热压烧结ITO靶材物相组成与电子结构研究

采用XRD、XPS对ITO固溶烧结前后物相结构及靶材表面In、Sn、O三元素价态进行表征和研究。结果发现:ITO固溶体中溶质与溶剂离子的半径差异较大是引发掺杂后XRD图谱谱峰偏移的主要原因;而XPS图谱中谱峰偏移则是Sn掺杂导致ITO导带中电子态占有率增加、Fermi能级升高的缘故。研究结果为制备成分、结构均匀的高密度ITO靶材提供了有益的参考。     

铝酸钡盐电子发射材料的研究

采用液相共沉淀法和机械混合法成功制备了阴极用(nBaO:nCaO: nAl2O3=6:1:2)铝酸盐,并研究了烧结温度对612铝酸盐的影响,同时探讨其烧结机制以及烧结过程中物相之间存在的化学反应。采用扫描电镜、能谱仪、X射线衍射仪和激光粒度分析仪对铝酸盐形貌、粒度分布以及物相变化进行了研究。结果表明：采用液相共沉淀法成功制备出亚微米粒径的准球形前驱粉末,D (n, 50)值仅为815 nm。前驱粉末经过高温烧结(1500 ℃b)后,得到了晶化程度高,主晶相为Ba5CaAl4O12的612铝酸盐,浸渍钡钨阴极后,1100 ℃b下的发射电流密度达15.56 A/cm-2,蒸发速率仅为14.5 nm/h     

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针对一种进口和国产的ITO靶材,用AES（SEM、SAM）、XPS、UPS和XRD进行了比较研究,通过研究发现两种样品的差别,为提高国产靶材的质量,提供一些改进意见。     

浅谈我国镁粉生产的发展历程

介绍了我国镁粉生产的发展历程，阐述了不同时期，不同粒度、形状镁粉的生产工艺，以及用途、特点和今后的发展方向。     

ITO薄膜的生产技术概况及发展趋势探讨

综述了铟锡氧化物(ITO)薄膜的生产技术概况及其发展趋势.介绍了ITO薄膜的主要制备技术的制备原理,包括磁控溅射法、溶胶-凝胶法、化学气相沉淀法、喷雾热分解法及真空蒸发法等5种制膜工艺,并对其优缺点进行了分析.指出ITO薄膜生产技术的发展趋势为:1)大力开发溶胶-凝胶工艺;2)进一步深入研究其合成机理与性能;3)拓宽应用领域;4)开发先进的薄膜制备工艺技术.     

Structure and magnetic properties of melt-spun Sm-Fe-Nb ribbons and their nitrides

SmFe_10-xNb_x(x = 0, 0.1, 0.2, 0.3) ribbons and their nitrides were prepared by melt-spinning, followed by annealing and subsequent nitriding. The structure and magnetic properties were investigated by means of X-ray diffraction(XRD) using the Rietveld method, vibrating sample magnetometer(VSM), transmission electron microscope(TEM) and Mossbauer spectroscopy. XRD analysis shows that the addition of Nb can impede the precipitation of Sm_2 Fe₁₇ and a-Fe phases and the Nb atoms occupy 2 e site in the alloys. At 300 K, the mean hyperfine fields of 2 e site are 29.58 T with Nb doping at x = 0.1 and the corresponding Curie temperature is 552 K. The optimal properties of remanence of B_r = 0.9 T, intrinsic coercivity of H_cj= 741.5 kA·m^-1, and maximum magnetic energy product of(BH)_max= 124.2 kJ·m^-3 are gained at x = 0.10 in the nitrides.     

Preparation of ITO transparent conductive film by sol-gel method

1Introduction Indium tin oxide(ITO)films are widely used as transparent conductive layers in a large variety of applications such as thin film transistor(TFT)[1,2],liquid crystal displayers(LCD)[3,4],smart mirrors for the windows,solar cells,electrolumine…     

Preparation of Sn-doped In2O3 nanopowders by a solvothermal process

Sn-doped In2O3 (ITO) nanopowders in square shape were prepared in ethylene solvent by a solvothermal process,using In (4N) and SnCl4·5H2O as starting materials.The effects of solvothermal temperature and coprecipitation pH on the products were investigated using XRD,XPS,and TEM.Mixtures of InOOH crystals and In4Sn3O12 crystals were prepared at 210℃ or 230℃ and ITO nanopowders with cubic structure were obtained at 250℃ or above 250℃.When the coprecipitation pH was 6,the product was ITO with impurity Sn3O4- When the pH was 9,the product was single phase ITO.     

