Distributed 2- and 3-bit W-band MEMS phase shifters on glass substrates

This paper presents state-of-the-art RF microelectromechanical (MEMS) phase shifters at 75-110 GHz based on the distributed microelectromechanical transmission-line (DMTL) concept. A 3-bit DMTL phase shifter, fabricated on a glass substrate using MEMS switches and coplanar-waveguide lines, results in an average loss of 2.7 dB at 78 GHz (0.9 dB/bit). The measured figure-of-merit performance is 93/spl deg//dB-100/spl deg//dB (equivalent to 0.9 dB/bit) of loss at 75-110 GHz. The associated phase error is /spl plusmn/3/spl deg/ (rms phase error is 1.56/spl deg/) and the reflection loss is below -10 dB over all eight states. A 2-bit phase shifter is also demonstrated with comparable performance to the 3-bit design. It is seen that the phase shifter can be accurately modeled using a combination of full-wave electromagnetic and microwave circuit analysis, thereby making the design quite easy up to 110 GHz. These results represent the best phase-shifter performance to date using any technology at W-band frequencies. Careful analysis indicates that the 75-110-GHz figure-of-merit performance becomes 150/spl deg//dB-200/spl deg//dB, and the 3-bit average insertion loss improves to 1.8-2.1 dB if the phase shifter is fabricated on quartz substrates.     

A compact V-band 2-bit reflection-type MEMS phase shifter

Air-gap overlay CPW couplers and low-loss series metal-to-metal contact microelectromechanical system (MEMS) switches have been employed to reduce the loss of reflection-type MEMS phase shifters at V-band. Phase shift is obtained by changing the lengths of the open-ended stubs using series MEMS switches. A 2-bit [135] reflection-type MEMS phase shifter showed an average insertion loss of 4 dB with return loss better than 11.7 dB from 50 to 70 GHz. The chip is very compact with a chip size as small as 1.5 mm /spl times/ 2.1 mm.     

2.4 GHz continuously variable ferroelectric phase shifters using all-pass networks

Continuously variable ferroelectric (BST on sapphire) phase shifters based on all-pass networks are presented. An all-pass network phase shifter consists of only lumped LC elements, and thus the total size of the phase shifter is kept to less than 2.2 mm /spl times/ 2.6 mm at 2.4 GHz. The tunability (C/sub max//C/sub min/) of a BST interdigital capacitor is over 2.9 with a bias voltage of 140 V. The phase shifter provides more than 121/spl deg/ phase shift with the maximum insertion loss of 1.8 dB and the worst case return loss of 12.5 dB from 2.4 GHz to 2.5 GHz. By cascading two identical phase shifters, more than 255/spl deg/ phase shift is obtained with the maximum insertion loss of 3.75 dB. The loss figure-of-merit of both the single- and double-section phase shifters is over 65/spl deg//dB from 2.4 GHz to 2.5 GHz.     

RF MEMS phase shifters based on PCB MEMS technology

An X-band main-line type loaded line RF MEMS phase shifter fabricated using printed circuit based MEMS technology is reported. The phase shifter provides a phase shift of 31.6/spl deg/ with a minimum insertion loss of 0.56 dB at 9 GHz for an applied DC bias voltage of 40 V. These phase shifters are suitable for monolithic integration with low-cost phased arrays on Teflon or Polyimide such as low dielectric constant substrates.     

A Monolithic Phased Array Using 3-bit Distributed RF MEMS Phase Shifters

This paper presents a novel electronically scanning phased-array antenna with 128 switches monolithically implemented using RF microelectromechanical systems (MEMS) technology. The structure, which is designed at 15 GHz, consists of four linearly placed microstrip patch antennas, 3-bit distributed RF MEMS low-loss phase shifters, and a corporate feed network. MEMS switches and high-Q metal-air-metal capacitors are employed as loading elements in the phase shifter. The system is fabricated monolithically using an in-house surface micromachining process on a glass substrate and occupies an area of 6 cm times 5 cm. The measurement results show that the phase shifter can provide nearly 20deg/50deg/95deg phase shifts and their combinations at the expense of 1.5-dB average insertion loss at 15 GHz for eight combinations. It is also shown by measurements that the main beam can be steered to required directions by suitable settings of the RF MEMS phase shifters.     

