Effect of thermal annealing treatment on structural, electrical and optical properties of transparent sol-gel ZnO thin films

Effect of thermal annealing in different ambients on the structural, electrical and optical properties of the sol-gel derived ZnO thin films are studied. XRD results show that the annealed ZnO films with wurtzite structure are randomly oriented. Crystallite size, carrier concentration, resistivity and mobility are found to be dependent on the annealing temperature. The change in carrier concentration is discussed with respect to the removal of adsorbed oxygen from the grain boundaries. The highest carrier concentration and lowest resistivity are 8 × 10¹⁸ cm⁻³ and 2.25 × 10⁻¹ Ω cm, respectively, for the film annealed at 500 °C in vacuum. The annealed films are highly transparent with average transmission exceeding 80% in the wavelength region of 400-800 nm. In all three ambients, the optical band gap value does not change much below 500 °C temperature while above this temperature band gap value decreases for nitrogen and air and increases for vacuum.     

Effect of thickness on the structural, electrical and optical properties of ZnO films

A series of ZnO films of different thickness have been deposited on glass substrates using sol-gel technique by varying the number of spin coatings and the effect of film thickness on the structural, electrical and optical properties have been investigated. The XRD results indicate that the full width at half maximum (FWHM) of the (0 0 2) diffraction peak and the strain along c-axis are decreased as the film is grown up to a thickness of 300 nm. Above 300 nm, the strain again becomes appreciable. The surface morphology shows that the grains become more uniform and bigger in size as the film thickness increases. Electrical result shows that although ZnO film with thickness of around 260 nm has the highest resistivity but is better for current conduction. The excitonic nature in the absorption spectrum becomes prominent for a film with thickness of around 260 nm. The band gap increases and then decreases as the film grows thicker.     

Oxygen treatment effects on properties of MgO thin films grown on single-crystalline diamond (1 0 0)

Oxygen post-treatment effects on the electronic structure and electrical properties of MgO films grown on homoepitaxial single-crystalline (1 0 0) diamond have been studied. MgO films examined were deposited at room temperature (RT) using an electron beam evaporator and were subsequently either annealed at 573-773 K for 12 h in oxygen ambient or treated by O₂ plasma for 10-40 min. RT resistivities remarkably increased after the O₂ annealing and plasma treatment, indicating that the post treatments play an essential part on the formation and positioning of bandgap states. Cathodoluminescence (CL) spectra had a broad band feature in a wavelength region from 360 to 530 nm, which were decomposed to several peaks originating mainly from the oxygen-vacancy-related F and F⁺ centers and the interstitial vacancies of MgO film. A prominent rectifying behavior of I-V property was observed for a Au/MgO/p-diamond layered structure. Based on temperature dependences of the electrical properties in a temperature region from RT to 600 K, the electrical conduction mechanism in the MgO films is discussed in relation to polaron-related conduction as well as the ionic conduction.     

Dielectric properties of barium strontium titanate thick films prepared by electrophoretic deposition

Ba_xSr_1−xTiO₃ (x = 0.5, 0.6, 0.7) thick films were prepared by electrophoretic deposition (EPD) technique on platinum metallic foils using BaTiO₃ and SrTiO₃ nanoparticles with different molar proportion of 1:1, 3:2 and 7:3, respectively. An isostatic pressure method was used to increase density of the thick films before high temperature sintering. Microstructures of the deposited films were examined with XRD and SEM techniques. Porosity of the thick films decreased after the isostatic pressure process. The Ba_0.5Sr_0.5TiO₃ thick films of 10 μm, 15 μm and 20 μm showed a tunability of 28.8%, 33.3% and 33.9%, respectively, at room temperature and at a biasing field of 2 kV/mm. The dielectric constant was from 2138 to 3446 and dielectric loss was from 0.016 to 0.011 at zero bias field at 10 kHz. The temperature dependence of dielectric constant was also measured and the effect of porosity and thickness on the electrical performance of the thick films was discussed.     

