Low-Threshold Strained Quantum-Well GaSb-Based Lasers Emitting in the 2.5- to 2.7-$mu$ m Wavelength Range

GaInAsSb–GaSb strained quantum-well (QW) ridge waveguide diode lasers emitting in the wavelength range from 2.51 to 2.72 $ mu{hbox {m}}$ have been grown by molecular beam epitaxy. The devices show ultralow threshold current densities of 44 $hbox{A}/{hbox {cm}}^{2}$ (${L}rightarrow infty $) for a single QW device at 2.51 $ mu{hbox {m}}$, which is the lowest reported value in continuous-wave operation near room temperature (15 $^{circ}hbox{C}$) at this wavelength. The devices have an internal loss of 3 ${hbox {cm}}^{-1}$ and a characteristic temperature of 42 K. By using broader QWs, wavelengths up to 2.72 $mu{hbox {m}}$ could be achieved.      

Experimental Demonstration of Deeply-Etched SiO$_{2}$ Ridge Optical Waveguides and Devices

Deeply-etched ${hbox{SiO}}_{2}$ optical ridge waveguides are fabricated and characterized. A detailed discussion of the fabrication process (especially for the deep etching process) is presented. The measured propagation losses for the fabricated waveguides with different core widths range from $0.33sim {hbox {0.81}}~{hbox {dB}}/{hbox {mm}}$. The loss is mainly caused by the scattering due to the sidewall roughness. The losses in bending sections are also characterized, which show the possibility of realizing a small bending radius (several tens of microns). 1 $,times {rm N}$ ( ${rm N}=2$, 4, 8) multimode interference couplers based on the deeply-etched ${hbox{SiO}}_{2}$ ridge waveguide are also fabricated and show fairly good performances.      

$S$ - and $C$ -Band Ultra-Compact Phase Shifters Based on All-Pass Networks

Ultra-compact phase shifters are presented. The proposed phase-shifting circuits utilize the lumped element all-pass networks. The transition frequency of the all-pass network, which determines the size of the circuit, is set to be much higher than the operating frequency. This results in a significantly small chip size of the phase shifter. To verify this methodology, 5-bit phase shifters have been fabricated in the $S$ - and $C$ -band. The $S$ -band phase shifter, with a chip size of 1.87 mm $,times,$0.87 mm (1.63 mm $^{2}$), has achieved an insertion loss of ${hbox{6.1 dB}} pm {hbox{0.6 dB}}$ and rms phase-shift error of less than 2.8$^{circ}$ in 10% bandwidth. The $C$ -band phase shifter, with a chip size of 1.72 mm $,times,$0.81 mm (1.37 mm $^{2}$), has demonstrated an insertion loss of 5.7 dB $pm$ 0.8 dB and rms phase-shift error of less than 2.3 $^{circ}$ in 10% bandwidth.      

A Low-Voltage Mobility-Based Frequency Reference for Crystal-Less ULP Radios

The design of a 100 kHz frequency reference based on the electron mobility in a MOS transistor is presented. The proposed low-voltage low-power circuit requires no off-chip components, making it suitable for application in wireless sensor networks (WSN). After a single-point calibration, the spread of its output frequency is less than 1.1% (3$sigma $) over the temperature range from $-{hbox{22}},^{circ}{hbox{C}}$ to 85$,^{circ}{hbox{C}}$ . Fabricated in a baseline 65$~$nm CMOS technology, the frequency reference circuit occupies 0.11$ hbox{mm}^{2}$ and draws 34 $ muhbox{A}$ from a 1.2 V supply at room temperature.      

High Heat Flux Two-Phase Cooling in Silicon Multimicrochannels

This paper presents performances of two-phase cooling of a chip at very high heat flux with refrigerant R236fa in a silicon multimicrochannel heat sink. This heat sink was composed of 134 parallel channels, 67 $mu {hbox {m}}$ wide, 680 $mu {hbox {m}}$ high, and 20 mm long, with 92-$mu {hbox {m}}$ -thick fins separating the channels. The base heat flux was varied from 3 to 255 ${hbox {W/cm}}^{2}$ , the volume flow rate from 0.18 to 0.67 l/min, and the exit vapor quality from 0 to 80%. The working pressure and saturation temperature were set at 273 kPa and 25 $^{circ}{hbox {C}}$, respectively. The present database includes 1040 local heat transfer coefficients. The base temperature of the chip could be maintained below 52 $^{circ}{hbox {C}}$ while dissipating 255 ${hbox {W/cm}}^{2}$ with 10 $~^circ{hbox {C}}$ of inlet subcooling and 90 kPa of pressure drop. A comparison of the respective performances with an extrapolation of the present results shows that two-phase cooling should be able to cool the chip 13 K lower than liquid cooling for the same pumping power at a base heat flux of 350 ${hbox {W/cm}}^{2}$.      

