Characterization of GaN epitaxial layers on SiC substrates with AlxGa1−xN buffer layers

High quality GaN epitaxial layers were obtained with Al_xGa_1−xN buffer layers on 6H–SiC substrates. The low-pressure metalorganic chemical vapor deposition (LP-MOCVD) method was used. The 500 Å thick buffer layers of Al_xGa_1−xN (0≤x≤1) were deposited on SiC substrates at 1025°C. The FWHM of GaN (0004) X-ray curves are 2–3 arcmin, which vary with the Al content in Al_xGa_1−xN buffer layers. An optimum Al content is found to be 0.18. The best GaN epitaxial film has the mobility and carrier concentration about 564 cm² V⁻¹ s⁻¹ and 1.6×10¹⁷ cm⁻³ at 300 K. The splitting diffraction angle between GaN and Al_xGa_1−xN were also analyzed from X-ray diffraction curves.     

AlxGa−xAs/GaAs heterostructure characterization by wet chemical etching

Selective wet chemical etching of the Al_xGa_1−xAs/GaAs system has been applied to heterostructure characterization. Samples of LPE grown AlGaAs/GaAs laser double-heterostructures and separate confinement heterostructures as well as antiresonant reflecting optical waveguides heterostructures were treated with “I2 solution” (I₂:KI:H₂O) and hydrochloric acid. These compounds selectively etch the ternary Al_xGa_1−xAs layers, but with different “threshold composition” x_th values (the x value is that above which the etching rate of a given compound increases sharply). Selectively etched samples have been examined by SEM. The experimental dependence of etching rate on the x value for I2 solution has been derived. From this dependence, the x composition of any ternary layer can be estimated simply. Observations were made of the “microscopic” properties of the heterostructure, such as the smoothness of the interfaces and the uniformity of layers. All imperfections resulting from the growth process, such as interface perturbations or compositional nonuniformity of layers, are clearly seen. An additional advantage of this etching technique is its simplicity. It allows quick examination of grown heterostructure for the selection of wafers for further processing.     

Magnetic behaviour of Cd and Cr substituted cobalt ferrites

Polycrystalline samples with general formula Cd_xCo_1−xFe_2−yCr_yO₄ (x=0, 0.25, 0.50, 0.75 and 1.00; y=0, 0.15 and 0.30) were prepared by standard ceramic techniques. The samples were characterized by XRD, IR, SEM and VSM techniques. The magnetic properties were studied at room temperature. The Neel's two-sublattice model is found to exist for lower concentration of Cd (x<0.25). Thereafter (x≥0.25) the canted spin model is found to exist for which Yafet–Kittel (Y–K) angles are calculated. The saturation magnetic moment is found to reduce with the substitution of Cr³⁺, and is explained on the basis of cation distribution. No magnetic transformation is observed for the samples with higher cadmium concentrations (for x=0.75 and 1.00).     

Determination of the E1 and E1+Δ1 energy bands by photoreflectance in AlxGa1−xAs in the region 0<x<0.55

The E₁ and E₁+Δ₁ energy bands of metal–organic chemical vapor deposition grown Al_xGa_1−xAs, with x in the range 0–0.55, have been determined using photoreflectance technique. The aluminum composition for each sample was determined using the energy of the room-temperature photoluminescence compensated peak value and a suitable fundamental band gap formula. The positions of the E₁ and E₁+Δ₁ peaks were determined from curve-fitting an appropriate theoretical model to our experimental data by a modified downhill simplex method. Using the results, we propose new E₁ and E₁+Δ₁ cubic expressions as functions of the aluminum composition, x, and compare them with the available reported expressions.     

