高效率半导体激光器波导层掺杂的优化设计

为获得高效率半导体激光器,理论分析并计算了p型波导层四种不同掺杂浓度分布对器件内损耗、串联电阻、阈值电流以及电光转换效率的影响,由此优化了p型波导层的掺杂浓度分布和厚度。根据计算及优化结果,p型波导层采取线性s杂分布,厚度为0.45μm,制备了腔长1200μm的980nm半导体激光器,其阈值电流为324mA,内损耗为1.62cm-1,串联电阻为136mΩ。当输入电流为1.98A时,激光器的斜率效率和输出光功率分别为1.05W/A和1.74W,对应的电光转换效率从未优化时的54.6%提高到58.4%。     

高效率976nm激光器材料

使用自洽二维数字模拟软件优化半导体激光器的外延结构,对GaInAs/AlGaAs分别限制压应变单量子阱结构进行了模拟,研究了包层和波导层的Al组分对工作电压的影响。根据模拟结果,采用金属有机化学淀积(MOCVD)技术,外延生长了单量子阱976nm激光器材料。利用该材料制作成2mm腔长的连续(CW)单管器件,采用C-mount载体标准封装,并进行了测试。测试结果表明,模拟与实验的结论一致,降低优化包层和波导层的Al组分可以减小工作电压,从而提高了976nm半导体激光器的转换效率。室温下,当工作电流为500A/cm2时,包层和波导层Al组分分别为0.35和0.15时,激光器的工作电压降低为1.63V,使得电光转换效率达到67%。     

高功率980nm非对称宽波导半导体激光器设计

设计了980nm非对称宽波导InGaAs/InGaAsP量子阱激光器,并在结构中插入电流阻挡层,有效地阻止载流子的泄露。用LASTIP软件对980nm非对称宽波导量子阱激光器进行理论模拟,与传统的980nm对称宽波导量子阱激光器相比,非对称宽波导量子阱激光器波导和量子阱之间有更小的能带差,非对称宽波导结构具有更低的阈值电流,更高的斜效率以及更低的阻抗,所以带有电流阻挡层的980nm非对称宽波导InGaAs/InGaAsP量子阱激光器有更高的光电转换效率和输出功率。     

键合方法研制InAsP/InGaAsP量子阱1.3μm垂直腔面发射激光器

设计并研制了由InAsP/InGaAsP应变补偿多量子阱有源层、SiO2/TiO2介质薄膜和GaAs/Al(Ga)As半导体分布布拉格反射镜(DBR)构成的垂直腔面发射激光器(VCSEL).采用直接键合技术实现InP基有源层与GaAs基DBR的晶片融合,并经过侧向湿法腐蚀定义电流限制孔径和沉积介质薄膜DBR等关键器件工艺,研制出InAsP/InGaAsP量子阱垂直腔面发射激光器,其阈值电流为13.5mA,单模激射波长为1288.6nm.     

非对称异质波导半导体激光器结构

提出了一种非对称异质波导半导体激光器外延结构,即通过优化选择材料体系和结构厚度,对器件外延层的P侧限制结构和N侧限制结构分别设计,从而降低器件的电压损耗,使其满足高输出功率以及高的电光转换效率的要求.从载流子的输运和限制等微观机制出发,对器件的主要输出特性进行了理论分析和数值模拟,并以此为根据设计和制作了一种1060 nm In Ga As/Ga As单量子阱非对称异质波导结构半导体激光器,并对器件的主要输出特性进行了测试.实验结果表明,非对称异质结构是降低器件的电压降、增大限制结构对注入载流子的限制,提高半导体激光器电光转换效率的有效措施.     

高温稳定(T_0=180K)的新型异质结InGaAsP/InP激光器

日本富土通实验室提出了一种新型异质结InGaAsP/InP激光器,即双重载流子限制(DCC)异质结激光器的工作原理并已得到实验证实。通过把一个P-InGaAsP第二势阱层,插进到通常的InGaAsP/InP双异质结激光器中的InP包层内制造了这种激光器。这种激光器阈值电流的温度稳定性极好[阈值电流按exp(T/T_0)变化时,在20～100℃的温度范围内,T_0=180K],而且微分量子效率很高(在100℃下η>45％)。垂直于结平面的光束发散特性亦有很大改进(θ_L<25°)     

键合方法研制InAsP/InGaAsP量子阱1.3μm垂直腔面发射激光器

设计并研制了由InAsP/InGaAsP应变补偿多量子阱有源层、SiO2/TiO2介质薄膜和GaAs/Al(Ga)As半导体分布布拉格反射镜（DBR）构成的垂直腔面发射激光器（VCSEL) . 采用直接键合技术实现InP基有源层与GaAs基DBR的晶片融合,并经过侧向湿法腐蚀定义电流限制孔径和沉积介质薄膜DBR等关键器件工艺,研制出InAsP/InGaAsP量子阱垂直腔面发射激光器,其阈值电流为13.5mA,单模激射波长为1288.6nm.     

