高速钢表面多弧离子镀(Ti,Al)N薄膜及性能研究

采用多弧离子镀技术在W18Cr4V表面制备出(Ti,Al)N硬质薄膜,研究了Al含量对(Ti,Al)N薄膜的形貌、硬度、膜基结合力、耐磨性、摩擦系数的影响。并利用扫描电镜、X射线衍射仪对薄膜进行了分析。结果表明Al含量在25%左右的(Ti,Al)N薄膜硬度达到2780HV0.05,耐磨性好,摩擦系数仅为0.168,且与钢基体结合良好,具有最佳的综合性能。     

(Ti,Al)N梯度涂层高温氧化表面形貌分析

利用MIP-8-800型电弧离子镀设备，在发动机压气机叶片材料1Cr11Ni2W2MoV不锈钢表面沉积了(Ti1-xAlx)N梯度纳米涂层。对其进行了700℃不同何温时间高温氧化性能实验。采用XL-30FEG型扫描电子显微镜对氧化后的涂层表面进行了观察分析。观察结果表明，(Ti1-xAlx)N梯度纳米涂层中，当x≥0．25时，所形成的A12O3氧化层是致密完整连续的，具有良好的抗高温氧化性能。     

High-Temperature Oxidation Behavior of (Ti,Cr)N Coating Deposited on 4Cr13 Stainless Steel by Multi-arc Ion Plating

在4Cr13不锈钢表面进行多弧离子镀沉积(Ti,Cr)N涂层,研究不同Cr含量的(Ti1-xCrx)N(x=0.28,0.56,0.73)复合薄膜在700℃的高温氧化行为。考察了薄膜氧化后的表面形貌、成分等。用热重法(TG)与差示扫描量热分析法(DSC)分析(Ti,Cr)N薄膜的加热氧化情况,并与TiN薄膜进行对比。结果表明:随着铬靶弧电流(ICr)的提高,(Ti1-xCrx)N薄膜中的Cr含量增加,Cr含量与ICr/ITi存在着线性关系;Cr含量越高,(Ti1-xCrx)N薄膜的高温抗氧化性能越好;(Ti1-xCrx)N薄膜的氧化热力学温度均高于TiN薄膜,表明Cr的加入明显提高了薄膜的氧化热力学温度。     

铝合金上电弧离子镀(Ti,Al)N膜的腐蚀特性

研究铝合金上电弧离子镀(Ti,Al)N膜层的腐蚀性能。通过对3种N2气分压下沉积膜层的阳极极化曲线、电化学阻抗谱、盐雾腐蚀失重曲线以及表面形貌的分析表明:沉积过程氮分压较低时,膜层中含有富金属相,耐腐蚀性能较低;增加氮分压使膜层中金属与非金属呈理想配比时,膜层的耐腐蚀性明显增加;膜层在缺陷处产生点蚀、电偶腐蚀,并通过形成裂纹、碎屑脱落使质量显著减小。     

电弧离子镀(Ti,Cr)N涂层的制备与性能研究

采用电弧离子镀膜机,通过调节Ti靶和Cr靶的阴极弧电流,在W6Mo5Cr4V2高速钢基体上制备了（Ti1-x Crx）N涂层,并对其组织结构和性能进行了研究。结果表明,该涂层具有较高的显微硬度,而且随Cr含量的增加,硬度值先增大后减小;涂层具有较高的膜基结合力;Cr的引入不仅有利于提高膜基结合力,对（Ti,Cr）N涂层的抗氧化性也有好处,在700℃时具有很好的抗氧化性。     

A comparative research on physical and mechanical properties of (Ti, Al)N and (Cr, Al)N PVD coatings with high Al content

