Al-induced Lateral Crystallization of Amorphous Si Thin Films by Microwave Annealing

Al-induced lateral crystallization of amorphous silicon thin films by micr owave annealing is investigated,The erystallized Si films are examined by optical microscopy,Raman spectroscopy ,transimission electron microscopy and transmission electron diffraction micrography.After microwave annealing at 480 ℃ for 50min the amorphous Si is completely cystallized with lagrge grains of main (111) orientation,The rate of lateral crystallization is 0.04μm/min,This process,labeled MILC-MA ,not only lowers the temperature but also reduces the time of crystallization.The crystallization.mechanism during microwave annealing and the electrical properies of polycrystalline Si thin films are analyzed.This MILC-MA process has potentila application in large area electronics.     

Preparation and electrical properties of BaPbO3 thin film

BaPbO3 thin films were deposited on Al2O3 substrates by sol-gel spin-coating and rapid thermal annealing. The microstructure and phase of BaPbO3 thin films were determined by X-ray diffractometry, scanning electrons microscopy and energy dispersive X-ray spectrometry. The influence of annealing temperature and annealing time on sheet resistance of the thin films was investigated. The results show that heat treatment, including annealing temperature and time, causes notable change in molar ratio of Pb to Ba, resulting in the variations of sheet resistance. The variation of electrical properties demonstrates that the surface state of the film changes from two-dimensional behavior to three-dimensional behavior with the increase of film thickness. Crack-free BaPbO3 thin films with grain size of 90 nm can be obtained by a rapid thermal annealing at 700 ℃ for 10 min. And the BaPbO3 films with a thickness of 2.5 μm has a sheet resistance of 35 Ω·-1.     

Optimization of material structure of ploy-Si thin film based on Al induced crystallization

Based on Al induced crystallization (AIC) method, influences of different material structures on formation and characteristics of ploy-silicon thin films were studied and optimized. Al-Si films on glass with different structures (Si/Al/Glass, Al/Si/Glass, Si/Al/…/Si/Al/Glass) were deposited on glass substrates by sputtering method. All samples were annealed for MIC with varied time processes under 500℃ N2 environment. X-ray diffraction test and scanning electron microscope were adopted to characterize cryst...     

Preparation of TiO<Subscript>2</Subscript> thin film by the LPD method on functionalized organic self-assembled monolayers

In this paper, uniform titania (TiO₂) films have been formed at 50° on silanol SAMs by the liquid-phase deposition (LPD) method at a temperature below 100°C. OTS (Octadecyltrichloro-Silane) self-assembled monolayers (SAMs) on glass wafers were used as substrates for the deposition of titanium dioxide thin films. This functionalized organic surface has shown to be effective for promoting the growth of films from titanic aqueous solutions by the LPD method at a low temperature below 100°C. The crystal phase composition, microstructure and topography of the as-prepared films were characterized by various techniques, including X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The results indicate that the as-prepared thin films are purely crystallized anatase TiO₂ constituted by nanorods after being annealed at 500°. The pH values, concentration of reactants, and deposition temperatures play important roles in the growth of TiO₂ thin films. Support by the National Natural Science Foundation of China (Grant No. 50672055) and National Key Technology R&D Program (Grant No. 2006BAF02A28)     

Correlations between the Optical Properties and the Microstructure of TiO2 Thin Films Prepared by Reactive Electron-beam Evaporation

High refractive index TiO₂ thin films were deposited on BK7 glass by reactive electron—beam (REB) evaporation at pressure of 2×10⁻² Pa, deposition rate of 0.2 nm/s and at various substrate temperatures from 120°C to 300°C. The refractive index and the thickness of the films were measured by visible spectroscopic ellipsometry (SE) and determined from transmission spectra. Optical properties and structure features were characterized by UV-VIS, SEM and XRD, respectively. The measurement and analysis on transmission spectra of all samples show that with the substrate temperature increasing from 120°C to 300°C, the refractive indices of thin films increase from 1.7 to 2.1 and the films after heat treatment have higher refractive indices due to its crystallizing. The XRD analysis results indicate that the structure of TiO₂ thin films deposited on BK7 glass at substrate temperatures of 120°C, 200°C and 300°C is amorphous, after post-annealing under air condition at 400°C for 1 hour, the amorphous structure is crystallized, the crystal phase is of 100% anatase with strong preferred orientation (004) and the grain size of crystalline is within 3.6–8.1 nm, which is consistent with results from SEM observation. WANG Xue-hua: Born in 1976. Funded by the Youth Project Foundation of Hubei Provincial Education Department (No. 2003B00)     