1580-V–40-$hbox{m}Omegacdot hbox{cm}^{2}$ Double-RESURF MOSFETs on 4H-SiC $(hbox{000}bar{hbox{1}})$

Double-reduced-surface-field (RESURF) MOSFETs with $hbox{N}_{2}hbox{O}$ -grown oxides have been fabricated on the 4H-SiC $(hbox{000} bar{hbox{1}})$ face. The double-RESURF structure is effective in reducing the drift resistance, as well as in increasing the breakdown voltage. In addition, by utilizing the 4H-SiC $(hbox{000}bar{hbox{1}})$ face, the channel mobility can be increased to over 30 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, and hence, the channel resistance is decreased. As a result, the fabricated MOSFETs on 4H-SiC $( hbox{000}bar{hbox{1}})$ have demonstrated a high breakdown voltage $(V_{B})$ of 1580 V and a low on-resistance $(R_{rm ON})$ of 40 $hbox{m}Omega cdothbox{cm}^{2}$. The figure-of-merit $(V_{B}^{2}/R_{rm ON})$ of the fabricated device has reached 62 $hbox{MW/cm}^{2}$, which is the highest value among any lateral MOSFETs and is more than ten times higher than the “Si limit.”      

17 GHz RF Front-Ends for Low-Power Wireless Sensor Networks

A 17 GHz low-power radio transceiver front-end implemented in a 0.25 $mu{hbox {m}}$ SiGe:C BiCMOS technology is described. Operating at data rates up to 10 Mbit/s with a reduced transceiver turn-on time of 2 $mu{hbox {s}}$, gives an overall energy consumption of 1.75 nJ/bit for the receiver and 1.6 nJ/bit for the transmitter. The measured conversion gain of the receiver chain is 25–30 dB into a 50 $Omega$ load at 10 MHz IF, and noise figure is 12 $pm$0.5 dB across the band from 10 to 200 MHz. The 1-dB compression point at the receiver input is $-$37 dBm and ${hbox{IIP}}_{3}$ is $-$25 dBm. The maximum saturated output power from the on-chip transmit amplifier is $-$1.4 dBm. Power consumption is 17.5 mW in receiver mode, and 16 mW in transmit mode, both operating from a 2.5 V supply. In standby, the transceiver supply current is less than 1 $mu{hbox {A}}$.      

Q-Band pHEMT and mHEMT Subharmonic Gilbert Upconversion Mixers

This letter makes a comparison between Q-band 0.15 $mu{rm m}$ pseudomorphic high electron mobility transistor (pHEMT) and metamorphic high electron mobility transistor (mHEMT) stacked-LO subharmonic upconversion mixers in terms of gain, isolation and linearity. In general, a 0.15 $mu{rm m}$ mHEMT device has a higher transconductance and cutoff frequency than a 0.15 $mu{rm m}$ pHEMT does. Thus, the conversion gain of the mHEMT is higher than that of the pHEMT in the active Gilbert mixer design. The Q-band stacked-LO subharmonic upconversion mixers using the pHEMT and mHEMT technologies have conversion gain of $-$7.1 dB and $-$0.2 dB, respectively. The pHEMT upconversion mixer has an ${rm OIP}_{3}$ of $-$12 dBm and an ${rm OP}_{1 {rm dB}}$ of $-$24 dBm, while the mHEMT one shows a 4 dB improvement on linearity for the difference between the ${rm OIP}_{3}$ and ${rm OP}_{1 {rm dB}}$. Both the chip sizes are the same at 1.3 mm $times$ 0.9 mm.      

A Merged CMOS Digital Near-End Crosstalk Canceller and Analog Equalizer for Multi-Lane Serial-Link Receivers

A digital near-end crosstalk (NEXT) canceller merged with an analog equalizer for multi-lane serial-link receivers has been realized in 0.13 $mu{hbox {m}}$ CMOS technology. By applying the proposed sign-sign block least-mean-square (SSB-LMS) circuit, a 5 Gb/s pseudorandom binary sequence (PRBS) of 2 $^{31}-$1 suffered from both the channel loss and NEXT over 10- and 20-inch FR4 traces with the width of 5-mil and the spacing of 7-mil is successfully equalized. The measured bit error rate (BER) is 10$^{-12}$ and the measured maximum peak-to-peak jitter is 49.7 ps. This chip occupies 0.56 $,times,$0.76 $ {hbox {mm}}^{2}$ and the whole circuit including buffers consumes 177 mW from a 1.2 V supply.      

