Microstructural, photocatalysis and electrochemical investigations on CeTi2O6 thin films

The properties of sol–gel derived CeTi₂O₆ thin films deposited using a solution of cerium chloride heptahydrate and titanium propoxide in ethanol are discussed. The effect of annealing temperature on structural, optical, photoluminescence, photocatalysis and electrochemical characteristics has been examined. Lowest annealing temperature for the formation of crystalline CeTi₂O₆ phase in these samples is identified as 580 °C. The optical transmittance of the films is observed to be independent of the annealing temperature. The optical energy bandgap of the 600 °C annealed film for indirect transition is influenced by the presence of anatase phase of TiO₂ in its structure. Fourier transform infrared spectroscopy investigations have evidenced increased bond strength of the Ti–O–Ti network in the films as a function of annealing temperature. The photoluminescence intensity of the films has shown dependence on the annealing temperature with the films fired at 450 °C exhibiting the maximum photoluminescence activity. The decomposition of methyl orange and eosin (yellow) under UV–visible light irradiation in the presence of crystalline CeTi₂O₆ films shows the presence of photoactivity in these films. The photocatalytic response of CeTi₂O₆ films is found to be superior to the TiO₂ films. In comparison to crystalline films, the amorphous films have shown superior electrochemical characteristics. The 500 °C annealed amorphous films have exhibited the most appropriate properties for incorporation in electrochromic devices comprising tungsten oxide as the primary electrochromic electrode.     

Investigation on the cross sensitivity of NO2 sensors based on In2O3 thin films prepared by sol-gel and vacuum thermal evaporation

In₂O₃ thin films have been prepared from commercially available pure In₂O₃ powders by high vacuum thermal evaporation (HVTE) and from indium iso-propoxide solutions by sol-gel techniques (SG). The films have been deposited on sapphire substrates provided with platinum interdigital sputtered electrodes. The as-deposited HVTE and SG films have been annealed at 500°C for 24 and 1 h, respectively. The film morphology, crystalline phase and chemical composition have been characterised by SEM, glancing angle XRD and XPS techniques. After annealing at 500°C the films’ microstructure turns from amorphous to crystalline with the development of highly crystalline cubic In₂O_3−x (JCPDS card 6-0416). XPS characterisation has revealed the formation of stoichiometric In₂O₃ (HVTE) and nearly stoichiometric In₂O_3−x (SG) after annealing. SEM characterisation has highlighted substantial morphological differences between the SG (highly porous microstructure) and HVTE (denser) films. All the films show the highest sensitivity to NO₂ gas (0.7–7 ppm concentration range), at 250°C working temperature. At this temperature and 0.7 ppm NO₂ the calculated sensitivities (S=R_g/R_a) yield S=10 and S=7 for SG and HVTE, respectively. No cross sensitivity have been found by exposing the In₂O₃ films to CO and CH₄. Negligible H₂O cross has resulted in the 40–80% relative humidity range, as well as to 1 ppm Cl₂ and 10 ppm NO. Only 1000 ppm C₂H₅OH has resulted to have a significant cross to the NO₂ response.     

RuO2–TiO2 mixed oxides prepared from the hydrolysis of the metal alkoxides

The hydrolysis of ruthenium alkoxide/titanium tetraethoxide mixtures to gels and powders containing 30–40 mol% Ru was investigated. Basic or neutral conditions led to powders consisting of 2–10 nm diameter crystalline RuO₂ nanoparticles embedded in a matrix of crystalline (anatase) and amorphous TiO₂. Acid hydrolysis conditions gave gels containing smaller, amorphous RuO₂ nanoparticles (1–3 nm). In all samples the RuO₂ nanoparticles tended to clump into aggregates up to 0.5 μm across. Acid or neutral hydrolysis of ruthenium ethoxide gave samples which displayed lower surface Ru:Ti ratios as measured by XPS compared to the bulk (XRF), and also contained more low-valent Ru (as measured by XRF), probably due to incomplete hydrolysis of the precursors. These samples also contained more Ru metal after calcination (XRD). Calcination (450 °C) was accompanied by Ru-promoted combustion of organic material and led to crystalline (anatase) TiO₂ and Ti_xRu_1−xO₂ solid solution (rutile phase).     