Chemical bonding and optoelectrical properties of ruthenium doped yttrium oxide thin films

Highly infrared transparent conductive ruthenium doped yttrium oxide (RYO) films were deposited on zinc sulfide and glass substrates by reactive magnetron sputtering. The structural, optical, and electrical properties of the films as a function of growth temperature were studied. It is shown that the sputtered RYO thin films are amorphous and smooth surface is obtained. The infrared transmittance of the films increases with increasing the growth temperature. RYO films maintain greater than ∼65% transmittance over a wide wavelength range from 2.5 μm to 12 μm and the highest transmittance value reaches 73.3% at ∼10 μm. With increasing growth temperature, the resistivity changed in a wide range and lowest resistivity of about 3.36 × 10⁻³ Ω cm is obtained at room temperature. The RYO thin films with high conductivity and transparency in IR spectral range would be suitable for infrared optical and electromagnetic shielding devices.     

Structure and electrical properties of sputtered lithium cobaltite thin films

Li_xCoO_y films with x<1 and y>2 have been prepared by radio-frequency (rf) sputtering from high temperature (HT) LiCoO₂ targets. Their structures have been examined with high resolution electron microscopy. Conductivities have been studied between 77 and 400 K. The electrochemical behaviour of film electrodes have been investigated with Li/LiClO₄-PC/Li_xCoO_y cells. The annealed films consist of nanocrystalline domains with amorphous boundaries. Electrical conductivities appear to arise from variable-range hopping (VRH) of holes. The films form good electrodes with operating potentials between 2.7 and 3.8 V. The observations have been discussed on the basis of a tentative and heuristic molecular orbital based energy band diagram.     

Effect of oxygen flow rate and radio-frequency power on the photoconductivity of highly ultraviolet sensitive ZnO thin films grown by magnetron sputtering

We have investigated the effect of oxygen flow rate and radio-frequency (RF) power on the photoconductivity properties of ZnO thin films grown by magnetron sputtering and correlated the changes to the structural qualities. The electrical measurements show that the carrier concentration decreases with increase in the oxygen flow rate which is attributed to the probable increase in the oxygen vacancy (V_O)-related defects. The photocurrent spectra show that as the oxygen content increases, the films become lesser and more sensitive to the visible and ultraviolet (UV) lights respectively. As a result, the photo-to-dark current ratio (gain) increases to a value of 1.10 × 10⁶. As the RF power increases from 50 W to 150 W, the films become more conducting. The photoconductivity results show that as the RF power increases, the UV gain decreases slowly indicating that highly UV sensitive films can be grown at lower RF power.     

Electrodeposited ZnO films with high UV emission properties

We report here our results in the preparation of ZnO films with high UV band to band characteristic luminescence emission by potentiostatic electrodeposition. Zinc nitrate aqueous baths with different concentration and additives were employed for the preparation of the films on platinum substrates. We focused our research in determining how the electrodeposition bath composition, i.e. zinc nitrate concentration and addition of KCl or polyvinyl pyrolidone and applied overpotential influence the morphological and optical properties of the oxide films. Scanning electron microscopy was employed for characterizing the films in terms of morphology. Optical reflection, photoluminescence spectroscopy and cathodoluminescence were used for determining the optical characteristics of the samples. The morphology of the deposit varies from hexagonal prisms to platelets as a function of the deposition rate. This experimental parameter also influences the luminescence properties. We found that at low deposition rates high UV luminescent material is obtained.     

Effect of A-site deficiency on electrical transport properties of YSZ doped manganites

The electrical transport properties of the composite samples: A-site stoichiometry (1−x)La_2/3Ca_1/3MnO₃+xYSZ and A-site deficiency (1−x)(La_2/3Ca_1/3)_0.95MnO₃+xYSZ with different YSZ percentage x were investigated, respectively. The similar metal-insulator transition at different temperature T_P was observed in the two types of composite samples: With increasing of the YSZ percentage, the zero-field resistivity of the composite samples increases and T_P shifts to the low temperature for the range of x<2%, but zero-field resistivity decreases and T_P increases for the range of x>2%. For the same YSZ percentage x, T_P of (1−x)La_2/3Ca_1/3MnO₃+xYSZ is lower than that of (1−x)(La_2/3Ca_1/3)_0.95MnO₃+xYSZ. The different effects between the two type composites were also observed in the nonlinear current-voltage (I-V) behaviors. The results suggest that A-site deficiency and YSZ dopant can be used to adjust purposely the metal-insulator transition temperature and resistivity of composites.     

