ITO substrate resistivity effect on the properties of CuInSe<Subscript>2</Subscript> deposited using two-electrode system

The purpose of this work is to deposit the CuInSe₂ films on the ITO substrate by electrodeposition technique using a simplified two electrodes system and to investigate the effect of ITO sheet resistance on the fundamental properties of the resulting films. The as deposited films were annealed under argon atmosphere at 300 °C during 30 min. The structural, morphological and electrical properties were characterized respectively by means of X-ray diffraction (XRD), scanning electron microscopy (SEM) and electrical resistivity measurements. The optical band gap of samples was estimated using the optical absorption technique. After annealing, the XRD spectra show diffraction peaks corresponding to the single-phase chalcopyrite CuInSe₂ with (112) as main reflection. The SEM images reveal a homogeneous surface and the estimated grain size was calculated from Scherrer’s Equation with (112) peak lay in the range of 165–272 Å. The band gap, E _g, is a decreasing function with the ITO sheet resistance.     

Spectroscopic ellipsometry study of In<Subscript>2</Subscript>O<Subscript>3</Subscript> thin films

In₂O₃ films grown by helicon magnetron sputtering with different thicknesses were characterized by spectroscopic ellipsometry in the energy range from 1.5 to 5.0 eV. Aside from one amorphous sample prepared at room substrate temperature, polycrystalline In₂O₃ films with cubic crystal structure were confirmed for other four samples prepared at the substrate temperature of 450 °C. Excellent SE fittings were realized by applying 1 and/or 2 terms F&B amorphous formulations, building double layered film configuration models, and further taking account of void into the surface layer based on Bruggeman effective medium approximation for thinner films. Spectral dependent refractive indices and extinction coefficients were obtained for five samples. The curve shapes were well interpreted according to the applied dispersion formulas. Almost similar optical band gap values from 3.76 to 3.84 eV were obtained for five samples by Tauc plot calculation using extinction coefficients under the assumption of direct allowed optical transition mode.     

Rutile TiO<Subscript>2</Subscript> films as electron transport layer in inverted organic solar cell

Titanium dioxide (TiO₂) thin films were prepared by sol–gel spin coating method and deposited on ITO-coated glass substrates. The effects of different heat treatment annealing temperatures on the phase composition of TiO₂ films and its effect on the optical band gap, morphological, structural as well as using these layers in P3HT:PCBM-based organic solar cell were examined. The results show the presence of rutile phases in the TiO₂ films which were heat-treated for 2 h at different temperatures (200, 300, 400, 500 and 600 °C). The optical properties of the TiO₂ films have altered by temperature with a slight decrease in the transmittance intensity in the visible region with increasing the temperature. The optical band gap values were found to be in the range of 3.28–3.59 eV for the forbidden direct electronic transition and 3.40–3.79 eV for the allowed direct transition. TiO₂ layers were used as electron transport layer in inverted organic solar cells and resulted in a power conversion efficiency of 1.59% with short circuit current density of 6.64 mA cm^?2 for TiO₂ layer heat-treated at 600 °C.     

Structural,morphological and optical properties of SnS<Subscript>2</Subscript> thin films by nebulized spray pyrolysis technique

The thin films of Nano crystalline tin disulfide (SnS₂) have been prepared by nebulized spray pyrolysis technique (NSP) with different molar concentrations (0.3, 0.4 and 0.5 M). Cleaned glass substrates were used and the substrate temperature was maintained at 300?°C. The films were deposited using tin tetrachloride monohydrate (SnCl₄·H₂O) and thiourea in de-ionized water and Isopropyl alcohol (1:3 ratio). The prepared films structural, morphological and optical properties were studied using X-ray diffraction (XRD), scanning electron microscope (SEM), UV–Vis spectrophotometer. The structure of the films were found to be face centered cubic with preferential orientation along (002) plane. X-ray line profile analysis was used to evaluate the micro structural parameters such as crystallite size, micro strain, dislocation density and texture coefficient. The average crystallite size values are 60 nm. Morphological results of the SnS₂ thin films are small needle shaped particles and the average grain size was 400 nm. The optical studies revealed that the band gap between 2.65 and 2.72 eV and high optical transmittance 98%. EDAX spectrum of tin disulfide result showed some amount of excess tin was present in the sample. This is the method with very low cost of producing tin disulfide (SnS₂) thin films, which is very important for many applications in industry.     

