Dielectric surface-polarity tuning and enhanced operation stability of solution-processed organic field-effect transistors

The electrical performance of triethylsilylethynyl anthradithiophene (TES-ADT) organic field-effect transistors (OFETs) was significantly affected by dielectric surface polarity controlled by grafting hexamethyldisilazane and dimethyl chlorosilane-terminated polystyrene (PS-Si(CH₃)₂Cl) to 300-nm-thick SiO₂ dielectrics. On the untreated and treated SiO₂ dielectrics, solvent–vapor annealed TES-ADT films contained millimeter-sized crystals with low grain boundaries (GBs). The operation and bias stability of OFETs containing similar crystalline structures of TES-ADT could be significantly increased with a decrease in dielectric surface polarity. Among dielectrics with similar capacitances (10.5–11 nF cm⁻²) and surface roughnesses (0.40–0.44 nm), the TES-ADT/PS-grafted dielectric interface contained the fewest trap sites and therefore the OFET produced using it had low-voltage operation and a charge-carrier mobility ∼1.32 cm² V⁻¹ s⁻¹, on–off current ratio >10⁶, threshold voltage ∼0 V, and long-term operation stability under negative bias stress.     

Operation voltage reduction and gain enhancement in organic CMOS inverters with the TTC/gelatin bilayer dielectric

An air ambient operated organic complementary metal oxide semiconductor (CMOS) inverter has been fabricated on poly(ethylene terephthalate) (PET) using pentacene and N,N-dioctyl-3,4,9,10-perylene tetracarboxylic diimide (PTCDI-C₈) as active layers with a bilayer dielectric of tetratetracontane (TTC) and gelatin. The inverter performance is greatly improved by replacing the gelatin dielectric with the TTC/gelatin bilayer. With the TTC/gelatin bilayer, both types of organic field-effect transistor (OFET) show better pinch-off and current saturation in output characteristics and negligible hysteresis transfer characteristics. The organic CMOS inverter with the TTC/gelatin bilayer dielectric exhibits balanced motilities of 0.5 (pentacene) and 0.3 cm² V⁻¹ s⁻¹ (PTCDI-C₈) with low threshold voltages of −1 (pentacene) and 3 V (PTCDI-C₈). A high static gain of 60 may be achieved with sharp inversion.     

Challenges and performance limitations of high-k and oxynitride gate dielectrics for 90/65 nm CMOS technology

For low power applications, the increase of gate leakage current, caused by direct tunneling in ultra-thin oxide films, is the crucial factor eliminating conventional SiO₂-based gate dielectrics in sub-90 nm CMOS technology development. Recently, promising performance has been demonstrated for poly-Si/high-k and poly-Si/SiON gate stacks in addressing gate leakage requirements for low power applications. However, the use of poly-Si gate electrodes on high-k created additional issues such as channel mobility and reliability degradations, as well as Fermi level pinning of the effective gate work function. Therefore, oxynitride gate dielectrics are being proposed as an intermediate solution toward the sub-65/45 nm nodes. Apparently, an enhanced SiON gate dielectric stack was developed and reported to achieve high dielectric constant and good interfacial properties. The purpose of this paper is to provide a comprehensive review some of the device performance and limitation that high-k and oxynitride as dielectric materials are facing for sub-65/45 nm node.     

Forming semiconductor/dielectric double layers by one-step spin-coating for enhancing the performance of organic field-effect transistors

We report one-step formation of the gate dielectric and conduction channel for enhancing the performance of organic field effect transistors (OFETs). The resulting OFET with the semiconductor/dielectric bi-layers spun in ambient conditions exhibits μ_FET up to 1.6 cm²/V s and on–off ratio higher than 10⁶, no additional treatment needed. Contact angle measurements and absorption spectra reveals that a well-defined semiconductor-top and dielectric-bottom film form after spin-coating the mixture of the two components, which is due to the surface induced self-organized phase separation. Compared to the single layer semiconductor film, the staggered film exhibits over 5 times higher mobility and nearly 90% reduced hysteresis in OFET. The higher performance is attributed to the simultaneous optimization in the dielectric interface and semiconductor crystallization. The approach is significant for the fabrication of low cost, easy processed and high performance OFETs.     