A $Q$ -Band Four-Element Phased-Array Front-End Receiver With Integrated Wilkinson Power Combiners in 0.18-$mu{{hbox{m}}}$ SiGe BiCMOS Technology

A four-element phased-array front-end receiver based on 4-bit RF phase shifters is demonstrated in a standard 0.18- $mu{{hbox{m}}}$ SiGe BiCMOS technology for $Q$-band (30–50 GHz) satellite communications and radar applications. The phased-array receiver uses a corporate-feed approach with on-chip Wilkinson power combiners, and shows a power gain of 10.4 dB with an ${rm IIP}_{3}$ of $-$13.8 dBm per element at 38.5 GHz and a 3-dB gain bandwidth of 32.8–44 GHz. The rms gain and phase errors are $leq$1.2 dB and $leq {hbox{8.7}}^{circ}$ for all 4-bit phase states at 30–50 GHz. The beamformer also results in $leq$ 0.4 dB of rms gain mismatch and $leq {hbox{2}}^{circ}$ of rms phase mismatch between the four channels. The channel-to-channel isolation is better than $-$35 dB at 30–50 GHz. The chip consumes 118 mA from a 5-V supply voltage and overall chip size is ${hbox{1.4}}times {hbox{1.7}} {{hbox{mm}}}^{2}$ including all pads and CMOS control electronics.      

2 MHz AO $Q$ -switched ${rm TEM}_{00}$ Grazing Incidence Laser With 3 at.% Neodymium Doped Nd:YVO$_{4}$

We present a detailed experimental and theoretical study of the ultrahigh repetition rate AO $Q$ -switched ${rm TEM}_{00}$ grazing incidence laser. Up to 2.1 MHz $Q$-switching with ${rm TEM}_{00}$ output of 8.6 W and 2.2 MHz $Q$ -switching with multimode output of 10 W were achieved by using an acousto-optics $Q$ -switched grazing-incidence laser with optimum grazing-incidence angle and cavity configuration. The crystal was 3 at.% neodymium doped Nd:YVO$_{4}$ slab. The pulse duration at 2 MHz repetition rate was about 31 ns. The instabilities of pulse energy at 2 MHz repetition rate were less than ${pm}6.7hbox{%}$ with ${rm TEM}_{00}$ operation and ${pm}3.3hbox{%}$ with multimode operation respectively. The modeling of high repetition rate $Q$-switched operation is presented based on the rate equation, and with the solution of the modeling, higher pump power, smaller section area of laser mode, and larger stimulated emission cross section of the gain medium are beneficial to the $Q$-switched operation with ultrahigh repetition rate, which is in consistent with the experimental results.      

A Sub-0.2$^{circ}/$ hr Bias Drift Micromechanical Silicon Gyroscope With Automatic CMOS Mode-Matching

This paper describes a system architecture and CMOS implementation that leverages the inherently high mechanical quality factor (Q) of a MEMS gyroscope to improve performance. The proposed time domain scheme utilizes the often-ignored residual quadrature error in a gyroscope to achieve, and maintain, perfect mode-matching (i.e., $sim$0 Hz split between the high-Q drive and sense mode frequencies), as well as electronically control the sensor bandwidth. A CMOS IC and control algorithm have been interfaced with a 60 $mu{hbox {m}}$ thick silicon mode-matched tuning fork gyroscope $({rm M}^{2}mathchar"707B {rm TFG})$ to implement an angular rate sensing microsystem with a bias drift of 0.16$^{circ}/{hbox{hr}}$. The proposed technique allows microsystem reconfigurability—the sensor can be operated in a conventional low-pass mode for larger bandwidth, or in matched mode for low-noise. The maximum achieved sensor Q is 36,000 and the bandwidth of the microsensor can be varied between 1 to 10 Hz by electronic control of the mechanical frequencies. The maximum scale factor of the gyroscope is 88 ${hbox{mV}}/^{circ}/{hbox{s}}$ . The 3$~$ V IC is fabricated in a standard 0.6 $ mu{hbox {m}}$ CMOS process and consumes 6 mW of power with a die area of 2.25 ${hbox {mm}}^{2}$.      