Arc ion plating (Ti_0.34, Al_0.66)N and (Cr_0.28, Al_0.72)N coatings are deposited onto cemented carbide substrates at 350 °C. The crystal structure and microstructure of the deposited coatings are characterized by means of X-ray diffraction (XRD), electron probe microanalysis (EPMA), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). XRD examination indicates that both (Ti_0.34, Al_0.66)N and (Cr_0.28, Al_0.72)N coatings are of fcc structure. The atomic ratios of Al against Ti (Cr) for the two coatings are approximately close to those of the alloy targets according to EPMA measurement. In accordance with SEM observation, the fractured cross-section of the (Cr_0.28, Al_0.72)N coating is composed of columnar crystallites repeatedly interrupted by a renucleation process. Based on SEM and TEM methods, the cross-sectional fracture of (Ti_0.34, Al_0.66)N coating is found to show nano-crystalline feature without appearance of the columnar structure. (Cr_0.28, Al_0.72)N coating exhibits better wear resistance, approximately equal adhesion with the substrate, but lower nano-hardness compared with (Ti_0.55, Al_0.45)N coating.     

多弧离子镀Ti-Al-Zr-Cr-N系双层膜的结构与力学性能

采用多弧离子镀技术和Ti-Al-Zr合金靶及Cr单质靶,在WC-8%Co硬质合金基体上制备了(Ti,Al,Zr)N/(Ti,Al,Zr,Cr)N和Cr N/(Ti,Al,Zr,Cr)N 2种四元双层氮化物膜。利用扫描电镜(SEM)、能谱仪(EDS)和X射线衍射仪(XRD)分析2种双层膜的微观组织、成分和结构;利用划痕仪和显微硬度计对比2种双层膜的力学性能。结果表明,获得的2种双层膜均具有B1-NaCl型的TiN面心立方结构;双层膜的组织均是典型的柱状晶结构;沉积偏压为–50~–200 V时,双层膜的力学性能均优于(Ti,Al,Zr,Cr)N单层膜,并与Ti-Al-Zr-Cr-N系梯度膜的力学性能相当,同时(Ti,Al,Zr)N/(Ti,Al,Zr,Cr)N双层膜可获得更高的硬度(HV_(0.01)最高值为41 GPa),而CrN/(Ti,Al,Zr,Cr)N双层膜可获得更强的膜层与基体间结合力(所有值均大于200 N)。     

脉冲偏压对（Ti，Al）N／TiN／（Ti，Al）N多层复合涂层成分和硬度的影响

采用脉冲偏压多弧离子镀技术在Hss-Al高速钢上涂镀（Ti,Al）N/TiN/（Ti,Al）N多层复合涂层。所用设备为复合八阵弧离子镀膜生长系统。简要介绍了多层复合膜的镀层工艺过程。鉴于复合涂层中的Al含量对涂层的性能特别是抗磨损性能有极重要的影响。实验中重点考察了脉冲偏压幅对Al含量的影响。同时测试了复合涂层的Vickers硬度与偏压幅值的关系。研究结果推出,随着脉冲偏压幅值的增加,涂层中Al含量先增加,然后减少,偏压幅值为-150V时,Al含量高达36.41at%,偏压幅与涂声能显微硬度的关系有相似的规律,在偏压幅值为-150V时,7层复合膜的Vickers硬度达2750MPa左右,10层复合膜的硬度约2880MPa。     

(Ti,Al)N涂层的微观组织和性能

采用EPMA、XRD、SEM、TEM、HR-TEM、EDX、纳米压痕、氧化实验和切削实验研究了磁控溅射在硬质合金基体上沉积TiN涂层和(Ti,Al)N涂层的微观组织结构和性能。结果表明:TiN涂层晶粒为喇叭口柱状晶,(Ti,Al)N涂层为面心立方平直柱状晶,由于固溶了Al元素,(Ti,A l)N涂层呈(200)面择优生长;(Ti,Al)N涂层在硬质合金基体上无外延生长;(Ti,Al)N涂层在800℃氧化后形成Al2O3/TiO2/(Ti,Al)N的分层结构;(Ti,Al)N涂层具有更高的硬度和更好的切削性能。     