Thermal evolution of TiO2---ZrO2 composites prepared by chemical coating processing

A xZrO₂ (100−x)TiO₂ composite gel powder (x = 50 mol%) has been prepared by chemical processing of anatase as inner core coated with in situ precipitated amorphous zirconia as outer core, which was obtained from controlled hydrolysis of zirconyl chloride using ammonia at pH=9–10. The thermal evolution of this composite is reported, showing the crystallization of metastable cubic/tetragonal zirconia at 437°C, as detected by DTA at 10°C min⁻¹ and XRD, with activation energy of 407 ± 10 kJ mol⁻¹, and the feasibility of preparing zirconium titanate powders by reaction of TiO₂ and ZrO₂ by heating at higher temperatures is discussed.     

Microstructure modification of amorphous titanium oxide thin films during annealing treatment

Thin films of titanium oxide have been deposited on (100) silicon wafers and on quartz substrates by reactive r.f. magnetron sputtering from a 99.6% pure Titanium target. Amorphous and overoxidised coatings (TiO_2.2) have been obtained from this technique. The influence of the post-deposition annealing between 300 °C and 1100 °C on the structural and optical properties and on the surface morphology has been investigated. The results of X-ray diffraction showed that films annealed from 300 to 500 °C have an anatase crystalline structure whereas those annealed at 1100 °C have a rutile crystalline structure. Optical analyses showed that UV-Vis transmission spectra are strongly modified by the annealing temperature and refractive index of TiO_x layers also changes. Atomic force microscopy measurements corroborate optical and structural analyses and showed that the surface of the coatings can have various appearances and morphologies for the annealing temperatures investigated.     

Effect of SnO2 on the photocatalytical properties of TiO2 films

TiO₂/SnO₂ thin films with different tin atomic percentages were successfully prepared on glass substrates by the spray pyrolysis method from an alcoholic solution of TiO[C₅H₇O₂]₂ with different concentrations of SnCl₄. The TiO₂/SnO₂ thin films prepared at 450 °C presented the anatase phase in polycrystalline configuration from %Sn = 0 in the starting solution up to %Sn = 20, at higher tin content the films present an amorphous configuration. The resulting thin films have a homogeneous surface structure with some porosity. The photocatalytical properties of the films were evaluated with the degradation of methylene blue. The products of the degradation reaction were identified by ¹H nuclear magnetic resonance and the film properties were studied by atomic force microscopy, scanning electron microscopy, UV–Vis spectroscopy, and X-ray diffraction.     

Synthesis of nanocrystalline photocatalytic TiO2 thin films and particles using sol–gel method modified with nonionic surfactants

A simple sol–gel route has been developed for the preparation of nanocrystalline photocatalytic TiO₂ thin films and particles at 500 °C. The synthesis involved a novel chemistry method employing nonionic surfactant molecules as a pore directing agent along with acetic acid-based sol–gel route without direct addition of water molecules. This study investigated the effect of surfactant type and concentration on the homogeneity, morphology, light absorption, dye adsorption and degradation, and hydrophilicity of TiO₂ films as well as on the structural properties of the corresponding TiO₂ particles. The method resulted in the synthesis of mesoporous TiO₂ material with enhanced structural and catalytic properties including high surface area, large pore volume, pore size controllability, small crystallite size, enhanced crystallinity, and active anatase crystal phase. The prepared TiO₂ thin films were super-hydrophilic and possessed thermally stable spherical bicontinuous mesopore structure with highly interconnected network. Highly porous TiO₂ films prepared with polyethylene glycol sorbitan monooleate surfactant exhibited four times higher photocatalytic activity for the decoloration of methylene blue dye than the nonporous control TiO₂ films prepared without the surfactant. This sol–gel method modified with surfactant templates is useful in the preparation of nanostructured anatase TiO₂ thin films with high photocatalytic activity and desired pore structure.     