Sintering behavior and microwave dielectric properties of Bi3(Nb1−xTax)O7 solid solutions

Solid solutions of Bi₃(Nb_1−xTa_x)O₇ (x = 0.0, 0.3, 0.7, 1) were synthesized using solid state reaction method and their microwave dielectric properties were first reported. Pure phase of fluorite-type could be obtained after calcined at 700 °C (2 h)⁻¹ between 0 ≤ x ≤ 1 and Bi₃(Nb_1−xTa_x)O₇ ceramics could be well densified below 990 °C. As x increased from 0.0 to 1.0, saturated density of Bi₃(Nb_1−xTa_x)O₇ ceramics increased from 8.2 to 9.1 g cm⁻³, microwave permittivity decreased from 95 to 65 while Q_f values increasing from 230 to 560 GHz. Substitution of Ta for Nb modified temperature coefficient of resonant frequency τ_f from −113 ppm °C⁻¹ of Bi₃NbO₇ to −70 ppm °C⁻¹ of Bi₃TaO₇. Microwave permittivity, Q_f values and τ_f values were found to correlate strongly with the structure parameters of fluorite solid solutions and the correlation between them was discussed in detail. Considering the low densified temperature and good microwave dielectric proprieties, solid solutions of Bi₃(Nb_1−xTa_x)O₇ ceramics could be a good candidate for low temperature co-fired ceramics application.     

Photoelectrochemical investigations of n-CdSe1−xTex thin film electrodes

An electrode/electrolyte interface has been formed between an n-type CdSe_1−xTe_x (0≤x≤1) alloyed/mixed type semiconductor and a sulphide/polysulphide redox electrolyte. It has been investigated through the current–voltage, capacitance–voltage and spectrally selective properties. The dependence of the dark current through the junction and the junction capacitance on the voltage across the junction have been examined and analysed. It appeared that the current transport mechanism across the junction is strongly influenced by the recombination mechanism at the interface and series resistance effects. Upon illumination of the interface with a light of 20 mW cm⁻², an open circuit voltage of the order of 0.35 V and a short circuit current of 212 μA cm⁻² have been developed (for x=0.2), yielding an efficiency of energy conversion equal to 0.2% and a form factor of 45%. The action spectra in the 450–1000 nm wavelength range showed presence of the interface states at the electrode/electrolyte interface. The magnitudes of the barrier heights at the interfaces were also determined. It has been seen that a significant improvement in the electrochemical performance of a cell is noticed for the electrode composition with x=0.2.     

Hardness, internal stress and fracture toughness of epitaxial AlxGa1−xAs films

Vickers microhardness indentations of 10 μm (001) oriented epilayers of Al_xGa_1−xAs on GaAs substrates have been utilized to evaluate the hardness H_v, the internal stress, and the fracture toughness K_Ic of the layers as a function of their composition parameter x. The hardness H_v varies linearly according to: (6.9-2.2x) GPa and K_Ic increases linearly with x according to: K_1c = (0.44+1.30x) MPa m^1/2. The influence of the substrate on these measurements was found to be negligible for the layer thickness (10 μm) and the indentation load (0.25 N) used, disregarding internal stresses.

Internal film stresses were evaluated by the bimorph buckling method, and were found to depend on the composition parameter according to σ = 0.13x GPa. These stresses did not notably affect the H_v measurements, but for K_Ic corrections as large as 25% had to be made.

The radial cracks observed were of the shallow Palmqvist type. In contradiction to previous reports on this type of cracking, it was found to initiate during unloading, not during loading, and a physical explanation for this deviation is given. No deep radial/median cracks were observed. It was found important to use expressions based on the correct crack geometry in the K_Ic evaluation. Also, a simple theory for the influence of internal stresses on the K_Ic results has been developed.     