铝和镁合金上电弧离子镀( Ti，Al)N梯度涂层的比较

为了探索和研究在铝合金和镁合金衬底上电弧离子镀沉积梯度的(Ti,Al)N涂层的沉积工艺并确定沉积涂层的基本性能,从而为该涂层的应用奠定理论基础.采用试验和比较的方法.结果表明:在铝合金衬底上可以成功地沉积厚度可达60μm的梯度(Ti,Al)N涂层,涂层与衬底的界面没有缺陷、空洞,与衬底的结合强度很好;而在AZ31镁合金衬底上,由于衬底上含有镁的氧化物,沉积涂层极易脱落.常规的研磨、抛光等方法无法克服由于镁活性大、氧化速率快所形成的氧化膜造成沉积涂层极易脱落现象.X射线衍射谱表明,沉积涂层为TiN结构,Al以替位的形式占据TiN中Ti的位置,形成(Ti,Al)N涂层,没有AlN结构出现;涂层中,Ti和Al原子比近似为1:1,与靶材的成分相同.得出结论:通过改变沉积过程中N2气的分压,可以在铝合金衬底上沉积出硬度和成分梯度变化的厚涂层,但在镁合金上涂层极易脱落;铝合金上的梯度厚涂层可以解决衬底材料硬度低而涂层硬度高所存在的不协调的问题.     

Ti(C,N)基金属陶瓷力学性能和高温抗氧化性能的研究

本文研究了添加不同比例的TaC、NbC对Ti(C,N)-NiMo系金属陶瓷的力学性能的影响及在750℃空气中的氧化行为,测定并计算了恒温氧化增重与时间的函数关系及氧化速率常数。结果表明,这类陶瓷材料的氧化为"钝性氧化",TaC/NbC质量比为4:3时,显示出较好的力学性能和抗氧化性。通过X射线衍射(XRD)、扫描电镜(SEM)、能谱分析(EDS)等手段,分析了氧化膜的组成与结构,探讨了Ti(C,N)基金属陶瓷高温下的氧化机制。     

(Cr_(0.72),Al_(0.28))N涂层的微观组织结构及力学性能研究

借助XRD、纳米压痕、SEM和划痕仪研究了采用阴极弧制备技术在硬质合金基体上沉积的(Cr,Al)N涂层的显微组织和力学性能。研究表明:面心立方结构的(Cr,Al)N涂层由晶粒尺寸分散的柱状晶晶粒组成;(Cr,Al)N涂层的硬度为31.7 GPa;与硬质合金基体的结合强度约为55 N。     

Oxidation of TiN and Ti(C,N) thin films deposited on titanium substrate

Single-layered TiN and functionally graded Ti(C,N) coatings were magnetron sputtered to a thickness of about 1 μm, and their oxidation behavior was studied. The Ti(C,N) coating oxidized as fast as the TiN coating, forming TiO₂ as an oxide layer. The nitrogen in the TiN and Ti(C,N) coatings tended to escape from the coating via the TiO₂ layer into the air. The carbon in the Ti(C,N) coating also had strong tendency to escape. Even before the complete oxidation of the coatings, the retained coating layer and the Ti-substrate were strongly enriched with oxygen.     

Ti(C,N)膜的离子镀及其抗氧化特性

采用空心阴极离子镀的方法在1Crl8Ni9Ti奥氏体不锈钢表面沉积了Ti(C，N)膜。通过测试膜层基本性能确定了反应气体流量C2H2和N2的最佳比例为0．1，即C2H2为5mL／min，N2为50mL／min。研究了膜层在750℃～950℃时的抗氧化性能。SEM及XRD分析表明，膜层抗氧化性较好，尤其在高温状态对基体有很好的保护作用。     

(Ti,Al)N涂层的织构特征和切削性能研究

借助EPMA、XRD、SEM、EDX、纳米压痕和切削实验研究了采用磁控溅射在硬质合金基体上沉积的(Ti,Al)N涂层的微观组织结构和切削性能。研究表明:(Ti,Al)N涂层为面心立方的的平直的柱状晶;(Ti,Al)N涂层因其高的硬度和良好的抗氧化性能大大地提高切削寿命。     