A fully integrated SOI RF MEMS technology for system-on-a-chip applications

In this paper, a silicon-on-insulator (SOI) radio-frequency (RF) microelectromechanical systems (MEMS) technology compatible with CMOS and high-voltage devices for system-on-a-chip applications is experimentally demonstrated for the first time. This technology allows the integration of RF MEMS switches with driver and processing circuits for single-chip communication applications. The SOI high-voltage device (0.7-/spl mu/m channel length, 2-/spl mu/m drift length, and over 35-V breakdown voltage), CMOS devices (0.7-/spl mu/m channel length and 1.3/-1.2 V threshold voltage), and RF MEMS capacitive switch (insertion loss 0.14 dB at 5 GHz and isolation 9.5 dB at 5 GHz) are designed and fabricated to show the feasibility of building fully integrated RF systems. The performance of the fabricated RF MEMS capacitive switches on low-resistivity and high-resistivity SOI substrates will also be compared.     

High-isolation W-band MEMS switches

This paper presents the design, fabrication and measurement of single, T-match and π-match W-band high-isolation MEMS shunt switches on silicon substrates. The single and T-match design result in -20 dB isolation over the 80-110 GHz range with an insertion loss of 0.25±0.1 dB. The π-match design results in a reflection coefficient lower than -20 dB up to 100 GHz, and an isolation of -30 to -40 dB from 75 to 110 GHz (limited by leakage through the substrate). The associated insertion loss Is 0.4±0.1 dB at 90 GHz. To our knowledge, this is the first demonstration of high-performance MEMS switches at W-band frequencies     

Ka波段分布式MEMS移相器低驱动电平容性开关的机电设计

为降低Ka波段分布式MEMS移相器容性开关的驱动电压,提出不同形状新型低弹性系数铰链梁结构MEMS电容开关的机电设计概念.采用Intelli SuiteTM和ADS软件分析了三种梁结构MEMS电容开关的位移分布、驱动电压、机械振动模式和射频性能等参数,结果表明:所设计新型beam2结构MEMS电容开关具有优越的机电特性和射频特性,即开关的驱动电压为3V,机械振动模式固有频率都大于31kHz,在35GHz处插入损耗和回波损耗分别为0.082dB和18.6dB,而相移量可达到105.9o.     

A low-loss single-pole six-throw switch based on compact RF MEMS switches

A low-loss single-pole six-throw (SP6T) switch using very compact metal-contact RF microelectromechanical system (MEMS) series switches is presented. The metal-contact MEMS switch has an extremely compact active area of 0.4 mm /spl times/ 0.3 mm, thus permitting the formation of an SP6T MEMS switch into the RF switch with a total area of 1 mm/sup 2/. The MEMS switch shows an effective spring constant of 746 N/m and an actuation time of 8.0 /spl mu/s. It has an isolation loss from -64.4 to -30.6dB and an insertion loss of 0.08-0.19 dB at 0.5-20 GHz. Furthermore, in order to evaluate RF performances of the SP6T MEMS switch, as well as those of the single-pole single-throw RF MEMS series switch, we have performed small-signal modeling based on a parameter-extraction method. Accurate agreement between the measured and modeled RF performances demonstrates the validity of the small-signal model. The SP6T switch performed well with an isolation loss from -62.4 to -39.1dB and an insertion loss of 0.19-0.70 dB from dc to 6 GHz between the input port and each output port.     

Switchable low-loss RF MEMS Ka-band frequency-selective surface

A switchable frequency-selective surface (FSS) was developed at 30 GHz using RF microelectromechanical systems (MEMS) switches on a 500-/spl mu/m-thick glass substrate. The 3-in-diameter FSS is composed of 909 unit cells and 3636 MEMS bridges with a yield of 99.5%. The single-pole FSS shows a transmission loss of 2.0 dB and a -3-dB bandwidth of 3.2 GHz at a resonant frequency of 30.2 GHz with the MEMS bridges in the up-state position. The -1-dB bandwidth is 1.6 GHz. When the MEMS bridges are actuated to the down-state position, an insertion loss of 27.5 dB is measured. Theory and experiment agree quite well. The power handling is limited to approximately 25 W with passive air cooling and >150 W with active air cooling due to the increased temperature of the overall circuit resulting from the transmission loss (for continuous-wave operation with the assumed maximum allowable temperature of 80/spl deg/C), or 370 W-3.5 kW due to self-actuation of the RF MEMS bridges (for pulsed incident power). Experimental results validate that 20 W of continuous-wave power can be transferred by the RF MEMS FSS with no change in the frequency response. This is the first demonstration of a switched low-loss FSS at Ka-band frequencies.     

