碲锌镉晶片中位错与Te沉淀的透射电子显微分析

采用透射电子显微镜对碲锌镉晶体材料的缺陷特性进行了分析,观察并研究了碲锌镉晶体中Te沉淀相形貌和Te沉淀周围的棱柱位错环.认为棱柱位错的形成是由Te沉淀相的析出引起的,而沉淀相在基体中的析出与基体形成错配应力,又造成位错的增殖.Te沉淀与棱柱位错两种缺陷是相互依存的.     

碲锌镉晶片中位错与Te沉淀的透射电子显微分析

采用透射电子显微镜对碲锌镉晶体材料的缺陷特性进行了分析，观察并研究了碲锌镉晶体中Te沉淀相形貌和Te沉淀周围的棱柱位错环. 认为棱柱位错的形成是由Te沉淀相的析出引起的，而沉淀相在基体中的析出与基体形成错配应力，又造成位错的增殖. Te沉淀与棱柱位错两种缺陷是相互依存的.     

Cd0.8 Mn0.2Te晶体的生长及其性能

通过适当的工艺措施,采用传统布里奇曼法生长了尺寸为φ30mm×120mm的Cd0.8Mn0.2Te晶体.对晶体进行了X射线粉末衍射、X射线双晶摇摆曲线、紫外-可见光光谱、红外透过率及电阻率测试.测试结果表明,晶体结构为立方型,半峰宽较低,吸收边为720nm,对应禁带宽度为1.722eV,晶体的红外透过率和电阻率都较高.并讨论了晶体中的缺陷对红外透过率和电阻率的影响.     

新型长波红外非线性晶体PbIn6Te10的生长

新型长波红外非线性晶体PbIn6Te10具有透光波段宽(1.3~31μm)、非线性系数大(d11=51 pm/V),双折射适宜(~0.05)等优点,在14~25μm乃至25μm以上波段具有较大应用潜力。文中通过相图分析结合具体实验,筛选出较合适的组分配比,并采用高温单温区法合成多晶,布里奇曼法生长出尺寸φ11 mm×55 mm的单晶棒。对生长的PbIn6Te10晶体进行X射线衍射、摇摆曲线、透过率等测试,结果表明,晶体为三方结构,晶格常格为a=b=1.496 1 nm,c=1.825 7 nm,生长出的单晶结晶性较好,半高宽(FHWM)约0.253°,2.5~25μm波段晶体的平均透过率在50%以上,对应收系数处于0.3~0.6 cm-1之间。     

Cd0.8Mn0.2Te晶体的生长及其性能

通过适当的工艺措施,采用传统布里奇曼法生长了尺寸为φ30mm×120mm的Cd0.8Mn0.2Te晶体.对晶体进行了X射线粉末衍射、X射线双晶摇摆曲线、紫外-可见光光谱、红外透过率及电阻率测试.测试结果表明,晶体结构为立方型,半峰宽较低,吸收边为720nm,对应禁带宽度为1.722eV,晶体的红外透过率和电阻率都较高.并讨论了晶体中的缺陷对红外透过率和电阻率的影响.     

高阻CdZnTe晶体的退火处理

获得高电阻率的、完整性好的CdZnTe晶体是研制高性能的CdZnTe γ射线探测器的关键.运用热力学关系估算了Cd1-xZnx熔体平衡分压,尝试以Cd1-xZnx合金源替代Cd源进行Cd0.8Zn0.2Te晶片的热处理,研究了退火对Cd0.8Zn0.2Te晶片质量的影响.结果表明：在1069K下用Cd0.8Zn0.2合金源（PZn=0.122×105Pa和PCd=1.20×105Pa）对Cd0.8Zn0.2Te晶片退火5天以上,可提高晶体电阻率一个数量级和晶体红外透过率10%以上,并可消除或减小晶片中的Te沉淀,同时避免了Zn的损失,改善Zn的径向分布.可见,采用Cd1-xZnx合金源代替Cd源控制进行CZT退火处理优于仅采用Cd源控制的退火处理.     

新型稀磁半导体Cd1-xMnxIn2Te4的光学和磁学性能

采用垂直Bridgman法制备出了x＝0.1、0.22和0.4的Cd1-xMnxIn2Te4晶体.采用红外透射光谱法研究了晶体的红外光学特性.用超导量子磁强计测量了样品在温度范围5～300K和磁场强度范围0～5T内的磁化强度.在中红外波段透过率曲线变化很小.随着x的增加Cd1-xMnxIn2Te4的光学带隙移向高能端.磁化率倒数χ-1与温度T的关系曲线在高温区服从居里-万斯定律,在低温下x≥0.22时向下偏离该定律.与具有相同Mn2+浓度的Cd1-xMnxTe晶体相比Cd1-xMnxIn2Te4晶体的交换积分常数较小.     