SiC颗粒增强铝基复合材料基材上制备(Ti,Al)N涂层的研究

利用电弧离子镀技术在SiCp／2024Al基体上制备(Ti，Al)N涂层．研究了偏压对涂层的相组成、晶格常数和成分的影响及不同过渡层对涂层与基体结合性能的影响．结果表明，在较小偏压下，(Ti，Al)N涂层呈(111)择优取向；偏压在-150V时，涂层无择优取向；但随偏压继续升高，出现(200)和(220)择优取向．在添加Ti过渡层时，涂层与基体形成致密均匀的良好结合．同时通过设计梯度涂层，获得了厚度达105um的无裂纹(Ti，Al)N涂层．     

反应溅射Ti(0，N)涂层的微结构与力学性能

采用反应磁控溅射方法在Ar、N2和O2混合气氛中制备了一系列Ti(O,N)涂层,并采用EDS、XRD、SEM、AFM和微力学探针研究了氧分压对涂层的化学成分、微结构和力学性能的影响.结果表明:随混合气氛中氧分压的提高,涂层中的氧含量逐步增加,氮含量相应减少,但涂层始终保持与TiN相同的NaCl结构.少量氧的加入,可以改善涂层的结晶状态,涂层的硬度也相应升高,明显高于未含氧的TiN涂层的硬度.氧含量为8.0%(原子数分数)时,涂层硬度达到最大值26.2 GPa.进一步增加氧含量,涂层的硬度基本保持不变.     

The electrochemical corrosion behavior of TiN and (Ti,Al)N coatings in acid and salt solution

In this study, the corrosion properties of TiN and (Ti,Al)N coatings fabricated by Hollow Cathode Ionic Plating (HCIP) were studied by electrochemical techniques such as electrochemical impedance spectroscopy (EIS) measurement and potentiodynamic measurement in acid and salt solution. It was found that both coatings showed an excellent corrosion resistance in acid and salt solutions at the beginning of long-term immersing test. The corrosion resistance of TiN coating deteriorated rapidly after nearly 100 h immersion in both acid and salt solutions. In the contrast, the corrosion rate of (Ti,Al)N coating decreased a little and then kept at a stable value. For the TiN coating, the corrosion initiated from pinholes and the underlying corrosion was very similar to pitting corrosion. With the addition of aluminum to the TiN coating, the corrosion resistance was improved, especially in salt solution. The test results demonstrated that the (Ti,Al)N coating seemed to posses certain self-repairing function. The corrosion mechanism took the form of denudation corrosion, owing to deterioration of the adhesion of the coating.     

Mo对多弧离子镀(Ti,Mo)xN涂层组织与性能的影响

采用Ti/Mo复合靶 ,用多弧离子镀技术沉积了 (Ti,Mo) xN多元涂层 ,研究了Mo对该涂层组织与性能的影响。结果表明 ,涂层的主要结构为 (Ti,Mo) 2 N ,其中Mo的固溶度可达 4 56% (质量分数 ) ,并具有较高的显微硬度、抗氧化性和低的孔隙率。在沉积过程中存在着多元合金涂层与复合靶的成分离析现象 ,这与靶材的结构有关。     

High-Temperature Oxidation of Ti0.3Al0.2N0.5 Thin Films Deposited on a Steel Substrate by Ion Plating

To improve the high-temperature oxidation resistance of STD61 steels used ashot dies or cutting tools, Ti_0.3Al_0.2N_0.5films were deposited on STD61 steel substrates by arc-ion plating. Thedeposited film consisted of Ti₃Al₂N₂ andTi₂N phases. The oxidation characteristics were studied attemperatures ranging from 700 to 900°C in air. The deposited STD61steels displayed excellent oxidation resistance up to 800°C, butexhibited large weight gains and breakaway oxidation at 900°C. Theoxidation products were primarily Fe₂O₃, TiO, TiO₂,and -Al₂O₃, the relative amount of each oxidebeing dependent on the oxidation condition. Among various oxides, TiO₂and -Al₂O₃ were the major oxides at 800°Cfor at least up to 16 hr. However, at a higher temperature or a longeroxidation period, the significant outward diffusion of iron from thesubstrate resulted in the formation of iron oxides, together with otheroxides of Ti and Al.