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

SiO₂/TiO₂ optical thin films with variable compositions have been prepared by ion beam induced and plasma enhanced chemical vapour deposition (IBICVD and PECVD). While the films obtained by IBICVD were very compact, the PECVD ones with a high content of Ti presented a columnar microstructure. The formation of Si–O–Ti bonds and a change in the environment around titanium from four- to six-coordinated has been proved by vibrational and X-ray absorption spectroscopies. The refractive index increased with the titanium content from 1.45 to 2.46 or 2.09 for, respectively, the IBICVD and PECVD films. Meanwhile, the band gap decreased, first sharply and then more smoothly up to the value of pure TiO₂. It is concluded that the optical properties of SiO₂/TiO₂ thin films can be properly tailored by using these two procedures.     

Preparation and antibacterial behavior of Fe-doped nanostructured TiO2 thin films

Fe³⁺-doped nanostructured TiO₂ thin films with antibacterial activity were prepared on soda–lime–silica glass slides by using sol–gel technology. Water containing Escherichia coli K-12 with TiO₂ thin films in was exposed to low intensity fluorescent light and antibacterial efficiency was evaluated with spread plate techniques. The films are porous and have anatase phase. Iron ions increased luminous energy utilization as the absorption edge of the Fe³⁺-doped film has a red shift compared to that of the pure TiO₂ film in the UV–VIS absorption spectrum. The bacterial removal efficiency reached 95% at the optimum concentration of iron ion (about 0.5% (mol)) after 120 min irradiation. The antibacterial behavior of the doped TiO₂ films was explicitly observed using scanning electron microscopy and cell wall damage was found.     

Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon

ZrO₂ films of thicknesses varied in the range of 3–30 nm were atomic layer deposited from ZrI₄ and H₂O–H₂O₂ on p-Si(100) substrates. The effects of film thickness and deposition temperature on the structure and dielectric properties of ZrO₂ were investigated. At 272 and 325 °C, the growth of ZrO₂ started with the formation of the cubic polymorph and continued with the formation of the tetragonal polymorph. The ratio between the lattice parameters increased with the film thickness and growth temperature. The effective permittivity, determined from the accumulation capacitance of Hg/ZrO₂/Si capacitors, increased with the film thickness, reaching 15–17 in 25-nm-thick films. The permittivity decreased with the increasing growth temperature. The hysteresis of the capacitance–voltage curves was the narrowest for the films deposited at 325 °C, and increased towards both lower and higher deposition temperatures.     

Structural, optical and electrical characterization of spray-deposited TiO2 thin films

Titanium oxide (TiO₂) thin films were deposited onto glass substrates by means of spray pyrolysis method using methanolic titanyl acetyl acetonate as precursor solution. The thin films were deposited at three different temperatures namely 350, 400 and 450 °C. As-deposited thin films were amorphous having 100–300 nm thickness. The thin films were subsequently annealed at 500 °C in air for 2 h. Structural, optical and electrical properties of TiO₂ thin films have been studied. Polycrystalline thin films with rutile crystal structure, as evidenced from X-ray diffraction pattern, were obtained with major reflexion along (1 1 0). Surface morphology and growth stages based on atomic force microscopy measurements are discussed. Electrical properties have been studied by means of electrical resistivity and thermoelectric power measurements. Optical study shows that TiO₂ possesses direct optical transition with band gap of 3.4 eV.     