横模稳定的InGaAsP/InP(λ=1.3μm)平凸波导激光器

本文介绍了一种InGaAsP/InP1.3μm波段平凸波导(PCW)激光器的导引机理和激射特性。在沟槽衬底上用一次液相外延(LPE)方法制造了这种激光器的结构。从理论上和实验上研究了由于与有源层相邻接的波导层侧向厚度的变化而产生的折射率导引问题。具有适当的折射率差和沟槽宽度的激光器,直到两倍阈值电流仍可呈现出稳定的基横模工作特性。     

AlGaN/GaN/InGaN对称分别限制多量子阱激光器的优化设计

采用一维传递矩阵法模拟计算了AlGaN/GaN/InGaN对称分别限制多量子阱激光器(发射波长为396.6nm)的波导特性.以光限制因子、阈值电流密度和功率效率作为优化参量,获得激光器的优化结构参数为:3周期量子阱In0.02Ga0.98N/In0.15Ga0.85N(10.5nm/3.5nm)作为有源层,90nm In0.1Ga0.9N为波导层,120周期Al0.25Ga0.75N/GaN(2.5nm/2.5nm)为限制层.     

用于半导体激光器的高效率复合波导结构

提出了一种高电光转换效率的新型复合波导半导体激光器结构（Composite Waveguide LD,CWG LD）。该器件结构高的电光转换效率得益于其所采用的Al组分阶梯分布AlxGa1-xAs波导层。通过优化设计波导层电阻率分布及能带分布,CWG LD结构在保证输出光功率的同时,可以有效地降低器件串联电阻并提高电光转换效率。结合理论分析及计算机数值仿真软件,分析了复合波导提升器件电光转换效率的机理。经优化,在激光器条宽为6 m、腔长为1 000 m的情况下,波导层阶梯数为1时CWG LD结构可以获得最大的电光转换效率。研究结果表明:在注入电流为900 mA时,CWG LD结构的串联电阻由常规波导器件结构的3.51 降低为2.67 ,电光转换效率由54.7%提升至69.5%。     

Highly efficient 40 GHz waveguide InGaAs p-i-n photodiode employing multimode waveguide structure

The authors describe the design procedure of a highly efficient waveguide p-i-n photodiode. The efficiency of the waveguide InP/InGaAsP ( lambda /sub g/=1.3 mu m)/InGaAs/InGaAsP ( lambda /sub g/=1.3 mu m)/InP p-i-n photodiode is calculated using the step-segment method and overlap-integral between the optical field of a fiber and that of the photodiode. A remarkably high coupling efficiency to a fiber can be obtained by using a multimode waveguide structure. The fabricated device has an external quantum efficiency of 68% as well as 3 dB bandwidth of higher than 40 GHz at a 1.55 mu m wavelength.<>     

Measurement of group effective index in integrated semiconductoroptical waveguides

The effective group index of InGaAsP/InP moderately diluted multiple quantum well (MQW) waveguides grown by metalorganic chemical vapor deposition (MOCVD/sur) on InP has been measured in the 1.55-μm spectral region. The technique used is based on the Fourier analysis of the spectral transmission function of a resonant cavity formed by the waveguide itself. Accuracy to the third decimal place is demonstrated, and differences between TE and TM indexes are also evidenced     

InGaAs（P）／InP应变量子阱和超晶格的光电性质

利用低压金属有机化合物化学汽相沉积（ＭＯＣＶＤ）生长技术在ＩｎＰ衬底上生长ＩｎＧａＡｓ／ＩｎＰ应变量子阱，超晶格和ＩｎＧａＡｓＰ／ＩｎＰ量子阱结构材料，利用７７Ｋ光荧光（ＰＬ）测量这一应变量了阱和量子阱的光学性质，利用双晶Ｘ光测量应变超晶格的性质。     