Growth of lithium doped silver niobate single crystals and their piezoelectric properties

Lithium doped silver niobate (Ag_1−xLi_xNbO₃, 0 < x < 0.1) is one of the candidate materials for lead-free piezoelectric materials. In this study, Ag_1−xLi_xNbO₃ single crystals were successfully grown by a slow cooling method. Crystal structure was assigned to perovskite-type orthorhombic (monoclinic) phase. Dielectric properties were measured as a function of temperature. As a result, with increasing lithium contents, the phase transition at around 60 °C was shifted to lower temperature while the phase transition at around 400 °C was shifted to higher temperature. On the basis of these peak shifts, the lithium contents in Ag_1−xLi_xNbO₃ single crystals were determined. Moreover, P–E hysteresis measurement revealed that pure silver niobate crystal was weak ferroelectrics with P_r of 0.095 μC/cm² while Ag_0.9Li_0.1NbO₃ (ALN10) crystal was normal ferroelectrics with P_r of 10.68 μC/cm². About this ALN10 crystal, polling treatment was performed and finally piezoelectric properties were measured. As a result, high electromechanical coupling coefficient k₃₁ over 70% was observed.     

Development of Bi-oxide superconducting tapes and coils

We have developed Bi-2212 and 2223 tapes. For Bi-2212, two double stacked pancake type coils were fabricated using Bi-2212/Ag tapes prepared by a combination of the continuous dip-coating process and melt-solidification. A small coil (13 mm inner bore, 46.5 mm outer diameter) was inserted in a conventional superconducting magnet system. In a bias field of 20.9 T, the generated field of the coil was 0.9 T, at an I_c of 310 A (criterion 10⁻¹³ Ωm) at 1.8 K. Thus, the superconducting magnet system achieved the generation of a field of 21.8 T in the full superconducting state. A large coil (20 mm inner bore, 94 mm outer diameter) generated a field of 2.6 T (I_c = 385 A (10⁻¹³ Ωm)) at 4.2 K and 1.53 T (I_c = 225 A (10⁻¹³Ωm)) at 20 K in self-field. For Bi-2223, tapes were prepared by the powder-in-tube technique using Ag-10% Cu-x%M (x = 0–1.0, M = Ti, Zr, Hf or Au) alloy sheaths. The high J_c values of 5–7 × 10⁴ A cm⁻² at 4.2 K and 14 T were obtained for the tapes doped with x = 0.03–0.1 at.% Ti, 0.1 at.% Zr, 0.1 at.% Hf or 0.3% Au. These tapes have a modified Bi-2223 grain structure at the sheath/core interface and also a dense and more aligned microstructure, resulting in higher J_c values.     

Optical transitions near the band edge in bulk CuInxGa1−xSe2 from ellipsometric measurements

From the analysis of the variation of optical absorption coefficient with incident photon energy between 0.8 and 2.6 eV, obtained from ellipsometric data, the energy E_G of the fundamental absorption edge and E_G′ of the forbidden direct transition for CuIn_xGa_1−xSe₂ alloys are estimated. The change in E_G and the spin-orbit splitting Δ_SO=E_G′−E_G with the composition x can be represented by parabolic expression of the form E_G(x)=E_G(0)+ax+bx² and Δ_SO(x)=Δ_SO(0)+a′x+b′x², respectively. b and b′ are called “bowing parameters”. Theoretical fit gives a=0.875 eV, b=0.198 eV, a′=0.341 eV and b′=−0.431 eV. The positive sign of b and negative sign of b′ are in agreement with the theoretical prediction of Wei and Zunger [Phys. Rev. B 39 (1989) 6279].     

Crystal structure, thermal expansion and electrical conductivity of Nd0.7Sr0.3Fe1−xCoxO3 (0≤x≤0.8)

