Ferroelectric properties of Mn-Doped Bi3.15Nd0.85Ti3O12 thin films prepared under different annealing conditions

Mn-doped Bi_3.15Nd_0.85Ti₃O₁₂ (BNTM) thin films were fabricated on Pt/Ti/SiO₂/Si(100) substrates by a chemical solution deposition technique and annealed at different temperatures from 650 to 800 °C. The structures of the films were analyzed using X-ray diffraction, which showed that the BNTM films exhibit polycrystalline structures and random orientations. The surface morphologies of the samples were investigated using scanning electron microscopy. The average grain size of the films increases with increasing annealing temperature. Electrical properties such as remanent polarization (2P_r) are quite dependent on the annealing temperature of BNTM films. It is found that the film annealed at 750 °C exhibits excellent ferroelectricity with a remanent polarization of 2P_r = 89.3 μC/cm² and a coercive field of E_c = 99.2 kV/cm respectively.     

Annealing temperature dependence of effective piezoelectric coefficients for Bi3.15Eu0.85Ti3O12 thin films

The effects of annealing temperatures 600, 650, 700, and 750 °C on microstructure, chemical composition, leakage current, ferroelectric, dielectric, and piezoelectric properties of Bi_3.15Eu_0.85Ti₃O₁₂ (BET) thin films prepared by metal–organic decomposition were studied in detail. The largest spontaneous polarization 2P _s (98.7 μC/cm² under 300 kV/cm), remnant polarization 2P _r (81.7 μC/cm² under 300 kV/cm), dielectric constant ε_r (889.4 at 100 kHz), effective piezoelectric coefficient d ₃₃ (46.7 pm/V under 260 kV/cm), and lowest leakage current (1.3 × 10⁻⁶ A/cm² under 125 kV/cm) of BET thin film were obtained with annealing at 700 °C. The mechanisms concerning the dependence of the enhancement d ₃₃ are discussed according to the phenomenological equation, and the improved piezoelectric performance could make BET thin film a promising candidate for piezoelectric thin film devices.     

Microstructure, domain structures and ferroelectric properties in (Pb0.8,La0.1,Ca0.1)TiO3/Pb(Zr0.2,Ti0.8)O3 bilayered thin film

Ferroelectric (Pb_0.8,La_0.1,Ca_0.1)TiO₃/Pb(Zr_0.2,Ti_0.8)O₃ (PLCT/PZT) bilayered thin film was prepared on Pt(111)/Ti/SiO₂/Si(100) substrate by RF magnetron sputtering technique. Pure perovskite crystalline phase, determined by X-ray diffraction, was formed in the PLCT/PZT bilayer. The bilayered film exhibited a very dense and smooth surface morphology with a uniform grain size distribution. The ferroelectric domain structures were investigated by a combination of vertical and lateral piezoresponse force microscopy (VPFM and LPFM, respectively). It is demonstrated by both VPFM and LPFM observations that out-of-plane and in-plane lamellar ferroelectric domains coexist in the bilayered thin film. The PLCT/PZT bilayered film possesses good ferroelectric properties with relatively high spontaneous polarization (2P_s = 82 µC/cm²) and remnant polarization (2P_r = 26.2 µC/cm²).     

Nanoscale domain switching in Bi3.15Eu0.85Ti3O12 thin films annealed at different temperature by scanning probe microscopy

The nanoscale domain switching behavior of Bi_3.15Eu_0.85Ti₃O₁₂ (BET) thin films annealed at temperatures of 600, 650 and 700 °C is investigated by scanning probe microscopy (SPM) via the direct observation on their domain structure. It is shown that most ferroelectric domains are clearly detectable and confined in the grains. Some domains opposite to the polarizing electric field were observed by SPM, and their formations are attributed to the grain boundaries playing an active roles in pinning a preferential polarization state. The remnant polarization (2P_r) values of BET thin films increase with the annealing temperature due to the increase of nanoscale domains switched into the direction of polarizing electric field.     