Effect of Annealing on Ferroelectric Properties of Bi3.25La0.75Ti3O12 Thin Films Prepared by the Sol-gel Method

Bi_3.25La_0.75Ti₃O₁₂(BLT) thin films were prepared on Pt/Ti/SiO₂/Si substrate by the sol-gel method. The effect of annealing on their structures and ferroelectric properties was investigated. The XRD patterns indicate that the BLT films annealed at different temperatures are randomly orientated and the single perovskite phase is obtained at 550°C. The remnant polarization increases and the coercive field decreases with the annealing temperature increasing. The leakage current density of the BLT films annealed at 700°C is about 5.8×10⁻⁸ Al cm² at the electric field of 250 kV/cm. Funded by the National Natural Science Foundation of China (No. 90407023)     

Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films

Hydrogenated amorphous silicon (a-Si:H) thin films were deposited by plasma-enhanced vapor deposition (PECVD) at different silane temperatures (Tg) before glow-discharge. The effect of Tg on the amorphous network and optoelectronic properties of the films has been investigated by Raman scattering spectra, ellipsometric transmittance spectra, and dark conductivity measurement, respectively. The results show that the increase in Tg leads to an improved ordering of amorphous network on the short and intermediate scales and an increase of both refractive index and absorption coefficient in a-Si:H thin films. It is indicated that the dark conductivity increases by two orders of magnitude when Tg is raised from room temperature (RT) to 433 K. The continuous ordering of amorphous network of a-Si:H thin films deposited at a higher Tg is the main cause for the increase of dark conductivity.     

液位沉降法制备ITO薄膜及其光电性能研究

采用自制的液位沉降制备薄膜装置在普通玻璃衬底上沉积了ITO薄膜,并对实验条件进行正交设计以考察制备ITO薄膜的最优条件。结果表明,采用液位沉降法成功地制备出ITO薄膜。该装置结构简单、操作方便。影响ITO薄膜光电性能的主要因素是镀膜层数,在进行的实验中,制备ITO薄膜的优化条件为:注射回抽速度为2.5cm/min,膜层数为20层,装置倾斜角度为30°,在300℃下预处理5min,500℃下退火处理2h,得到的薄膜的透光率为88.3%,方块电阻为970Ω/□。     

Preparation and Properties of IrO2 Thin Films Grown by Pulsed Laser Deposition Technique

Highly conductive IrO2 thin films were prepared on Si （100） substrates by means of pulsed laser deposition technique from an iridium metal target in an oxygen ambient atmosphere. Emphasis was put on the effect of oxygen pressure and substrate temperature on the structure, morphology and resistivity of IrO2 films. It was found that the above properties were strongly dependent on the oxygen pressure and substrate temperature. At 20 Pa oxygen ambient pressure, pure polycrystalline IrO2 thin films were obtained at substrate temperature in the 300-500℃ range with the preferential growth orientation of IrO2 films changed with the substrate temperature. IrO2 films exhibited a uniform and densely packed granular morphology with an average feature size increasing with the substrate temperature. The room-temperature resistivity variations of IrO2 films correlated well with the corresponding film morphology changes. IrO2 films with the minimum resistivity of （42 ±6）μΩ·cm was obtained at 500℃.     

室温非晶硅薄膜热电阻温度系数研究

用离子束增强沉积（IBED）方法,在SiO2/Si衬底上沉积了非晶硅薄膜和注氢的非晶硅薄膜。研究薄膜的电阻温度系数（TCR）随制备工艺的变化,分析非晶硅薄膜电阻的稳定性对电阻温度系数的影响。本征非晶硅电阻太大,虽然经过适当地退火后,TCR能够达到6.39%K-1,但是电阻值还是过高,不适合制作器件。经过硼掺杂的非晶硅薄膜,电阻显著下降,相应的TCR可以达到6.80%K-1。制作的氢化非晶硅薄膜的电阻温度系数（TCR）高达8.72%K-1,且制作工艺简单,与常规集成电路工艺兼容性好。用离子束增强沉积的非晶硅薄膜可以用于制备红外探测仪。但实验还存在着重复性不好等问题,需要作深入的实验研究。     