The crystal structure, thermal expansion and electrical conductivity of the solid solution Nd_0.7Sr_0.3Fe_1−xCo_xO₃ for 0≤x≤0.8 were investigated. All compositions had the GdFeO₃-type orthorhombic perovskite structure. The lattice parameters were determined at room temperature by X-ray powder diffraction (XRPD). The pseudo-cubic lattice constant decreased continuously with x. The average linear thermal expansion coefficient (TEC) in the temperature range from 573 to 973 K was found to increase with x. The thermal expansion curves for all values of x displayed rapid increase in slope at high temperatures. The electrical conductivity increased with x for the entire temperature range of measurement. The calculated activation energy values indicate that electrical conduction takes place primarily by the small polaron hopping mechanism. The charge compensation for the divalent ion on the A-site is provided by the formation of Fe⁴⁺ ions on the B-site (in preference to Co⁴⁺ ions) and vacancies on the oxygen sublattice for low values of x. The large increase in the conductivity with x in the range from 0.6 to 0.8 is attributed to the substitution of Fe⁴⁺ ions by Co⁴⁺ ions. The Fe site has a lower small polaron site energy than Co and hence behaves like a carrier trap, thereby drastically reducing the conductivity. The non-linear behaviour in the dependence of log σT with reciprocal temperature can be attributed to the generation of additional charge carriers with increasing temperature by the charge disproportionation of Co³⁺ ions.     

Pyroelectric properties of BST/PLT composite thick films with addition of xPbO–(1 − x)B2O3 glass

The Ba_xSr_1−xTiO₃ (BST)/Pb_1−xLa_xTiO₃ (PLT) composite thick films (20 μm) with 12 mol% amount of xPbO–(1 − x)B₂O₃ glass additives (x = 0.2, 0.35, 0.5, 0.65 and 0.8) have been prepared by screen-printing the paste onto the alumina substrates with silver bottom electrode. X-ray diffraction (XRD), scanning electron microscope (SEM) and an impedance analyzer and an electrometer were used to analyze the phase structures, morphologies and dielectric and pyroelectric properties of the composite thick films, respectively. The wetting and infiltration of the liquid phase on the particles results in the densification of the composite thick films sintered at 750 °C. Nice porous structure formed in the composite thick films with xPbO–(1 − x)B₂O₃ glass as the PbO content (x) is 0.5 ≥ x ≥ 0.35, while dense structure formed in these thick films as the PbO content (x) is 0.8 ≥ x ≥ 0.65. The volatilization of the PbO in PLT and the interdiffusion between the PLT and the glass lead to the reduction of the c-axis of the PLT phase. The operating temperature range of our composite thick films is 0–200 °C. At room temperature (20 °C), the BST/PLT composite thick films with 0.35PbO–0.65B₂O₃ glass additives provided low heat capacity and good pyroelectric figure-of-merit because of their porous structure. The pyroelectric coefficient and figure-of-merit F_D are 364 μC/(m² K) and 14.3 μPa^−1/2, respectively. These good pyroelectric properties as well as being able to produce low-cost devices make this kind of thick films a promising candidate for high-performance pyroelectric applications.     

Influence of disorder on electronic structure and magnetic properties in Fe-rich Fe–Si alloys

We present the results of ab initio calculations of the spin-polarized electronic structure of disordered bcc and fcc Fe_1 − xSi_x alloys from dilute solid solutions of Si on iron up to FeSi intermetallic compound composition (x=0.01..0.5) and ordered intermetallic phases FeSi in B20 structure and Fe₃Si in DO₃ structure. The self-consistent calculations were performed with the coherent potential approximation within the Korringa–Kohn–Rostoker method (KKR–CPA) for disordered case and by using the tight-binding linear muffin–tin orbital (TB LMTO) method for intermetallic compounds. In the last case the supercell approach has been utilized in order to take into account the structural defects for this ordered phase. In particular, we have performed a series of calculations in the BCC Fe_1 − xSi_x alloys with x=0.01, 0.015, 0.1, 0.15, 0.25.     

