无机激光热刻蚀材料的研究进展

激光热刻蚀技术是近年发展起来的利用激光热刻蚀薄膜的热变化阈值特性突破光学衍射极限进行纳米图形制备的新技术,在亚波长纳米结构器件和高密度光盘母盘制造等领域具有广阔的应用前景.阐述了激光热刻蚀技术的基本原理和特点,以及对激光热刻蚀材料性质的要求,综述了相变型激光热刻蚀薄膜材料(包括硫系相变薄膜材料、金属亚氧化物薄膜材料和陶...     

电子束重复增量扫描生成三维结构的研究

针对三维曝光图形的结构特点,结合自行设计的图形发生器,提出了电子束重复增量扫描方式及曝光剂量与刻蚀深度关系和灵敏度的计算方法.根据计算得到的剂量关系,按照重复增量扫描方式,在SDS-3电子束曝光机上进行了曝光实验,显影后得到了轮廓清晰的梯锥和圆锥的三维结构.因此,重复增量扫描方式可以用于三维结构的加工,并且关于曝光剂量与刻蚀深度关系和灵敏度的计算可以为其提供符合实际曝光的参数.     

电子束重复增量扫描生成三维结构的研究

针对三维曝光图形的结构特点,结合自行设计的图形发生器,提出了电子束重复增量扫描方式及曝光剂量与刻蚀深度关系和灵敏度的计算方法.根据计算得到的剂量关系,按照重复增量扫描方式,在SDS-3电子束曝光机上进行了曝光实验,显影后得到了轮廓清晰的梯锥和圆锥的三维结构.因此,重复增量扫描方式可以用于三维结构的加工,并且关于曝光剂量与刻蚀深度关系和灵敏度的计算可以为其提供符合实际曝光的参数.     

激光光刻大面积扫描投影成像光学系统测试及评价

基于351nm XeF激光大面积投影成像光刻系统,通过对其光学系统包括光学照明系统和折叠投影系统进行光学性能测试。由激光经过柱面透镜、微透镜阵列均束器以及投影折叠物镜之后产生的能量及光束质量变化,将准分子激光光束均匀性评价指标部分运用到光学系统的评价之中,得到光学系统在不同关键位置的能量分布曲线以及平顶因子关系图,表明微透镜阵列均束器虽保证了整个光学系统各处光斑的均匀性,但衍射却造成了能量利用率的降低。同时,通过对印制电路板(PCB)和玻璃(ITO)进行曝光和显影实验,表明该双远心共焦投影光学系统,只要控制使均匀输出的能量符合曝光剂量,就能够满足分辨率的要求。     

3D Micropatterned Functional Surface Inspired by Salvinia Molesta via Direct Laser Lithography for Air Retention and Drag Reduction

Bioinspired functional surfaces are attracting increasing interest in surface engineering, mostly in the field of wettability. The Salvinia-effect is a remarkable example of superficial air retention and drag force reduction caused by selective chemical coating (super-hydrophobic wax and hydrophilic dead cells) and peculiar 3D hierarchical morphological structures. The replication of Salvinia-like patterns at the microscale has always been prevented by limitations in microfabrication techniques, thus hindering relevant technological applications at this dimensional scale. Integrating 3D laser lithography and traditional microfabrication techniques, dimensionally downscaled, 3D micropatterned surfaces inspired for the first time by both morphology and chemical coating of the hairs present on the Salvinia Molesta leaves are reproduced. The effect of design and different surface energies (bare hydrophilic, hydrophobic, selective hydrophilic/hydrophobic coating) on the wettability are modeled and investigated. Bioinspired surfaces demonstrated to be super-hydrophobic in terms of apparent static contact angle (up to 170°) and provide tunable adhesion with roll-off angle from less than 10° to 90°. They successfully proved remarkable underwater air retention capability, sustained by stable Cassie-Baxter state under external hydrostatic pressure up to 4 atm. The proposed surfaces are tested in hydrodynamic conditions: drag force reduction is successfully demonstrated with up to 40% of energy saved.     

