMZO (x = 0.3) film was 3.4 eV (based on the ultraviolet photoelectron spectroscopy). To investigate carrier injection properties of such contacts, single layer organic structures with either pentacene or 2,4-bis[4-(N,N-diisobutylamino)-2,6-dihydroxyphenyl] squaraine layers were prepared. Deposition of the AMZO layers with x = 0.3 resulted in a decrease of the reverse currents by 1–2 orders of magnitude and an improvement of the diode rectification. The AMZO layer improved hole blocking/electron injecting properties of the AZO electrodes. The analysis of the current-voltage characteristics by a differential approach revealed a richer injection and recombination mechanisms in the structures containing the additional AMZO layer. Among those mechanisms, monomolecular, bimolecular and superhigh injection were identified.     

Al0.5Ga0.5N/GaN/Al0.5Ga0.5N量子阱中依赖于表面载流子浓度的Rashba自旋劈裂

通过自洽求解薛定谔和泊松方程,计算了不同表面载流子浓度的Al0.5Ga0.5N/GaN/Al0.5Ga0.5N 量子阱中第一子带的Rashba系数和Rashba自旋劈裂。第一子带在费米能级处的Rashba自旋劈裂可观并且随Ns明显增加,因为Rashba系数特别是费米波矢增加很快。随着Ns的增加,第一子带波函数的峰朝着左异质结界面移动,且阱层的平均电场增加,所以来自阱层和异质结界面的这两个主要贡献部分增加。因而,III族氮化物异质结构中的强极化电场和高浓度的二维电子气对α至关重要,使AlGaN/GaN量子阱的Rashba自旋劈裂同窄带隙的III-V族材料可比。结果表明Ns是影响AlGaN/GaN量子阱中的Rashba系数和Rashba自旋劈裂的一个重要参数,表明这种材料可以应用到自旋电子学器件中。     

Al含量对GaN/Alx Ga1-x N量子点中激子态的影响

利用有效质量方法和变分原理,考虑内建电场和量子点的三维约束效应,研究了Al含量对局域在GaN/AlxGa1xN量子点中激子性质的影响.结果表明,随着Al含量的增加,GaN/AlxGa1-xN异质界面处的导带不连续性增强,势垒变高,载流子受到的约束增强,激子结合能增加,电子-空穴的复合率先增大后减小,且存在最大值.对给定体积的量子点,随其高度的变化激子结合能存在最大值,相应的电子-空穴被最有效约束,激子态最稳定.     

Properties of epitaxial (Al x Ga1 − x As)1 − y C y alloys grown by MOCVD autoepitaxy

The growth of epitaxial Al _x Ga_{1 ? x} As:C alloys by metal-organic chemical vapor deposition (MOCVD) at low temperatures results in the formation of quaternary (Al _x Ga_{1 ? x} As)_{1 ? y} C _y alloys, in which carbon atoms can be concentrated at lattice defects in the epitaxial alloy with the formation of impurity nanoclusters.     

p-GaN/Al0.35Ga0.65N/GaN应变量子阱肖特基紫外探测器

报道了p-GaN/Al0.35Ga0.65N/GaN应变量子阱结构的肖特基紫外探测器的制备及性能.器件的测试结果表明,在p-GaN/Al0.35Ga0.65N/GaN双异质结中强烈的压电极化和Stark效应共同作用下使得器件在正偏和反偏时的响应光谱都向短波方向移动了10nm.零偏下器件在280nm时的峰值响应为0.022A/W,在反向偏压为1V时,峰值响应增加到0.19A/W,接近理论值.在正向偏压下器件则呈平带状态,并在283和355nm处分别出现了两个小峰.在考虑极化的情况下,通过器件中载流子浓度分布的变化解释了器件在不同偏压下的响应特性,发现p-GaN/Al0.35Ga0.65N/GaN中的极化效应对器件的响应特性影响很大,通过改变偏压和适当的优化设计可以使探测器在紫外波段进行选择性吸收.     

p-GaN/Al0.35Ga0.65N/GaN应变量子阱肖特基紫外探测器

报道了p-GaN/Al0.35Ga0.65N/GaN应变量子阱结构的肖特基紫外探测器的制备及性能.器件的测试结果表明,在p-GaN/Al0.35Ga0.65N/GaN双异质结中强烈的压电极化和Stark效应共同作用下使得器件在正偏和反偏时的响应光谱都向短波方向移动了10nm.零偏下器件在280nm时的峰值响应为0.022A/W,在反向偏压为1V时,峰值响应增加到0.19A/W,接近理论值.在正向偏压下器件则呈平带状态,并在283和355nm处分别出现了两个小峰.在考虑极化的情况下,通过器件中载流子浓度分布的变化解释了器件在不同偏压下的响应特性,发现p-GaN/Al0.35Ga0.65N/GaN中的极化效应对器件的响应特性影响很大,通过改变偏压和适当的优化设计可以使探测器在紫外波段进行选择性吸收.     

