等离子体基高温离子注入研究进展

综述了等离子体基高温离子注入的发展及应用情况,介绍了由于高温注入中辐照增强扩散和热扩散的共同作用,注入层成分、组织结构、力学性能和抗腐蚀性能随温度提高发生的变化.并对今后的发展趋势作了预测.     

Cr离子高温注入Al靶的传质模型

利用注入离子在固体中传输理论和辐照增强扩散理论建立了金属离子高温注入金属Al靶的传质模型,计算了金属离子高温注入的浓度-深度分布.在所建立的传质模型中采用动态Monte Carlo方法模拟离子注入过程,引入饱和浓度限模拟晶体靶局部饱和现象;采用基于辐照增强扩散的扩散方程描述注入粒子扩散过程;根据缺陷线性退火理论确定辐照增强扩散系数;结合杂质原子和非平衡空位扩散方程给出了注入粒子的浓度分布;在扩散方程中引入了空位源函数并考虑了离子溅射造成的表面退让效应.针对离子能量140keV,注入剂量2×10~(17)cm~(-2),温度250,400和510℃的Cr离子注入Al靶计算得到的浓度-深度分布与实验结果相符.     

银基体上铜等离子体基离子注入层的成分分布

研究了银基体上铜等离子体基离子注入 (CuPBII)层成分深度分布与试验工艺参数的关系。选择影响注入离子能量的脉冲偏压和注入剂量的不平衡磁控靶放电电流和靶基距作为试验参数 ,用X射线光电子谱 (XPS)进行注入层成分深度分析。结果表明 ,对较高的脉冲偏压 (80kV)、中等的磁控靶电流 (75mA)和近的靶基距 (2 0 0mm) ,容易形成厚的银铜过渡层 (7.6μm) ,且铜离子注入、铜原子的反冲注入与铜的沉积很好地匹配。与气体等离子体基离子注入不同 ,铜的沉积速率成为影响银铜过渡层的又一决定因素。     

9Cr18轴承钢的金属离子加氮离子复合注入处理新工艺

简单地叙述了金属等离子体浸没离子注入与沉积（ＭｅＰⅢＤ）表面处理新工艺的发展,以及ＭｅＰⅢＤ工艺对于脉冲阴极弧金属等离子体源的要求。详细报导了９Ｃｒ１８轴承钢样品的氮离子注入表面处理工艺及金属离子加氮离子复合注入处理新工艺,对被处理和未被处理试样进行了显微硬度、磨痕、摩擦因数及腐蚀特性测试后表明：用金属离子加氮离子复合注入处理的９Ｃｒ１８钢试样的表面特性改善明显优于只有氮离子处理的试样,证明脉冲阴     

第14届等离子体基离子注入和沉积国际会议将在上海召开

<正>第14届等离子体基离子注入和沉积国际会议将于2017年10月17~20日在上海召开。会议由国际等离子体注入和沉积委员会(PBIID International Committee)发起,由中国科学院上海硅酸盐研究所、中国科学院上海微系统与信息研究所共同承办。离子体基离子注入和沉积国际会议具有悠久的历史,每两年举办一届,自1993年在美国召开第一届     

等离子体源离子注入表面改性研究及应用

采用等离子体源离子注入技术 (PSII)对W18Cr4V高速钢进行了氮离子注入。用俄歇能谱仪对注入层的成分进行了分析。对注入层的显微硬度和耐磨性进行了测试。用扫描电镜对摩擦磨损表面进行了分析。研究结果表明 :氮在注入层呈高斯分布 ,注入层的硬度和耐磨性均明显提高。对等离子体源离子注入技术在航空液压泵配油盘上的应用进行了研究。应用研究结果表明 :经等离子体源离子注入后的配油盘单位行程内回油量的增加量比未注入前下降约 90 % ,从而明显地增加了配油盘的使用寿命     

离子渗氮新技术的研究现状

为了克服传统离子渗氮的一些固有缺点，近些年来出现一些新的离子渗氮技术，如活性屏离子渗氮、等离子体源离子渗氮、离子注入离子渗氮等，本文简要介绍了这些新技术及其原理、特点，总结了这类技术的共性模型。其中，活性屏离子渗氮技术和等离子体源离子渗氮技术有着明显的设备和工艺优势，可能成为离子渗氮技术的发展方向。     