Low-voltage,high speed inkjet-printed flexible complementary polymer electronic circuits

We report the development of high-performance inkjet-printed organic field-effect transistors (OFETs) and complementary circuits using high-k polymer dielectric blends comprising poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TrFE)) and poly(methyl methacrylate) (PMMA) for high-speed and low-voltage operation. Inkjet-printed p-type polymer semiconductors containing alkyl-substituted thienylenevinylene (TV) and dodecylthiophene (PC12TV12T) and n-type P(NDI2OD-T2) OFETs showed high field-effect mobilities of 0.1–0.4 cm² V^?1 s^?1 and low threshold voltages down to 5 V. These OFET properties were modified by changing the blend ratio of P(VDF-TrFE) and PMMA. The optimum blend – a 7:3 wt% mixture of P(VDF-TrFE) and PMMA – was successfully used to realize high-performance complementary inverters and ring oscillators (ROs). The complementary ROs operated at a supplied bias (V_DD) of 5 V and showed an oscillation frequency (f_osc) as high as ～80 kHz at V_DD = 30 V. Furthermore, the f_osc of the complementary ROs was significantly affected by a variety of fundamental parameters such as the electron and hole mobilities, channel width and length, capacitance of the gate dielectrics, V_DD, and the overlap capacitance in the circuit configuration.     

Realization of electrically stable organic field-effect transistors using simple polymer blended dielectrics

Organic field-effect transistors (OFETs) were fabricated using polymer blended gate dielectrics in an effort to enhance the electrical stability against a gate bias stress. A poly(melamine-co-formaldehyde) acrylated (PMFA) gate dielectric layer with great insulating properties was blended with polypentafluorostyrene (PFS), a type of hydrophobic fluorinated polymer. Although the overall electrical performance dropped slightly due to the rough and hydrophobic surfaces of the blend films, at the blend ratio (10%), the OFET’s threshold voltage shift under a sustained gate bias stress applied over 3 h decreased remarkably compared with an OFET based on a PMFA dielectric alone. This behavior was attributed to the presence of the hydrophobic and electrically stable PFS polymer, which provided a low interfacial trap density between the gate dielectric and the semiconductor. A stretched exponential function model suggested that the energetic barrier to create trap states was high, and the distribution of energetic barrier heights was narrow in devices prepared with PFS.     

Detection of explosive analytes using a dendrimer-based field-effect transistor

We report the detection of nitroaromatic vapors using a top-contact, bottom-gate organic field-effect transistor (OFET) by monitoring changes in the drain current. The active channel of the OFET contains a first generation dendrimer comprised of a spirobifluorene core, carbazole branching moieties, and fluorenyl surface groups. It is found that operating the device with pulsed gating reduces the bias stress and improves operational stability. p-Nitrotoluene (pNT) is used as the archetypical high electron affinity explosive analyte to demonstrate the sensing capability. Penetration and diffusion of pNT vapor into the dendrimer active channel is found to result in charge trapping and a resultant decrease of the carrier mobility and drain current. At room temperature the pNT is strongly bound to the dendrimer of the channel resulting in a prolonged and persistent response. However, the OFET performance is restored by heating the device at 80 °C for 5 min, which releases the pNT from the dendrimer layer.     

Phonon-scattering effects in CNT-FETs with different dimensions and dielectric materials

The impact of acoustic and optical phonon scattering on the performance of CNT-FETs is investigated using a full-quantum transport model within the NEGF formalism. Different gate lengths, dielectric materials and chiralities are considered. It is shown that the use of a high-κ dielectric lowers the off-current dominated by phonon-assisted band-to-band tunneling. The device scalability is demonstrated: with the oxide thickness fixed to 1.5 nm, good performance is obtained with 15 nm and 10 nm gate lengths with SiO₂ and HfO₂ gate dielectrics, respectively. The role of phonon scattering in CNT-FETs of different chiralities is investigated for the HfO₂ devices. A similar analysis has also been carried out for source/drain underlap geometries. The results confirm that the calculation of the off-currents and delay times is strongly influenced by phonon scattering.     