新型稀磁半导体Cd1-xMnxIn2Te4的光学和磁学性能

采用垂直Bridgman法制备出了x＝0.1、0.22和0.4的Cd1-xMnxIn2Te4晶体.采用红外透射光谱法研究了晶体的红外光学特性.用超导量子磁强计测量了样品在温度范围5～300K和磁场强度范围0～5T内的磁化强度.在中红外波段透过率曲线变化很小.随着x的增加Cd1-xMnxIn2Te4的光学带隙移向高能端.磁化率倒数χ-1与温度T的关系曲线在高温区服从居里-万斯定律,在低温下x≥0.22时向下偏离该定律.与具有相同Mn2+浓度的Cd1-xMnxTe晶体相比Cd1-xMnxIn2Te4晶体的交换积分常数较小.     

高阻碲锌镉单晶体的生长及其性能观测

报道了采用富Cd原料的无籽晶垂直布里奇曼法生长高阻碲锌镉Cd0.8Zn0.2Te(CZT)单晶体的新工艺,对所生长的晶体作了X射线衍射分析、红外透过率测试、光吸收截止波长测量及电学性能测试.晶体在4400～450cm-1范围内的红外透过率达到50%,截止吸收波长为787.6nm,带隙为1.574eV,室温电阻率达到2×1010Ω·cm,已接近本征Cd0.8Zn0.2Te半导体的理论值.用该晶体制作的核探测器在室温下对241Am和109Cd放射源均有响应,并获得了比较好的241Am-59.5keV吸收谱.结果表明改进的方法是一种生长室温核辐射探测器应用的高阻CZT单晶体的简便有效的新方法.     

高阻碲锌镉单晶体的生长及其性能观测

报道了采用富Cd原料的无籽晶垂直布里奇曼法生长高阻碲锌镉Cd0.8Zn0.2Te(CZT)单晶体的新工艺,对所生长的晶体作了X射线衍射分析、红外透过率测试、光吸收截止波长测量及电学性能测试.晶体在4400～450cm-1范围内的红外透过率达到50%,截止吸收波长为787.6nm,带隙为1.574eV,室温电阻率达到2×1010Ω·cm,已接近本征Cd0.8Zn0.2Te半导体的理论值.用该晶体制作的核探测器在室温下对241Am和109Cd放射源均有响应,并获得了比较好的241Am-59.5keV吸收谱.结果表明改进的方法是一种生长室温核辐射探测器应用的高阻CZT单晶体的简便有效的新方法.     

MnQ2（Q=S,Se,Te）and [Mn（en）3]Te4 Structures and Their Semiconductor Properties

The solvo-thermal technique is used for the synthesis of [Mn(en)3]Te4 (I).The crystal structure has been determined by single crystal X-ray diffraction techniques.The crystal belongs to the monoclinic, space group p21/c with unit cell:a=0.8461(1),b=1.5653(2), c=1.4269(2)nm, α=90°,β=91.37(1) (3)°, γ=90°,V=1.8893(4)nm3,and Z=4.The results show that the structure contains a linear chain Zintl anion,[Te4]2-and a complex cation,[Mn(en)3]2+. Optical studies have been performed on the powder sample of I, suggesting that the compound is a semiconductor with a band gap of 0.73eV. The semiconductor properties for MnQ2(Q=S,Se,Te) and [Mn(en)3]Te4 have been discussed by molecular orbital theory.     

Thermomigration of Te precipitates and improvement of (Cd,Zn)Te substrate characteristics for the fabrication of LWIR (Hg,Cd)Te photodiodes

(Cd,Zn)Te wafers containing Te precipitates have been annealed under well defined thermodynamic conditions at temperatures below and above the melting of Te. Results of the examination of the wafers with infrared microscopy before and after the anneals indicate a substantial reduction of the Te precipitates in wafers annealed at temperatures in excess of the melting point of Te compared with those annealed at temperatures below the melting point of Te. These results confirm the thermomigration of liquid Te precipitates to be the principally operative mechanism during annealing in the elimination of these precipitates in (Cd,Zn)Te wafers. The occurrence of Te precipitates in (Hg,Cd)Te epitaxial layers grown on (Cd,Zn)Te substrates containing Te precipitates is also explained on the basis of thermomigration of these precipitates during LPE growth from the substrates to the epilayers. Absence of occurrence of Te precipitates in (Hg,Cd)Te epilayers grown on annealed (Cd,Zn)Te substrates with negligible Te precipitates is also confirmed. Usefulness of annealing (Cd,Zn)Te substrates—to eliminate Te precipitates—prior to epilayer growth is confirmed via demonstration of improved long wavelength infrared (Hg,Cd)Te device array performance uniformity in epitaxial layers grown on (Cd,Zn)Te substrates with negligible Te precipitates after annealing.     

