高长径比探针在高分子纳米纤维膜原子力显微镜扫描上的应用

原子力显微镜技术是用于表征表面纳米级形貌的一种重要手段，对于纳米纤维膜等聚合物表面分析具有一定的优势。本文详细叙述了原子力显微镜的基本原理及操作步骤，研究了扫描模式、测试参数、探针类型等因素对较大粗糙度的纳米纤维膜测试结果的影响。结果表明,高长径比探针比常规探针更能真实的反应表面的形貌信息。     

用于超精表面分析的宽范围扫描隧道显微镜

本文描述了一种能检测超精密度表面纳米级超微观形貌的扫描隧道显微镜，该装置可测到高定向石墨表面原子图象和精密光栅，金刚石切削表面和精密磨削表面的纳米级形貌。     

扫描离子电导显微镜技术及其在纳米生物学研究中的应用

扫描探针显微镜技术的出现开辟生命科学研究的新纪元并逐步发展成为在纳米尺度研究细胞结构与功能的一类新型的显微镜技术。扫描离子电导显微镜技术就是新近发展起来的这一扫描探针显微镜技术家族中的一员,可被用来在生理条件下、高分辨率及非接触地研究活细胞的表面形貌,从而帮助人们深入研究细胞微观结构与功能的关系。本文简要介绍扫描离子电导显微镜技术的基本原理,并结合国外研究现状综述该技术在纳米生物学研究中的应用。     

扫描探针显微镜的进展

扫描探针显微镜（SPMs）经过近30年的发展，已经应用到科学研究的各个方面。为适应不同研究的需要，扫描探针显微镜本身的发展也非常迅速。如其中原子力显微镜（AFM）从发明初期的单一的接触工作模式发展到包括可以测量粘弹性的相位模式在内的多种工作模式，同时通用型方面也高度发展，已经形成了一个庞大的高度自动化的扫描探针显微镜的家族。在这个家族中，严格环境控制的扫描探针显微镜的出现，很好的解决了各种务件下对样品的原位观察，环控化扫描探针显微镜的发展已经引起了人们的足够重视，必将成为扫描探针显微镜发展的一个重要方向。新近出现的各种显微镜集成的扫描探针显微镜系列是这个家族中的新成员，这个成员可以同时完成大范围、高分辨和精确定位等各种研究，必将在半导体制造厂的异物检查、金属和绝缘体等表面测定以及生物大分子研究等领域发挥重要作用。扫描探针显微镜的发明和发展促进了一门新兴的高科技——一纳米科学技术的诞生，宣告一个科枝新纪元，纳米科技时代已经来临。     

具有宽测量范围的扫描探针见微镜研究

介绍了具有宽测量范围（１４０×１４０μｍ２）的高灵敏度扫描探针显微镜（ＳＰＭ）。仅用了６个需加工的零件，构造出了直接对１３０ｍｍ的磁盘、光盘表面纳诺形貌和集成电路芯片光刻质且检查分析的多模式测量仪器。通过更换测头，可以在扫描隧道显微镜（ＳＴＭ）、原子力显微镜（ＡＦＭ）、磁力显微镜（ＭＰＭ）与静电力显微镜（ＥＦＭ）模式下工作。本文给出了部份试验结果，如高定向石墨的原子图像、光栅和超精密磨削试件表面的纳米级形貌图。     

扫描探针显微镜在纳米材料表征中的应用

报道了扫描探针显微镜在纳米电子薄膜材料的形貌、晶界、晶粒形状与尺度、表面粗糙度和剖面分析中的具体应用实例,以及纳米磁性薄膜中的微磁畴、铁电材料的微电畴和半导体PN区像等电磁特殊性的可视分析应用。     

原子力显微镜在生物分子力学性质方面的研究

原子力显微镜在生物纳米研究领域有广泛应用,包括对生物样品的形貌成像、超微结构、机械性能和相互作用等方面的研究。利用其非修饰和修饰探针进行样品扫描,可以得到样品表面形貌和样品表面某一特定点的力与距离的关系曲线,从而得到相关生物分子的力学性质。目前国际上应用原子力显微镜对生物分子力学特性方面的研究已经成为最热门的研究课题之一,在生物医学和临床医学方面有重要研究意义。本文简述了原子力显微镜的力曲线原理,并对近年来应用原子力显微镜在探测生物分子力学性质方面的研究进展进行了综述。     

原子力显微镜在聚合物研究中的应用

原子力显微镜以其分辨率高、样品无需特殊制备、实验可在大气环境中进行等优点而广泛应用于聚合物研究之中,弥补扫描隧道显微镜不能观测非导电样品的缺憾。近年来,其应用已由对聚合物表面几何形貌的观测发展到纳米级结构和表面性能的研究领域。在介绍原子力显微镜工作原理的基础上,简要回顾其在聚合物研究方面的若干新应用,并对其应用前景作展望。     