Optimization of Cu<Subscript>2</Subscript>ZnSnS<Subscript>4</Subscript> thin film absorber layer growth without sulphurization using triethanolamine as complexing agent for thin film solar cells applications

Quaternary kesterite Cu₂ZnSnS₄ (CZTS) thin films have been prepared via a simple spin-coating technique based on a sol–gel precursor of 2-methoxyethanol solution with metal salts and thiourea. Solution processed CZTS thin film growth parameters using complexing agent triethanolamine (TEA) have been investigated. Effects of complexing agent TEA on structural, morphological, optical, electrical and photovoltaic properties of CZTS thin films were systematically investigated. X-ray diffraction and Raman spectroscopy studies reveal that amorphous nature of CZTS thin film changes into polycrystalline with kesterite crystal structure with optimized TEA concentartion. Surface morphology of CZTS films were analyzed by field emission scanning electron microscope and atomic force microscope, which revealed the smooth, uniform, homogeneous and densely packed grains and systematic grain growth formation with varying TEA concentrations. UV–Vis spectra revealed a direct energy band gap ranging from 1.78 to 1.50 eV, which was found to depend upon the TEA concentration. X-ray photoelectron spectroscopy demonstrated stoichiometric atomic ratios of multicationic quaternary CZTS thin film grown without sulphurization. p-type conductivity was confirmed using Hall measurements and the effect of varying concentartion of TEA on electrical and photovoltaic properties are studied. The SLG/FTO/ZnO/CZTS/Al thin film solar cell is fabricated with the CZTS absorber layer grown at optimized TAE concentration of 0.06 M. It shows a power conversion efficiency of 0.87% for a 0.16 cm² area with V_oc = 0.257 mV, J_sc = 8.95 mA/cm² and FF?=?38%.     

Mixed Nb<Subscript>2</Subscript>O<Subscript>5</Subscript>:MoO<Subscript>3</Subscript> (95:5 and 85:15) thin films and their properties for electrochromic device applications

Nb₂O₅:MoO₃ (95:5 and 85:15) thin films were deposited onto glass and fluorine doped tin oxide coated glass substrates at 100 and 300 °C by RF magnetron sputtering technique. The physical and electrochromic properties of the films were studied. XRD result reveals that deposited films were amorphous. The XPS study confirms the compositional purity and the presence of Nb⁵⁺ and Mo⁶⁺ in the deposited film. Surface morphological study shows platelet like features of deposited film. The average transmittance of the film is varied between 91 and 85 %. Photoluminescence study exhibits three characteristic emission peaks and confirms the better optical quality of deposited film. Raman spectra show the LO–TO splitting of Nb–O stretching of the deposited film. Electrochromic behavior of the deposited films characterized by cyclic voltammetry using 0.5 M LiClO₄·PC and 0.5 M H₂SO₄ electrolyte solutions show all the films are having better reversibility and reproducibility in their electrochemical analysis.     

Structural,morphological, optical and gas sensing properties of pure and Ce doped SnO<Subscript>2</Subscript> thin films prepared by jet nebulizer spray pyrolysis (JNSP) technique

Pure and cerium (Ce) doped tin oxide (SnO₂) thin films are prepared on glass substrates by jet nebulizer spray pyrolysis technique at 450 °C. The synthesized films are characterized by X-ray diffraction (XRD), scanning electron microscopy, energy dispersive analysis X-ray, ultra violet visible spectrometer (UV–Vis) and stylus profilometer. Crystalline structure, crystallite size, lattice parameters, texture coefficient and stacking fault of the SnO₂ thin films have been determined using X-ray diffractometer. The XRD results indicate that the films are grown with (110) plane preferred orientation. The surface morphology, elemental analysis and film thickness of the SnO₂ films are analyzed and discussed. Optical band gap energy are calculated with transmittance data obtained from UV–Visible spectra. Optical characterization reveals that the band gap energy is found decreased from 3.49 to 2.68 eV. Pure and Ce doped SnO₂ thin film gas sensors are fabricated and their gas sensing properties are tested for various gases maintained at different temperature between 150 and 250 °C. The 10 wt% Ce doped SnO₂ sensor shows good selectivity towards ethanol (at operating temperature 250 °C). The influence of Ce concentration and operating temperature on the sensor performance is discussed. The better sensing ability for ethanol is observed compared with methanol, acetone, ammonia, and 2-methoxy ethanol gases.     