温度对N离子注入金属深度分布的影响

研究了N离子注入金属表面时温度对N原子深度分布的影响,在常温－460℃范围内N离子注入到α-Fe和316L奥氏体不锈钢中的深度分布显著依赖于注入温度和基体材料,随注入温度升高,α-Fe中N深度分布形态为准Gauss形、梯形和扩散形,并发现N注入存在“盲区”注入温度,N表观扩散系数与注入温度的关系完全偏离Arrhenius方程,在316L不锈钢中、N呈扩散形分布,其表面扩散系数与注入温度的关系与Arrhenius方程较吻合,通过Auger谱线形分析、X射线衍射分析和TEM组织分析,认为N注入金属深度分布由离了注入混合作用、化学效应和热扩散作用中占主导地位者决定。     

材料的等离子体基离子注入表面改性

简要总结了哈工大近10年来在材料的等离子体基离子注入表面改性方面的工作,包括铝合金、钛合金、轴承钢的等离子体基离子注入,等离子体基离子注入混合,以及等离子体基离子注入的工业应用等。     

铀表面全方位离子注入渗氮处理研究

利用全方位离子注入技术在金属铀表面进行渗氮处理。结果表明,离子注入温度和脉宽是关键工艺参数;提高基体温度,明显增加氮离子在铀中的注入深度。利用俄歇电子能谱（AES）分析注入工艺参数与渗氮层深度间的关系,增加注入脉宽能明显提升含氮层深度。在其它工艺参数不变的情况下,采用60μs脉宽的渗氮层深度比40μs有显著增加,而80μs注入脉宽的渗氮层深度比低温氮离子注入深度提高一个数量级。脉冲负高压对渗氮层深度影响并不明显,但会提高氮的保持剂量。     

Ti,Y离子注入65Nb钢的表面优化

利用ＭＥＶＶＡ强流金属防子注入机,对６５Ｎｂ钢进行离子注入,采用了Ａｕｇｅｒ电子能谱（ＡＥＳ）,Ｘ射线衍射（ＸＲＤ）等表面分析技术,研究了Ｔｉ及Ｔｉ＋Ｙ离子注入后的６５Ｎｂ钢表面的微结构变化。力学性能实验结果表明,Ｔｉ及Ｔｉ＋Ｙ离子注入能使材料表面硬度和耐磨性显著提高,且双元离子注入比单元注入效果好,着重分析和讨论了稀土元素Ｙ在离子注入层中的合金化作用。     

Nitrogen plasma source ion implantation of AISI S1 tool steel

Significant economic savings can be achieved by improving the wear lifetime of precision manufacturing tools through nitrogen-ion implantation. This near-ambient temperature, surface modification process preserves dimensional integrity and surface finish while eliminating delamination problems that are often associated with overlay coatings. Conventional ion implantation is a line-of-sight process which requires elaborate manipulation and masking to uniformly implant components of complex shapes. A recently developed process, plasma source ion implantation (PSII), circumvents this line-of-sight restriction and makes ion implantation more attractive economically. In this article, the effects of PSII of nitrogen at a target bias of 50 kV, to a dose of 0.3 × 10¹⁸ atoms/cm² on the surface microstructure and mechanicalproperties of AISI S1 tool steel are presented.     

活性屏等离子体源渗氮工艺特性及传质机制

为揭示活性屏等离子体源渗氮工艺特性（试样偏压电位和试样距屏高度）对AISI 316奥氏体不锈钢渗氮效果的影响规律,利用最小二乘法线性回归拟合了不同工艺条件下渗氮层厚度数据,绘制了活性屏等离子体源渗氮AISI 316奥氏体不锈钢的工艺特性图,以此确定其最佳工艺参数。并通过对金属网屏上溅射颗粒的化学成分和相结构分析,探讨了活性屏等离子体源渗氮的传质机制。结果表明：渗氮层厚度随试样距屏高度增大而降低,当适当降低渗氮气压或试样施加一定负偏压时,均有助于提高渗氮层的厚度,并且证实了"溅射-再沉积"模型是活性屏等离子体源渗氮重要的传质机制。     

Synchronous plasma enhancement in RF-driven plasma source for ion implantation

We report an original method to increase periodically the plasma density in RF-driven plasma source for surface treatment of materials by ion implantation. The method consists of supplementary injection of ions, electrons and metastable atoms into the processing RF plasma using very short high voltage pulsed discharges applied on a separate electrode at the same repetition rate as the negative accelerating pulses applied on the target. Thus plasma density is periodically increased by an order of magnitude so that the synchronized negative pulses applied on the target for ion implantation find a background plasma about 10 times denser. The advantages of this new method were revealed by nitrogen implanted tests on copper and brass samples.     