Self-assembled growth and magnetotransport investigations on strained Si/SiGe multilayers on vicinal (113)-Si surfaces

We have reported on the growth and magnetotransport properties of modulation p-doped Si_1−xGe_x quantum wells on strained multilayers of 2.5 nm Si_1−xGe_x/10 nm Si on vicinal (113) Si surfaces. Owing to the strong step-bunching properties of the (113) Si surface, both the Si_1−xGe_x and the Si layers exhibited a regular pattern of large steps. Low-temperature magnetotransport measurements revealed a hole density (6–9×10¹¹ cm⁻²) independent of direction, whereas a pronounced mobility anisotropy was found. The mobility (1000–2000 cm²/Vs) was approximately two times higher along the [33-2] direction compared to a perpendicular [−110] direction. This is attributed to anisotropic hole scattering caused by anisotropic shear strain which is always present in strained layers on (113) Si. No influence of the large regular steps, whose direction is given by the direction of the substrate miscut, on the mobility was found.     

Molecular beam epitaxy of CdTe and CdxHg1−xTe on InSb

The crystalline quality of InSb substrates and their transparency in the 8–12 μm IR window compare favourably with those of CdTe. We report the first results obtained for Cd_xHg_1−xTe (CMT) layers grown using molecular beam epitaxy over a buffer layer of CdTe on InSb. The (100)-oriented InSb wafer is chemically cleaned prior to thermal treatment which may be accompanied by ion beam cleaning; this process leads to a (2x4) reconstructed surface. Characterization of the surface using Auger spectroscopy, UV photoemission spectroscopy and X-ray photoelectron spectroscopy shows that it is free from oxygen and carbon. CdTe is grown at a substrate temperature of 523 K using a single CdTe cell. When 0.5 μm of CdTe has grown, the substrate temperature is lowered and the CMT is deposited epitaxially using three different cells for cadmium, mercury and tellurium. The layers exhibit X-ray rocking curves 6' wide and n-type conductivity with n = 3× 10¹⁵ cm⁻³ and μ = 40 000 cm² V⁻¹ s⁻¹. Measurement of the strain in each layer shows that CMT is totally relaxed on the CdTe which in turn grows coherently on the InSb.     

Fabrication and characterization of (1−x)SrBi2Ta2O9–xBi3TaTiO9 layered structure solid solution thin films for ferroelectric random access memory (FRAM) applications

We report on the properties of (1−x)SrBi₂Ta₂O₉–xBi₃TaTiO₉ solid solution thin films for ferroelectric non-volatile memory applications. The solid solution thin films fabricated by modified metalorganic solution deposition technique showed much improved properties compared to SrBi₂Ta₂O₉. A pyrochlore free crystalline phase was obtained at a low annealing temperature of 600°C and grain size was found to be considerably increased for the solid solution compositions. The film properties were found to be strongly dependent on the composition and annealing temperatures. The measured dielectric constant of the solid solution thin films was in the range 180–225 for films with 10–50% of Bi₃TaTiO₉ content in the solid solution. Ferroelectric properties of (1−x)SrBi₂Ta₂O₉–xBi₃TaTiO₉ thin films were significantly improved compared to SrBi₂Ta₂O₉. For example, the observed remanent polarization (2P_r) and coercive field (E_c) values for films with 0.7SrBi₂Ta₂O₉–0.3Bi₃TaTiO₉ composition, annealed at 650°C, were 12.4 μC/cm² and 80 kV/cm, respectively. The solid solution thin films showed less than 5% decay of the polarization charge after 10¹⁰ switching cycles and good memory retention characteristics after about 10⁶ s of memory retention. The improved microstructural and ferroelectric properties of (1−x)SrBi₂Ta₂O₉–xBi₃TaTiO₉ thin films compared to SrBi₂Ta₂O₉, especially at lower annealing temperatures, suggest their suitability for high density FRAM applications.     