Gd-Ba-Cu-O超导块材用原始粉Gd2BaCuO5（Gd211）粉的制备

分别采用3种方法在不同烧结温度下制备Gd211粉末。利用X射线衍射(XRD)、扫描电镜(SEM)、激光粒度分析等手段对3种制备方法进行比较研究。Gd211的成相温度约在900℃以上。随着烧结温度的升高，粉末的碳含量明显降低，但粒子尺寸逐渐增人，且由均匀的球形颗粒变成越来越来规则的大颗粒。3种制备方法相比，草酸盐共沉淀法相对复杂，但合成的材料颗粒较细且均匀，碳含呈很低，是最理想的制备Gd211的方法。     

关键工艺参数对铬酸镧粉体形态的影响

采用Pechini法制备了铬酸镧超细粉体,在系统分析Pechini法工艺的基础上,找出了影响粉体形貌的关键因素,即柠檬酸量、乙二醇量、凝胶干燥温度、加热速率和煅烧温度,并确定了最佳工艺参数.结果表明,在柠檬酸与金属阳离子的摩尔比1.2∶1、乙二醇与柠檬酸的摩尔比3∶1条件下制得的凝胶在80 ℃干燥,并将干凝胶在800 ℃直接煅烧,可以获得均匀、极少团聚的铬酸镧超细粉体,平均粒径约为40 nm.     

热处理对湿法制备ITO薄膜性能的影响

用湿法涂布的方式制备了ITO透明导电膜,考察了不同热处理条件对ITO薄膜性能的影响。结果表明,随着热处理温度的升高,ITO薄膜的导电性和透光性均逐渐增强;随着热处理时间的延长,ITO透明导电膜的电阻率表现出先增强后减弱的趋势,透光率随着热处理时间的延长而增强到某一程度后,继续延长热处理时间其透光率保持不变;真空环境有利于提高ITO透明导电膜的导电性。     

纳米ITO/WPU复合隔热材料的制备与性能

采用溶胶-凝胶技术制备氧化铟锡(ITO)纳米粉体,以异佛尔酮二异氰酸酯(IPDI)为原料合成水性聚氨酯(WPU),再以自制的WPU与ITO湿浆采用共混法制备纳米ITO/WPU有机无机复合材料,并对涂层的基本性能、光学性能、隔热性能等指标进行表征测试。结果表明:所制得的纳米ITO/WPU涂膜的拉伸强度和断裂伸长率分别达到了9.28MPa、268%;具有良好的隔热效果和足够的可见光区透明度,可见光透射率达80%以上;红外线透过率小于25%。     

低温燃烧合成Ce0.8Nd0.2O1.9固溶体纳米粉末

采用低温燃烧合成工艺在甘氨酸-硝酸盐体系中制备出Ce0.8Nd0.2O1.9固溶体纳米粉末,重点考察了甘氨酸与硝酸盐的配比（G/N）以及焙烧温度对粉末特性的影响.通过热重-差示扫描量热分析（TG-DSC）得知,燃烧反应的点火温度为257℃.利用X射线衍射（XRD）、透射电镜（TEM）、比表面积仪（BET）及傅里叶红外光谱（FTIR）等手段对粉末的结构、形貌、成分、尺寸及比表面积进行了分析.结果表明：燃烧反应后直接得到萤石型结构的单相固溶体,晶粒尺寸为8nm-12nm之间，比表向积为38m^2/g～47m^2／g；晶粒尺寸随焙烧温度升高而增加，在800℃下焙烧1h后，可以去除反应残留物质，并使获得的品形更加完整。     

低温燃烧合成Ce_(0.8)Nd_(0.2)O_(1.9)固溶体纳米粉末

采用低温燃烧合成工艺在甘氨酸-硝酸盐体系中制备出Ce0.8Nd0.2O1.9固溶体纳米粉末,重点考察了甘氨酸与硝酸盐的配比(G/N)以及焙烧温度对粉末特性的影响。通过热重-差示扫描量热分析(TG-DSC)得知,燃烧反应的点火温度为257℃。利用X射线衍射(XRD)、透射电镜(TEM)、比表面积仪(BET)及傅里叶红外光谱(FTIR)等手段对粉末的结构、形貌、成分、尺寸及比表面积进行了分析。结果表明:燃烧反应后直接得到萤石型结构的单相固溶体,晶粒尺寸为8nm~12nm之间,比表面积为38m2/g~47m2/g;晶粒尺寸随焙烧温度升高而增加,在800℃下焙烧1h后,可以去除反应残留物质,并使获得的晶形更加完整。     

钨粉表面化学镀铜研究

为了提高钨粉制品的性能,采用正交实验方法,利用SEM、XRD、EDS等分析手段,系统研究了化学镀铜主要工艺参数对钨粉表面化学镀铜的影响规律。结果表明:在温度固定条件下,各因素对镀液稳定性影响的显著性顺序是:硫代硫酸钠加入量>pH值>χ(Tar2-/Cu2 )>甲醛加入量,而对镀速影响的显著性顺序是:χ(Tar2-/Cu2 )>pH值>甲醛加入量>硫代硫酸钠加入量;较佳的钨粉表面化学镀铜工艺为:五水硫酸铜8g/L;酒石酸钾钠28g/L;EDTA0.75g/L;NaOH8.5g/L;硫代硫酸钠10mg/L;甲醛7.5ml/L;pH=12;温度40℃。采用所推荐的工艺,成功的在钨粉上获得了化学镀铜层。     