光降解苯酚用rGO/Mo@TiO2纳米复合材料的制备及性能表征

利用溶胶-凝胶法,制备了TiO₂和Mo@TiO₂纳米粒子。采用液相沉积法,将TiO₂和Mo@TiO₂纳米粒子沉积到GO上面,制备了rGO/TiO₂和rGO/Mo@TiO₂纳米复合材料。利用SEM、XRD、XPS、FT-IR和拉曼光谱分别对TiO₂、Mo@TiO₂、rGO/TiO₂和rGO/Mo@TiO₂样品的形貌、晶型结构、离子状态以及材料的复合情况进行了研究;利用紫外-可见分光光度计测定了样品的UV-Vis吸收光谱。结果表明,制备的所有样品中的TiO₂均为锐钛矿型,且GO大部分被还原成了rGO;Mo@TiO₂、rGO/TiO₂和rGO/Mo@TiO₂样品的UV-Vis吸收光谱谱带向可见光区域内明显移动,纳米复合材料可见光利用率得到明显提升;Mo和rGO的引入,使样品的Ti2p和Mo3d光谱强度降低,XPS光谱均发生了红移,从而导致TiO₂表面化学环境发生变化,特征峰向较高的结合能处偏移;SEM分析表明,rGO和TiO₂之间具有良好的相互作用,在rGO表面沉积Mo@TiO₂颗粒后,其形貌保持不变,形成了rGO/Mo@TiO₂纳米复合材料;rGO/Mo@TiO₂纳米复合材料的光催化活性最高,3 h对p-NP的降解率为84%,而TiO₂、rGO/TiO₂和Mo@TiO₂3 h对p-NP的降解率分别为26%,42%和61%。     

Preparation and properties of radiofrequency sputtered X-ray amorphous films in the system SiO2–ZrO2

Amorphous films in the system SiO₂–ZrO₂ were prepared by radiofrequency sputtering method and their density, refractive index, elastic constants, and thermal expansion coefficient were measured. All of the physical properties had a similar compositional dependence; that is, they increased, but not proportionally, with increasing ZrO₂ content. The coordination states of cations in these amorphous films were estimated by the compositional dependence of volume and molar refractivity. The coordination state of silicon ions in the amorphous films did not change, but the coordination number of zirconium ions changed from 8 to 6, depending on ZrO₂ content. These results indicate that, in amorphous films in the system SiO₂–ZrO₂, the change of the coordination state of zirconium ions in the amorphous films has an important effect on the properties.     

N、Fe共掺杂纳米TiO2的制备和性能

以钛酸丁酯为钛源,用醇热法制备了N、Fe单掺杂及共掺杂纳米TiO₂。对样品的晶型结构、表面形貌、比表面积、紫外可见吸收、光致发光和分解水制氢催化性能分别进行了表征。结果表明,在500℃退火的N、Fe共掺杂TiO₂样品均为锐钛矿相棱形纳米颗粒,分散性较好,平均粒径约20 nm;N、Fe共掺杂的摩尔分数分别为5.0%和2.0%时,样品具有良好的可见光吸收活性,对光的吸收从387 nm（未掺杂锐钛矿相TiO₂）红移至510 nm处。主要原因可能是,N和Fe共掺杂在其禁带中产生杂质能级,导致其禁带宽度减小;N、Fe单掺杂及共掺杂改性,有效抑制了电子-空穴的复合,提高了光生载流子的分离效率;在可见光下（λ>400 nm）N、Fe共掺杂TiO₂具有较高的光催化分解水制氢活性,氢气生成速率为299.2μmol·g^-1·h^-1。     

Hydrophilicity on carbon-doped TiO2 thin films under visible light

Carbon-doped TiO₂ thin films in the anatase phase with dopant concentrations of 1.1, 0.9, and 0.7 mol% were fabricated by a radio-frequency magnetron sputtering method. Dopant carbons were located at the oxygen sites. Carbon substitution caused the absorbance edge and/or the shoulder of TiO₂ to shift to a higher wavelength region. Carbon-doped TiO₂ thin films underwent a hydrophilic conversion when irradiating with visible light (400–530 nm). The hydrophilic property under visible light was inferior to that under ultraviolet light, which is explained by considering that the visible light sensitivity originates from the localized C 2p formed in the band-gap.     

