Formation mechanism and optical properties of InAs quantum dots on the surface of GaAs nanowires

Formation mechanism and optical properties of InAs quantum dots (QDs) on the surface of GaAs nanowires (NWs) were investigated. This NW-QDs hybrid structure was fabricated by Au-catalyzed metal organic chemical vapor deposition. We found that the formation and distribution of QDs were strongly influenced by the deposition time of InAs as well as the diameter of GaAs NWs. A model based on the adatom diffusion mechanism was proposed to describe the evolution process of the QDs. Photoluminescence emission from the InAs QDs with a peak wavelength of 940 nm was observed at room temperature. The structure also exhibits a decoupling feature that QDs act as gain medium, while NW acts as Fabry-Perot cavity. This hybrid structure could serve as an important element in high-performance NW-based optoelectronic devices, such as near-infrared lasers, optical detectors, and solar cells.     

Understanding and optimizing spin injection in self-assembled InAs/GaAs quantum-dot molecular structures

Semiconductor quantum-dot (QD) structures are promising for spintronic applications owing to their strong quenching of spin relaxation processes that are promoted by carrier and exciton motions. Unfortunately, the spin injection efficiency in such nanostructures is very low and the exact physical mechanism of the spin loss is still not fully understood. Here, we show that exciton spin injection in self-assembled InAs/GaAs QDs and QD molecular structures (QMSs) is dominated by localized excitons confined within the QD-like regions of the wetting layer (WL) and GaAs barrier layer that immediately surround the QDs and QMSs. These localized excitons in fact lack the commonly believed 2D and 3D character with an extended wavefunction. We attribute the microscopic origin of the severe spin loss observed during spin injection to a sizable anisotropic exchange interaction (AEI) of the localized excitons in the WL and GaAs barrier layer, which has so far been overlooked. We determined that the AEI of the injected excitons and, thus, the efficiency of the spin injection processes are correlated with the overall geometric symmetry of the QMSs. This symmetry largely defines the anisotropy of the confinement potential of the localized excitons in the surrounding WL and GaAs barrier. These results pave the way for a better understanding of spin injection processes and the microscopic origin of spin loss in QD structures. Furthermore, they provide a useful guideline to significantly improve spin injection efficiency by optimizing the lateral arrangement of QMSs and overcome a major challenge in spintronic device applications utilizing semiconductor QDs.

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Investigations for InAs/GaAs multilayered quantum-dot structure treated by high energy proton irradiation

This paper focuses on the high energy proton irradiation effect of InAs/GaAs multilayers quantum-dot (QD) wafer and photodetector. With high energy proton path simulation, the releases of proton energy and trap distribution in QD multilayers are predicted well. Treated by 1 and 3 MeV protons, all protons almost penetrate the multilayers of QD structures and stop deeply in GaAs substrate. InAs QD multilayer structures/Infrared photodetector have been irradiated by protons with different energies (1 and 3 MeV) and doses (1 × 10⁹∼ 1 × 10¹³ protons/cm²). The photoluminescence (PL) and photoresponsivity (PR) spectrum of samples were measured and discussed with as grown and post irradiation.     

Growth of InAs quantum dots on GaAs nanowires by metal organic chemical vapor deposition

InAs quantum dots (QDs) are grown epitaxially on Au-catalyst-grown GaAs nanowires (NWs) by metal organic chemical vapor deposition (MOCVD). These QDs are about 10-30 nm in diameter and several nanometers high, formed on the {112} side facets of the GaAs NWs. The QDs are very dense at the base of the NW and gradually sparser toward the top until disappearing at a distance of about 2 μm from the base. It can be concluded that these QDs are formed by adatom diffusion from the substrate as well as the sidewalls of the NWs. The critical diameter of the GaAs NW that is enough to form InAs QDs is between 120 and 160 nm according to incomplete statistics. We also find that these QDs exhibit zinc blende (ZB) structure that is consistent with that of the GaAs NW and their edges are faceted along particular surfaces. This hybrid structure may pave the way for the development of future nanowire-based optoelectronic devices.     

Insight of surface treatments for CMOS compatibility of InAs nanowires

Nano Research - A CMOS compatible process is presented in order to grow self-catalyzed InAs nanowires on silicon by molecular beam epitaxy. The crucial step of this process is a new in-situ surface...     