等离子喷涂陶瓷粒子加热加速行为的数值模拟

通过数值模拟研究了等离子喷涂陶瓷粒子的加热加速行为。用SprayWatch-2i粒子测速仪测定的典型工艺条件下等离子喷涂陶瓷粒子的状态参量进行验证,结果表明:测量结果与计算结果吻合较好。系统地研究了气体参数和粒子参数对粒子加热加速行为的影响,为提高等离子喷涂效率和获得高质量涂层提供理论依据。     

等离子喷涂陶瓷粒子加热加速行为的数值模拟

通过数值模拟研究了等离子喷涂陶瓷粒子的加热加速行为。用SprayWatch-2i粒子测速仪测定的典型工艺条件下等离子喷涂陶瓷粒子的状态参量进行验证，结果表明：测量结果与计算结果吻合较好。系统地研究了气体参数和粒子参数对粒子加热加速行为的影响，为提高等离子喷涂效率和获得高质量涂层提供理论依据。     

Indium tin oxide nanosized composite powder prepared using waste ITO target

Indium tin oxide （ITO） nano-particles were prepared directly using waste ITO target, which had been coated by magnetron controlled sputtering. The waste ITO target was cleaned with de-ionized water, and then dissolved in acid, filtrated, neutralized, manipulated through azeotropic distillation and finally dried, and in this way the precursor of indium tin hydroxide was obtained. The nanosized rio composite powder was prepared after the precursor heat-treated at 500℃ for 2 h. TEM images show a narrow distribution of particle size is 5-20 nm and the particle size can be controlled. Its granule has a spherical shape and the dispersion of the particle is well. X-ray diffraction （XRD） patterns indicate the only cubic In2O3 phase in the ITO powder hot-treated at 500℃. The purity of ITO composite powder is 99.9907%. The content of radium within filtrate was detected by using the EDTA titration of determination of indium in the ITO powder and ITO target. Appropriate amount of SnCl4.5H2O was dissolved in the filtrate, and then ITO powder containing 10 wt.% SnO2 was successfully prepared by heat-treating.     

氧化铟锡(ITO)薄膜溅射生长及光电性能调控

目的 选取影响氧化铟锡(ITO)薄膜生长关键的3种参数,即薄膜生长的氧气流量、薄膜厚度和热处理退火,系统研究其对ITO薄膜光学和电学性能的影响规律。方法 采用直流溅射法,在氩气和氧气混合气氛中溅射陶瓷靶材制备ITO薄膜样品。利用真空热处理技术对所制备的ITO薄膜进行真空退火处理。通过表面轮廓仪测试厚度、X-射线衍射仪(XRD)表征结构、X-射线光电子能谱仪(XPS)分析元素含量、分光光度计测试透过率和四探针测试薄膜方块电阻,分别评价薄膜厚度、光学性能和电学性能,并对比研究热处理对薄膜结构和光电性能的影响规律。结果 电阻率随氧气流量的增加呈现出先缓慢后急剧升高的规律,在氩气和氧气流量比为150∶8时,可得到400 nm厚、电阻率为8.0×10^?4 ?.cm的ITO薄膜。厚度增加可降低薄膜电阻率,氧气流量的增加可明显改善薄膜透光性。通过真空热处理可提高室温沉积ITO薄膜的结晶性能,较大程度地降低电阻率。在真空热处理条件下增大薄膜厚度可降低薄膜电阻率,氧气流量增加不利于ITO薄膜电阻率的降低。在氩气和氧气流量为150∶6条件下制备的ITO薄膜,经500 ℃真空热处理后电阻率可达到最低值(2.7×10^?4 ?.cm)。结论 通过调控氧气流量和厚度来优化ITO薄膜的结构和氧空位含量,低温下利用磁控溅射法可制备光电性能优异的ITO薄膜;真空热处理可提高薄膜结晶性能,通过氧气流量、厚度和热处理温度3种参数调控可获得最低电阻率的晶态ITO薄膜(2.7×10^?4 ?.cm),满足科技和工程领域的需求。     

Microstructure and properties of pLASMA-sPRAYED Mo-Mo2C composites

Thermally sprayed molybdenum coatings are used in a variety of industrial applications, such as auto-motive piston rings, aeroturbine engines, and paper and plastics processing machinery. Molybdenum ex-hibits excellent scuffing resistance under sliding contact conditions. However, plasma-sprayed molybde-num coatings are relatively soft and require dispersion strengthening (e.g., Mo₂C) or addition of a second phase (e.g., NiCrBSi) to improve hardness, wear resistance, and thus coating performance. In this study, Mo-Mo₂C composite powders were plasma sprayed onto mild steel substrates. Considerable decarburi-zation was observed during air plasma spraying—a beneficial condition because carbon acts as a sacrifi-cial getter for the oxygen, thereby reducing the oxide content in the coating. Finer powders showed a greater degree of decarburization due to the increased surface area; however, the starting carbide con-tent in the powder exerted very little influence on the extent of decarburization. The friction properties of Mo-Mo₂C coatings were significantly improved compared to those of pure molybdenum under con-tinuous sliding contact conditions. It also was found that the abrasion resistance of the coatings improved with increasing carbide addition.