Effect of temperature on nonlinear electrical behavior and dielectric properties of (Ca, Ta)-doped TiO2 ceramics

TiO₂ ceramics doped with 0.75 mol% Ca and 2.5 mol% Ta were sintered at different temperatures ranging from 1300 to 1450°C. The effects of sintering temperature on the microstructure, nonlinear electrical behavior, and dielectric properties of the ceramics were studied. The sample sintered at 1300°C exhibits the highest nonlinear coefficient (5.5) and a comparatively lower relative dielectric constant.     

Effects of annealing temperature on microstructure and electrical properties of Mn-Co-Ni-O thin films

Mn_1.85Co_0.3Ni_0.85O₄ (MCN) thin films were prepared on Al₂O₃ substrates by chemical solution deposition method at different annealing temperature (650, 700, 750 and 800 °C). Effects of annealing temperature on microstructure and electrical properties of MCN thin films were investigated. The MCN thin film annealed at 750 °C is of good crystallization and compact surface. It shows lower resistance (4.8 MΩ) and higher sensitivity (3720.6 K) than those of other prepared films. It also has small aging coefficient (3.7%) after aging at 150 °C for 360 h. The advantages of good properties make MCN thin film very promising for integrated devices.     

Effect of annealing atmosphere on phase formation and electrical characteristics of bismuth ferrite thin films

Bismuth ferrite thin films were deposited on Pt/Ti/SiO₂/Si substrates by a soft chemical method and spin-coating technique. The effect of annealing atmosphere (air, N₂ and O₂) on the structure and electrical properties of the films are reported. X-ray diffraction analysis reveals that the film annealed in air atmosphere is a single-phase perovskite structure. The films annealed in air showed better crystallinity and the presence of a single BFO phase leading to lower leakage current density and superior ferroelectric hysteresis loops at room temperature. In this way, we reveal that BFO film crystallized in air atmosphere by the soft chemical method can be useful for practical applications, including nonvolatile digital memories, spintronics and data-storage media.     

Improved efficiency of the chemical bath deposition method during growth of ZnO thin films

Chemical bath deposition (CBD) is an inexpensive and low temperature method (25-90 °C) that allows to deposit large area semiconductor thin films. However, the extent of the desired heterogeneous reaction upon the substrate surface is limited first by the competing homogeneous reaction, which is responsible for colloidal particles formation in the bulk solution, and second, by the material deposition on the CBD reactor walls. Therefore, the CBD method exhibits low efficiency in terms of profiting the whole amount of starting materials. The present work describes a procedure to deposit ZnO thin films by CBD in an efficient way, since it offers the possibility to minimize both the undesirable homogeneous reaction in the bulk solution and the material deposition on the CBD reactor walls. In a first stage, zinc peroxide (ZnO₂) crystallizing with cubic structure is obtained. This compound shows a good average transparency (90%) and an optical bandgap of 4.2 eV. After an annealing process, the ZnO₂ suffers a transformation toward polycrystalline ZnO with hexagonal structure and 3.25 eV of optical bandgap. The surface morphology of the films, analyzed by atomic force microscope (AFM), reveals three-dimensional growth features as well as no colloidal particles upon the surface, therefore indicating the predominance of the heterogeneous reaction during the growth.     

Controlling the photoluminescence of ZnO:Si nano-composite films by heat-treatment

Nano-composite thin films of silicon and zinc oxide were deposited on glass substrates using thermal co-evaporation. On heating the films at different temperatures and different atmospheric pressures, the photoluminescence (PL) emission spectra become broad, giving emissions in UV-Blue, Green and Red region. Analyses reveal that defect-dominated structure of ZnO contributes to the broad PL spectra observed. X-ray diffraction and Raman spectra analysis show that the defects caused by oxygen vacancies decrease with heating which is accompanied by a competing process of decrease in grain size made possible by surrounding silicon reacting at the surface of the ZnO nano-cluster grains giving new bonds, possibly O-Si-Zn bonds. Crystallinity of nano-grains and defects contribute different emission peaks that depending on relative contributions can give comparable peaks resulting in broad emission spectra. The study shows that simple post-deposition process can lead to fabrication of white light emitting devices based on these nano-composites. Best emission spectra are obtained by heating at a temperature of 250 °C in low vacuum.     

