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Haiwu ZHENG Junjie ZHU Zhuxi FU Bixia LIN Xiaoguang LI Hefei National Laboratory for Physical Sciences at Microscale Department of Materials Science Engineering University of Science Technology of China Hefei China Department of Physics University of Science Technology of China Hefei China 《材料科学技术学报》2005,21(4):536-540
3C-SiC films have been deposited on Si (111) substrates by the low-pressure vertical chemical vapor deposition (LPVCVD) with gas mixtures of SiH4, C3Hg and H2- The growth mechanism of SiC films can be obtained through the observations using field emission scanning electron microscope (FESEM). It is found that the growth process varies from surface control to diffusion control when the deposition temperature increases from 1270 to 1350℃. The X-ray diffraction (XRD) patterns show that the SiC films have good crystallinity and strong preferred orientation. The results of the high resolution transmission electron microscopy (HRTEM) image and the transmission electron diffraction (TED) pattern indicate a peculiar superlattice structure of the film. The values of the binding energy in the high resolution X-ray photoelectron spectra (XPS) further confirm the formation of SiC. 相似文献
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Savio Fabretti Patrick Thomas Markus Meinert Inga-Mareen Imort Andy Thomas 《Journal of Superconductivity and Novel Magnetism》2013,26(5):1879-1882
We fabricated superconducting MgB2 thin films on (001) MgO substrates by magnetron rf and dc co-sputtering on heated substrates. We annealed the samples ex-situ and in-situ at temperatures between 450 °C and 750 °C. The substrate temperature during the sputtering process and the post annealing temperatures play a crucial role in forming MgB2 superconducting thin films. We achieved a critical onset temperature of up to 27.1 K for the ex-situ and 25.6 K for the in-situ annealed samples at a film thickness of 30 nm. The samples shows an out of plane (0002)-Peak which was determined by x-ray diffraction. 相似文献
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ZnO thin films were grown on Si (100) substrates by pulsed laser deposition using a ZnO target.The substrate temperature was varied in the range of room temperature to 800 ℃,and the oxygen partial pressure of 0.1333 Pa (1 m Torr) to 1333 Pa (10 Torr).The properties of the resulting films were investigated by photoluminescence (PL),grazing incidence X-ray diffraction (GIXRD),X-ray photoelectron spectroscopy (XPS),and field emission scanning electron microscopy (FESEM).Based on the ultraviolet (UV,~380 nm) to... 相似文献
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研究了发展一种Si衬底上低温外延生长3C-SiC的方法。采用LPCVD生长系统,以SiH4和C2H4为气源,在超低压(30Pa) ,低温(900℃)的条件下,在Si(111衬底上外延生长出高质量的3C-SiC薄膜材料。采用俄歇能谱(AES),X射线衍射(XRD)和原子力显微镜(AFM)等分析手段研究了SiC薄膜的外延层组分,晶体结构及其表面形貌。AES结果表明薄膜中的Si/C的原子比例符合SiC的理想化学计量比,XRD结果显示了3C-SiC外延薄膜的良好晶体结构,AFM揭示了3C-SiC薄膜的良好的表面形貌。 相似文献