纳米CaCO3、Cu混合物润滑油添加剂的摩擦学性能

采用纳米碳酸钙、纳米铜粒子混合物作为润滑油添加剂，利用四球摩擦磨损试验机考察了含纳米碳酸钙、纳米铜粒子添加剂的润滑油的摩擦学性能；用扫描电子显微镜（SEM）考察了磨痕表面的形貌；用原子力显微镜和扫描电子显微镜（SEM）观察分析了在磨损表面纳米粒子的形态与分布。研究结果表明，纳米碳酸钙、纳米铜的混合粒子的总添加量为0.6％，质量比为1：1时，润滑油具有最佳的摩擦学性能；润滑油中纳米碳酸钙、纳米铜混合物粒子添加剂的优良摩擦学性能与纳米粒子在表面存在形态相关。     

扫描探针显微镜在纳米科技中的应用

本文在介绍了扫描探针显微镜的发展和有关纳米科技知识的基础上，论述了扫描显微镜在纳米科技中的应用。     

The Effect of Topography on Water Wetting and Micro/Nano Tribological Characteristics of Polymeric Surfaces

The effect of surface topography on the water-wetting nature and micro/nano tribological characteristics of polymer surfaces was experimentally studied. A plasma-treated thin polymer film and ion-beam-treated PTFE (polytetrafluoroethylene) were used as flat specimens. Thin polymer films were deposited on Si-wafer (100) by the parallel-plate plasma technique. The ion-beam-roughening treatment was performed to change the PTFE surface topography using a hollow cathode ion gun under different argon-ion dose conditions in a vacuum chamber. Micro and nano tribological characteristics, water-wetting angles and roughness were measured with a micro-tribotester, SPM (scanning probe microscope), contact anglemeter and profilometer, respectively. The plasma-treated thin polymer film and ion-beam-treated PTFE surfaces were rendered increasingly hydrophobic as a function of the treatment time. The wetting characteristics were strongly dependent on the micro-roughness and the sharpness of the asperities. The tribological characteristics on the nano-scale showed different results from those on the micro-scale. It was noted that the contact-size ratio, especially the ratio of the tip or ball to the average surface roughness at a standard cut-off length, should be considered for evaluating the micro- and nano-scale tribological test results.     

基于SPM的纳米加工技术研究进展

扫描探针显微镜(SPM)使人们不仅可以观察到物质表面的微观形貌,还可以在微纳米尺度上对样品表面进行加工,这种方法有可能成为未来微纳米器件的主要制作方法,成为推动人类科学和技术发展的新动力。主要介绍基于SPM的三种纳米加工方法:单原子操纵法、阳极氧化法和机械刻蚀法。详细阐述了各自的原理、特点及发展状况,并指出阳极氧化法是目前最有可能应用在实际生产制造中的加工方法,而机械刻蚀法则不仅可以作为纳米加工的手段,还可以应用于纳米加工机理方面的研究。     

Atomic and magnetic force microscopy imaging of thin-film recording heads

Investigations on the use of the scanning probe microscope (SPM) in the atomic force microscopy (AFM) mode for topography imaging and the magnetic force microscopy (MFM) mode for magnetic imaging are presented for a thin-film recording head. Results showed that the SPM is suitable for imaging the surface profile of the recording head, determining the width of the pole gap region, and mapping the magnetic field patterns of the recording head excited under current bias conditions of different polarity. For the cobalt sputter-coated tips used in MFM imaging, it was found that the magnetic field patterns obtained under different polarities of the current bias to the recording head were similar. This can be explained by the nature of the thin-film MFM tip, in which the direction of the tip magnetic moment can follow the stray magnetic field of the sample as the current bias to the recording head reverses in direction.     

高速车削工件表面形貌及其粗糙度特征的试验研究

借助于扫描电镜照片、已加工样品表面形貌轮廓描绘和试验数据处理等手段,对高速车削工件已加工表面形貌与其表面粗糙度之间的关系以及它们的形成特征进行了分析研究.研究结果表明,切削速度和被切削材料的硬度是决定高速车削过程中被切削层材料变形和已加工表面形貌及其表面粗糙度形成的主要因素,随着被切削材料硬度和切削速度的提高,工件已加工表面质量在一定程度上得到了改善.在已加工表面上出现了犁垄和高速加工所特有的熔融金属涂抹现象,由此决定着已加工表面粗糙度值的变化.     