Structure and properties of silver-containing a-C(H) films deposited by plasma immersion ion implantation

In this study, we have grown silver-containing hydrogenated (a-C:H) and non-hydrogenated (a-C) amorphous carbon coatings by two plasma immersion ion implantation methods: I) chemical vapor deposition of methane combined with pulsed filtered cathodic arc deposition of silver, and II) by alternating arc pulses from graphite and silver in a dual cathodic arc plasma source. This unique “bias selective” feature of the deposition system allowed the deposition of silver with the substrates at ground and avoided the sputtering of the grown a-C film. Chemical composition of the samples was analyzed by acquiring their compositional depth-profiles using radio-frequency Glow Discharge Optical Emission Spectroscopy (rf-GDOES), while the microstructural properties were analyzed by X-ray absorption near edge spectroscopy (XANES) and Raman spectroscopy. In this contribution, we compare mechanical and biomedical properties by means of nanoindentation and cell viability tests, respectively, of a-C(H) films obtained by two different plasma immersion ion implantation techniques.     

N / Ti / Al 离子注入 304 不锈钢的耐磨性

目的研究N,Ti,Al离子注入对304不锈钢耐磨性的影响规律,为304不锈钢材料的改良提供参考。方法采用等离子注入技术,在不同剂量下对304不锈钢分别进行N,Ti,Al离子注入,对离子注入后的试样进行表面微观形貌观测、表面硬度测试、摩擦磨损性能测试,并与304不锈钢基材进行对比。结果 304不锈钢经3种离子注入后,均能获得平整、致密,没有裂纹,具有一定光洁度的表面组织,但是注入剂量增大会引起表面起泡现象,形成多孔形貌,光洁度降低。此外,3种离子注入均能提高304不锈钢的表面硬度,且高剂量注入试样的硬度比低剂量注入试样更高,相较而言,N离子注入使表面硬度的提高更明显。相比未注入基材,注N与注Ti表面层的摩擦系数均变小,注Al表面层的摩擦系数反而变大,但磨损量都明显降低。高剂量注N、注Al试样的耐磨性均高于低剂量注入试样,而高剂量注Ti试样的耐磨性低于低剂量注入试样,但仍好于注N、注Al试样。结论在相同实验条件与注入工艺下,N离子注入对表面硬度提高最显著(剂量为5.0×1017ions/cm2),约提高41%;Ti离子注入对耐磨性提高最显著(剂量为3.0×1017ions/cm2),约提高6倍。     

Characteristics of Cu implantation into Si by PBII using UBMS cathode

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Wear and corrosion properties of plasma-based low-energy nitrogen ion implanted titanium

Plasma-based low-energy nitrogen ion implantation, including plasma source ion nitriding/carburizing and plasma source low-energy ion enhanced deposition, has emerged as a low-temperature surface engineering technique for metal and alloy. In this paper, the pure metal Ti samples have been modified by the plasma source ion nitriding process at a process temperature of 700 °C for a processing time of 4 h. The nitrided Ti surfaces were constructed of a continuous and dense Ti₂N compound layer about 2 μm thick and a 7-8 μm diffused layer. During tribological test on a ball on disk tribometer against the Si₃N₄ ceramic counterface, a low friction coefficient of about 0.3 and the faint wear volume were obtained for the nitrided Ti samples. The cyclic polarization curves of the nitrided Ti samples in 3.5% and 6.0% NaCl solutions showed that the improved pitting corrosion resistance with an increase of corrosion potential and a decrease of passive current, compared with that of the unnitrided Ti sample. The plasma source ion nitriding of the Ti samples provided the engineering surfaces for the functional applications with the combined improvement in wear and corrosion resistance.