Structural Evolution Following Spinodal Decomposition of the Pseudoternary Compound (Pb0.3Sn0.1Ge0.6)Te

Pseudoternary (Ge,Sn,Pb)Te compounds display favorable thermoelectric properties. Spinodal decomposition in the quasiternary (Ge,Sn,Pb)Te system is at the origin of a wide solubility gap at low Sn concentrations. The structural evolution of the spinodal decomposition was investigated as a function of aging time at 500°C, using x-ray diffraction, electron microscopy, and scanning electron microscopy. The evolution of the structure at 500°C consists initially of a short diffusion-controlled demixing stage into Pb- and Ge-rich coherent areas, with compositions corresponding to the inflection points of the free-energy curve. The Pb-rich areas adopt configurations associated with the directions of the soft elastic moduli of the cubic compound. Both the Pb- and Ge-rich areas are supersaturated and undergo in a second stage a nucleation and growth process and give rise to a biphased structure with equilibrium compositions corresponding to the boundaries of the miscibility gap. The resulting Pb-rich areas display a relatively stable microstructure suggesting the presence of long-range interactions between the Pb-rich precipitates in the Ge-rich matrix.     

剩余杂质对Hg_(0.8)Cd_(0.2)Te晶体光吸收的影响

研究了Hg_(0.8)Cd_(0.2)Te晶体经吸除工艺处理前后的透射光谱,发现样品经吸除处理后的光吸收发生明显变化,分析认为因吸除工艺降低了样品内的剩余杂质含量,从而减少了杂质参与的光吸收,利用受主“掺杂”实验进一步验证了上述解释。     

Structural and optical properties of Cd_(0.8)Zn_(0.2)S thin films

Cd_(1-x)Zn_xS thin films were deposited on glass substrates by a vacuum coevaporation method.The structural,compositional,and optical properties of as-deposited Cd_(0.8)Zn_(0.2)S films were investigated using X-ray diffraction(XRD),X-ray fluorescence(XRF),X-ray photoelectron spectroscopy(XPS),and optical transmittance spectrum.The thin films are hexagonal in structure,with strong preferential orientation along the(002) planes.The composition of Cd_(1-x)Zn_xS thin films monitored by a quartz crystal oscil...     

Cd1-xZnxTe合金的退火研究

用红外透射谱和喇曼散射谱研究了退火对 Cd1 - x Znx Te晶片中 Te沉淀的影响 .研究结果表明 ,红外透射谱只对大尺寸的 Te沉淀较为敏感 ,而喇曼散射谱却能够探测到样品中小尺寸的 Te沉淀 ,两者互为补充 .在 Cd气氛下对晶片进行退火处理 ,选择合适的退火温度和退火时间 ,可以有效地消除晶片中大尺寸的 Te沉淀 ,却难以消除晶片中小尺寸的微量 Te沉淀     

Precipitation of tellurium in (Hg,Cd)Te alloys

The precipitation of tellurium in alloys of Hg_1?xCd_xTe with x = 0.2 to 0.3 prepared under conditions of excess tellurium by the solid state recrystallization method have been studied using chemical defect etching and transmission eloctron microscopy. Precipitation of tellurium occurred during the quench from the recrystallization anneal. During the initial part of the quench, precipitation occurred as a result of nucleation of precipitates on pre-existing dislocations. This precipitation resulted in the formation of dislocation helices with precipitates in the interior of the helix loops. Both monoclinic and trigonal phases of tellurium were found in these precipitate defects, as well as the twinned matrix phase. Later in the quench, an additional nucleation mechanism, either homogeneous or heterogeneous on an impurity occurs resulting in the formation of complex defects in the bulk. During a subsequent post-anneal at temperatures of approximately 300°C, the tellurium precipitates dissolve, and interstitial perfect and faulted dislocation loops are formed. Both the precipitation process and the subsequent post-annealing result in considerable multiplication of dislocations.     

Hg0．8Cd0．2Te晶体低温热处理时的热力学平衡常数

在研究低温热处理对HgCdTe电学性质的影响时,在只考虑Hg间隙、Hg空位影响的情况下,通过对大量的、可靠的Hg0.8Cd0.2Te晶体低温热处理结果进行分析,确定了热力学平衡常数关系式中的常数,从而获得热力学平衡常数与温度的明确解析表达式。实验结果与所得表达式的计算结果能够很好地相符。     

Cd1—xZnxTe晶体生长技术进展

介绍了Cd_(1-x)Zn_xTe晶体生长国外新进展和国内研究动态。指出Cd(1-x)Zn_xTe晶体研究正在向大面积单晶,组分和结构高均匀性,低位错密度和定向生长等方面发展