High mobility and low operation voltage organic field effect transistors by using polymer-gel dielectric and molecular doping

In this work, we present a method to increase the performance in solution processed organic field effect transistors (OFET) by using gel as dielectric and molecular doping to the active organic semiconductor. In order to compare the performance improvement, Poly (methylmethacrylate) (PMMA) and Poly (3-hexylthiophene-2,5-diyl) P3HT material system were used as a reference. Propylene carbonate (PC) is introduced into PMMA to form the gel for using as gate dielectric. The mobility increases from 5.72×10⁻³ to 0.26 cm² V s^–1 and operation voltage decreases from −60 to −0.8 with gel dielectric. Then, the molecular dopant 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ) is introduced into P3HT via co-solution. The mobility increases up to 1.1 cm² V s^–1 and the threshold voltage downs to −0.09 V with doping. The increase in performance is discussed in terms of better charge inducing by high dielectric properties of gel and trap filling due to the increased carrier density in active semiconductor by molecular doping.     

The role of water in the device performance of n-type PTCDI-C8 organic field-effect transistors with solution-based gelatin dielectric

Gelatin is a natural protein, which works well as the gate dielectric for N,N-dioctyl-3,4,9,10-perylene tetracarboxylic diimide (PTCDI-C₈) organic field-effect transistors (OFETs). An aqueous solution process was applied to form the gelatin gate dielectric on poly(ethylene terephthalate) (PET) by spin-coating and subsequent casting. The field-effect mobility in the saturation regime (μ_FE,sat) and the threshold voltage (V_T) values of a typical 40 nm PTCDI-C₈ OFET are (0.22 cm² V⁻¹ s⁻¹, 55 V) in vacuum and (0.74 cm² V⁻¹ s⁻¹, 2.6 V) in air ambient. The maximum voltage shift in hysteresis is also reduced from 10 V to 2 V when the operation environment for PTCDI-C₈ OFETs is changed from vacuum to air ambient. Nevertheless, a slight reduction of electron mobility was found when the device was stressed in the air ambient. The change in the device performance has been attributed to the charged ions generation owing to water absorption in gelatin in air ambient.     

Novel organic inverters with dual-gate pentacene thin-film transistor

We report on the fabrication and characterization of dual-gate pentacene organic thin-film transistors (OTFTs) with plasma-enhanced atomic-layer-deposited (PEALD) 150 nm thick Al₂O₃ as a bottom-gate dielectric and PEALD 200 nm thick Al₂O₃ as a top-gate dielectric. The V_th of dual-gate OTFT has changed systematically with the application of voltage bias to top-gate electrode. When voltage bias from −10 V to 10 V is applied to top gate, V_th changes from 1.95 V to −9.8 V. Two novel types of the zero drive load logic inverter with dual-gate structure have been proposed and fabricated using PEALD Al₂O₃ gate dielectrics. Because the variation of V_th due to chemical degradation and the spatial variation of V_th are inherent in OTFTs, the compensation technology by dual-gate structure can be essential to OTFT applications.     

Organic field-effect transistors based on low-temperature processable transparent polymer dielectrics with low leakage current

A solution-based transparent polymer was investigated as the gate dielectric for organic field-effect transistors (OFETs). Organic thin films (400 nm) are readily fabricated by spin-coating a polyhydrazide solution under ambient conditions on the ITO substrates, followed by annealing at a low temperature (120 °C). The smooth transparent dielectrics exhibited excellent insulating properties with very low leakage current densities of ～10^?8 A/cm². High performance OFETs with evaporated pentacene as organic semiconductor function at a low operate voltage (?15 V). The mobility could reach as high as 0.7 cm²/Vs and on/off current ratio up to 10⁴. Solution-processed TIPS-pentacene OFETs also work well with this polymer dielectric.     

Enhanced performance of room temperature ammonia sensors using morphology-controlled organic field-effect transistors

Developing electronic sensors for ammonia (NH₃) is very useful for environmental monitoring and diagnostic purposes. In this work, a highly sensitive, organic field-effect transistor (OFET) based, room temperature sensor for NH₃ has been fabricated using dinaphtho [2,3-b:2′,3′-f]thieno [3,2-b]thiophene (DNTT), which showed a fast response to low concentration of the analyte down to 100 ppb. A thin film of solution-processed polymethyl methacrylate (PMMA) has been used as the gate dielectric material and its hydrophobic surface promoted structured growth of organic semiconductor, DNTT, by inducing mass transfer. By controlling the thickness and thereby exploiting the growth dynamics of the semiconductor film, the sensor performance was improved. The sensitivity of the device towards 1 ppm of NH₃ was almost doubled with a thinner and porous film of DNTT as compared to that with a thick film. Morphological studies of the sensing layers, using atomic force microscopy (AFM), have established this structure-property relation. The variations in different transistor parameters have been studied with respect to different analyte concentrations. The p-channel devices in the enhancement mode showed depletion upon exposure to NH₃. The devices exhibited a fast response and good recovery to the initial state within 2 min.     