Doping and electrical characteristics of in-situ heavily B-doped Si1−x−yGexCy films epitaxially grown using ultraclean LPCVD

Doping and electrical characteristics of in-situ heavily B-doped Si_1−x−yGe_xC_y (0.22<x<0.6, 0<y<0.02) films epitaxially grown on Si(100) were investigated. The epitaxial growth was carried out at 550°C in a SiH₄–GeH₄–CH₃SiH₃–B₂H₆–H₂ gas mixture using an ultraclean hot-wall low-pressure chemical vapor deposition (LPCVD) system. It was found that the deposition rate increased with increasing GeH₄ partial pressure, and only at high GeH₄ partial pressure did it decrease with increasing B₂H₆ as well as CH₃SiH₃ partial pressures. With the B₂H₆ addition, the Ge and C fractions scarcely changed and the B concentration (C_B) increased proportionally. The C fraction increased proportionally with increasing CH₃SiH₃ partial pressures. These results can be explained by the modified Langmuir-type adsorption and reaction scheme. In B-doped Si_1−x−yGe_xC_y with y=0.0054 or below, the carrier concentration was nearly equal to C_B up to approximately 2×10²⁰ cm⁻³ and was saturated at approximately 5×10²⁰ cm⁻³, regardless of the Ge fraction. The B-doped Si_1−x−yGe_xC_y with high Ge and C fractions contained some electrically inactive B even at the lower C_B region. Resistivity measurements show that the existence of C in the film enhances alloy scattering. The discrepancy between the observed lattice constant and the calculated value at the higher Ge and C fraction suggests that the B and C atoms exist at the interstitial site more preferentially.     

Comparison between measurements on Rayleigh scattering and form-factor theories for 1 Å ≤ x ≤ 50 Å

From our measured differential cross section of Rayleigh scattering, the form factor for momentum transfers in the range 1 Å⁻¹ ≤ x ≤ 50 Å⁻¹ was deduced. Data for U, Pb, Pt, W, Sn, Cd, Ag, Mo and Cu at energies from 60 to 662 keV and scattering angles ranging from 5° to 140° were used. In addition, for the region 1 Å⁻¹ ≤ x ≤ 50 Å⁻¹ of momenta, experimental data from other authors at higher energies were analyzed. The experimental values obtained were compared with various form-factor theories and limits of validity are established. For the relativistic modified form factor G a good agreement always exists for θ ≤ 65°, independently of energy and atomic number.     

In situ co-precipitation synthesis and photoluminescence of YxGd1−xVO4:Tm microcrystalline phosphors by hybrid precursors

Y_xGd_1−xVO₄:Tm³⁺ (5 mol%) phosphors were prepared by in situ co-precipitation technology with the different content ratio of Y/Gd (x = 0.2, 0.3, 0.4, 0.5, 0.6, 0.8, respectively). During the process, rare earth coordination polymers with o-hydroxylbenzoate were used as precursors, composing with polyethylene glycol (PEG) as dispersing media. After heat-treatment of the resulting multicomponent hybrid precursors at 900 °C, the samples were obtained. SEM indicated the particles present good crystalline state, whose crystalline grain sizes were about 0.2–2 μm. Under the excitation of 257 nm, all the materials show the characteristic emission of Tm³⁺ which is the strong blue emission centered at 475 nm originating from ¹G₄ → ³H₆ of Tm³⁺. Besides this, concentration quenching appears in the system of YVO₄:Tm³⁺ and GdVO₄:Tm³⁺. And when x reaches 0.5, the system of Y_xGd_1−xVO₄:Tm³⁺ shows the strongest blue emission.     

Temperature dependence of optical transitions in AlxGa1–xAs/GaAs quantum well structures grown by molecular beam epitaxy

Quantum well (QW) structures of Al_xGa_1–xAs/GaAs were characterized by photoluminescence technique as a function of the temperature between 10 and 300 K. The structures were grown on a 500 nm thick GaAs buffer layer with Molecular Beam Epitaxy technique. We have studied the properties of in-situ Cl₂-etched GaAs surfaces and overgrown QW structures as a function of the etching temperature (70 and 200 °C). Several models were used to fit the experimental points. Best fit to experimental points was obtained with the Pässler model.