压电薄膜特性参数的测量方法

随着电子元器件向微型、高灵敏、集成等方向发展,薄膜材料及器件在微机电(MEMS)系统中得到广泛应用,而测量压电薄膜特性参数的方法与体材料相比有很大的不同.介绍了当前测量压电薄膜特性参数的两大类方法:直接测量法(包括气腔压力法、悬臂梁法、激光干涉法和激光多普勒振动法)和间接测量法(传统阻抗分析法),详细分析了这些方法的基本原理、测试表征、应用状况及存在的问题,比较了这些方法的优缺点,并对未来压电薄膜特性参数的测试表征作了展望.     

SnS薄膜的制备及其特性研究

以硫代乙酰胺、三乙醇胺、氯化亚锡和氨水作反应物,氯化铵作缓冲剂,采用化学浴法在玻璃衬底上沉积SnS薄膜。用XRD,SEM等手段分别对薄膜样品的晶体结构及表面形貌进行了表征。XRD分析结果表明薄膜样品为具有斜方晶体结构的多晶SnS薄膜,SEM测量结果显示薄膜晶粒尺寸为数十纳米。此外,本文还简要分析了氯化铵在反应中的作用。     

BaTiO3薄膜的水热合成与分析表征

采用水热合成法直接在高纯钛金属薄片上制备了BaTiO3薄膜;研究了水热反应温度对制备BaTiO3薄膜的影响;利用X-射线衍射(XRD)、扫描电子显微镜(SEM)和X-射线光电子能谱(XPS)对制备的薄膜进行分析表征。研究结果表明,当水热反应温度相对较低(低于200℃)时,得不到纯净的四方钙钛矿BaTiO3薄膜;在250℃下水热反应5 h,得到了纯净的四方钙钛矿BaTiO3薄膜,薄膜的晶粒呈球形,平均粒径为200~300 nm。     

压电陶瓷发电装置的能效优化系统设计

针对压电发电装置发电效率不高的问题,设计了一种基于单片机的压电陶瓷发电装置的能效优化系统,该系统可调节悬臂梁长度来改变装置的固有频率,让系统自动适应外界振动信号变化,实现装置的能效最大化。利用LTC3331电源管理芯片来进行整流、变压,将能量存储在可充电电池的同时,又将一部分电能作为整个系统的工作能源,实现优化系统的自供电。     

Nanoscale Origins of Nonlinear Behavior in Ferroic Thin Films

The nonlinear response of a ferroic to an applied field has been studied through the phenomenological Rayleigh Law for over a hundred years. Yet, despite this, the fundamental physical mechanisms at the nanoscale that lead to macroscopic Rayleigh behavior have remained largely elusive, and experimental evidence at small length scales is limited. Here, it is shown using a combination of scanning probe techniques and phase field modeling, that nanoscale piezoelectric response in prototypical Pb(Zr,Ti)O₃ films appears to follow a distinctly non‐Rayleigh regime. Through statistical analysis, it is found that an averaging of local responses can lead directly to Rayleigh‐like behavior of the strain on a macroscale. Phase‐field modeling confirms the twist of the ferroelastic interface is key in enhancing piezoelectric response. The studies shed light on the nanoscale origins of nonlinear behavior in disordered ferroics.     

路面振动压电俘能器的性能分析

建立路面振动压电俘能的数学模型,提出压电俘能器的性能要求,分析结构参数及埋设深度对俘获电能及路面变形的影响.结果表明,压电俘能器埋设越深,俘获电能越多,路面变形越小;压电陶瓷片直径和厚度越大,俘获性能虽提高,路面的变形却增大.一个直径φ30 mm、厚5 mm的压电俘能器,埋设40 mm路面下,在15 Hz、0.7 MPa标准轮载作用下,可俘获0.42 mW的电能.     

AlN压电薄膜换能器性能的仿真研究

在压电换能器的制作中,电极对其谐振和反谐振频率、机电耦合系数及品质因数等重要性能有着直接的影响。该文针对AlN压电薄膜复合结构,采用COMSOL Multiphysics有限元软件对电极-AlN-不锈钢结构的三维模型进行了压电-结构耦合分析。基于此模型,通过改变电极厚度、材料及压电层的介电和机械损耗等参数,来研究换能器的性能参数变化,研究结果对后续以不锈钢为基底的压电超声换能器的制作起到了一定的理论指导作用。     