Charge accumulation on the surface of GaAs nanowires near the Schottky contact

The distribution of external potential along GaAs nanowires with electric contacts formed at the ends has been studied by the method of Kelvin probe force gradient microscopy (KPFGM). It is established that, in the case of Schottky contact formation, the application of external blocking voltage leads to charge accumulation in the surface layer of natural oxide near the contact, which significantly modifies the potential profile along the GaAs nanowire. The accumulation of charge and its dissipation upon removal of the blocking voltage proceed with characteristic times on the order of several minutes.     

生长温度对InAs/GaAs横向异质结构纳米线形貌及晶体结构的影响

低维半导体材料因其超常的物理性能而受到了广泛关注和研究。本文采用金属有机物化学气相沉积（MOCVD）技术,利用金作催化剂制备了InAs/GaAs横向异质结构纳米线,并讨论了不同生长温度情况下InAs横向异质材料对纳米线形貌及晶体结构的影响。提高InAs材料的生长温度,可以有效地抑制纳米线的纵向生长,使其实现横向异质结构的生长。在异质结构纳米线横向生长时发生了侧面晶面旋转的现象,这是纳米线表面重构后侧面趋向能量更低的晶面的结果。本文的研究工作为推动微纳技术的发展提供了相应的理论基础和科学依据。      

Optical emission of InAs nanowires

Wurtzite InAs nanowire samples grown by chemical beam epitaxy have been analyzed by photoluminescence spectroscopy. The nanowires exhibit two main optical emission bands at low temperatures. They are attributed to the recombination of carriers in quantum well structures, formed by zincblende-wurtzite alternating layers, and to the donor-acceptor pair. The blue-shift observed in the former emission band when the excitation power is increased is in good agreement with the type-II band alignment between the wurtzite and zincblende sections predicted by previous theoretical works. When increasing the temperature and the excitation power successively, an additional band attributed to the band-to-band recombination from wurtzite InAs appears. We estimated a lower bound for the wurtzite band gap energy of approximately 0.46?eV at low temperature.     

Remote p-doping of InAs nanowires

We report on remote p-type doping of InAs nanowires by a p-doped InP shell grown epitaxially on the core nanowire. This approach addresses the challenge of obtaining quantitative control of doping levels in nanowires grown by the vapor-liquid-solid (VLS) mechanism. Remote doping of III-V nanowires is demonstrated here with the InAs/InP system. It is especially challenging to make p-type InAs wires because of Fermi level pinning around 0.1 eV above the conduction band. We demonstrate that shielding with a p-doped InP shell compensates for the built-in potential and donates free holes to the InAs core. Moreover, the off-current in field-effect devices can be reduced up to 6 orders of magnitude. The effect of shielding critically depends on the thickness of the InP capping layer and the dopant concentration in the shell.     

Role of molecular surface passivation in electrical transport properties of InAs nanowires

The existence of large densities of surface states on InAs pins the surface Fermi level above the conduction band and also degrades the electron mobility in thin films and nanowires. Field effect transistors have been fabricated and characterized in the "as fabricated" state and after surface passivation with 1-octadecanethiol (ODT). Electrical characterization of the transistors shows that the subthreshold slope and electron mobility in devices passivated with ODT are superior to the respective values in unpassivated devices. An X-ray photoelectron spectroscopy study of ODT passivated undoped InAs nanowires indicates that sulfur from ODT is bonded to In on the InAs nanowires. Simulations using a two-dimensional device simulator (MEDICI) show that the improvements in device performance after ODT passivation can be quantified in terms of a decrease of interface trap electron donor states, shifts in fixed interfacial charge, and changes in body and surface mobilities.     

Removal of surface states and recovery of band-edge emission in InAs nanowires through surface passivation

Surface states in semiconductor nanowires (NWs) are detrimental to the NW optical and electronic properties and to their light emission-based applications, due to the large surface-to-volume ratio of NWs and the congregation of defects states near surfaces. In this paper, we demonstrated an effective approach to eliminate surface states in InAs NWs of zinc-blende (ZB) and wurtzite (WZ) structures and a dramatic recovery of band edge emission through surface passivation with organic sulfide octadecylthiol (ODT). Microphotoluminescence (PL) measurements were carried out before and after passivation to study the dominant recombination mechanisms and surface state densities of the NWs. For WZ-NWs, we show that the passivation removed the surface states and recovered the band-edge emission, leading to a factor of ～19 reduction of PL linewidth. For ZB-NWs, the deep surface states were removed and the PL peaks width became as narrow as ～250 nm with some remaining emission of near band-edge surface states. The passivated NWs showed excellent stability in atmosphere, water, and heat environments. In particular, no observable changes occurred in the PL features from the passivated NWs exposed in air for more than five months.     