New miniature 15-20-GHz continuous-phase/amplitude control MMICs using 0.18-/spl mu/m CMOS technology

The design and performance of two new miniature 360/spl deg/ continuous-phase-control monolithic microwave integrated circuits (MMICs) using the vector sum method are presented. Both are implemented using commercial 0.18-/spl mu/m CMOS process. The first phase shifter demonstrates all continuous phase and an insertion loss of 8 dB with a 37-dB dynamic range from 15 to 20 GHz. The chip size is 0.95 mm /spl times/ 0.76 mm. The second phase shifter can achieve all continuous phase and an insertion loss of 16.2 dB with a 38.8-dB dynamic range at the same frequency range. The chip size is 0.71 mm /spl times/ 0.82 mm. To the best of the authors' knowledge, these circuits are the first demonstration of microwave CMOS phase shifters using the vector sum method with the smallest chip size for all MMIC phase shifters with 360/spl deg/ phase-control range above 5 GHz reported to date.     

Fabrication and accelerated hermeticity testing of an on-wafer package for RF MEMS

A hermetic silicon micromachined on-wafer dc-to-40-GHz packaging scheme for RF microelectromechanical systems (MEMS) switches is presented. The designed on-wafer package has a deembedded insertion loss of 0.03 dB per transition up to 40 GHz (a total measured loss of 0.3 dB including a 2.7-mm-long through line) and a return loss below -18dB up to 40 GHz. The hermeticity of the packaged is tested using an autoclave chamber with accelerated conditions of 130/spl deg/C, 2.7 atm of pressure, and 100% relative humidity. The fabrication process is designed so as to be completely compatible with the MEMS switch process, hence, allowing the parallel fabrication of all the components on a single wafer. The on-wafer proposed packaging approach requires no external wiring to achieve signal propagation and, thus, it has the potential for lower loss and better performance at higher frequencies.     

Fabrication, assembly, and testing of RF MEMS capacitive switches using flexible printed circuit technology

A novel approach for cost effective fabrication, assembly, and packaging of radio-frequency microelectromechanical systems (RF MEMS) capacitive switches using flexible circuit processing techniques is reported. The key feature of this approach is the use of most commonly used flexible circuit film, Kapton-E polyimide film, as the movable switch membrane. The physical dimensions of these switches are in the mesoscale range. For example, electrode area and gap height of a capacitive shunt switch on coplanar waveguide are 2 /spl times/ 1 mm/sup 2/ and 43 /spl mu/m, respectively. Pull-down voltage is in the range of 90-100 V. In the ON state (up-position), the insertion loss is less than 0.3-0.4 dB up to 30 GHz. In OFF state (down-position), the isolation value is about 15 dB at 12 GHz and increases to 36 dB at 30 GHz. These switches are uniquely suitable for batch integration with printed circuits and antennas on laminate substrates.     

A 2-bit RF MEMS phase shifter in a thick-film BGA ceramic package

The development of a thick-film hermetic BGA package for a radio-frequency (RF) microelectromechanical systems (MEMS) 2-bit phase shifter is presented. The measured packaged MEMS phase shifter average in-band insertion loss was 1.14 dB with an average return loss of 15.9 dB. The package transition insertion loss was less than 0.1 dB per transition with excellent agreement between simulated and measured results. It was also demonstrated that the RF MEMS phase shift performance could be improved to obtain a phase error of less than 3.3 degrees. The first reported measurements of the average rise and fall times associated with a MEMS circuit (in this case a 2-bit phase shifter) were 26 and 70 /spl mu/s, respectively. The advent of packaged RF MEMS phase shifters will reduce the cost (both design and building) of future phase arrays.     