Structural,optical and magnetic properties of Cr doped In<Subscript>2</Subscript>O<Subscript>3</Subscript> powders and thin films

The (In_1?xCr_x)₂O₃ powders as well as thin films of x = 0.03, 0.05 and 0.07 were synthesized using a solid state reaction and an electron beam evaporation technique (on glass substrate), respectively. The influence of Cr doping concentration on structural, optical and magnetic properties of the In₂O₃ samples was systematically studied. The X-ray diffraction results confirmed that all the Cr doped In₂O₃ samples exist cubic structure of In₂O₃ without any secondary phases presence. The chemical composition analyses showed that all the Cr doped In₂O₃ compounds were nearly stoichiometric. The X-ray photoelectron spectroscopy analysis of the Cr doped In₂O₃ thin films showed an increase of oxygen vacancies with Cr concentration and the existence of Cr as Cr³⁺ state in the host In₂O₃ lattice. A small blue shift in the optical band gap was observed in the powder compounds, when the dopant concentration increased from x = 0.03 to x = 0.07. In thin films, the band gap found to increase from 3.63 to 3.74 eV, with an increase of Cr concentration. The magnetic measurements show that the undoped In₂O₃ bulk powder sample has the diamagnetic property at room temperature. And a trace of paramagnetism was observed in Cr doped In₂O₃ powders. However (In_1?xCr_x)₂O₃ thin films (x = 0.00, 0.03, 0.05 and 0.07) samples shows soft ferromagnetism. The observed ferromagnetism in thin films are attributed to oxygen vacancies created during film prepared in vacuum conditions. The ferromagnetic exchange interactions are established between metal cations via free electrons trapped in oxygen vacancies (F-centers).     

Optical and structural properties of ZnO + Zn<Subscript>2</Subscript>TiO<Subscript>4</Subscript> thin films prepared by the sol–gel method

ZnO + Zn₂TiO₄ thin films were obtained by the sol–gel method using precursor solutions with different Ti/Zn ratios in the 0.18–2.13 range. The films were deposited on glass substrates and annealed in an open atmosphere at 550 °C. The oxide was characterized by X-ray diffraction and photoacoustic (PA) spectroscopy. The films were constituted of polycrystalline ZnO for the lowest Ti/Zn ratio (0.18), polycrystalline Zn₂TiO₄ for the 0.70 and 1.0 ratios, and mixes of both oxides for the intermediate ratios (0.32 and 0.50). For the highest ratios studied (1.44 and 2.13), the films were amorphous. The energy band gap (E_g) values were determined from optical absorption spectra, measured by means of the PA technique spectra. E_g varied in the 3.15 eV (ZnO) to 3.70 eV (Zn₂TiO₄) range.     

Linear and nonlinear optical properties of RF sputtered (Pb,La)(Zr,Ti)O<Subscript>3</Subscript> ferroelectric thin films

Linear and nonlinear optical properties of (Pb,La)(Zr,Ti)O₃ (PLZT) ferroelectric thin films were presented in this paper. The PLZT ferroelectric thin films have been in situ grown on quartz substrates by radio-frequency (RF) magnetron sputtering at 650 °C. Their crystalline structure and surface morphologies were examined by X-ray diffraction and atomic force microscopy, respectively. It can be found that the PLZT thin films exhibit well-crystallized perovskite structure and good surface morphology. The fundamental optical constants (the band gap energy, linear refractive index, and linear absorption coefficient) were obtained through the optical transmittance measurements. A Z-scan technique was used to investigate the optical nonlinearity of the PLZT thin films on quartz substrates. The films display the strong third-order nonlinear optical effect. A large and negative nonlinear refractive index n ₂ is determined to be 1.21 × 10⁻⁶ esu for the PLZT thin films. All results show that the PLZT ferroelectric thin films have potential applications in optical limiting, switching, and modulated-type optical devices.     

Optical band gap of Sn<Subscript>0.2</Subscript>Bi<Subscript>1.8</Subscript>Te<Subscript>3</Subscript> thin films

Sn_0.2Bi_1.8Te₃ thin films were grown using the thermal evaporation technique on a (001) face of NaCl crystal as a substrate at room temperature. The optical absorption was measured in the wave number range 500–4000 cm⁻¹. From the optical absorption data the band gap was evaluated and studied as a function of film thickness and deposition temperature. The data indicate absorption through direct interband transition with a band gap of around 0.216 eV. The detailed results are reported here.     