Transport in GaAs/Al x Ga1−x As superlattices with narrow forbidden minibands: Low-frequency negative differential conductivity and current oscillations

Semiconductors - Current-voltage characteristics have been measured and low-frequency current instabilities have been studied for GaAs/Al x Ga1?x As superlattices with narrow forbidden...     

Thick In x Ga1−x N Films Prepared by Reactive Sputtering with Single Cermet Targets

In _x Ga_1?x N films with x = 0, 0.25, and 0.5 were grown on SiO₂/Si(100) substrates by reactive sputtering at 200°C for 90 min with single cermet targets made by hot pressing a powder mixture of metallic indium and gallium and gallium nitride. After alloying with In, InGaN showed preferential (10 $ \mathop 1\limits^{ - } $ 0) diffraction, smooth surface with roughness less than 1.80 nm, reduced mismatch with the Si substrate, enhanced electron mobility above 7 cm² V^?1 s^?1, and blue and green light-emitting capabilities.     

新型复合沟道Al0.3Ga0.7N/Al0.05Ga0.95N/GaN HEMT低相位噪声微波单片集成压控振荡器

设计并研制了一种新型复合沟道Al0.3Ga0.7N/Al0.05Ga0.95N/GaN HEMT(CC-HEMT)微波单片集成压控振荡器(VCO),且测试了电路的性能.CC-HEMT的栅长为1μm,栅宽为100μm.叉指金属-半导体-金属(MSM)变容二极管被设计用于调谐VCO频率.为提高螺旋电感的Q值,聚酰亚胺介质被插入在电感金属层与外延在蓝宝石上GaN层之间.当CC-HEMT的直流偏置为Vgs=-3V,Vds=6V,变容二极管的调谐电压从5.5V到8.5V时,VCO的频率变化从7.04GHz到7.29GHz,平均输出功率为10dBm,平均功率附加效率为10.4%.当加在变容二极管上电压为6.7V时,测得的相位噪声为-86.25dBc/Hz(在频偏100KHz时)和-108dB/Hz(在频偏1MHz时),这个结果也是整个调谐范围的平均值.据我们所知,这个相位噪声测试结果是文献报道中基于GaN HEMT单片VCO的最好结果.     

Structure and optical properties of heterostructures based on MOCVD (Al x Ga1 − x As1 − y P y )1 − z Si z alloys

Epitaxial heterostructures produced by MOCVD on the basis of Al _x Ga_{1 ? x} As ternary alloys with the composition parameter x ≈ 0.20–0.50 and doped to a high Si and P atomic content are studied. Using the high-resolution X-ray diffraction technique, scanning electron microscopy, X-ray microanalysis, Raman spectroscopy, and photoluminescence spectroscopy, it is shown that the epitaxial films grown by MOCVD are formed of five-component (Al _x Ga_{1 ? x} As_{1 ? y} P _y )_{1 ? z} Si _z alloys.     

Specifics of MOCVD formation of InxGa1−x N inclusions in a GaN matrix

MOCVD-grown heterostructures with one or several In_xGa_1?x N layers in a GaN matrix have been studied by transmission electron microscopy. In heterostructures with thick InGaN layers, a noncoherent system of domains with lateral dimensions (～50 nm) on the order of the layer thickness (～40 nm) is formed. In the case of ultrathin InGaN inclusions, nanodomains coherent with the GaN matrix are formed. The content of indium in nanodomains, determined by the DALI method, is as high as x≈0.6 or more, substantially exceeding the average In concentration. The density of the nanodomains formed in the structures studied is n≈(2–5)×10¹¹ cm^?2. In the structures with ultrathin InGaN inclusions, two characteristic nanodomain sizes are observed (3–6 and 8–15 nm).     

Luminescence Properties of GaN/InxGa1−xN/InyGa1−yN Double Graded Structures (Zigzag Quantum Wells)

Journal of Electronic Materials - We have designed graded InGaN quantum well (QW) structures with the In composition increasing then decreasing in a zigzag pattern. Through polarization doping,...