A DC to 10-GHz 6-b RF MEMS time delay circuit

A 6-b radio frequency (RF) microelectromechanical system (MEMS) time-delay circuit operating from dc to 10 GHz with 393.75-ps total time delay is presented. The circuit is fabricated on 250-/spl mu/m-thick alumina and uses metal contacting RF MEMS switches to realize series-shunt SP4T switching networks. The circuit demonstrates 1.8+/-0.6 dB of loss at 10 GHz and has linear phase response across the entire band with accuracy of better than a least significant bit for most states.     

Compact single-pole six-throw switch using centre-anchor MEMS switches

A single-pole six-throw switch based on centre-anchor MEMS switches is presented. It has a chip size of 1 mm/sup 2/ and shows isolation of -48 dB and insertion loss of -0.5 dB between P1 and P4 at 6 GHz. Also, to evaluate the RF performance, the SP6T switch has been modelled using a structure-based /spl pi/ small-signal model.     

A 2-bit miniature X-band MEMS phase shifter

The design and performance of a compact low-loss X-band true-time-delay (TTD) MEMS phase shifter fabricated on 8-mil GaAs substrate is described. A semi-lumped approach using microstrip transmission lines and metal-insulator-metal (MIM) capacitors is employed for the delay lines in order to both reduce circuit size as well as avoid the high insertion loss found in typical miniaturized designs. The 2-bit phase shifter achieved an average insertion loss of -0.70 dB at 9.45 GHz, and an associated phase accuracy of /spl plusmn/1.3/spl deg/. It occupies an area of only 5 mm/sup 2/, which is 44% the area of the smallest known X-band MEMS phase shifter . The phase shifter operates over 6-14 GHz with a return loss of better than -14 dB.     

Low-voltage high-isolation DC-to-RF MEMS switch based on an S-shaped film actuator

This paper presents a new electrostatically actuated microelectromechanical series switch for switching dc to radio frequency (RF) signals. The device is based on a flexible S-shaped film moving between a top and a bottom electrode in touch-mode actuation. This concept, in contrast to most other microelectrochemical systems (MEMS) switches, allows a design with a low actuation voltage independent of the off-state gap height. This makes larger nominal switching contact areas for lower insertion loss possible, by obtaining high isolation in the off-state. The actuation voltages of the first prototype switches are 12 V to open, and 15.8 V to close the metal contact. The RF isolation with a gap distance of 14.2 /spl mu/m is better than -45 dB up to 2 GHz and -30 dB at 15 GHz despite a large nominal switching contact area of 3500 /spl mu/m/sup 2/.     

Distributed MEMS analog phase shifter with enhanced tuning

The design, fabrication, and measurement of a tunable microwave phase shifter is described. The phase shifter combines two techniques: a distributed capacitance transmission line phase shifter, and a large tuning range radio frequency (RF) microelectromechanical system (MEMS) capacitor. The resulting device is a large bandwidth, continuously tunable, low-loss phase shifter, with state-of-the-art performance. Measurements indicate analog tuning of 170/spl deg/ phase shift per dB loss is possible at 40 GHz, with a 538/spl deg/ phase shift per centimeter. The structure is realized with high-Q MEMS varactors, capable of tuning C/sub max//C/sub min/= 3.4. To our knowledge, this presents the lowest loss analog millimeter wave phase shifter performance to date.     

RF MEMS switch integrated on printed circuit board with metallic membrane first sequence and transferring

This letter reports, for the first time, on RF MEMS switches integrated on flexible printed circuit boards (i.e., FR-4) using transfer technology. The devices were first processed on Si-substrate using a modified MEMS sequence and subsequently transferred onto an FR-4 substrate by thermal compressive bonding, mechanical grinding, and wet removal of silicon. The switches were demonstrated with flat metal membrane (top electrode), precisely controlled gap between the membrane and bottom electrode, low insertion loss (/spl les/ 0.15 dB at 20 GHz), and high isolation (/spl sim/ 21 dB at 20 GHz). This technology shows the potential to monolithically integrate RF MEMS components with other RF devices on organic substrate for RF system implementation.