Ku-Band Power Amplifier MMIC Chipset with On-Chip Active Gate Bias Circuit

We propose a Ku-band driver and high-power amplifier monolithic microwave integrated circuits (MMICs) employing a compensating gate bias circuit using a commercial 0.5 μm GaAs pHEMT technology. The integrated gate bias circuit provides compensation for the threshold voltage and temperature variations as well as independence of the supply voltage variations. A fabricated two-stage Ku-band driver amplifier MMIC exhibits a typical output power of 30.5 dBm and power-added efficiency (PAE) of 37% over a 13.5 GHz to 15.0 GHz frequency band, while a fabricated three-stage Ku-band high-power amplifier MMIC exhibits a maximum saturated output power of 39.25 dBm (8.4 W) and PAE of 22.7% at 14.5 GHz.     

Ku波段20W AlGaN/GaN功率管内匹配技术研究

文章的主要目的是研究第三代半导体AlGaN/GaN功率管内匹配问题。以设计Ku波段20WGaN器件为例,研究了内匹配电路的设计、合成以及内匹配电路的测试,实现了GaN功率HEMT在Ku波段20W连续波输出功率的内匹配电路,并使整个电路的输入、输出电路阻抗提升至50Ω。最终所研制的AlGaN/GaNKu波段内匹配功率管在11.8GHz～12.2GHz频带内,输出功率大于20W。在12GHz功率增益大于5dB,功率附加效率29.07%,是目前国内关于GaN功率器件在Ku波段连续波输出的最高报道。     

基于波导合成高效高功率密度Ku波段功放

提出了一种基于BB180波导电桥合成器与波导微带双探针相结合的Ku波段高效空间合成方案,波导合成实现了高效率,波导微带双探针结构实现功率模块的叠层安装,在Ku波段通过二者的结合实现了高功率密度。首先利用HFSS软件分析波导合成器和波导微带双探针模型,给出了仿真结果。在工程设计中采用GaN功率芯片构成放大器小模块单元,输出峰值功率25W。功放采用8个模块单元合成,在Ku波段合成饱和输出180W峰值功率(19%占空比),合成效率超过85%,附加效率高于25%,功率密度达到0.135W/cm3,实现了Ku波段微波高效合成与高功率密度输出。     

High efficiency, low offset voltage InGaP/GaAs power heterostructure-emitter bipolar transistors with advanced thermal management

High efficiency, low offset voltage InGaP/GaAs power heterostructure-emitter bipolar transistors (HEBTs) have been demonstrated. The large signal performance of the HEBTs is characterized. Output power of 0.25 W with power added efficiency (PAE) of 63.5% at 1.9 GHz has been achieved from a 26-finger HEBT with total emitter area of 873.6 /spl mu/m/sup 2/. Output power of 1.0 W with PAE of 63% has been obtained from the composition of four above-mentioned power cells at the optimum conditions of impedance matching. The thermal performance of HEBT is presented and the results show better thermal management than conventional HBT. The experimental results demonstrate good power performance and capability of HEBTs.     

250 W HVHBT Doherty With 57% WCDMA Efficiency Linearized to ${-}$55 dBc for 2c11 6.5 dB PAR

A two-way symmetrical Doherty amplifier exhibiting 250 W saturated power has been developed using high-voltage HBT (HVHBT) GaAs technology biased at 28 V on the collector. Greater than 57% collector efficiency at 50 W (47 dBm) average output power has been demonstrated while achieving -55 dBc linearized ACPR at 5 MHz offset using a two-carrier-side-by-side WCDMA input signal with 6.5 dB PAR measured at 0.01% probability on the CCDF. In addition, a two-stage HVHBT lineup exhibiting 450 W (56.5 dBm) peak power has been demonstrated. The output stage consists of a pair of 250 W two-way symmetrical Doherty amplifiers power combined using a low-loss branchline combiner and driven by a single-ended 100 W class AB high-efficiency amplifier. The lineup demonstrated 44% PAE at 100 W (50 dBm) average output power with 25 dB lineup gain while achieving - 55 dBc linearized ACPR at 5 MHz offset using a two-carrier-side-by-side WCDMA input signal with 6.5 dB PAR measured at 0.01% probability on the CCDF. The lineup exhibits 400 W (56 dBm) PldB at 60% PAE CW, with 45% PAE at 6 dB backoff.     