PECVD沉积SiOP电介质膜及其XPS研究

采用等离子体增强化学气相沉积(PECVD)技术沉积含P电介质薄膜,用于无杂质空穴扩散(IFVD)技术中InGaAsP-InP MQW结构中新的包封层,替代传统的SiO2层。经X射线光电子谱(XPS)研究证明,该膜就是SiOP结构。快速退火(RTA)研究表明,该膜结构基本稳定,但膜中P原子存在明显扩散,它增强了InPMQW结构中In原子的外扩,却抑制了Ga原子的外扩。这些都明显区别于常规SiO2膜的性质。     

非均匀阱宽多量子阱1.55 μm高功率超辐射光源

采用非均匀阱宽多量子阱材料拓宽超辐射器件的输出光谱 ,并利用前期关于倾斜脊形集成超辐射光源的研究成果 ,制得了新型的 1 5 5 μm高功率宽光谱InGaAsP InP集成超辐射光源。发现该器件较均匀阱宽多量子阱器件的输出光谱有很大变化 ,光谱半宽由原来的 2 0～ 30nm ,增加到 4 5～ 6 0nm左右。该器件同样具有较好的抑制激射能力 ,在可测试范围内 ,在没有蒸镀腔面抗反射膜的情况下未见激射模式的出现。在准连续工作条件下 ,器件最大峰值功率已达到 15 0mW以上。     

Current-injection efficiency in semiconductor lasers with a waveguide based on quantum wells

A dynamic distributed diffusion-drift model of laser heterostructures, which takes into account carrier capture by quantum wells, is developed. The leakage currents in the lasing mode are calculated for different laser structures without wide-gap emitters: InGaAs/GaAs (lasing wavelength λ = 0.98 μm), InGaAsP/InP (λ = 1.3 μm), and InGaAs/InP (λ = 1.55 μm). It is shown that consideration of the finite carrier-capture time is of major importance for calculating structures with deep quantum wells. The ratio of the leakage currents to the total current in the structures with deep quantum wells (InGaAsP/InP and InGaAs/InP) increases with an increase in the injection current and may reach a few percent when the lasing threshold is multiply exceeded.     

High-speed InGaAsP/InP multiple quantum well, 1.55 mu m singlemode modulator

1.55 mu m single mode ridge waveguide modulators based on electroabsorption in InGaAsP/InP multiple quantum wells (MQW) are reported. A 10 dB extinction ratio was obtained by applying a 2 V drive voltage to a 100 mu m long device with a 3 dB on-state loss. The 3 dB cutoff frequency is 12.5 GHz.<>     

Intermixing of InP-based multiple quantum wells for integrated optoelectronic devices

The intermixing characteristics of three widely used combinations of InP-based quantum wells (QW) are investigated using the impurity-free vacancy disordering (IFVD) technique. We demonstrate that the bandgap energy shift is highly dependent on the concentration gradient of the as-grown wells and barriers, as well as the thickness of the well, with thinner wells more susceptible to interdiffusion at the interface between the barrier and well. According to our results, the InGaAsP/InGaAsP and InGaAs/InP are well suited for applications requiring a wide range of bandgap values within the same wafer. In the case of the InGaAs/InGaAsP system, its use is limited due to the significant broadening of the photoluminescence spectrum that was observed. The effect of the top InGaAs layer over the InP cladding is also investigated, which leads to a simple way to obtain three different bandgaps in a single intermixing step.     

Multi-bandgap photonic materials and devices fabricated by UV-laser induced quantum well intermixing

Ultraviolet(UV)-laser induced quantum well intermixing(QWI) technique can generate large multiple bandgap blue shifts in III-V quantum well semiconductor heterostructure.The application of the UV-laser QWI technique to fabricate multi-bandgap photonic devices based on compressively strained InGaAsP/InP quantum well laser microstructure is reported.We show that under certain UV-laser irradiation conditions,the photoluminescence(PL) intensity can be enhanced,and the full width at half maximum(FWHM) linewidth can be reduced.The blue shift of bandgap can reach as large as 145 nm,while the PL intensity is about 51% higher than that of the as-grown material.Experimental results of post growth wafer level processing for the fabrication of bandgap-shifted waveguides and laser diodes are presented.     

InGaAsP/InGaAs heterojunction p-i-n detectors with low dark current and small capacitance for 1.3?1.6 ?m fibre optic systems

A new long wavelength p-i-n photodetector, consisting of an In0.53 Ga0.47 As absorbing layer and an adjacent InGaAsP p-n junction is demonstrated. These diodes exhibit dark currents as low as 0.2 nA and a capacitance < 0.5 pF at ? 10 V for a device area of 1.3 × 10?4 cm2. The external quantum efficiency is ? 60% at ? = 1.3 ?m for front illumination. A systematic study of the background doping of the quaternary layers using different InP sources is also reported.