Effect of substrate temperature on the texture and structure of polycrystalline Si0.7Ge0.3 films deposited on SiO2 by molecular beam deposition

The evolution of microstructure and texture of molecular beam deposited Si_0.7Ge_0.3 films on SiO₂ at the deposition temperature range of 400–700°C was investigated by X-ray diffraction and transmission electron microscopy. At deposition temperatures between 400 and below 500°C, the films were directly deposited as a mixed-phase on SiO₂ and have a inversely cone-shaped structure. In this temperature range deposited as a mixed-phase, the grain size increases as the temperature increases, so that the grains not only grow up by deposition, but also laterally grow by the solid phase crystallization, furthermore, the texture is changed from a {110} texture to mixed {311} and {110} textures. At 500°C, the film was deposited as only a crystalline phase and has a columnar structure with a strong {110} texture. In the temperature range of 500–700°C, as the temperature increases, the {311} and {111} textures develop whereas the {110} texture reduces. The film deposited at 700°C has a random orientation and structure.     

Comparison of the electrochemical behavior of CeO2–SnO2 and CeO2–TiO2 electrodes produced by the Pechini method

CeO₂–SnO₂ and CeO₂–TiO₂ thin films were prepared by the Pechini method and their characteristics were compared, using a fractional factorial design to quantify the effect of five preparation variables. It was observed that CeO₂–SnO₂ electrodes show a greater electrochemical response than the CeO₂–TiO₂ films. The best intercalation charge densities were 18.11 and 9.91 mC/cm² for CeO₂–SnO₂ and CeO₂–TiO₂, respectively. Both films were optically inactive with transparencies, in most cases, higher than 90%.     

g-C3N4/Ag/TiO2 NTs的制备及其对西维因的光催化降解

采用阳极氧化法制备二氧化钛纳米管(TiO₂ NTs),然后在紫外光和微波辅助下引入Ag、g-C₃N₄制备出g-C₃N₄/Ag/TiO₂ NTs三元复合光催化材料。用扫描电镜(SEM)、X-射线衍射(XRD)、X-射线光电子能谱(XPS)、紫外-可见漫反射光谱(UV-Vis)、光致发光(PL)等手段对g-C₃N₄/Ag/TiO₂ NTs进行表征,研究了这种材料对西维因的降解性能。结果表明,在模拟太阳光照射下,g-C₃N₄/Ag/TiO₂ NTs对西维因的降解率由TiO₂ NTs的29.1%提高到51.8%。光催化活性的提高,与Ag表面等离子体共振效应、Ag优异的电荷传导性以及g-C₃N₄与TiO₂ NTs界面的异质结有关。     

介孔电气石/TiO2复合材料的制备及其模拟太阳光光催化性能

采用一步溶胶-凝胶共缩合结合溶剂热合成技术制备出一系列介孔电气石/TiO₂复合材料,表征了复合材料的相结构、形貌、孔隙率、光吸收性质以及组成结构.结果表明:制备的电气石/TiO₂复合材料具有纯锐钛矿晶相、均匀的介孔结构、较大的比表面积(205~242 m²·g^-1)、均匀的孔径分布(3.4~3.8 nm)以及较低的带隙能(3.0 eV).在模拟太阳光照射下,电气石/TiO₂复合材料可以被成功地应用于水中有机污染物罗丹明B和诺氟沙星的降解.降解动力学研究表明:电气石的掺杂提高了TiO₂的光催化量子效率,降低了TiO₂的带隙能.对罗丹明B的降解,电气石掺杂量为1wt%~5wt%的电气石/TiO₂复合材料表现出比纯TiO₂更高的降解速率,对诺氟沙星的降解,电气石/TiO₂复合材料的降解速率高于纯TiO₂的.     

Formation of Mg–Al–Ti/MgO composite via reduction of TiO2

This paper investigates the possibility of reduction of TiO₂ through the mechanical alloying of Mg and TiO₂ powders. Elemental Mg and Al powders were first mixed with TiO₂ according to the nominal composition of Mg5wt.%–Al17.15wt.%–TiO₂. The powder mixture was mechanically milled in a planetary ball mill for different durations. Two types of DSC curves have been observed. The unmilled powders showed no reaction when heated to about 500 °C, while an exothermic reaction in the mechanically milled powders was observed at about 390 °C. Further investigation of the heat treatment of the mechanically milled powders showed the complete disappearance of TiO₂ and the formation of MgAl₂O₄ after annealing at 400 °C, implying that reduction of TiO₂ has occurred via the mechanical activation and annealing processes.