Benzopyrazine-fused tetracene derivatives: Thin-film formation at the crystalline mesophase for solution-processed hole transporting devices

Benzopyrazine-fused tetracene (TBPy) and its disulfide (TBPyS) bearing alkoxy groups (OCH₃, OC₈H₁₇) were designed and synthesized to obtain π-expanded tetracene derivatives. These derivatives are featured with long-wavelength light absorption property (λ_onset: up to 820 nm), photooxidative stability (half-lives (τ_1/2): 11 times longer than tetracene), and solubility for solution process. The methoxy compounds (TBPy-C1 and TBPyS-C1) were used for single-crystal X-ray crystallographic analysis and single-crystal organic field-effect transistor (OFET) devices showing relationship between packing structures and hole mobilities. The octyloxy compounds (TBPy-C8 and TBPyS-C8) were investigated on solution-processed thin-film formation and hole transport property in thin-film OFET devices. Crystalline mesophase of TBPy-C8 and TBPyS-C8 was characterized by differential scanning calorimetry analysis showing endothermic peaks at 98 and 198 °C on its second heating process and exothermic peaks at 177 and 76 °C on its second cooling process for TBPyS-C8, and played crucial roles in thin-films formation. Hole mobility of 1.7 × 10^?2 cm²/V s (with V_th = ?30 V and I_ON/I_OFF = 10⁴) was obtained for the thin-film OFET device of TBPyS-C8.     

Role of ultrathin Al2O3 layer in organic/inorganic hybrid gate dielectrics for flexibility improvement of InGaZnO thin film transistors

We investigated flexible amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) on a polyimide (PI) substrate by using organic/inorganic hybrid gate dielectrics of poly-4vinyl phenol (PVP) and ultrathin Al₂O₃. IGZO TFTs were fabricated with hybrid PVP/Al₂O₃ gate dielectrics having Al₂O₃ layers of different nanoscale thicknesses, which were deposited by atomic layer deposition (ALD). The electrical characteristics of the TFTs with the organic/inorganic hybrid gate dielectrics were measured after cyclic bending up to 1,00,000 cycles at the bending radius of 10 mm. The ultrathin Al₂O₃ layer in the hybrid gate dielectrics improved the mechanical flexibility and protected the organic gate dielectric against damage during the sputter deposition of the IGZO layer. Finite elements method (FEM) simulations along with the structural characterization of the cyclically bent device showed the importance of optimizing the thickness of the Al₂O₃ layer in the hybrid gate dielectrics to obtain mechanically stable and flexible a-IGZO TFTs.     

Addressable growth of oriented organic semiconductor ultra-thin films on hydrophobic surface by direct dip-coating

Oriented organic field-effect transistor (OFET) stripe arrays on hydrophobic substrates were fabricated by fast dip-coating technique. The addressable growth was achieved by decreasing surface energy of the channel areas with respect to the electrodes via hydrophobic treatment. The higher surface energy of the electrodes allows solution to adhere and then organic semiconductors nucleate and bridge the channels after evaporation of the solvent. Area-selective behaviour can be controlled by adjusting surface property of transistor channel, geometry features of the gold electrodes, pulling speed and evaporation atmosphere. The mechanism behind is the competition between receding of the solution and evaporating of the solvent that generate the organic semiconductor films on the substrate. The patterned bottom-contact transistor arrays exhibit carrier mobility of 2.0 × 10⁻³ cm² V⁻¹ s⁻¹, while no field-effect characteristics can be detected for bottom-contact arrays without hydrophobic treatment. Such reliable, fast and solution-based patterned OFET arrays are highly desirable for large-scale and low-cost production.     