电子束重复曝光加工PCR微通道的工艺研究

对PCR微流控芯片通道中流体的流动特性进行了分析,发现流体在横截面为圆形的通道中流动时由摩擦引起的等效水头损失及表面张力均小于微矩形通道。以此为依据,将PCR芯片微通道优化设计成圆形通道。在JSM-5CF电子束曝光机上采用束斑尺寸80nm、能量20keV的电子束对1μm厚的聚甲基丙烯酸甲酯进行了单次曝光剂量40μC/cm2的8次重复增量扫描曝光实验,显影后得到的PCR芯片微圆通道轮廓清晰,边缘连续光滑。证明了电子束重复增量扫描曝光方式制作PCR微流控芯片微圆通道的可行性。     

垂直面送粉激光强化系统与应用研究

针对汽车发动机缸体、缸套、模具侧壁等垂直表面激光强化的需求 ,研制了垂直面送粉喷嘴和垂直面送粉激光强化系统 ,适合于内侧和外侧垂直面送粉激光熔覆和合金化及不送粉熔凝、相变硬化 ;利用该系统 ,选择合适的激光处理工艺参数 ,在垂直放置的灰铸铁表面进行了激光熔凝、送粉激光合金化、送粉激光熔覆等表面处理 ,分析了处理层的显微组织 ,合金元素成分分布与硬度分布。激光强化显著提高了基材的使用性能。垂直面送粉激光强化技术有良好的工业应用前景。     

扫描电子显微镜在栅光刻工艺中的应用

阐述了扫描电子显微镜在解决栅光刻在线监测中遇到的问题和解决过程。在充分的理论分析基础上,通过大量实验研究,克服了光刻胶在高能电子辐照下变形、变性的问题;削弱了光刻胶样品表面荷电对图像质量的影响;在观测"T"型栅的胶窗口时采用特殊的工作条件获得了三层胶的立体形貌图像,从而能够观察三层胶的内部结构。上述问题的解决和技术的改进实现了栅光刻工艺的在线监测;并为栅光刻工艺的稳定和改进、产品成品率的提高提供了大量数据和图像。     

纳米级高压扫描电子束曝光技术

通过简单添加一些附件,将一台带有扫描附件的商用透射电子显微镜改造为一台高压扫描电子束曝光机,以研究高压下高分辨率、高深宽比抗蚀剂图形曝光及邻近效应的影响。重点介绍了如何获得一个高分辨率的电子光学系统,并利用此系统初步进行了曝光实验,在120nm厚的PMMA胶上获得了53nm线宽的抗蚀剂图形,表明此装置可用于纳米图形的制作。     

电子束曝光机激光工件台系统研制

介绍了nm级电子束曝光机激光定位精密工件台系统的结构组成、各部分技术措施及总体性能指标。该工件台采用HP5527激光干涉测量系统,测量分辨率达0.6nm,结构上成功将导向与承载分离,对承片台、机械手等进行重大创新。无论是整机性能还是关键技术单元均处于国内领先水平,是一台性能优良、高精度的电子束曝光机工件台。     

激光扫描显微镜的探讨

本文探讨在满足象素密度要求的条件下,充分利用电视监视器可分辨光点数,具有大扫描视场的激光扫描显微镜的设计。     

电子束光刻制造软刻蚀用母板的研究

使用通用电子束曝光机,采用一种新的电子束微三维加工的重复增量扫描方式进行曝光实验,显影后得到轮廓清晰的微三维结构,以此为制作弹性印章的母模板,经硅烷化后可用来制作弹性印章,得到弹性印章后便可再利用软刻蚀相关技术进行微图形的复制.曝光实验的结论表明采用电子束重复增量扫描方式可用来制作微三维弹性印章的母版.     

一种新型激光扫描偏转器的设计研究

目前扫描式激光投影机是利用高速电机带动多个发射镜进行激光光束偏转的,存在着体积大,寿命短,频率不能满足高清视频等要求。根据目前扫描式激光投影机存在的问题,研究设计一种新型的电磁式激光扫描成像器件,它由一对行扫描电磁振荡器和一对场扫描电磁振荡器组成的扫描器件去驱动一片矩形反光镜,对被视频信号调制的激光光束进行偏转,使得反射出的光束通过光学放大镜进行放大后在屏幕上形成视频图像。利用该技术可设计开发一种新型激光电视投影机。     

浸没式阵列激光扫描直写光刻

介绍一种以显微镜结构为基础的浸没式阵列激光扫描直写光刻系统的光路结构、有效焦深、自动调焦及曝光能量控制的原理和方法。实验系统的有效数值孔径(ENA)为1.83,使用的激光波长为355nm时,在实验室条件下得到的最细线条宽度为65nm。     