Fabrication and its characteristics of low-temperature polycrystalline silicon thin films

In order to reduce the cost of solar cells or flat-panel display, it is very important to synthesis poly-crystalline silicon films on low cost substrate such as glass at low temperature. In this work, electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (PECVD) system was successfully applied to synthesize poly-Si thin-film on common glass substrate using H2 as the plasma source and SiH4 (Ar:SiH4=19:1) as the precursor gas at low temperature. Since the multicusp cav- ity-coupling ECR plasma source was adopted to provide active precursors, the growth temperature decreased to lower than 200℃. In the plasma, the electron temperatures kTe are ~2―3 eV and the ion temperatures kTi≤1 eV. This leads to non-remarkable ion impacts during the film deposition. The characteristic of poly-Si films was investigated. It was shown that the crystalline fraction Xc of the films can be up to 90% even deposit at room temperature, and the film was (220) preferably oriented. The growth behaviors of the film between the interface of glass and Si films were also discussed in detail.     

Depth profile study on Raman spectra of high-energy-electron-irradiated hydrogenated amorphous silicon films

According to the different penetration depths for the incident lights of 472 nm and 532 nm in hydrogenated amorphous silicon (a-Si:H) thin films, the depth profile study on Raman spectra of a-Si:H films was carried out. The network ordering evolution in the near surface and interior region of the unirradiated and irradiated a-Si:H films was investigated. The results show that there is a structural improvement in the short- and intermediate-range order towards the surface of the unirradiated a-Si:H films. The amorphous silicon network in the near and interior region becomes more disordered on the short- and intermediate-range scales after being irradiated with high energy electrons. However, the surface of the irradiated films becomes more disordered in comparison with their interior region, indicating that the created defects caused by electron irradiation are concentrated in the near surface of the irradiated films. Annealing eliminates the irradiation effects on a-Si:H thin films and the structural order of the irradiated films is similar to that of the unirradiated ones after being annealed. There exists a structural improvement in the short- and intermediate-range order towards the surface of the irradiated a-Si:H films after being annealed. Supported by the National Outstanding Young Scientists Foundation of China (Grant No. 60425101) and the Science Foundation of General Armament Department of China (Grant No. 06DZ02)     

Preparation and Properties of a-Si：H Thin Films Deposited on Different Substrates

The effects of different substrates on the structure and hydrogen evolution from a-Si： H thin films deposited by plasma enhanced chemical vapour deposition were studied, as well as the similar films exposed to an hydrogen plasma. Spectroscopic ellipsometry and hydrogen evolution measurements were used to analyse the effects of the substrate and hydrogen plasma on the films microstructure, thickness, hydrogen content, hydrogen bonding and hydrogen evolution. The hydrogen evolution spectra show a strong substrate dependence. In particular on crystalline silicon substrate, the formation of bubbles was observed. For different substrates, hydrogen plasma treatments lightly affected the hydrogen evolution spectra. These results indicate that the action of hydrogen in a-Si：H was modified by the nature of the substrate.     

Orientation of Bi<Subscript>3.2</Subscript>La<Subscript>0.8</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> ferroelectric thin films with different annealing schedules

Fatigue-free Bi_3.2La_0.8Ti₃O₁₂ ferroelectric thin films were successfully prepared on p-Si (100) substrates using metalorganic solution deposition process. The orientation and formation of 5-layers thin films were studied under different processing conditions using XRD. Experimental results indicate that increase in annealing time at 700 °C after preannealing for 10 min at 400 °C can remarkably increase (200)-orientation of the films derived from the precursor solutions with two contents of citric acid. Meanwhile, high content of citric acid increases the film thickness and is conducive to the a-orientation of the films with the preannealing, and low concentration of the solution is conducive to the c-orientation of the films without the preannealing.     