The effect of substrate temperature on Al-doped ZnO characteristics for organic thin film transistor applications

The influence of substrate temperature on the structural, electrical, and optical properties of aluminum-doped zinc oxide (AZO) films fabricated by radio frequency (RF) magnetron sputtering was investigated. The AZO films were deposited at various substrate temperatures, and the effect of AZO gate electrode conductivity on organic thin film transistor (OTFT) performance was examined. While an increase in the substrate temperature from 100 °C to 300 °C led to an improvement in crystallinity, substrate temperatures over 300 °C caused degradation of the electrical and surface properties. We fabricated OTFTs using AZO films prepared at various substrate temperatures and obtained good device performance. Thus, the performance of an OTFT can be determined by the conductivity of the AZO gate electrode.     

A study on the electrical properties of Pb(Zr, Ti)O3 thin films crystallized by the electrical resistive heating of Pt thin film

The electrical properties of Pb(Zr, Ti)O₃ thin films annealed by Pt thin film heater were investigated. By the thin film heater, we successfully crystallized Pb(Zr, Ti)O₃ thin films at a high temperature above 750 °C in a few seconds. The thin film heater has some advantages, such as a low thermal budget, little Pb-loss and enhanced surface morphology compared with the conventional furnace because it has a fast heating rate. The electrical properties of the Pb(Zr, Ti)O₃ thin film crystallized by thin film heater improved considerably comparing to those crystallized in conventional furnace. The remanent polarization, breakdown field, and leakage current density measured to be 22.7 μC/cm², 853 kV/cm, and 6.93 × 10⁻⁷ A/cm², respectively.     

Structural, electrical and optical studies of SILAR deposited cadmium oxide thin films: Annealing effect

Successive ionic layer adsorption and reaction (SILAR) method has been successfully employed for the deposition of cadmium oxide (CdO) thin films. The films were annealed at 623 K for 2 h in an air and changes in the structural, electrical and optical properties were studied. From the X-ray diffraction patterns, it was found that after annealing, H₂O vapors from as-deposited Cd(O₂)_0.88(OH)_0.24 were removed and pure cubic cadmium oxide was obtained. The as-deposited film consists of nanocrystalline grains of average diameter about 20-30 nm with uniform coverage of the substrate surface, whereas for the annealed film randomly oriented morphology with slight increase in the crystallite size has been observed. The electrical resistivity showed the semiconducting nature with room temperature electrical resistivity decreased from 10⁻² to 10⁻³ Ω cm after annealing. The decrease in the band gap energy from 3.3 to 2.7 eV was observed after the annealing.     

Structural, electrical and optical properties of TiO2-WO3 polycrystalline ceramics

Mixed oxides from the TiO₂-WO₃ system were prepared as polycrystalline materials. Their phase composition and electrical conductivity were investigated using X-ray diffraction (XRD) and dc electrical measurements. The energy gap, evaluated on the basis of optical measurements, was presented as a function of W concentration. The influence of chemical composition on structural, semiconducting and optical properties of the TiO₂-WO₃ polycrystalline ceramics was discussed.     

Structures, varistor properties, and electrical stability of ZnO thin films

In this letter, we report the structures, varistor properties, and electrical stability of ZnO thin films deposited by the gas discharge activated reaction evaporation (GDARE) technique. The X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements showed that the thin films thus prepared have polycrystalline structures with the preferred orientation along the (002) plane whose surface consists of ZnO aggregates with sizes of 50-200 nm. The ZnO thin films deposited by GDARE and annealed at 250 °C for 2 h have strong nonlinear varistor-type I-V characteristics. The nonlinear coefficient (α) of a single-layered ZnO thin film sample was 33 and that of a triple-layered sample obtained by the many-time deposition was 62. The varistor voltages (V_1mA) of the two samples are found rather close each other. Under a DC bias of 0.75 V_1mA and a temperature of 150 °C these thin films exhibit good electrical stability with a degradation rate coefficient K_T of 0.05 mA/h^1/2.