激光转镜扫描宽带温度场

应用温度场的叠加原理,导出了激光扫描转境宽带温度场的数学模型,用计算机模拟了不同参数下的温度曲线,分析了温度曲线的特点及参数对扫描宽带温度分布的影响,提出了“温度波线行波法”,使长时间加热的激光转镜扫描宽带温度场函数表达和计算简化,导出了准稳态下t时刻,激光转镜扫描宽带温度场在点(x0,y,z0)处的温度函数可表示为T=f0(y-u0×t)     

Fabrication of Periodic Nanostructure Assemblies by Interfacial Energy Driven Colloidal Lithography

A novel interfacial energy driven colloidal lithography technique to fabricate periodic patterns from solution‐phase is presented and the feasibility and versatility of the technique is demonstrated by fabricating periodically arranged ZnO nanowire ensembles on Si substrates. The pattern fabrication method exploits different interfaces formed by sol–gel derived ZnO seed solution on a hydrophobic Si surface covered by a monolayer of colloidal silica spheres. While the hydrophobic Si surface prevents wetting by the seed solution, the wedge shaped regions surrounding the contact point between the colloidal particles and the Si substrate trap the solution due to interfacial forces. This technique allows fabrication of uniform 2D micropatterns of ZnO seed particles on the Si substrate. A hydrothermal technique is then used to grow well‐defined periodic assemblies of ZnO nanowires. Tunability is demonstrated in the dimensions of the patterns by using silica spheres with different diameters. The experimental data show that the periodic ZnO nanowire assembly suppresses the total reflectivity of bare Si by more than a factor of 2 in the wavelength range 400–1300 nm. Finite‐difference time‐domain simulations of the wavelength‐dependent reflectivity show good qualitative agreement with the experiments. The demonstrated method is also applicable for other materials synthesized by solution chemistry.     

激光扫描光斑温度场

为能较准确描述激光扫描光斑温度分布和温度场特性,分析了扫描光斑的形成过程,应用温度场的叠加原理,导出了激光扫描转镜扫描光斑温度场的数学模型,用计算机模拟了不同参数下的温度曲线,讨论了参数对扫描宽带温度分布的影响。结果显示,扫描光斑温度场有明显的类趋肤效应。扫描光斑温度场的这一特征给出了激光扫描转镜能在较低功率下实现金属材料激光宽带表面强化的理论依据。所述方法也适用于其他形式的扫描叠加温度场。     

激光扫平仪的应用

介绍了激光扫平仪在工程机械上的一种动态应用。激光扫平信号与闭环控制系统结合，可实现地面的水平产整。文中对影响平整精度的误差作了详尽的分析。初步分析和实验结果表明：在２５０×２５０ｍ＾２的工作范围中，平整精度优于±２５ｍｍ。     

Ionic Liquid-Mediated Scanning Probe Electro-Oxidative Lithography as a Novel Tool for Engineering Functional Oxide Micro- and Nano-Architectures

Functional oxides have extensively been investigated as a promising class of materials in a broad range of innovative applications. Harnessing the novel properties of functional oxides in micro- to nano-scale applications hinges on establishing advanced fabrication and manufacturing techniques able to synthesize these materials in an accurate and reliable manner. Oxidative scanning probe lithography (o-SPL), an atomic force microscopy (AFM) technique based on anodic oxidation at the water meniscus formed at the tip/substrate contact, not only combines the advantages of both “top-down” and “bottom-up” fabrication approaches, but also offers the possibility of fabricating oxide nanomaterials with high patterning accuracy. While the use of self-assembled monolayers (SAMs) broadened the application of o-SPL, significant challenges have emerged owing to the relatively limited number of SAM/solid surface combinations that can be employed for o-SPL, which constrains the ability to control the chemistry and structure of oxides formed by o-SPL. In this work, a new o-SPL technique that utilizes room-temperature ionic liquids (RTILs) as the functionalizing material to mediate the electrochemistry at AFM tip/substrate contacts is reported. The results show that the new IL-mediated o-SPL (IL-o-SPL) approach allows sub-100 nm oxide features to be patterned on a model solid surface, namely steel, with an initiation voltage as low as −2 V. Moreover, this approach enables high tunability of both the chemical state and morphology of the patterned iron oxide structures. Owing to the high chemical compatibility of ILs, which derives from the possibility of synthesizing ILs able to adsorb on a wide variety of solid surfaces, IL-o-SPL can be extended to other material surfaces and provide the opportunity to accurately tailor the chemistry, morphology, and electronic properties within nanoscale domains, thus opening new pathways to the development of novel micro- and nano-architectures for advanced integrated devices.