Enhancement on effective piezoelectric coefficient d33 of Bi3.15Dy0.85Ti3O12 ferroelectric thin films

Effects of annealing temperature (600-800 °C) on microstructure, ferroelectric and piezoelectric properties of Bi_3.15Dy_0.85Ti₃O₁₂ (BDT) thin films prepared by metal-organic decomposition were studied. The remnant polarization 2P_r and spontaneous polarization 2P_s (16.2 µC/cm² and 23.3 µC/cm² under 690 kV/cm), effective piezoelectric coefficient d₃₃ (63 pm/V under the bipolar driving field of 310 kV/cm) of BDT thin film annealed at 700 °C are better than those of others. The higher 2P_s and relatively permittivity ε_r induced by moderate annealing temperature should be responsible for the enhancement of piezoelectric properties. The improved d₃₃ may make BDT a promising candidate for piezoelectric thin film devices.     

The influence of annealing temperatures on the properties of Bi2VO5.5/LaNiO3/Si thin films

Bi₂VO_5.5 ferroelectric thin films were fabricated on LaNiO₃/Si(100) substrate via chemical solution deposition. Ferroelectric and dielectric properties of the thin films annealed at 500-700 °C were studied. The thin film annealed at 700 °C exhibited more favorable ferroelectric and dielectric properties than those annealed at lower temperatures. The values of remnant polarization 2P_r and coercive field E_c for the film annealed at 700 °C are 10.62 µC/cm² and 106.3 kV/cm, respectively. The leakage current of the film is about 1.92 × 10^− 8 A/cm² at 6 V. The possible mechanism of the dependence of electrical properties of the films on the annealing temperature was discussed.     

Nd-substituted SrBi2Ta2O9 ferroelectric thin films prepared by radio frequency magnetron sputtering

Nd-substituted SrBi₂Ta₂O₉ (SNBT) thin films are sputtered on Pt/Ta/SiO₂/Si substrates. X-ray diffraction and x-ray photoelectron spectroscopy studies indicate that Nd³⁺ is substituted into the bismuth layered perovskite structure, preferentially at the Sr²⁺ site. The annealed thin film is polycrystalline with plate/needle-like grain microstructure. Secondary ion mass spectrometry results show that elements in SNBT thin film homogeneously distribute along film depth and interfacial diffusion takes place during post annealing. The Nd substitution leads to enhanced remnant polarization (2P_r = 18 μC/cm²) and reduced coercivity (2E_c = 64 kV/cm) at 180 kV/cm measured at 25 °C. After 10¹⁰ switching cycles, around 9% remnant polarization is decreased.     

Chemical deposition of Al2O3 thin films on Si substrates

Uniform Al₂O₃ films were deposited on silicon substrates by the sol–gel process from stable coating solutions. The technological procedure includes spin coating deposition and investigating the influence of the annealing temperature on the dielectric properties. The layers were studied by Fourier transform infrared spectroscopy and Scanning Electron Spectroscopy. The electrical measurements have been carried out on metal–insulator–semiconductor (MIS) structures. The C–V curves show a negative fixed charge at the interface and density of the interface state, Dit, 3.7 × 10¹¹ eV^− 1cm^− 2 for annealing temperature at 750 °C.     

Enhancement on effective piezoelectric coefficient of Bi3.25Eu0.75Ti3O12 ferroelectric thin films under moderate annealing temperature

Bi_3.25Eu_0.75Ti₃O₁₂ (BET) thin films were deposited on Pt/Ti/SiO₂/Si(111) substrates by a metal-organic decomposition method. The effects of annealing temperatures 600-800 °C on microstructure, ferroelectric, dielectric and piezoelectric properties of BET thin films were studied in detail. The spontaneous polarization (87.4 × 10^− 6 C/cm² under 300 kV/cm), remnant polarization (65.7 × 10^− 6 C/cm² under 300 kV/cm), the dielectric constant (992.9 at 100 kHz) and the effective piezoelectric coefficient d₃₃ (67.3 pm/V under 260 kV/cm) of BET thin film annealed at 700 °C are better than those of the others. The mechanisms concerning the dependence of the enhancement d₃₃ are discussed according to the phenomenological equation, and the improved piezoelectric performance could make the BET thin film a promising candidate for piezoelectric thin film devices.     