Bandwidth enhancement of an inverse class-F power amplifier based on LDMOS devices

In this article, we report the design of an inverse class-F power amplifier for L-band transmit/receive module based on LDMOS (laterally diffused metal oxide semiconductor) transistors. The objective was to obtain high power efficiency over a wide band. Measurements showed a minimum of 61% power added efficiency (PAE) and 10?W output power with a gain of 14?dB over a bandwidth of 200?MHz. Average measured performances are, respectively, 11.4?W (±1.4?W) output power and 62.8% (±1.8%) PAE; 64.5% maximum PAE associated with 12.7?W output power has been reached. These results are, to our knowledge, the highest reported combination of power efficiency and bandwidth.     

多晶发射极双台面微波功率SiGe HBT

研制成功了可商业化的75mm单片超高真空化学气相淀积锗硅外延设备SGE500,并生长了器件级SiGe HBT材料.研制了具有优良小电流特性的多晶发射极双台面微波功率SiGe HBT器件,其性能为:β=60@VCE/IC=9V/300μA,β=100@5V/50mA,BVCBO=22V,ft/fmax=5.4GHz/7.7GHz@10指,3V/10mA.多晶发射极可进一步提供直流和射频性能的折衷,该工艺总共只有6步光刻,与CMOS工艺兼容且(因多晶发射极)无需发射极外延层的生长,这些优点使其适合于商业化生产.利用60指和120指的SiGe HBT制作了微波锗硅功率放大器.60指功放在900MHz和3.5V/0.2A偏置时在1dB压缩点给出P1dB/Gp/PAE＝22dBm/11dB/26.1%.120指功放900MHz工作时给出了Pout/Gp/PAE＝33.3dBm (2.1W)/10.3dB/33.9%@11V/0.52A.     

High-power AlGaN/GaN HEMTs for Ka-band applications

We report on the fabrication and high-frequency characterization of AlGaN/GaN high-electron mobility transistors (HEMTs) grown by molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD). In devices with a gate length of 160 nm, a record power density of 10.5 W/mm with 34% power added efficiency (PAE) has been measured at 40 GHz in MOCVD-grown HEMTs biased at V/sub DS/=30 V. Under similar bias conditions, more than 8.6 W/mm, with 32% PAE, were obtained on the MBE-grown sample. The dependence of output power, gain, and PAE on gate and drain voltages, and frequency have also been analyzed.     

A high-efficiency class-E GaN HEMT power amplifier at 1.9 GHz

A single stage class-E power amplifier in GaN high electron mobility transistor (HEMT) technology is reported. The circuit operates at 1.9 GHz. At 30-V drain bias, a power-added-efficiency (PAE) of 57% and a maximum output power of over 37dBm was achieved, corresponding to a power density of 5.25W/mm. At 40-V drain bias, an output power of 38.7dBm is achieved at 50% PAE corresponding to a power density of 7.4W/mm.     

A Cool, Sub-0.2 dB Noise Figure GaN HEMT Power Amplifier With 2-Watt Output Power

This paper reports on a S-, C-band low-noise power amplifier (LNPA) which achieves a sub-0.2 dB noise figure (NF) over a multi-octave band and a saturated output power (Psat) of 2 W at a cool temperature of -30degC . The GaN MMIC is based on a 0.2 mum AlGaN/GaN-SiC HEMT technology with an f_T ~ 75 GHz. At a cool temperature of -30degC and a power bias of 15 V-400 mA, the MMIC achieves 0.25-0.45 dB average NF over a 2-8 GHz band and a linear P_1dB of 32.8 dBm ( ~ 2 W) with 25% power-added efficiency (PAE). At a medium bias of 12 V-200 mA, the amplifier achieves 0.1-0.2 dB average NF across the same band and a P_1dB of 32.2 dBm (1.66 W) with 35% PAE. The corresponding saturated output power is greater than 2 W. At a low noise bias of 5 V-200 mA, a remarkable 0.05-0.15 dB average NF is achieved with a P_1dB > 24 dBm and PAE ~ 33%. These results are believed to be the lowest NF ever reported for a multi-octave fully matched MMIC amplifier capable of > 2 W of output power.     