A 300 mV 494GOPS/W Reconfigurable Dual-Supply 4-Way SIMD Vector Processing Accelerator in 45 nm CMOS

This paper describes a reconfigurable 4-way SIMD engine fabricated in 45 nm high-k/metal-gate CMOS, targeted for on-die acceleration of vector processing in power-constrained mobile microprocessors. The SIMD accelerator is reconfigured to perform 4-way 16b$,times, $16b multiplies, 32b$,times, $32b multiply, 4-way 16b additions, 2-way 32b additions or 72b addition with single-cycle throughput and wide supply voltage range of operation (1.3 V–230 mV). A reconfigurable 2 $,times,$2 tile of signed 2's complement 16b multipliers, with conditional carry gating in the 72b sparse tree adder, dual-supplies for voltage hopping, and fine-grained power-gating enables peak energy efficiency of 494GOPS/W (measured at 300 mV, 50 $,^{circ}{hbox{C}}$) with a dense layout occupying 0.081 ${hbox {mm}}^{2}$ while achieving: (i) scalable performance up to 2.8 GHz, 278 mW measured at 1.3 V; (ii) fast single-cycle switching between any operating/idle mode; (iii) configuration-dependent power reduction of up to 41% in total power and 6.5$times$ in active leakage power; (iv) 10 $times$ standby leakage reduction during idle mode; (v) deep subthreshold operation measured at 230 mV, 8.8 MHz, 87 $mu{hbox {W}}$; and (vi) compensation for up to 3$times$ performance variation in ultra-low voltage mode.      

A Wideband PLL-Based G/FSK Transmitter in 0.18 $mu$m CMOS

A wideband phase-locked loop (PLL)-based G/FSK transmitter (TX) architecture is presented in this paper. In the proposed TX, the G/FSK data is applied outside the loop; hence, the data rate is not constrained by the PLL bandwidth. In addition, the PLL remains locked all the time, preventing the carrier frequency from drifting. In this architecture, the G/FSK modulation signal is generated from a proposed Sigma-Delta modulated Phase Rotator $(SigmaDelta{hbox{-PR}})$. By properly combining the multi-phase signals from the PLL output, the $SigmaDelta{hbox{-PR}}$ effectively operates as a fractional frequency divider, which can synthesize modulation signals with fine-resolution frequencies. The proposed $SigmaDelta{hbox{-PR}}$ adopts the input signal as the phase transition trigger, facilitating a glitch-free operation. The impact of the $SigmaDelta{hbox{-PR}}$ on the TX output noise is also analyzed in this paper. The proposed TX with the $SigmaDelta{hbox{-PR}}$ is digitally programmable and can generate various G/FSK signals for different applications. Fabricated in a 0.18 $muhbox{m}$ CMOS technology, the proposed TX draws 6.3 mA from a 1.4 V supply, and delivers an output power of $-$11 dBm. With a maximum data rate of 6 Mb/s, the TX achieves an energy efficiency of 1.5 nJ/bit.      

A Noise-Coupled Time-Interleaved Delta-Sigma ADC With 4.2 MHz Bandwidth, ${-}$ 98 dB THD, and 79 dB SNDR

This paper describes a wideband high-linearity $Delta Sigma $ ADC. It uses noise coupling combined with time interleaving. Two versions of a two-channel time-interleaved noise-coupled $Delta Sigma $ ADC were realized in a 0.18- $mu{hbox {m}}$ CMOS technology. Noise coupling between the channels increases the effective order of the noise-shaping loops, provides dithering, and prevents tone generation in all loops. Time interleaving enhances the effects of noise coupling. Using a 1.5 V supply, the device achieved excellent linearity (${rm SFDR} > {hbox {100~dB}}$, ${rm THD}= -{hbox {98~dB}}$) and an SNDR of 79 dB in a 4.2 MHz signal band.      

Performance Improvement of N-Type $hbox{TiO}_{x}$ Active-Channel TFTs Grown by Low-Temperature Plasma-Enhanced ALD

We report on performance improvement of $n$-type oxide–semiconductor thin-film transistors (TFTs) based on $hbox{TiO}_{x}$ active channels grown at 250 $^{circ}hbox{C}$ by plasma-enhanced atomic layer deposition. TFTs with as-grown $hbox{TiO}_{x}$ films exhibited the saturation mobility $(mu_{rm sat})$ as high as 3.2 $hbox{cm}^{2}/hbox{V}cdothbox{s}$ but suffered from the low on–off ratio $(I_{rm ON}/I_{rm OFF})$ of $hbox{2.0} times hbox{10}^{2}$. $hbox{N}_{2}hbox{O}$ plasma treatment was then attempted to improve $I_{rm ON}/I_{rm OFF}$. Upon treatment, the $hbox{TiO}_{x}$ TFTs exhibited $I_{rm ON}/I_{rm OFF}$ of $hbox{4.7} times hbox{10}^{5}$ and $mu_{rm sat}$ of 1.64 $hbox{cm}^{2}/hbox{V}cdothbox{s}$, showing a much improved performance balance and, thus, demonstrating their potentials for a wide variety of applications such as backplane technology in active-matrix displays and radio-frequency identification tags.      