Optical and electrical properties of E-Beam deposited TiO<Subscript>2</Subscript>/Si thin films

In this paper, optical and electrical properties of E-Beam deposited TiO₂/Si thin films have been studied and investigated extensively. The films were deposited on p-type (100) silicon wafer by using electron beam evaporation technique. The thickness of the thin films was measured by a spectroscopic reflectometer, which is about 216 nm. The fabricated titanium oxide (TiO₂) thin films were annealed at 800 °C for 1 h under N₂ ambient. X-ray diffraction measurements were performed to study the structure and phase identification of the fabricated TiO₂ thin films. For the optical properties, reflection, transmittance, refractive index and absorption coefficient were obtained and analyzed. The photocurrent and dark current of the fabricated films were measured by I–V measurements. The measurement of the current–voltage (I–V) characteristics possesses good ohmic contact. The electrical characterizations of the films were performed in the range of the low frequencies (50 and 100 kHz) and high frequencies (750 kHz and 1 MHz) by the capacitance–voltage and conductance–voltage measurements at room temperature. The capacitance of the fabricated TiO₂ MOS capacitor at both high and low frequencies increases with the decrease in frequencies. The obtained conductance curves (peaks) increase with the decreasing in the frequencies. This can be due to the interface state density, series resistance and interfacial dielectric of the fabricated MOS capacitors. The variation in the characteristics of the fabricated film shows that TiO₂ is a promising candidate to be used in the optoelectronic and future UV detector applications as a switch, such as an optical amplifier, emitter, and UV light detectors.     

Photocurrent and Optical Transmission Spectra of Sn- and Pb-Doped (As<Subscript>2</Subscript>S<Subscript>3</Subscript>)<Subscript>0.3</Subscript>(As<Subscript>2</Subscript>Se<Subscript>3</Subscript>)<Subscript>0.7</Subscript> Glass Films

The photocurrent and optical transmission spectra of thin (As₂S₃)_0.3(As₂Se₃)_0.7 glass films doped with Sn and Pb are reported. The strongest photoresponse is offered by the films doped with 0.010– 0.015 at % Sn or Pb. Low doping levels are shown to have a significant effect on the peak-response wavelength and band gap of the films.     

Study of surface morphology and optical properties of Nb<Subscript>2</Subscript>O<Subscript>5</Subscript> thin films with annealing

Nb₂O₅ films have been deposited on variety of substrates using the sol-gel dip coating technique. As-deposited films on all substrates are amorphous. Films were annealed under controlled ambience at 300, 400 and 600°C for 5 h. As-deposited films on glass substrate show uniform surface structure. The crystal structure and surface topography are found to depend strongly on the annealing temperature and nature of the substrates. The average grain size of 40 nm is observed in films annealed at 300°C. On annealing at 400°C increasing grain size and resulting fusing of them, enhanced surface roughness. Films deposited on NaCl substrates crystallized into a stable monoclinic phase and those deposited on single crystal Si substrates crystallized into hexagonal phase after annealing at 600°C. The as-deposited films show very high transmittance (>90%) in the visible region. The optical band gap is observed to increase from 4.35 eV when the films are in amorphous state to 4.87 eV on crystallization.     

Visible photocatalytic degradation of methylene blue on magnetic semiconducting La<Subscript>0.2</Subscript>Sr<Subscript>0.7</Subscript>Fe<Subscript>12</Subscript>O<Subscript>19</Subscript>

Methylene blue (MB) is a representative of a class of dyestuffs resistant to biodegradation. This paper presents a novel photocatalytic degradation of MB by La_0.2Sr_0.7Fe₁₂O₁₉ compound, which is a traditional permanent magnet and displays a large magnetic hysteresis (M–H) loop. The remnant magnetic moment and coercive field are determined to be 52 emu/g and 5876 Oe, respectively. UV–Visible optical spectroscopy reveals that La_0.2Sr_0.7Fe₁₂O₁₉ is simultaneously a semiconductor, whose direct and indirect band gap energies are determined to be 1.47 and 0.88 eV, respectively. The near infrared band gap makes it a good candidate to harvest sunlight for photocatalytic reaction or solar cell devices. This magnetic compound demonstrates excellent photocatalytic activity on degradation of MB under visible illumination. The colour of MB dispersion solution changes from deep blue to pale white and the absorbance decreases rapidly from 1.8 down to zero when the illumination duration extends to 6 h. Five absorption bands did not make any blue shifts along with the reaction time, suggesting a one-stepwise degradation process of MB, which makes La_0.2Sr_0.7Fe₁₂O₁₉ a unique magnetic catalyst and differs from TiO₂ and other conventional catalysts.     