Atomic force microscopy of InAs quantum dots on the vicinal surface of a GaAs crystal

An approach to the processing of images obtained by atomic force microscopy is proposed. An example of determining the parameters of InAs clusters formed on the vicinal surface of a GaAs crystal is presented. Using the proposed technique within the framework of the previously developed spherical cluster model, it is possible to determine the energy levels of electrons and holes in InAs quantum dots.     

Au-free epitaxial growth of InAs nanowires

III-V nanowires have been fabricated by metal-organic vapor-phase epitaxy without using Au or other metal particles as a catalyst. Instead, prior to growth, a thin SiOx layer is deposited on the substrates. Wires form on various III-V substrates as well as on Si. They are nontapered in thickness and exhibit a hexagonal cross-section. From high-resolution X-ray diffraction, the epitaxial relation between wires and substrates is demonstrated and their crystal structure is determined.     

The formation of surface arsenic oxide crystals on GaAs

The growth of small crystals of dimensions up to approximately ten microns was observed on the surface of GaAs(100) wafers upon air exposure. The composition and the formation mechanism of these crystals were studied by secondary electron micros-copy, scanning Auger microscopy and X-ray photoelecton spectroscopy. It was found that the crystals consist mainly of As₄O₆. The growth of these surface oxide crystals is attributed to the surface migration and nucleation of the arsenic oxides.     

Growth of InAs/InAsSb heterostructured nanowires

We report the growth of InAs/InAs(1-x)Sb(x) single and double heterostructured nanowires by Au-assisted chemical beam epitaxy. The InAs(1-x)Sb(x) nanowire segments have been characterized in a wide range of antimony compositions. Significant lateral growth is observed at intermediate compositions (x ~ 0.5), and the nucleation and step-flow mechanism leading to this lateral growth has been identified and described. Additionally, CuPt ordering of the alloy has been observed with high resolution transmission electron microscopy, and it is correlated to the lateral growth process. We also show that it is possible to regrow InAs above the InAsSb alloy segment, at least up to an intermediate antimony composition. Such double heterostructures might find applications both as mid-infrared detectors and as building blocks of electronic devices taking advantage of the outstanding electronic and thermal properties of antimonide compound semiconductors.     

Compositional profile of heteroepitaxial InAs on GaAs substrates

The nature of the interface region between semiconducting heteroepitaxial layers and their substrates has been experimentally studied using Auger electron spectroscopy and energy dispersive X-ray analysis. InAs grown epitaxially on single-crystal semi-insulating GaAs was investigated since it has exhibited electrical properties superior to those of bulk InAs in spite of the considerable crystal lattice mismatch between InAs and GaAs.Findings indicate the existence of a graded composition (In_xGa_1-xAs) region of approximately 1500 Å thickness between the substrate and epilayer which is thought to play a major role in strain relief and, consequently, in determining the electrical characteristics of the resulting InAs epilayer.     

On the p-type character of Cd-and Zn-doped InAs nanowires

InAs nanowires are potential materials for high speed nanoelectronic devices due to their high electron mobility among the semiconductor nanostructures. One of the main challenges, however, is to obtain a p-type InAs material, since the Fermi level is usually pinned at the conduction band, leading to an intrinsic n-type behaviour. Here we show through first principles calculations that InAs nanowires, doped with Cd or Zn substitutional impurities, can behave as p-type materials. Differently from other III-V nanowires, these impurities introduce shallow acceptor levels. We show that the Zn impurity can be equally distributed along the nanowire radius, naturally compensating the surface levels. On the other hand, the Cd impurity is preferentially found in the core region, requiring a surface treatment to eliminate the surface pinning levels. These results explain the available experiments and show how and why p-type InAs nanowires can be obtained.