Analysis of nanometer-scale InGaAs/InAs/InGaAs composite channel MOSFETs using high-K dielectrics for high speed applications

The outstanding electron transport properties of InGaAs and InAs semiconductor materials, makes them attractive candidates for future nano-scale CMOS. In this paper, the ON state and OFF state performance of 30 nm gate length InGaAs/InAs/InGaAs buried composite channel MOSFETs using various high-K dielectric materials is analyzed using Synopsys TCAD tool. The device features a composite channel to enhance the mobility, an InP spacer layer to minimize the defect density and a heavily doped multilayer cap. The simulation results show that MOSFETs with Al₂O₃/ZrO₂ bilayer gate oxide exhibits higher gm/I_D ratio and lower sub threshold swing than with the other dielectric materials. The measured values of threshold voltage (V_T), on resistance (R_ON) and DIBL for Lg = 30 nm In_0.53Ga_0.47As/InAs/In_0.53Ga_0.47As composite channel MOSFET having Al₂O₃/ZrO₂ (EOT = 1.2 nm) bilayer dielectric as gate oxide are 0.17 V, 290 Ω-µm, and 65 mV/V respectively. The device displays a transconductance of 2 mS/µm.     

Investigations and detections on a new BEOL dielectric failure mechanism at advanced technologies

The ultra-low k dielectrics have been widely used as semiconductor technology steps into 45 nm, 28 nm, and more advanced nodes. Combined with the rapid shrinks of critical dimensions, the ultra-low k dielectrics face challenges to retain the benefits of interconnect scaling both on their manufacturability and reliability performances. In this paper, abnormal failure phenomena were investigated on 28 nm ILD (Intra Level Dielectric) and IMD (Inter Metal Dielectric) qualifications and 40 nm mass production. A new failure mechanism of metal 1 to poly (M1-to-poly) leaky path was proposed based on theoretical investigations and experiments. Based on our newly proposed dielectric breakdown mechanism, a series of innovative test structures were designed for early detections and evaluations of reliability performances. These newly designed test structures have been proven to be useful due to better representing actual using profiles, more precise reliability evaluations, and more effective monitors on process variations at mass production.     

Ultra-thin polymer gate dielectrics for top-gate polymer field-effect transistors

We have demonstrated top-gate polymer field-effect transistors (FETs) with ultra-thin (30–50 nm), room-temperature crosslinkable polymer gate dielectrics based on blending an insulating base polymer such as poly(methyl methacrylate) with an organosilane crosslinking agent, 1,6-bis(trichlorosilyl)hexane. The top-gate polymer transistors with thin gate dielectrics were operated at gate voltages less than ?8 V with a relatively high dielectric breakdown strength (>3 MV/cm) and a low leakage current (10–100 nA/mm² at 2 MV/cm). The yield of thin gate dielectrics in top-gate polymer FETs is correlated with the roughness of underlying semiconducting polymer film. High mobilities of 0.1–0.2 cm²/V s and on and off state current ratios of 10⁴ were achieved with the high performance semiconducting polymer, poly(2,5-bis(3-alkylthiophen-2yl)thieno[3,2-b]thiophene.     

Room temperature NO2 gas sensing properties of DBSA doped PPy–WO3 hybrid nanocomposite sensor

We demonstrate the chemiresistive NO₂ gas sensor based on DBSA doped PPy–WO₃ hybrid nanocomposites operating at room temperature. The sensor was fabricated on glass substrate using simple and cost effective drop casting method. The gas sensing performance of sensor was studied for various toxic/flammable analytes like NO₂, C₂H₅OH, CH₃OH, H₂S and NH₃. The sensor shows higher selectivity towards NO₂ gas with 72% response at 100 ppm. Also the sensor can successfully detect low concentration of NO₂ gas upto 5 ppm with reasonable response of 12%. Structural, morphological and compositional analyses evidenced the successful formation of DBSA doped PPy–WO₃ hybrid nanocomposite with uniform dispersion of DBSA into PPy–WO₃ hybrid nanocomposite and enhance the gas sensing behavior. We demonstrated that DBSA doped PPy–WO₃ hybrid nanocomposite sensor films shows excellent reproducibility, high stability, moderate response and recovery time for NO₂ gas in the concentration range of 5–100 ppm. A gas sensing mechanism based on the formation of random nano p–n junctions distributed over the surface of the sensor film has been proposed. In addition modulation of depletion width takes place in sensor on interaction with the target NO₂ gas has been depicted on the basis of schematic energy band diagram. Impedance spectroscopy was employed to study bulk, grain boundary resistance and capacitance before and after exposure of NO₂ gas. The structural and intermolecular interaction within the hybrid nanocomposites were explored by Raman and X-ray photoelectron spectroscopy (XPS), while field emission scanning electron microscopy (FESEM) was used to characterize surface morphology. The present method can be extended to fabricate other organic dopent-conducting polymer–metal oxide hybrid nanocomposite materials and could find better application in the gas sensing.