InGaAs/GaAs 0.98- $mu{hbox {m}}$ Low-Divergence Central-Lobe Semiconductor Lasers With $delta$ -Doped Resonant Tunneling Quantum Wells

In this paper, we describe a new structure design for producing low-threshold, high-efficiency, and high-brightness 0.98-$mu{hbox {m}}$ lasers. In this structure, we incorporated a self-discriminating weak optical confinement asymmetrical waveguide coupled to passive waveguides, and an active region based on three InGaAs quantum wells (QWs) coupled to Te n-type $delta$-doping. Optimized coupling between the $delta$-doping and the three QWs, together with waveguide optimization and doping profile optimization, yields $J_{rm th}=98 {hbox {A/cm}}^{2}$ per QW, ${T}_{0}=80;^{circ}hbox{C}$, and a far-field central lobe angle of $sim 10^{circ}$.      

$hbox{TiN/ZrO}_{2}$/Ti/Al Metal–Insulator–Metal Capacitors With Subnanometer CET Using ALD-Deposited $hbox{ZrO}_{2}$ for DRAM Applications

We provide the first report of the structural and electrical properties of $hbox{TiN/ZrO}_{2}$/Ti/Al metal–insulator–metal capacitor structures, where the $hbox{ZrO}_{2}$ thin film (7–8 nm) is deposited by ALD using the new zirconium precursor ZrD-04, also known as Bis(methylcyclopentadienyl) methoxymethyl. Measured capacitance–voltage ($C$– $V$) and current–voltage ( $I$–$V$) characteristics are reported for premetallization rapid thermal annealing (RTP) in $hbox{N}_{2}$ for 60 s at 400 $^{circ}hbox{C}$, 500 $^{circ}hbox{C}$, or 600 $^{ circ}hbox{C}$. For the RTP at 400 $^{circ}hbox{C}$ , we find very low leakage current densities on the order of nanoamperes per square centimeter at a gate voltage of 1 V and low capacitance equivalent thickness values of $sim$ 0.9 nm at a gate voltage of 0 V. The dielectric constant of $ hbox{ZrO}_{2}$ is 31 $pm$ 2 after RTP treatment at 400 $^{circ}hbox{C}$.      

W-Band Active Down-Conversion Mixer in Bulk CMOS

A W-band (76–77 GHz) active down-conversion mixer has been demonstrated using low leakage (higher ${rm V}_{{rm T}}$) NMOS transistors of a 65-nm digital CMOS process with 6 metal levels. It achieves conversion gain of ${-}8$ dB at 76 GHz with a local oscillation power of 4 dBm (${sim-}2$ dBm after de-embedding the on-chip balun loss), and 3 dB bandwidth of 3 GHz. The SSB noise figures are 17.8–20 dB (11.3–13.5 dB after de-embedding on-chip input balun loss) between 76 and 77 GHz. ${rm IP}_{1{rm dB}}$ is ${-}6.5$ dBm and IIP3 is 2.5 dBm (${sim-}13$ and ${sim}-4$ dBm after de-embedding the on-chip balun loss). The mixer consumes 5 mA from a 1.2 V supply.      

Soft Glass Equiangular Spiral Photonic Crystal Fiber for Supercontinuum Generation

An equiangular spiral photonic crystal fiber (ES-PCF) design in soft glass is presented that has high nonlinearity ( $gamma>5250 hbox{W}^{-1}cdothbox{km}^{-1}$ at 1064 nm and $gamma>2150 hbox{W}^{-1}cdothbox{km}^{-1}$ at 1550 nm) with a low and flat dispersion (${D}sim {hbox {0.8}} hbox{ps/km}cdothbox{nm}$ and dispersion slope $sim-0.7 hbox{ps/km}cdothbox{nm}^{2}$ at 1060 nm). The design inspired by nature is characterized by a full-vectorial finite element method. The ES-PCF presented improves over the mode confinement of triangular core designs and dispersion control of conventional hexagonal PCF, combining the advantages of both designs; it can be an excellent candidate for generating supercontinuum pumped at 1.06 $mu{hbox {m}}$.