Electrical and optical properties of 12CaO·7Al2O3 electride doped indium tin oxide thin film deposited by RF magnetron co-sputtering

12CaO·7Al₂O₃ electride (C12A7:e⁻) doped indium tin oxide (ITO) (ITO:C12A7:e⁻) thin films were fabricated on a glass substrate by an RF magnetron co-sputtering system with increasing number of C12A7:e⁻ chips (from 1 to 7) and at various oxygen partial pressure ratios. The optical transmittance of the ITO:C12A7:e⁻ thin film was higher than 70% in the visible wavelength region. In the electrical properties of the thin film, a decrease of the carrier concentration from 2.6 × 10²⁰ cm^− 3 to 2.1 × 10¹⁸ cm^− 3 and increase of the resistivity from 1.4 × 10^− 3 Ω cm to 4.1 × 10^− 1 Ω cm were observed with increasing number of C12A7:e⁻ chips and oxygen partial pressure ratios. It was also observed that the Hall mobility was decreased from 17.27 cm²·V^− 1·s^− 1 to 5.13 cm²·V^− 1·s^− 1. The work function of the ITO thin film was reduced by doping it with C12A7:e⁻.     

Effects of annealing atmosphere on microstructure and ferroelectric properties of praseodymium-doped Bi4Ti3O12 thin films prepared by sol-gel method

Praseodymium-substituted bismuth titanate (Bi_3.2Pr_0.8Ti₃O₁₂, BPTO) thin films were successfully deposited on Pt(111)/Ti/SiO₂/Si(100) substrates by spin coating with a sol-gel technology and rapid thermal annealing. The effects of annealing atmospheres (vacuum, ambient atmosphere and oxygen) on the growth and properties of thin films were investigated. The results show that the intensity of the (117) diffraction peak of Bi_3.2Pr_0.8Ti₃O₁₂ film annealed in oxygen is stronger than those annealed in ambient atmosphere and vacuum. The XRD spectra demonstrated that a highly (117) orientation could be obtained when the Bi_3.2Pr_0.8Ti₃O₁₂ thin film was annealed in an oxygen-sufficient environment. The BPTO thin films annealed in oxygen atmosphere exhibits the maximum remanent polarization (2P_r) of 49 μC/cm² and a low coercive field (2E_c) of 130 kV/cm, fatigue free characteristics up to ≧ 10¹¹ switching cycles. These results indicate that the BPTO thin film is useful in nonvolatile ferroelectric random access memory applications.     

Influence of ZnO additions to 0.8(Mg0.95Co0.05)TiO3–0.2Ca0.6La0.8/3TiO3 ceramics on sintering behavior and microwave dielectric properties

The effects of ZnO addition on the microstructures and microwave dielectric properties of 0.8(Mg_0.95Co_0.05)TiO3–0.2Ca_0.6La_0.8/3TiO₃ ceramics were investigated. ZnO was selected as liquid phase sintering aids to lower the sintering temperature of 0.8(Mg_0.95Co_0.05)TiO3–0.2Ca_0.6La_0.8/3TiO₃ ceramics. With ZnO additives, the densification temperature of 0.8(Mg_0.95Co_0.05)TiO₃–0.2Ca_0.6La_0.8/3TiO₃ can be effectively reduced from 1450 to 1200–1325 °C. The crystalline phase exhibited no phase difference at low addition levels (0.25–2 wt.%). It is found that low-level doping of ZnO (0.25–2 wt.%) can significantly improve the density and dielectric properties of 0.8(Mg_0.95Co_0.05)TiO₃–0.2Ca_0.6La_0.8/3TiO₃ ceramics. The quality factors Q × f were strongly dependent upon the amount of additives. Q × f values of 36 000 and 13 000 GHz could be obtained at 1200–1325 °C with 1 and 2 wt.% ZnO additives, respectively. During all additives ranges, the relative dielectric constants were significantly different and ranged from 23.1 to 27.96. The temperature coefficient varies from 14.1–24.3 ppm/°C.     