Characterization and Electrochemical Properties of LiMn2O4 Thin Films Prepared by Solution Deposition

1 IntroductionThin-filmlithium-ion batteries have attracted greatattention of researchfor possible use inimplantable medi-cal devices , CMOS-based integrated circuits ,radio fre-quency (RF) identification tags for inventory control andanti-theft protection[1],etc. Li Mn2O4thin films , aspromising cathode materials for thin-filmlithium-ion bat-teries, have been prepared by a few methods such aspulsedlaser deposition[2 ,3],electrospraying[4-9],RF mag-netron sputtering[10], laser ablation[11]…     

Effect of Annealing on Structural, Optical and Electrical Properties of CdS Thin Films Grown by ILGAR

CdS thin films were deposited by ILGAR （ ion lay gas reaction） method. The effect of annealing temperature under N2 atmosphere on the structural, chemical, topographical development and optical and electrical properties of CdS thin films was investigated by XRD, SEM, XPS, UV- VIS and two-probe technique. It is found that the cubic-phase of as-deposited CdS film transforms to hexagonal phase with a perfected orientation along （002） plane at 300 ℃ . The band gap decreases with increasing annealing temperature until 300 ℃ , which is consistent with the grain growth. The fall of dark and light resistivitiy is obvious with increasing annealing temperature, corresponding to the continuous grain growth and deviation of stoichiometry at higher temperature. The smooth and uniform surface of as-deposited films becomes rougher through thermal treatment, which is related to grain growth and sublimation of CdS at a higher annealing temperature.     

Effect of the Cool System on Internal Stress of CaO-Al203-SiO2 Glass-ceramic System

The samples were attained through altering the cooling system of producing glass-ceramics. The X-ray diffraction was used to test the stress value of different samples. The relation of the cooling system and internal stress were also investigated. The experimental results show that the stress of glass-ceramic had a close relation with starting cool temperature. Above 800 ~C, glass-ceramic could be accelerated cooling and did not bring stress. Temperature between 500 ℃ and 800℃ was an important temperature range of the formation of stress in glass-ceramic, in which the glass-ceramic stress would change obviously. Cool system was the key on how to control and eliminate internal stress in order to reduce the destroy of materials crated by internal stress. In addition, glass particles size increase, glass-ceramic stress increase in consequent.     

Optimization of the process for preparing Al-doped ZnO thin films by sol-gel method

Transparent and conducting Al-doped ZnO thin films with c-axis-preferred orientation were prepared on glass substrate via sol-gel route. The physical and chemical changes during thermal treatment were analyzed by TG-DSC spectra and the crystallization quality was characterized by XRD patterns. The optimized preheating and post-heating temperatures were determined at ~420℃ and ~530℃, respec-tively. From thermodynamic and kinetics views, we investigated the mechanism of orientation growth with (002) plane parallel to the substrates. The surface morphologies of the films, post-heated at 420℃, 450℃, 530℃ and 550℃, respectively, were observed by SEM micrographs. The film post-heated at 530℃ shows a homogenous dense microstructure and exhibits the minimum sheet resistance of 140 Ω/Sq. The visible optical transmittance of all the films is beyond 90%. In addition, the annealing treatment in vacuum can contribute greatly to the electrical conductivity.     

气体压强对n型a-Si:H薄膜光学性能的影响

用射频等离子增强化学气相沉积(RF-PECVD)制备磷掺杂氢化非晶硅(a-Si:H)薄膜,研究了辉光放电气体压强(20~80 Pa)对薄膜折射率、消光系数、光学带隙以及氢含量的影响;用激光拉曼光谱研究了气体压强对a-Si:H薄膜微结构的影响,并与薄膜的光学性能进行了综合讨论。结果表明,随着辉光放电气体压强的增加,a-Si:H薄膜的光学带隙和氢含量都有不同程度的增大,但折射率和消光系数却逐步减小;与此同时,薄膜内非晶网络的短程和中程有序程度逐渐恶化。     

Preparation and Properties of CdTe Polycrystalline Films for Solar Cells

The structure and characteristics of CdTe thin filrns are closely dependent on the whole deposition process in close-space sublimation （CSS）. The physical mechanism of CSS was analyzed aud the temperature distribution in CSS system was measured, and the influences of the increasing-temperature process and pressure on the preliminary nucleus creation were studied. The resuits indicate ： tire samples deposited at different pressures hare a cubical structure of CdTe and the diffraction peaks of CdS and SnO2 ： F. As the atmosphere pressure increases, the crystal size of CdTe decreases, the rate of the transparency of the thin film decreases and the absorption side moves towards the short-wave direction. After a 4-minute depositing process with a substrate teraw.rature of 500℃ and a source temperature of 620 ℃, the polycostallinc thin films can be mmade , so the production of high-quality integrated cell with StrO2： F/ CdS/ CdTe/ Au structure is hopeful.