An X-Band High-Power and High-PAE PHEMT MMIC Power Amplifier for Pulse and CW Operation

An X-band high-power and high power added efficiency (PAE), two-stage AlGaAs/InGaAs/GaAs psuedomorphic high electronic mobility transistor (PHEMT) monolithic microwave integrated circuit (MMIC) power amplifier is presented. The amplifier is designed to fully match a 50 Omega input and output impedance. Based on a 0.35 mum gate-length power PHEMT technology, the MMIC is fabricated on a 3 mil thick wafer. Under an 8 V DC bias condition, the characteristics of 17.5 dB small-signal gain, 10 W continuous wave mode saturation output power of 42% PAE, and 12.6 W pulse saturation output power of 52.6% PAE at 9.4 GHz can be achieved.     

共基极与共发射极结构的InP DHBT器件功率特性

制作了发射极面积为1μm×15μm×4指的InP DHBT器件,器件拓扑使用了共基极和共发射极两种结构,通过负载牵引测试系统对器件功率特性进行测试。在功率优化匹配条件下,所测得最大输出功率密度和相应的功率附加效率(PAE)在10GHz下为1.24W/mm和50%,在18GHz下的数据为0.82W/mm和26%。测试同时表明,共发射极结构相对稳定和易于匹配,共基极模式具有更大的输出功率潜力,但需要进一步解决难于匹配、容易振荡和寄生参量影响等问题。在功放电路设计中,可以根据不同需求选择合适的电路拓扑结构。     

Gate-recessed AlGaN-GaN HEMTs for high-performance millimeter-wave applications

We report deep-submicrometer gate-recessed and field-plated AlGaN-GaN HEMTs and their state-of-the-art continuous wave (CW) power performance measured at 30 GHz. The AlGaN-GaN HEMTs exhibit a CW power density of 5.7 W/mm with a power-added efficiency (PAE) of 45% and drain-efficiency of 58% at V/sub ds/=20 V. At V/sub ds/=28 V, the output power density is measured as high as 6.9 W/mm with both PAE and output power increasing with input power level. Compared to conventional T-gated AlGaN-GaN HEMTs, the output power density and PAE of gate-recessed AlGaN-GaN HFETs are improved greatly, along with the excellent pulsed IVs. We attribute the improvement to both a field-plating effect and a vertical separation of the gate plane from surface states.     

Highly efficient double-doped heterojunction FET's forbattery-operated portable power applications

Microwave power performance of double-doped AlGaAs-InGaAs-AlGaAs heterojunction field-effect transistors (HJFET's) operated at a drain bias of 3 V is described. The fabricated 1.0 μm gate-length HJFET exhibited a maximum drain current of 500 mA/mm, a transconductance of 300 mS/mm, and a gate-to-drain breakdown voltage of 10 V. Power performance for a 14 mm gate periphery device demonstrated a maximum output power of 1.7 W with a 66% power-added efficiency (PAE) at 900 MHz. When the device was tuned for a maximum PAE, it delivered a 71% PAE with an output power of 1.2 W. The results indicate that the developed HJFET has great potential for 3 V battery-operated portable power applications     

A 4-W X-band compact coplanar high-power amplifier MMIC with 18-dB gain and 25% PAE