PT种子层对PZT薄膜结晶及压电性能的影响

采用溶胶-凝胶法(Sol-Gel)在Pt/Si衬底上制备了PbTiO3 (PT)薄膜和Pb (Zrx,Ti1-x)O3(PZT)薄膜,研究了退火温度以及PT种子层对PZT薄膜结晶及压电性能的影响。X射线衍射(XRD)结果表明,制备的PZT薄膜为纯钙钛矿结构的多晶薄膜,有PT种子层的PZT薄膜晶粒尺寸更大,(110)面取向度更高,结晶性能更好;原子力显微镜(AFM)结果表明,制备的薄膜表面形貌比较平整、均匀、无裂纹;压电力显微镜(PFM)结果表明,压电力显微镜(PFM)结果表明,有PT种子层时,PZT薄膜的平均压电系数d33为128～237 pm/V,无PT种子层时平均压电系数d33为21～29 pm/V。在升温速率为10 ℃/s的退火条件下保温10 min时,随着退火温度的升高,PZT薄膜晶粒尺寸增大,粗糙度增大,(110)面取向度升高,平均压电系数d33增大。PT种子层能够有效的改善PZT薄膜的结晶性能和压电性能。     

复合氮化铝压电薄膜研制及其应用

采用中频(MF,40 kHz)双S枪磁控反应溅射制备出了氮化铝(AlN)压电薄膜;采用直流磁控溅射法制作了Mo电极薄膜;采用脉冲DC磁控溅射Au、Cr、Al靶分别制作Au/Cr底电极薄膜及Al/Cr顶电极薄膜。通过对AlN压电薄膜、Mo及Au电极薄膜进行了X线衍射(XRD)分析,结果表明,复合AlN压电薄膜(002)面、Mo薄膜(110)面及Au薄膜(111)面择优取向优良,说明选用Al/Cr/AlN/Au/Cr/YAG复合结构压电薄膜能研制出Ku波段及K波段声体波微波延迟线(BAWDL),其Ku及K波段BAWDL器件插入损耗分别低至43.7 dB、54.6 dB。     

激光热冲击引起PZT压电薄膜铁电性能的变化

应用高能量单脉冲激光作用在锆钛酸铅 (PZT)压电薄膜上 ,研究脉冲激光的热冲击对PZT薄膜性能产生的影响。发现在激光未烧熔薄膜的能量密度下 ,经过激光作用后 ,PZT薄膜的铁电性能发生变化 :在外加电压为 6V时 ,剩余极化强度值Pr 从 32 6 99μC/cm2 变到 2 6 316 μC/cm2 ;矫顽电场保持为 38 396kV/cm不变 ;疲劳性能变稳定 ,在循环 1 75× 10 9次时 Pr 衰变率由 4 4 3%变为 34 7%。最后讨论分析了产生这种现象的微观机理。     

溶胶-凝胶旋涂法制备ITO薄膜

以InCl_3和SnCl_4·5H_2O为主要原料,采用溶胶-凝胶法和旋转涂膜工艺,在普通玻璃基片上制备掺锡氧化铟(ITO)纳米透明导电薄膜。应用X射线衍射(XRD)、扫描电子显微镜(SEM)对薄膜进行表征;研究了不同热处理温度、热处理时间及不同旋转速度对薄膜形态和结构的影响。结果表明,采用溶胶-凝胶旋涂法制备的ITO薄膜是由立方相纳米颗粒构成,随涂层增加,薄膜表面变得平滑。随热处理温度的提高或时间的延长,薄膜由非晶态逐渐转化为良好的晶态薄膜。     

光电子薄膜的进展

由于光电子器件的迅速发展,对光电子器件应用的薄膜提出了很高的要求。本文简要地论述了光电子薄膜制备技术的重要进展,同时扼要地介绍了本实验室在这方面所开展的初步工作。     

钛酸铋钠钾无铅压电厚膜的制备及表征

采用传统固相法制备(Na0.82K0.18)0.5Bi0.5TiO3无铅压电陶瓷粉体,将质量分数5%的乙基纤维素溶入到质量分数为92%的松油醇中配制粘合剂溶液,加入质量分数2%的二乙二醇丁醚醋酸酯作分散剂,质量分数1%的邻苯二甲酸二丁酯作增塑剂,将陶瓷粉体与粘合剂溶液按3:1的质量比混合碾磨,用320目筛印刷至带有Pt电极的氧化铝衬底上,经放平、烘烤、预烧、加压及烧结后,制备出厚度约40 μm的BNKT厚膜,平均晶粒尺寸为1.1 μm,介电常数也达到最大为782,损耗最小为3.6%(10 kHz),剩余极化为24.8 μC/cm2矫顽场为71.6 kV/cm,纵向压电系数为79 pC/N.     

Electrodeposition and Characterization of ZnO Thin Films

Thin films of ZnO were electrodeposited from an aqueous solution of Zn（NO3 ）2 on indium tin oxide（ITO）-covered glass substrate. The analysis of X-ray diffraction（XRD） and scanning electron micrograph （SEM） indicated that the obtained ZnO films had a compact hexagonal wurtzite type structure with preferable （002） growth direction. A sharp near-UV emission peak located at 380 nm and a strong orange-red emission peak located at 593 nm were observed in the photoluminescence, when excited with 325 nm wavelength at room temperature. Then the prepared ZnO films were introduced as anode phosphors into the field emission test. It was found that orange-red cathode-luminescence was observed and the luminescent brightness was enhanced by annealing. When annealing temperature increased about 600 ℃, the photoluminescence with peak of 531 nm and the green cathode-luminescence were observed. The tests showed that the brightness of about 2 × 102 cd/m^2 was obtained at electric field of 2 V/μm for annealed sample. The results revealed that the film could be a good kind of low-voltage drived cathode-luminescence phosphor.     