Optical properties of CeO<Subscript>2</Subscript> thin films

Cerium oxide (CeO₂) thin films have been prepared by electron beam evaporation technique onto glass substrate at a pressure of about 6 × 10⁻⁶ Torr. The thickness of CeO₂ films ranges from 140–180 nm. The optical properties of cerium oxide films are studied in the wavelength range of 200–850 nm. The film is highly transparent in the visible region. It is also observed that the film has low reflectance in the ultra-violet region. The optical band gap of the film is determined and is found to decrease with the increase of film thickness. The values of absorption coefficient, extinction coefficient, refractive index, dielectric constant, phase angle and loss angle have been calculated from the optical measurements. The X-ray diffraction of the film showed that the film is crystalline in nature. The crystallite size of CeO₂ films have been evaluated and found to be small. The experimental d-values of the film agreed closely with the standard values.     

Effect of O<Subscript>2</Subscript> partial pressure and thickness on the gasochromic properties of sputtered V<Subscript>2</Subscript>O<Subscript>5</Subscript> films

V₂O₅ thin films were deposited by reactive DC-diode sputtering technique in a mixed atmosphere of O₂/Ar gas at room temperature from a high purity target of 99.99% vanadium. For the investigation, the thickness of the films and the O₂/Ar ratio during the sputtering process were the parameters. The sputtering rate of the V₂O₅ films dramatically decreases with increasing the O₂/Ar ratio. By X-ray diffraction it was found that films sputtered with 1% O₂/Ar ratio grow preferentially in two orientations: the 200 and the 001 orientation. The increase of the O₂/Ar ratio enhances the growth preferentially in the c-axis (001) and strongly decreases the growth in the a-axis (200) direction. The scanning electron microscope pictures confirm these results. In the visible region the optical transmittance is increased with increasing the O₂/Ar ratio in the sputter gas. Additionally, the optical band gap is slightly larger for the films sputtered with an O₂/Ar ratio higher than 5%. Beyond a thickness of about 220 nm and an O₂/Ar ratio of 10% the electrical sheet resistance of the films increases dramatically. During the insertion/extraction of hydrogen ions, the change in the optical transmission was investigated. The gasochromism of the V₂O₅ films was explained by use of the Infra Red (IR) measurements during the insertion/extraction of hydrogen ions.     

Effects of Al content on the properties of ZnO:Al films prepared by Al<Subscript>2</Subscript>O<Subscript>3</Subscript> and ZnO co-sputtering

Aluminum doped zinc oxide (AZO) films were deposited on quartz substrates by radio-frequency magnetron co-sputtering method with ZnO and Al₂O₃ ceramic targets. The structural, optical and electrical properties of these films as a function of the Al content were investigated. XRD results reveal that the AZO films are wurtzite structure with (002) preferred orientation. The average transmittance of all the films is higher than 80% in a wide wavelength range from 400 to 1,500 nm. The band gap energy, calculated from their optical absorption spectra, is in the range of 3.50–3.66 eV depending on the Al content. Doping of Al³⁺ in the ZnO makes the film surface roughness decrease. The dopant Al³⁺ acts as electron donor by which the electrical conductivity and carrier concentration of the films are obviously increased until the Al³⁺ reaches its saturation content of about 4.50 at.%.     

Properties of AgInSe<Subscript>2</Subscript> films grown by magnetron sputtering

n-Type AgInSe₂ films 0.5 to 0.9 μm thick were grown by dc magnetron sputtering. As targets, we used AgInSe₂ crystals grown by a modified Bridgman process using high-purity precursors. The crystal structure, morphology, electrical conductivity, and Hall coefficient of the films were studied at various temperatures. We determined the optimal growth and annealing temperatures of the films (500 and 250°C, respectively). Using structures based on the films, we obtained the spectral dependences of their photoresponse, established the nature of interband transitions in the films, and evaluated their band gap. The ability to vary electrical and optical properties with no changes in stoichiometry is of interest for concentrated solar power applications.     

Structural,optical and microscopic properties of chemically deposited Mo<Subscript>0.5</Subscript>W<Subscript>0.5</Subscript>Se<Subscript>2</Subscript> thin films

Mo_0.5W_0.5Se₂ thin films were obtained by using relative simple chemical route at room temperature. Various preparative conditions of the thin films are outlined. The films were characterized by X-ray diffraction, scanning electron microscope, optical and electrical properties. The grown films were found to be uniform, well adherent to substrate and brown in color. The X-ray diffraction pattern shows that thin films have a hexagonal phase. Optical properties show a direct band gap nature with band gap energy 1.44 eV and having specific electrical conductivity in the order of 10⁻⁵ (Ωcm)⁻¹.