The performance of a compact coplanar microwave monolithic integrated circuit (MMIC) amplifier with high output power in the X-band is presented. Based on our 0.3-/spl mu/m gate-length GaAs power pseudomorphic high electron mobility transistor (PHEMT) process on 4-in wafer, this two-stage amplifier, having a chip size of 16 mm/sup 2/, averages 4-W continuous-wave (CW) and 25% mean power-added efficiency (PAE) in the X-band, with more than 18-dB linear gain. Peak output powers of P/sub -1dB/=36.3dBm (4.3 W) and P/sub sat/ of 36.9 dBm (4.9 W) at 10 GHz with a PAE of 50% were also measured. Compared to previously reported X-band coplanar high-power amplifiers, this represents a chip size reduction of 20%, comparable to the size of compact state-of-the-art microstrip power amplifiers.     

High-efficiency Ku-band HBT MMIC power amplifier

A Ku-band monolithic HBT power amplifier was developed using a metal-organic chemical vapor deposition (MOCVD)-grown AlGaAs/GaAs heterojunction bipolar transistor (HBT) operating in common-emitter mode. At a 7.5 V collector bias, the amplifier produced 0.5 W CW output power with 5.0 dB gain and 42% power-added efficiency in the 15-16 GHz band. When operated at a single frequency (15 GHz), 0.66 W CW output power and 5.2 dB of gain were achieved with 43% PAE     

高效率GaAs/InGaAsHFET功率放大器

研制成 Ga As/ In Ga As异质结功率 FET(HFET) ,该器件是在常规的高 -低 -高分布 Ga As MESFET的基础上 ,在有源层的尾部引入 i-In Ga As层。采用 HFET研制的两级 C波功率放大器 ,在 5 .0～ 5 .5 GHz带内 ,当Vds=5 .5 V时 ,输出功率大于 3 2 .3 1 d Bm(0 .1 77W/ mm ) ,功率增益大于 1 9.3 d B,功率附加效率 (PAE)大于3 8.7% ,PAE最大达到 49.4% ,该放大器在 Vds=9.0 V时 ,输出功率大于 3 6.65 d Bm(0 .48W/ mm) ,功率增益大于 2 1 .6d B,PAE典型值 3 5 %     

8GHz带有RC稳定网络的AlGaN/GaN HEMTs内匹配功率合成放大器的设计

设计了工作在8GHz的基于AIGaN/GaN HEMTs的内匹配功率合成放大器.输入和输出匹配电路制作在0.381mm厚的氧化铝陶瓷基片上,为了提高整个电路的稳定因子K,在电路输入端增加了片上RC有损网络.在8GHz测出连续波ldB压缩点时的输出功率为PldB=43dBm(20W),线性增益7.3dB,最大PAE为38.1%,合成效率达到70.6%.     

8GHz带有RC稳定网络的AIGaN/GaN HEMTs内匹配功率合成放大器的设计

设计了工作在8GHz的基于AIGaN/GaN HEMTs的内匹配功率合成放大器.输入和输出匹配电路制作在0.381mm厚的氧化铝陶瓷基片上,为了提高整个电路的稳定因子K,在电路输入端增加了片上RC有损网络.在8GHz测出连续波ldB压缩点时的输出功率为PldB=43dBm(20W),线性增益7.3dB,最大PAE为38.1%,合成效率达到70.6%.     

Power performance of AlGaN-GaN HEMTs grown on SiC by plasma-assisted MBE

We report AlGaN-GaN high electron mobility transistors (HEMTs) grown by molecular beam epitaxy (MBE) on SiC substrates with excellent microwave power and efficiency performance. The GaN buffers in these samples were doped with carbon to make them insulating. To reduce gate leakage, a thin silicon nitride film was deposited on the AlGaN surface by chemical vapor deposition. At 4 GHz, an output power density of 6.6 W/mm was obtained with 57% power-added efficiency (PAE) and a gain of 10 dB at a drain bias of 35 V. This is the highest PAE reported until now at 4 GHz in AlGaN-GaN HEMTs grown by MBE. At 10 GHz, we measured an output power density of 7.3 W/mm with a PAE of 36% and gain of 7.6 dB at 40-V drain bias.