轴向超声辅助端面磨削金属表面形貌及粗糙度预测

轴向超声辅助端面磨削被广泛应用于难加工材料加工,而磨削后的表面粗糙度对构件摩擦、疲劳等服役性能有重要影响。超声振幅的大小对轴向超声辅助端面磨削金属表面形貌和粗糙度有较大影响,但是现有模型中并未考虑实际加载对振幅的影响,因此提出了一种考虑加载状态下振幅变化的轴向超声辅助端面磨削金属表面形貌及粗糙度预测方法。根据砂轮粒度及尺寸建立了考虑磨粒随机分布的砂轮端面模型,并对轴向超声辅助端面磨削磨粒的三维磨削轨迹进行了数学描述,生成了加工后的表面三维数据矩阵并对表面粗糙数值进行了计算。在此基础上,研究了粗糙度随振幅的变化规律,提出了振幅衰减形貌映射系数这一概念,并给出了其标定方法。通过振幅衰减形貌映射系数近似计算出加载状态下的振幅并代入到所建立的轴向超声辅助端面磨削表面形貌及粗糙度预测模型中,实现了金属表面形貌模拟及粗糙度预测。最后,通过试验对所建模型的正确性进行了验证。     

High-resolution scanning near-field EBIC microscopy: application to the characterisation of a shallow ion implanted p+-n silicon junction

High-resolution electron beam induced current (EBIC) analyses were carried out on a shallow ion implanted p⁺–n silicon junction in a scanning electron microscope (SEM) and a scanning probe microscope (SPM) hybrid system. With this scanning near-field EBIC microscope, a sample can be conventionally imaged by SEM, its local topography investigated by SPM and high-resolution EBIC image simultaneously obtained. It is shown that the EBIC imaging capabilities of this combined instrument allows the study of p–n junctions with a resolution of about 20 nm.     

On the method of revealing enamel structure by acid etching. Aspects of optimization and interpretation

The study aimed at finding an optimal combination of acid concentration and etching time when nitric acid is used as etchant for the study of the finer details of human dental enamel structure. Four hundred 2–3‐mm‐thick segments of facio‐lingually sectioned human third molar crowns were assigned to 20 groups with 20 specimens in each group, each group differing with respect to acid concentration (0.1, 1, 2.5, and 5%) and etching time (15, 30, 45, 90, and 180 s). After etching and preparation, specimens were observed in the scanning electron microscope (SEM). Surface roughness/topography increased with increasing acid concentration and increasing etching time, but not in a linear fashion; generally, prisms tended to go from flat‐surfaced to cone‐shaped and prism sheaths from fissure‐like to wedge‐shaped. Intragroup variations and intergroup similarities were considerable. The two major enamel factors determining the etch effect are crystal orientation and prism sheath properties. Other factors, such as distribution of porosities and crystal quality, also contribute probably. Slight to moderate topography is best for observing the finer enamel structure, for example, etching with concentrations in the range 0.1–1% and with etching times in the range 15–90 s, the stronger the acid, the shorter the time. The depth effect of nitric acid is judged to be relatively small. Considerable variations in expression of prism cross‐striations were observed. SEM observations of acid‐etched enamel in carefully selected planes are a powerful method for the study of enamel structure, bearing in mind the artifactual aspects of the observed surface.     

MEMS-based fast scanning probe microscopes

Scanning probe microscopy is a frequently used nanometer-scale surface investigation technique. Unfortunately, its applicability is limited by the relatively low image acquisition speed, typically seconds to minutes per image. Higher imaging speeds are desirable for rapid inspection of samples and for the study of a range of dynamic surface processes, such as catalysis and crystal growth. We have designed a new high-speed scanning probe microscope (SPM) based on micro-electro mechanical systems (MEMS). MEMS are small, typically micrometer size devices that can be designed to perform the scanning motion required in an SPM system. These devices can be optimized to have high resonance frequencies (up to the MHz range) and have very low mass (10⁻¹¹ kg). Therefore, MEMS can perform fast scanning motion without exciting resonances in the mechanical loop of the SPM, and hence scan the surface without causing the image distortion from which conventional piezo scanners suffer. We have designed a MEMS z-scanner which we have integrated in commercial AFM (atomic force microscope) and STM (scanning tunneling microscope) setups. We show the first successful AFM experiments.     

猪笼草蜡质滑移区表面反粘附特性的研究

利用环境扫描电子显微镜(ESEM)和原子力显微镜(AFM)表征红瓶猪笼草蜡质滑移区表面微观形貌,并提取粗糙度的相关参数。利用AFM分别在低载荷和高载荷下对蜡质区表面同一区域进行扫描,在不同条件下的扫描形貌一致,且扫描后的探针针尖上未发现附着污染物。利用胶体探针技术在无针尖的探针悬臂上粘附15 μm SiO2小球,模拟单根刚毛与猪笼草蜡质区表面的接触,并测试蜡质区表面的粘附力和摩擦力,并与不同粗糙度的抛光纸表面做对照。考虑到表面物理化学性质对其粘附特性的重要影响,利用接触角测量仪测量蜡质区表面和同粗糙度范围抛光纸表面对水和二碘甲烷的表观接触角并利用二滴法计算其表面能。研究结果表明：蜡质滑移区表面单个蜡质晶体具有力学稳定性,不会因脱落而污染昆虫的粘附器官,污染学说不成立;表面微粗糙度能有效地减小界面间的接触面积,降低了蜡质滑移区表面的粘附力和摩擦力;蜡质滑移区超疏水特性和低表面能是降低表面粘附力和摩擦力的另一个重要因素,两者共同作用形成了猪笼草蜡质滑移区的反粘附特性。