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室温下,结合正交实验表,用射频磁控溅射在涤纶(PET)非织造布基材上生长AZO(Al2O3:ZnO)纳米结构薄膜.采用四探针测量仪测试AZO薄膜的方块电阻,用原子力显微镜(AFM)分析薄膜微结构;通过正交分析法对实验L9(33)AZO薄膜的性能指标进行分析.实验结果表明:溅射厚度对AZO薄膜导电性能起主导作用,其次为氩气压强和溅射功率;同时,得出制备AZO薄膜的最佳工艺为:溅射功率150W、厚度100m和气压0.2Pa,该参数下样品的方块电阻为1.633×103Ω,AZO纳米颗粒的平均直径约为69.4nm. 相似文献
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SiO2/Si衬底制备ZnO薄膜及表征 总被引:2,自引:0,他引:2
本文报道了利用脉冲激光沉积技术在热氧化p型硅衬底上生长ZnO外延薄膜.引入高阻非晶SiO2缓冲层,有效地降低了检测过程中单晶衬底对ZnO薄膜的电学性能影响.利用XRD,SEM,Hall和PL对其进行研究.结果表明,在衬底温度为500℃时,生长的ZnO薄膜具有优良的晶体质量,电学性能和发光性能. 相似文献
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在国际上第一次采用电子束反应蒸发法在Si(111)衬底上生长了MgxZn1-xO晶体薄膜.能量色散X射线(EDX)特征能谱及X射线衍射(XRD)分析表明薄膜呈立方结构,薄膜的晶面取向依赖于生长温度,在200C温度下生长得到高度(200)取向的立方MgxZn1-xO薄膜,温度过高时得到多晶薄膜.对高度(200)取向的立方MgxZn1-xO薄膜的光荧光激发谱(PLE)分析表明其光学带隙为4.20eV,相对于MgO的带隙红移量为3.50eV.XRD分析还表明立方MgxZn1-xO薄膜与MgO衬底之间的晶格失配仅为0.16%.这使得高质量立方MgxZn1-xO/MgO多量子阱材料的制备成为可能. 相似文献
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Jun ZOU Shengming ZHOU Jun XU 《材料科学技术学报》2006,22(3):333-335
About φ45 mm LiAlO2 single crystal was grown by Czochralski (Cz) technique. However, the full-width at half-maximum (FWHM) value was high to 116.9 arcsec. After three vapor transport equilibration (VTE) processes, we can obtain high-quality LiAlO2 slice with the FWHM value of 44.2 arcsec. ZnO films were fabricated on as-grown slices and after-VTE ones by pulsed laser deposition (PLD). It was found that ZnO films on the two slices have similar crystallinity, optical transmittance and optical band gap at room temperature. These results not only show that LAO substrate is suitable for ZnO growth, but also prove that the crystal quality of LAO substrate slightly affects the structural and optical properties of ZnO film. 相似文献
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透明导电薄膜在不同衬底上的性能对比研究 总被引:3,自引:0,他引:3
为了对比研究不同透明衬底上ZnO:Al(ZAO)薄膜的性能,采用直流反应溅射法制备薄膜,并对其作EDS、XRD和电学测试分析.结果表明:所制备的ZAO薄膜具有典型的ZnO晶体结构;沉积在玻璃基片上的ZAO薄膜,Al,O含量高于沉积在透明聚酯塑料基片上的,而Zn的含量则相反;在两种衬底上获得的ZAO薄膜电阻率分别为4.5×10-4Ω*cm和9.73×10-4Ω*cm,可见光透射率分别达到87.7%和81.5%.由此可见:用直流反应磁控溅射法在不同衬底上都能获得可见光透射率达到80%以上的ZAO薄膜;相比而言,在玻璃衬底上获得的ZAO薄膜电阻率低,而在透明聚酯塑料上沉积的ZAO薄膜透射性好. 相似文献
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C.Z.Gu X.Jiang 《材料科学与工程学报》2000,18(Z2):653-656
Epitaxial CoSi2 (001) layers, deposited on Si (001) substrate by molecular beam allotaxy (MBA), were used as substrate for diamond deposition in order to realise new applications. The results indicate that, in a microwave plasma chamber, diamond can be nucleated with a higher density on CoSi2 at lower temperatures using a bias enhanced method. High quality, [001]-textured diamond films can be synthesized on CoSi2 (001) using the [001] textured growth conditions. So far an epitaxial growth of diamond on CoSi2 cannot be observed. Statistically, a rotating angle distribution of diamond grains around the [001] axis in an [001]-textured film shows, however, preferred in-plane orientations of 13°, 22°, 45° and 77° relative to the CoSi2 [011]axis. The structural and chemical analyses show that no Co and Si element diffusion from the CoSi2 substrate into the diamond film can be detected. 相似文献
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本文采用金属有机化学气相沉积(MOCVD)法在MgO(100)衬底上成功生长了非极性的m面(1010)ZnMgO薄膜。研究了衬底温度对ZnMgO薄膜生长取向的影响。X射线衍射(XRD)分析结果表明当衬底温度为400℃时可以获得单一取向的m面ZnMgO薄膜。采用扫描电子显微镜(SEM)观察到ZnMgO薄膜表面平整,由条纹状结构组成。透射电子显微镜(TEM)分析进一步证明ZnMgO为具有m面取向的单晶薄膜。X射线光电子能谱(XPS)定量分析表明ZnMgO薄膜中Mg含量为3at.%。 相似文献
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K.-J. Friedland J. Herfort P. K. Muduli H.-P. Schönherr K. H. Ploog 《Journal of Superconductivity and Novel Magnetism》2005,18(3):309-314
For ferromagnetic layers with in-plane magnetic fields, the longitudinal and transverse resistivities probe the magnetization
orientation and its reversal via a spin-orbit-related resistance anisotropy. In the planar Hall effect, we found new contributions
in Fe films on GaAs(001) and GaAs(113)A substrates, which cannot be understood within the conventionally used model of the
resistance anisotropy. To understand its origin, we adopted a method to determine the orientation of the magnetization from
magnetoresistance data. As a result, we were able to identify a symmetric fourfold and a twofold saturated asymmetric in-plane
Hall effect for the Fe/GaAs(001) and Fe/GaAs(113)A systems, respectively. Since these new contributions almost perfectly compensate
the planar Hall effect based on the resistance anisotropy, we argue about an intrinsic origin of the planar Hall effect in
terms of scattering at spin textures within the Fe films. 相似文献
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不同衬底上低温生长的ZnO晶体薄膜的结构及光学性质比较 总被引:2,自引:0,他引:2
采用电子束反应蒸发方法,在单晶Si(001)及玻璃衬底上低温外延生长了沿c轴高度取向的单晶ZnO薄膜,并对沉积的ZnO晶体薄膜的结构和光学性质进行了分析比较。通过对ZnO薄膜的X射线衍射(XRD)分析及光致荧光激发谱(PLE)测量,研究了衬底材料结构特性、生长温度及反应气氛中充O 相似文献
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Si(111)衬底上生长的立方MgxZn1-x晶体薄膜 总被引:1,自引:0,他引:1
在国际上第一次采用电子束反应蒸发法在Si(111)衬底上生长了MgxZn1-xO晶体薄膜。能量色散X射线(EDX)特征能谱及X射线衍射(XRD)分析表明薄膜呈立方结构,薄膜的晶面取向依赖于生长温度,在200℃温度下生长得到高度(200)取向的立方MgxZn1-xO薄膜,温度过高时得到多晶薄膜。对高度(200)取向的立方MgxZn1-xO薄膜的光荧光激发谱(PLE)分析表明其光学带隙为4.20eV,相对于MgO的带隙红移量为3.50eV。XRD分析还表明立方MgxZn1-xO薄膜与MgO衬底之间的晶格失配仅为0.16%。这使得高质量立方MgxZn1-xO多量子阱材料的制备成为可能。 相似文献
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利用固源分子束外延(SSMBE)技术, 在Si(111)衬底上异质外延生长3C-SiC单晶薄膜, 通过RHEED、XRD、AFM、XPS等实验方法研究了衬底温度对薄膜结构、形貌和化学组分的影响. 研究结果表明, 1000℃生长的样品具有好的结晶质量和单晶性. 在更高的衬底温度下生长, 会导致大的孔洞形成, 衬底和薄膜间大的热失配使降温过程中薄膜内形成更多位错, 从而使晶体质量变差. 在低衬底温度下生长, 由于偏离理想的化学配比也会导致薄膜的晶体质量降低. 相似文献