Electrical and optical switching properties of ion implanted VO2 thin films

The metal-insulator transition in vanadium dioxide thin films implanted with O⁺ ions was studied. Ion implantation lowered the metal-insulator transition temperature of the VO₂ films by 12 °C compared to the unimplanted ones, as measured both optically and electrically. The lowering of the transition temperature was accomplished without significantly reducing the mid-wave infrared optical transmission in the insulating state for wavelengths > 4.3 μm. Raman spectroscopy was used to examine changes to the crystalline structure of the implanted films. The Raman spectra indicate that ion implantation effects are not annealed out for temperatures up to 120 °C.     

Preparation of SrAl2O4: Eu, Dy nanometer phosphors by detonation method

SrAl₂O₄: Eu²⁺, Dy³⁺ nanometer phosphors were synthesized by detonation method. The particle morphology and optical properties of detonation soot that was heated at different temperatures (600–1100 °C) had been studied systematically by X-ray diffraction (XRD) and transmission electron microscopy (TEM). Results indicated SrAl₂O₄: Eu²⁺, Dy³⁺ nanometer powders in monoclinic system (a = 8.442, b = 8.822, c = 5.160, β = 93.415) can be synthesized by detonation method, when detonation soot was heated at 600–800 °C. The particle size of SrAl₂O₄: Eu²⁺, Dy³⁺ is 35 ± 15 nm. Compared with the solid-state reaction and sol-gel method, synthesis temperature of the detonation method is lower about 500 and 200 °C respectively. After being excited under UN lights, detonation soot and that heated at 600–1100 °C can emit a green light.     

Microstructural, mechanical and magnetic properties of shape memory alloy Ni55Mn23Ga22 thin films deposited by radio-frequency magnetron sputtering

The near-stoichiometric Ni₂MnGa ferromagnetic alloys are one of the smart materials, that are of a great interest when they are deposited as a thin film by r.f. sputtering. These thin films of shape memory alloys are prospective materials for micro and nanosystem applications. However, the properties of the shape memory polycrystalline thin films depend strongly on their structure and internal stress, which develop during the sputtering process as well as during the post-deposition annealing treatment. In this study, about 1 μm Ni₅₅Mn₂₃Ga₂₂ thin films were deposited in the range 0,45 to 1,2 Pa of Ar pressure and P = 40 to 120 W. Their composition, crystallographic structure, internal stress and stress gradient, indentation modulus, hardness, deflection induced by magnetic field and magnetic properties were systematically studied as a function of the temperature of the silicon substrate ranging from 298 to 873 K and the vacuum annealing treatment at 873 K for 21,6 ks and 36 ks. A silicon wafer having a native amorphous thin SiO_x buffer layer was used as a substrate. This substrate influences the microstructure of the films and blocks the diffusion process during the heat treatment.The crystal structure of the martensitic phase in each film was changed systematically from bct or 10 M or 14 M. In addition, the evolution of the mechanical properties such as mean stress, stress gradient, roughness, hardness and indentation modulus with the temperature (of substrate or of heat treatment) were measured and correlated to crystal structure and morphology changes.Moreover, it has been shown that it is necessary to associate a high temperature (873 K) annealing during a long time (21 ks and 36 ks) to obtain good ferromagnetic properties. Thus, for the well annealed films (36 ks at 873 K) the magnetostrain is about - 170 ppm for a magnetic field of 1 MA m^- 1 applied along the beams.As a conclusion, the response of free-standing magnetic shape memory films to a magnetic field of 0,2 MA m^- 1 depends strongly on the martensitic structure, internal mechanical stress (mean and gradient) and magnetic properties. The free-standing annealed film at 873 K for 36 ks points out a considerable magnetic actuation associated with bct or 10 M or 14 M martensitic structures.     

The improvement in ferroelectric performance of (Bi3.15Nd0.85)4Ti3O12 films by the addition of hydrogen peroxide in a spin-coating solution

Chemically synthesized (Bi_3.15Nd_0.85)Ti₃O₁₂ (BNT) films annealed at 650 °C for 15 min were prepared by different approaches to improve their fatigue problem. These approaches involved the selection of substrates with different overlayers, the addition of hydrogen peroxide (H₂O₂) to a spin-coating solution, and annealing in different atmospheres. BNT films on Ti-overlayered substrates had performed badly if processed at oxidation environments. BNT films on TiO₂-overlayered substrates displayed stable and unchanged fatigue endurance if the spin-coating solution was modified by drops of the H₂O₂ solution to lesson the formation of oxygen vacancies in crystalline films. They were also fatigue-free in ferroelectricity after 10¹⁰ switching cycles and had remanent polarization of 24 μm/cm², coercive field of 52 kV/cm, nonvolatile charge density of 13 μC/cm² during relaxed fatigue tests, and leakage current of 10^− 6 A at 3 V.     