压电发电技术研究综述

面对21世纪能源短缺的挑战,努力寻找更可持续性和更环保的新型能源无疑成为解决问题的关键.从环境中采集能量转换为电能的技术也越来越受到重视.该文在对比此类新型发电方式的基础上,认为利用压电发电技术采集环境能量具有独特的优势.分析了振动式压电发电技术在国内外的研究进展,并以大功率的道路压电发电为重点,阐述了其原理、结构和应用领域,总结了今后的发展方向和热点问题.     

SCEI能量回收接口电路的设计

基于压电效应的能量回收接口电路是能量回收系统的重要组成部分,经典的接口电路有标准接口、同步电荷提取电路(SECE)、并联同步开关电感电路(Parallel-SSHI)、串联同步开关电感电路(Series-SSHI)4种。提出并设计了一种新的接口电路——同步电荷提取和翻转电路(SCEI)接口电路,完成了该接口电路在恒定激振位移情况下回收功率的理论分析和计算,并利用电子仿真软件Multisim对SCEI和4种典型接口电路的回收功率进行了仿真和比较。结果表明,SCEI接口电路性能优越,其回收功率约是SECE电路的1.5倍,且与负载无关。     

应用于压电能量收集器的PZT PZN系陶瓷材料

压电材料作为环境振动能量收集器的核心功能材料,是制备高性能能量收集器的关键。该文从提高能量收集效率入手,研究适合于能量转换的高性能压电陶瓷材料。采用两步合成工艺制备出了0.7Pb(Zr0.51Ti0.49)0.99O3-0.3Pb(Zn1/3Nb2/3)O3(PZT-PZN)压电陶瓷,研究了La2O3掺杂对其微观结构和机电性能的影响。实验结果表明,掺杂少量的La2O3能显著提高PZT-PZN陶瓷的压电系数(d33)、机电耦合系数(k31、kp)、介电常数(εr)等。当掺杂量为4%(摩尔分数)时,在1 200℃烧结PZT-PZN,显示出良好的压电和介电性能:d33=560pC/N,k31=0.376,kp=0.642,s1E1=16.5×10-12 m2/N,εr=3 125。     

Efficient Piezoelectric Energy Harvesters Utilizing (001) Textured Bimorph PZT Films on Flexible Metal Foils

Extracting energy from low vibration frequencies (<10 Hz) using piezoelectric energy harvester promises continuous self‐powering for sensors and wearables. The piezoelectric compliant mechanism (PCM) design provides a significantly higher efficiency by fostering a uniform strain for its 1st mode shape, and so is interesting for this application. In this paper, a PCM energy harvester with bimorph Pb(Zr,Ti)O₃ (PZT) films on Ni foil deposited by rf magnetron sputtering is shown to have high efficiency and large power for low frequency mechanical vibration. In particular, {001} textured PZT films are deposited on both sides of polished Ni foils with (100) oriented LaNiO₃ seed layers on HfO₂ buffer layers. The performance of PCM with an active area of 5.2 cm² is explored for various excitation accelerations (0.02–0.16 g [g = 9.8 m s^?2]) around 6 Hz. The PCM device provides a power level of 3.9 mW cm^?2 g² and 65% mode shape efficiencies.     

Declamped Piezoelectric Coefficients in Patterned 70/30 Lead Magnesium Niobate–Lead Titanate Thin Films

Lateral subdivision of blanket piezoelectric thin films increases the functional properties through both increased domain wall mobility and declamping of the intrinsic response. This work presents the local effects of substrate declamping on the piezoelectric coefficient d _33,f of 300 nm thick, rhombohedral, {001}‐oriented lead magnesium niobate–lead titanate thin films at the 70/30 composition (70PMN–30PT). Films grown by chemical solution deposition on platinized Si substrates are patterned into strip structures ranging from 0.75 to 9 µm in width. The longitudinal piezoelectric coefficient, d _33,f, is interrogated as a function of position across the patterned structures by three approaches: finite element modeling, piezoresponse force microscopy, and nanoprobe synchrotron X‐ray diffraction. It is found that d _33,f increases from the clamped value of 40–50 to ≈160 pm V^?1 at the free sidewall under 200 kV cm^?1 excitation. The sidewalls partially declamp the piezoelectric response 500–600 nm into the patterned structure, raising the piezoelectric response at the center of features with lateral dimensions less than 1 µm (3:1 width to thickness aspect ratio). The normalized data from all three methods are in excellent agreement, with quantitative differences providing insight to the field dependence of the piezoelectric coefficient and its declamping behavior.