Ferroelectric properties of Bi3.4Dy0.6Ti3O12 thin films crystallized in N2

Bi_3.4Dy_0.6Ti₃O₁₂ (BDT) ferroelectric thin films were deposited on Pt/Ti/SiO2/Si substrates by chemical solution deposition (CSD) and annealed in an N₂ environment after pre-annealing in air at 400 °C. The effect of crystallization temperature on the structural and electrical properties of the BDT films was studied. The BDT films annealed in N₂ in the temperature range of 600 °C to 750 °C were crystallized well and the average grain size increased with increasing crystallization temperature, while the remanent polarization of the films is not a monotonic function of the crystallization temperature. The BDT films crystallized at 650 °C have the largest remanent polarization value of 2P_r = 39.4 μC/cm², and a fatigue-free characteristic.     

Synthesis and ferroelectric properties of SrBi2Ta2O9/Bi4Ti3O12/p-Si multilayer thin films by Sol-Gel

SrBi₂Ta₂O₉(SBT)/Bi₄Ti₃O₁₂(BIT) multilayer thin films were prepared on p-Si substrates by Sol-Gel method, the effect of thickness of SBT and annealing temperature on structure, morphology, ferroelectric and fatigue properties of SBT/BIT ferroelectric films were investigated. The SBT/BIT multilayer films annealed at above 600 ^∘C were uniform and crack free as well as exhibited no pyrochlore phase. The remanent polarization and the coercive field of SBT/BIT multilayer films both increases with the increase of annealing temperature due to better crystallization and larger grain size. The SBT/BIT multilayer thin films consisting of 1 layer of SBT and 3 layers of BIT annealed above 650 ^∘C obtained its best ferroelectric properties with a P_r of 8.1 μC/cm² and a E_c of 130 kV/cm which is comparable to that of pure BIT films and had a fatigue-free property up to 10¹¹ switching cycles, but P_nv appeared under the cycle field of 175 kV/cm and increased with the decrease of cycle field.     

Growth and optical characterizations of (Ba0.32Sr0.68)5Nb4O15 crystal

(Ba_0.32Sr_0.68)₅Nb₄O₁₅ crystal with sizes of Ø 17 × 35 mm was grown successfully by Czochralski technique method. The thermal anisotropy was discussed. The principal coefficients of thermal expansion along (100), (010), (001) directions were precisely measured to be 1.308 × 10^− 5, 1.288 × 10^− 5, 1.478 × 10^− 5 K^− 1, respectively. Its optical transparency range has been measured and found to span from 323 to 5500 nm. The bands present in the IR spectra were identified and assigned to the corresponding vibration modes of NbO₆ anions.     

Fabrication and ferroelectric properties of sol–gel derived 1–1 intergrowth-superlattice-structured Bi<Subscript>3</Subscript>TiNbO<Subscript>9</Subscript>-Bi<Subscript>4</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> thin films

1–1 intergrowth-superlattice-structured Bi₃TiNbO₉–Bi₄Ti₃O₁₂ (BTN–BIT) ferroelectric thin films have been prepared on p-Si substrates by sol-gel processing. The precursor films are crystallized in the desired intergrown BTN–BIT superlattice structures by optimizing the processing conditions. Synthesized BTN–BIT thin films annealed below 750 °C are polycrystalline, uniform and crack-free, no pyrochlore phase or other second phase, and exhibited good ferroelectric properties. As the annealing temperature increases from 600 to 700 °C, both remanent polarization P _r and coercive electric field E _c of BTN–BIT thin films increase, but the pyrochlore phase in BTN–BIT films annealed above 750 °C will impair the ferroelectric properties. The BTN–BIT thin films annealed at 700 °C have a P _r value ~19.1μC/cm² and an E _c value ~135 kV/cm.